WorldWideScience
1

Effect of hydrostatic pressure on photoluminescence spectra from structures with Si nanocrystals fabricated in SiO_2 matrix  

International Nuclear Information System (INIS)

The effect of hydrostatic pressure applied at high temperature on photoluminescence of Si-implanted SiO_2 films was studied. A 'blue'-shift of PL spectrum from the SiO_2 films implanted with Si"+ ions to total dose of 1.2x10"1"7 cm"-"2 with increase in hydrostatic pressure was observed. For the films implanted with Si"+ions to a total dose of 4.8x10"1"6 cm"-"2 high temperature annealing under high hydrostatic pressure (12 kbar) causes a 'red'-shift of photoluminescence spectrum. The 'red' photoluminescence bands are attributed to Si nanocrystals while the 'blue' ones are related to Si nanocrystals of reduced size or chains of silicon atoms or Si-Si defects. A decrease in size of Si nanocluster occurs in result of the pressure-induced decrease in the diffusion of silicon atoms. (author)

2001-09-23

2

Mechanism for the reduction of interstitial supersaturations in MeV-implanted silicon  

International Nuclear Information System (INIS)

We demonstrate that the excess vacancies induced by a 1 MeV Si implant reduce the excess interstitials generated by a 40 keV Si implant during thermal annealing when these two implants are superimposed in silicon. It is shown that this previously observed reduction is dominated by vacancy annihilation and not by gettering to deeper interstitial-type extended defects. Interstitial supersaturations were measured using B doping superlattices (DSL) grown on a silicon-on-insulator (SOI) substrate. Implanting MeV and keV Si ions into the B DSL/SOI structure eliminated the B transient enhanced diffusion normally associated with the keV implant. The buried SiO_2 layer in the SOI substrate isolates the deep interstitials-type extended defects of the MeV implant, thereby eliminating the possibility that these defects getter the interstitial excess induced by the keV Si ...

1999-03-01

3

Effects of ion irradiation on the diffusion of pre-implanted B atoms in crystalline silicon  

International Nuclear Information System (INIS)

N-type crystalline Si (100) implanted with 5 keV B ions was subsequently irradiated with MeV Si, O and F ions. The B atom profiles were measured by means of secondary ion mass spectrometer after the treatment of rapid thermal annealing. The results show that the transient enhanced diffusion of B atoms is effectively limited by the post-implantation of high energy ions at high dose. At the same irradiation conditions, it is found that the existence of a SiO_2 layer in the near surface of Si is even more effective in suppressing the transient enhanced diffusion of the doped B atoms. The results are qualitatively discussed in combination with the analyses of RBS/c measurements and calculation of the DICADA code

2001-12-01

4

Implantation damage and anomalous diffusion of implanted boron in silicon through SiO_2 films  

International Nuclear Information System (INIS)

Boron is implanted in crystalline silicon through oxide layers with different thicknesses. The implantation is carried out at various doses and energies of interest in ultra large scale integration (ULSI) application. Rapid thermal annealings (RTA) are used to obtain shallow junctions and electrical activation of the B atoms. However, transient enhanced diffusion induced by implantation damage can be observed. The boron concentration profiles before and after annealing are obtained with secondary ion mass spectrometry (SIMS). It is found that the diffusion transient in the tail region of the boron profile increases with decreasing oxide thickness. Even more, if the implantation damage concerns mostly the oxide, i.e. when the concentration peak is located in this oxide, the oxygen knocked into the silicon substrate could play this way an important role in restricting the boron diffusion, which is good to ...

5

Effect of nitrogen segregation on TED and loss of phosphorus in CZ-Si  

International Nuclear Information System (INIS)

Transient enhanced diffusion (TED) and dose loss (pile-up) are investigated for phosphorus-implanted samples covered with both oxide and nitride films. P ions were implanted into p-type (1 0 0) CZ-Si (dose 5x10"1"3 cm"-"3, 100 keV) through a chemical vapor deposition (CVD) Si_3N_4 film. For a half of samples, Si_3N_4 was etched off and SiO_2 films were grown by CVD. Both samples were annealed for 20-360 min at 700 deg. C. Diffusivity of P and the dose loss were estimated based on the secondary-ion mass spectrometry (SIMS) P profiles. Both Si/Si_3N_4 and Si/SiO_2 interfaces were investigated with transmission electron microscopy (TEM) and electron energy-loss spectroscopy (EELS). There is no significant difference in P diffusivity between the SiO_2 and Si_3N_4 films for the present annealing condition of 700 deg. C for 20-360 min. Regarding dose loss, a distinct different behavior was observed. In case of the SiO_2 cover film, amount of dose ...

2002-01-01

7

Rare-earth doped (#alpha#'/#beta#')-sialon ceramics  

International Nuclear Information System (INIS)

The objectives of this research were to investigate the possibility of controlling the #alpha#'/#beta#' phase ratio and morphology in Sialon ceramics. These objectives have been sought by the control of the starting composition, and by post sintering heat treatment. The main emphasis has been on the production of a series of #alpha#' and (#alpha#'+#beta#') Sialon ceramics with a minimum amount of the glass phase by the pressureless sintering technique and using ytterbium (Yb) as an #alpha#' stabilising element. The Yb additions were made via the oxide or the alumino- silicate presynthesised glass; the latter was found to improve the density. The XRD analysis of the as sintered materials revealed #alpha#' to be the dominant phase with minor contributions from #beta#' sialon and/ or 12H A1N polytype. Additions of SiO_2 or #beta#-Si_3N_4 were made to various materials to assess potential mechanisms for obtaining control over the microstructural development of #alpha#'/#beta#' sialon ...

8

Influence of high energy electron irradiation on the characteristics of polysilicon thin film transistors  

International Nuclear Information System (INIS)

The influence of high energy electron (23 MeV) irradiation on the electrical characteristics of p-channel polysilicon thin film transistors (PSTFTs) was studied. The channel 220 nm thick LPCVD (low pressure chemical vapor deposition) deposited polysilicon layer was phosphorus doped by ion implantation. A 45 nm thick, thermally grown, SiO_2 layer served as gate dielectric. A self-alignment technology for boron doping of the source and drain regions was used. 200 nm thick polysilicon film was deposited as a gate electrode. The obtained p-channel PSTFTs were irradiated with different high energy electron doses. Leakage currents through the gate oxide and transfer characteristics of the transistors were measured. A software model describing the field enhancement and the non-uniform current distribution at textured polysilicon/oxide interface was developed. In order to assess the irradiation-stimulated changes of gate oxide parameters the gate oxide tunneling conduction ...

2006-08-01

10

Selective formation of ZnO nanodots on nanopatterned substrates by metalorganic chemical vapor deposition  

International Nuclear Information System (INIS)

Selective formation of ZnO nanodots was accomplished by metalorganic chemical vapor deposition on nanopatterned SiO_2/Si substrates. Self-organized ZnO nanodots were selectively formed in nanopatterned lines of Si created by etching of SiO_2 with focused ion beam (FIB), whereas any nanodots were hardly observed on the SiO_2 surface in the vicinity of the FIB-sputtered Si areas. The mechanism of the selective formation of ZnO nanodots on FIB-nanopatterned lines is mainly attributed to the effective migration of Zn adatoms diffusing on the SiO_2 surface into the Si lines followed by the nucleation at surface atomic steps and kinks created by Ga"+ ion sputtering. Cathodoluminescence measurements confirmed that the emission originated from the selectively grown ZnO nanodots.

2003-10-27

11

Formation of SiO2 protective coating on SUS 304 stainless steel by chemical vapor deposition using TEOS-O3 gas system. TEOS-O3 kei CVD ni yoru SUS 304 stainless kojo eno SiO2 boshoku hifuku no keisei  

Energy Technology Data Exchange (ETDEWEB)

The passive films formed in stainless steels are thin and fine oxide films, a high corrosion resistance can be provided by these films. This study formed SiO2 protective coating on the substrate of SUS 304 stainless steels by chemical vapor deposition using TEOS-O3 system. Firstly, relations of substrate temperature and deposition rate of films, chemical composition, refractive index of films were investigated. Then, the corrosion resistance of SUS 304 stainless steels coated SiO2 films was examined by activation time and an anodic polarization curve in 1 kmol[center dot]m[sup -3] HCl solution. The results were obtained as follows. Thickness of SiO2 films linearly increases with time at the deposition temperature of 473 to 673 K. Si-OH bonds would disappear above the deposition temperature of 573 K, almost perfect SiO2 films were obtained. The activation time in 1 kmol[center dot]m[sup -3] HCl solution increased with increase of thickness of SiO2 films. 21 refs., 11 figs., 1 tab.

1993-05-15

12

Rapid self-assembly of Ni nanodots on Si substrate covered by a less-adhesive and heat-accumulated SiO_2 layers  

International Nuclear Information System (INIS)

Rapid self-aggregation of Ni nanodots on Si substrate covered with a thin SiO_2 buffered layer is investigated. The Ni nanodots can hardly self-aggregate on highly heat-dissipated Si substrate with a thermal conductivity of 148 W/m K. Adding a 200-A-thick SiO_2 buffer with an ultralow thermal conductivity of 1.35 W/m K prevents the formation of NiSi_2 compounds, enhances the heat accumulation, and releases the adhesion at Ni/Si interface, which greatly accelerates the self-assembly of Ni nanodots. Dense Ni nanodots with size and density of 30 nm and 7x10"1"0 cm"-"2, respectively, can be formatted after rapid thermal annealing at 850 deg. C for 22 s.

2006-08-14

13

A facile process for preparing superhydrophobic films with surface-modified SiO2/nylon 6,6 nanocomposite  

British Library Electronic Table of Contents (United Kingdom)

A superhydrophobic SiO2/nylon 6,6 nanocomposite coating was fabricated by a facile casting process. Compared with the intrinsically hydrophilic pure nylon 6,6, the as-prepared coating displayed a superhydrophobic property in the pH range from 1 to 14. It was also found that the resulting water contact angles of the as-prepared surface were always larger than 159?, but the sliding angles had an obvious decrease from about 33.4??1? as the content of SiO2 nanoparticles increased. In addition, a transition from the transitional superhydrophobic state between Wenzel?s and Cassie?s state to the Cassie?s state was observed.

2011-01-01

14

Gate-oxide integrity for polysilicon thin-film transistors: a comparative study for ELC, MILC and SPC crystallized active polysilicon layer  

International Nuclear Information System (INIS)

In this paper, we present the results of Plasma-Enhanced Chemical Vapor Deposition gate-oxide (SiO_2) integrity on ELC (excimer-laser-crystallized), MILC (metal-induced lateral-crystallized) and SPC (solid-phase-crystallized) polysilicon films. We observed that gate oxide strength of poly-Si TFT strongly depends on the crystallization method for the active silicon layer. In the case of ELC films, asperities on the silicon surface reduce the SiO_2 breakdown field significantly. The metallic contaminants in MILC films are responsible for a deleterious impact on gate oxide integrity. Among the three cases, the SiO_2 breakdown field was the highest for the SPC silicon films. The breakdown fields at the 50 % failure points in Weibull plots for the ELC, MILC and SPC cases were 5.1 MV/cm, 6.2 MV/cm, and 8.1 MV/cm, respectively. We conclude that the roughness and metallic contamination of the poly-Si films are the main factors that cause enhanced breakdown of SiO_2 films.

2006-01-01

15

Electron and ion beam effects in amorphous SiO_2 and Si_3N_4 films for electronic devices  

International Nuclear Information System (INIS)

The effect of electron and ion beam irradiation on the Sisub(LVV) Auger spectra of SiO_2, Si_3N_4 and Si-oxynitride films was measured by the relative intensity of the 92 eV signal, characteristic for the formation of 'free' silicon during irradiation. While in Si-oxynitride the beam effects were almost negligible, some damage was found in Si_3N_4, but SiO_2 appeared to be extremely sensitive for electron and ion beam irradiation. By low energy electron loss spectroscopy of ion bombarded SiO_2 and Si_3N_4 films new electron states due to broken Si-O and Si-N bonds could be determined within the band gap of the insulators. The measured energy losses were interpreted by means of electron energy level schemes of the amorphous films. (author).

1982-01-01

16

Photochemical generation of E' centre from Si-H in amorphous SiO2 under pulsed ultraviolet laser radiation  

CERN Document Server

In situ optical absorption spectroscopy was used to study the generation of E' centres in amorphous SiO_2 occurring by photo-induced breaking of Si-H groups under 4.7eV pulsed laser radiation. The dependence from laser intensity of the defect generation rate is consistent with a two-photon mechanism for Si-H rupture, while the growth and the saturation of the defects are conditioned by their concurrent annealing due to reaction with mobile hydrogen arising from the same precursor. A rate equation is proposed to model the kinetics of the defects and tested on experimental data.

2006-01-01

17

Impact of palladium silicide formation on the catalytic properties of Pd/SiO2 catalysts in liquid-phase semihydrogenation of phenylacetylene  

British Library Electronic Table of Contents (United Kingdom)

Palladium silicide was formed on the sol-gel derived SiO2 supported Pd catalysts prepared by ion-exchange method (Pd/SiO2-SG-ion). However, the catalysts exhibited superior performances than commercial SiO2 supported ones in liquid-phase semihydrogenation of phenylacetylene. It was probably due to an inhibition of a product of styrene, which is adsorbed on the surface of Pd, more strongly on Pd/SiO2-SG in which Pd is electron-deficient as shown by larger binding energy from XPS results.

2007-01-01

18

A kinetic and mechanistic study of the oxidation of silicon- and thin metal silicide layers  

International Nuclear Information System (INIS)

The formation of thin SiO_2 layers on silicon and metal silicides was studied by phase- and thickness measurements with Rutherford back-scattering of 2 MeV alfa particles. Thermal oxidation was done in steam and dry oxygen at temperatures between 750 degrees Celsius and 1 100 degrees Celsius, while SiO_2 formation at room temperature was carried out by anodic oxidation. The study of silicon oxidation was done on Si<100>, Si<111> and amorphous silicon substrates. Thermal oxidation of CoSi_2, CrSi_2, NiSi_2, PtSi and TiSi_2 was investigated. The oxidation rates of the silicides were found to be much higher than for silicon. The oxidation process is also diffusion-limited with a higher oxidation rate for steam as compared to dry oxygen. The silicide layers were found to stay intact during thermal oxidation. A certain amount of structural and chemical instability did appear. Chemical instabiliy was shown by metal oxidation which led to metal atoms being incorporated into the ...

19

Magnetic properties of FePt nanodots formed by a self-assembled nanodot deposition method  

International Nuclear Information System (INIS)

Fe_5_0Pt_5_0 nanodots dispersed in a SiO_2 film (Fe_5_0Pt_5_0 nanodot film) were formed by a self-assembled nanodot deposition (SAND) method in which Fe_5_0Pt_5_0 and SiO_2 are cosputtered in a high vacuum rf magnetron sputtering equipment. Fe_5_0Pt_5_0 pellets are laid on a SiO_2 target in a sputtering chamber to form the Fe_5_0Pt_5_0 nanodot film in the SAND method. The size and density of Fe_5_0Pt_5_0 nanodot were controlled by changing the ratio of the total area of Fe_5_0Pt_5_0 pellets to that of SiO_2 target. The Fe_5_0Pt_5_0 nanodot size decreases and its density increases when the ratio decreases. As-deposited Fe_5_0Pt_5_0 nanodots self-assembled to a face-centered-cubic phase of single-crystal structure. The Fe_5_0Pt_5_0 nanodot films were annealed to evaluate the nanodot size controllability, the magnetic anisotropy, and the thermal stability. Fully ordered L1_0 face-centered-tetragonal Fe_5_0Pt_5_0 nanodots with high magnetocrystalline anisotropy (K_u congruent with 8.7x10"7 ...

2006-08-07

20

In vitro toxicity of silica nanoparticles in human lung cancer cells  

International Nuclear Information System (INIS)

The cytotoxicity of 15-nm and 46-nm silica nanoparticles was investigated by using crystalline silica (Min-U-Sil 5) as a positive control in cultured human bronchoalveolar carcinoma-derived cells. Exposure to 15-nm or 46-nm SiO_2 nanoparticles for 48 h at dosage levels between 10 and 100 #mu#g/ml decreased cell viability in a dose-dependent manner. Both SiO_2 nanoparticles were more cytotoxic than Min-U-Sil 5; however, the cytotoxicities of 15-nm and 46-nm silica nanoparticles were not significantly different. The 15-nm SiO_2 nanoparticles were used to determine time-dependent cytotoxicity and oxidative stress responses. Cell viability decreased significantly as a function of both nanoparticle dosage (10-100 #mu#g/ml) and exposure time (24 h, 48 h, and 72 h). Indicators of oxidative stress and cytotoxicity, including total reactive oxygen species (ROS), glutathione, malondialdehyde, and lactate dehydrogenase, were quantitatively assessed. Exposure to SiO_2 nanoparticles increased ROS ...

2006-12-15

21

FT-IR spectroscopic studies of tin-modified rhenium alumina-silica metathesis catalyst  

International Nuclear Information System (INIS)

FT-IR spectra of the products obtained in each step of the tetramethyltin (TMT)/3-wt.% Re_2O_7/Al_2O_3-SiO_2 and TMT/Al_2O_3-SiO_2 system preparation are presented and discussed. The obtained spectra show that TMT reacts with alumina-silica hydroxyl groups already at room temperature, yielding surface methyltin compounds; NH_4ReO_4 reacts with alumina-silica surface at temperatures up to 423 K, yielding rhenium surface species and ammonia, which is strongly bonded by acidic sites of the Broensted kind. FT-IR spectrum of the system (TMT)/3-wt.% Re_2O_7/Al_2O_3-SiO_2 indicated the absence of surface methyl tin compounds observed on the surface system TMT/Al_2O_3-SiO_2 , and the presence of physically adsorbed TMT; after 5 h of evacuation of the TMT/3-wt.% Re_2O_7/Al_2O_3-SiO_2 system, the FT-IR spectrum indicated the presence of only a single band at 2977 cm"-"1, which may be assigned to the C-H bond stretching of the methyl group in the surface bridged (O,O')Re(=O)_2CH_3 complexes ...

2000-01-01

22

Rutherford backscattering study of the oxidation of palladium silicide on amorphous silicon substrates  

International Nuclear Information System (INIS)

Marker experiments for studying the mass transport through a palladium silicide layer on a crystalline substrate during thermal oxidation at 700 to 850 deg C have been reported recently. In this work argon gas embedded in amorphous silicon during sputtering was implemented as the inert marker and the oxidation of PdSi was processed above 900 deg C. At this high-temperature oxidation silicon-rich silicide PdSisub(y), with y exceeding 5, may be obtained. This can be anticipated by considering the Pd-Si phase diagram which shows the liquid phase may appear at an annealing temperature above 892 deg C. As a result, a non-stoichiometric and non-uniform silicide layer may develop at the sample surface. Marker analysis showed that both palladium and silicon dissociated at the Pdsub(x)Si/ SiO_2 interface and moved to the substrate with the silicon being the dominant diffuser. The Rutherford backscattering spectra (RBS) showing the oxide film and composition isothermally annealed at 900 deg C is ...

23

Role of yttria-stabilized zirconia produced by ion-beam-assisted deposition on the properties of RuO_2 on SiO_2/Si  

International Nuclear Information System (INIS)

Highly conductive biaxially textured RuO_2 thin films were deposited on technically important SiO_2/Si substrates by pulsed laser deposition, where yttria-stabilized zirconia (YSZ) produced by ion-beam-assisted-deposition (IBAD) was used as a template to enhance the biaxial texture of RuO_2 on SiO_2/Si. The biaxially oriented RuO_2 had a room-temperature resistivity of 37 #mu##OMEGA#-cm and residual resistivity ratio above 2. We then deposited Ba_0_._5Sr_0_._5TiO_3 thin films on RuO_2/IBAD-YSZ/SiO_2/Si. The Ba_0_._5Sr_0_._5TiO_3 had a pure (111) orientation normal to the substrate surface and a dielectric constant above 360 at 100 kHz. copyright 1998 Materials Research Society.

1998-09-01

24

Up-conversion luminescence saturation under pulsed excitation of erbium-doped, SiO_2-TiO_2 sol-gel powders  

International Nuclear Information System (INIS)

The intensity of erbium up-conversion luminescence could be limited by a saturation effect due to increased pump power. We studied the luminescence saturation of the 550 nm emission on erbium-doped, SiO_2-TiO_2 sol-gel powders under pulsed excitation at 979 and 1532 nm. From the latter, the up-converted luminescence intensity decreased with increasing excitation power, whereas no saturation was observed at 979 nm excitation. We proposed that the saturation effect is determined by the pump power, the erbium content and the lifetime of the corresponding first excited states at different pumping schemes.

2010-12-01

25

Ru/SiO2 AND CuRu/SiO2 PREPARED BY SOL-GEL: EFFECT OF pH AND WATER AMOUNT  

Scientific Electronic Library Online (English)

Abstract in english Ru(1%)/SiO2 and Cu(1%)Ru(1%)/SiO2 catalysts were prepared by cogelation. The effect of pH and the amount of water on the physical-chemical properties and the catalytic properties of them were analyzed. The acid medium increased the formation of microporosity and the formation of small size of metallic ruthenium particle. The variation of the water quantity used in the gelation not modify considerably the texture neither the dispersion of the noble metal. The reduction lev (more) el of all prepared catalyst was similar, showing displacement in some of reduction peaks. The toluene hydrogenation indicated that the conversion and the quantity of hydrogenate product varied with the pH and the quantity of water used in the gelation. The addition of copper to Ru/SiO2 catalysts diminished the reactive conversion and their hydrogenant activity

2003-06-01

26

Effects of carbon fiber surface treatment on the friction and wear behavior of 2D woven carbon fabric/phenolic composites  

British Library Electronic Table of Contents (United Kingdom)

To improve the friction and wear behavior of carbon fabric reinforced polymer composites (CFRP), nano-SiO2 was deposited on the fabric surface. The friction and wear behavior of the resulting composites were investigated on a model ring-on-block test rig. Experimental results revealed that fiber surface treatment contributed to largely improve the tribological properties of the CFRP composites. Scanning electron microscope (SEM) investigation showed that the worn surface of the surface modified CFRP composite was smoother under given load and sliding rate. Field emission scanning electron microscopy (FESEM), FTIR and X-ray photoelectron spectroscopy (XPS) studies of the carbon fiber surface showed that nanostructured Sio2 thin film can be obtained by SiO2 sols deposition, which improved th...

2009-01-01

27

Chemical state analysis of Si-base ceramics sliding materials by EPMA  

International Nuclear Information System (INIS)

The purpose of the present study is to develop a new method for chemical state analysis by means of EPMA(Electron probe microanalyser). The measured X-ray intensity of Si-K#beta# characteristic X-ray spectra were read-out by a 16 bit microcomputer with a RS-232C interface. And using the curve fitting method the quantitative analysis of chemical compositions in a ternary compound that constituted of the same element has been established. The present method was applied to analyse of the friction and wear properties of Si-base ceramics sliding materials. It was found that the wear debris contains both the compositions of the sliding materials and SiO_2, and the SiO_2 contents in wear debris was changed with relative humidity. The results clearly showed that the proposed method is very useful for determing the compositions in the ternary compound. (author).

29

TIMBER TOP - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

The Gateway to Astronaut Photography of Earth hosts the best and most complete online collection of astronaut photographs of the Earth.

30

TIMBER CREEK - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

The Gateway to Astronaut Photography of Earth hosts the best and most complete online collection of astronaut photographs of the Earth.

31

BIG TIMBER - The Gateway to Astronaut Photography of Earth - NASA  

Science.gov (United States)

The Gateway to Astronaut Photography of Earth hosts the best and most complete online collection of astronaut photographs of the Earth.

32

High resolution transmission electron microscopy of a #beta#'-sialon-TiN nanocomposite  

International Nuclear Information System (INIS)

TEM and HRTEM have been used to characterise the microstructures of materials formed by hot-pressing silicon nitride with an Al_2O_3-SiO_2-TiO_2 densification aid system, to form #beta#'-sialon-TiN composites in which the TiN particles are of 20-100 nm dimension. (orig.).

1992-06-21

33

ESCA-investigations of the passive films formed on austenitic stainless steels in nitric acid  

International Nuclear Information System (INIS)

By means of ESCA the composition and the thickness of passive films formed on austenitic stainless steels were investigated after the attack of nitric acid at various temperatures and acid concentrations. The outermost layers of the oxide film consist of SiO_2, then a layer rich of Cr-oxid follows, containing also some Mo in the four- and sixvalent state. Ni does not contribute to the oxide film. Cr is also enriched in the metal just below the oxide film. (orig.).

1978-01-01

34

Oxygen Implanted Materials  

International Science & Technology Center (ISTC)

Development of Oxygen Ion-Implanted Collector materials for Thermal Emission Converters of Thermal Energy into the Electric One.

35

Control of Phosphorus Transient Enhanced Diffusion using Co-implantation  

CERN Document Server

Control of Phosphorus Transient Enhanced Diffusion using Co-implantation

2006-01-01

36

Visible Earth: Typhoon Aere  

Science.gov (United States)

NASA's Visible Earth catalog of NASA images and animations of our home planet.

37

Organisation of care for Swedish patients with an implantable cardioverter defibrillator, a national survey  

British Library Electronic Table of Contents (United Kingdom)

Aim.- To describe the clinical aspects of implantable cardioverter defibrillators care in Sweden with focus on organisation, the role and education of nurses, patient information and education and areas in need of improvement. Background.- Implantable cardioverter defibrillators implantations have developed rapidly in recent years and are now an established arrhythmia treatment. The expanding indication for implantable cardioverter defibrillators implantation demands new competencies and resources in the implantable cardioverter defibrillators team members. Methods.- Participants were recruited among physicians and nurses in all of the hospitals implanting implantable cardioverter defibrillators (n-=-16). Data were collected by a questionnaire. Additionally, all written educational materia...

2011-01-01

38

The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure  

British Library Electronic Table of Contents (United Kingdom)

Effective work function (m,eff) values of Ru gate electrode on SiO2 and HfO2 MOS capacitors were carefully examined and discussed from the viewpoint of an effect of oxygen incorporation in Ru gate electrode on m,eff. Annealing at 400degreeC in the reduction (3%H2) and the oxidation (1%O2) ambient resulted in similar changes in the m,eff of Ru/HfO2/SiO2 and Ru/SiO2 MOS capacitors. Furthermore, the Ru gate MOS capacitor after annealing in the oxidation condition have shown almost the same m,eff value to that of RuO2 gate MOS capacitors. The oxygen concentration in the Ru/HfO2 interface after annealing in oxidizing atmosphere is approximately one order of magnitude higher than that after annealing in reducing atmosphere as confirmed by secondary ion mass spectroscopy analysis. Furthermore, th...

2006-01-01

39

Synthesis of nano-size Ca-#alpha# SiAlON Powders by carbothermal reduction-nitridation  

International Nuclear Information System (INIS)

Carbothermal reduction-nitridation (CRN) of SiO_2 is an attractive method for manufacturing Si_3N_4 powders with controlled grain morphology. Moreover, #beta#-sialon powders could also be synthesized from either pure powder mixtures or some inexpensive raw minerals by CRN. The resultant powders have shown some advantages, especially in manufacturing sialon products at low cost. However, there have been only a few works on preparing #alpha#-sialon powders. In this work, Ca-#alpha# sialon powder was synthesized by CRN of a SiO_2-Al_2O_3 and CaCO_3 powder mixture An unusual morphology of hollow balls of 200 to 500nm with many nano size #alpha#-sialon particles of 10 to 30nm was identified from the resultant Ca-#alpha# sialon powders. This has never been previously reported for sialon ceramics. It was consequently confirmed that the morphologies of the products were clearly related to the intermediate products appearing during CRN reaction. Copyright (2000) The Australian Ceramic Society

40

Site-selective spectroscopy of Er"3"+ ions in the Bi_1_2SiO_2_0 piezoelectric crystal  

International Nuclear Information System (INIS)

Site-selective spectroscopy fluorescence experiments (emission and excitation) in the near-infrared region associated with the "4I_1_5_/_2_4I_1_1_/_2 transitions of Er"3"+ ions have been successfully used to show the presence of two different Er"3"+ centres in the Bi_1_2SiO_2_0 piezoelectric crystal. Green (545-570 nm), red (650-690 nm) and near-infrared (850-890 nm) up-converted emissions have been observed and resolved for each type of centre under excitation up to the "4_I_1_1_/_2 state. The Stark energy level schemes of the three lower energy states of Er"3"+ ions have been determined and compared for both centres, showing two quite different crystalline field environments. The mechanisms responsible for the up-conversion process (excited state absorption and/or energy transfer up-conversion) are also analysed. (author)

2001-12-03

41

Radiation effects on MOS devices and radiation-hard CMOS technologies  

International Nuclear Information System (INIS)

Total-dose irradiation seriously damages MOS devices and their circuit performance. Threshold voltage shifts, transconductance degradation and increase in off-state leakage current are generally observed for irradiated devices. These instabilities are essentially due to positive and/or negative charge trapping in SiO_2 and interface trap generation at the SiO_2/Si interface. Radiation hardening of CMOS VLSIs is to eliminate these trapping effects, and for this purpose, special considerations for fabrication processes and layout design are necessary. In this paper, basic mechanisms for radiation-induced charge trapping and related effects on MOS devices are reviewed. Also discussed are radiation-hardening technologies from both fabrication-process and layout-design viewpoints. Using these technologies, 1 #mu#m radiation-hard CMOS gate arrays have been successfully developed. Experimental data taken for 2k-gate test chips indicate that radiation hardness of these gate arrays is over 1 ...

42

Preparation of CaWO_4:Ln"3"+ SiO_2 (Ln=Tb, Dy and Ho) nanoparticles by a combustion reaction and their optical properties  

International Nuclear Information System (INIS)

The CaWO_4:Ln"3"+ SiO_2 (Ln=Tb, Dy and Ho) nanoparticles were synthesized via a combustion process at 800 "oC, using citric acid as chelating agent and fuel, ammonium nitrate as fuel, boric acid as flux material and silica as supports. The persistent phosphor nanoparticles were characterized by X-ray diffraction (XRD), reflectance UV-vis and fluorescence spectroscopy (PL) and transmission electron microscopy (TEM) techniques. XRD patterns indicated that crystalline calcium tungstate with scheelite structure was produced. The reflectance UV-vis spectra showed the broad absorption band of WO_4"2"- groups and the PL spectra showed the WO_4"2"- wide excitation band, broad emission band of WO_4"2"- and characteristic emissions of Ln"3"+ ions. The average particle sizes were determined by TEM, which are about 50 nm.

2010-11-01

43

Modeling of the band structure of Bi_2Se_2Te crystallites deposited on Si and SiO_2 substrates  

International Nuclear Information System (INIS)

The band structure (BS) of crystalline Bi_2Se_2Te both pure as well as deposited on Si or SiO_2 (substrates) was calculated for the first time. The calculation approach consists of an orthogonalization of the plane wave basis set with respect to the core-like orbitals and the application of the Perdew-Alder exchange-correlation scheme. In addition, a virtual crystal approach was applied. Experimental ellipsometric spectra were used as a criterion of the advantages of the different calculation techniques. The results of traditional one-electron methods of BS calculations, using norm-conserving pseudo-potential (NCPP), and full linear augmented plane wave (FLAPW), were compared with the experimental data. Better agreement with experiment is achieved when the NCPP wave functions are orthogonalized to the 4dBi core-like states. Concerning the LMTO and the FLAPW all-electron methods, only appropriate application of the virtual crystal approximation to these approaches produces results that ...

2004-06-15

44

Effect of chemical composition of SiOx films on rapid formation of Si nanocrystals induced by thermal plasma jet irradiation  

British Library Electronic Table of Contents (United Kingdom)

Si nanocrystal floating gate MOS capacitors were formed on p-Si (100) wafers by thermal plasma jet (TPJ) annealing of SiO2/SiOx /SiO2/Si(100) stacked structure. The chemical composition of SiOx layer was controlled by changing the SiH4, He, and O2 gas flow ratio during plasma enhanced chemical vapour deposition. The MOS capacitors showed clear hysteresis in capacitance-voltage (CV) characteristics after TPJ annealing. The hysteresis width shows maximum value when initial composition x =1.7, which shows the maximum photoluminescence (PL) intensity. The maximum hysteresis width of 6.8 V was observed with gate voltage swept between 20 and -20 V in x = 1.7 sample. The result means 7.4 x 1012 cm-2 carriers are injected to or emitted from Si nanocrystals. The duration of 1 V shift in flatband vo...

2010-01-01

45

Deposition of Cu film on SiO_2 using a partially ionized beam  

International Nuclear Information System (INIS)

Ion bombardment during deposition can significantly modify the film properties. In the partially ionized beam deposition, ions derived from the depositing material, i.e., the self-ions, are used during deposition. Cu films were deposited on SiO_2 substrates at room temperature using 1% Cu self-ions with an energy ranging between 0--4 keV. We studied the microstructures of the Cu films using x-ray diffraction and transmission electron microscopy, measured the impurity level inside the films using secondary ion mass spectrometry, and performed the resistivity measurements using a four point probe. The results indicate that there is an optimum ion energy around 2 keV at which, the integrated x-ray intensity ratio I(111)/I(200) reaches its maximum value indicating a strong left-angle 111 right-angle texture, while the impurity concentration and resisitivity are minimum. The correlation between the structural, compositional and electrical properties are discussed in the framework of Mayadas ...

1990-01-01

46

Consolidated silica glass from nanoparticles  

International Nuclear Information System (INIS)

A dense silica glass was prepared by consolidating a highly dispersed silicic acid powder (particle size 1H magic-angle spinning (MAS) NMR confirmed an increase in hydroxyl groups in the sample prepared by SPS relative to that of the conventional SiO2 reference glass. Aside from the comparably high water content, we conclude from the similarity of the IR-reflectance and the 29Si MAS NMR spectra of the SPS sample and the corresponding spectra of the conventionally prepared silica glass, that the short- and medium-range order is virtually the same in both materials. Raman spectroscopy, however, suggests that the number of three- and four-membered rings is significantly smaller in the SPS sample compared to the conventionally prepared sample. Based on these results we conclude that it is possible to prepare glasses by compacting amorphous powders by the SPS process. The SPS process may therefore enable the preparation of glasses with compositions inaccessible by conventional methods. - ...

2008-09-01

47

Characterisation of a re-cast composite Nafion 1100 series of proton exchange membranes incorporating inert inorganic oxide particles  

International Nuclear Information System (INIS)

A series of cation exchange membranes was produced by impregnating and coating both sides of a quartz web with a Nafion solution (1100 EW, 10%wt in water). Inert filler particles (SiO_2, ZrO_2 or TiO_2; 5-20%wt) were incorporated into the aqueous Nafion solution to produce robust, composite membranes. Ion-exchange capacity/equivalent weight, water take-up, thickness change on hydration and ionic and electrical conductivity were measured in 1 mol dm"-"3 sulfuric acid at 298 K. The TiO_2 filler significantly impacted on these properties, producing higher water take-up and increased conductivity. Such membranes may be beneficial for proton exchange membrane (PEM) fuel cell operation at low humidification. The PEM fuel cell performance of the composite membranes containing SiO_2 fillers was examined in a Ballard Mark 5E unit cell. While the use of composite membranes offers a cost reduction, the unit cell performance was reduced, in practice, due to drying of the ionomer at the cathode.

2010-09-01

48

Simplified Infrastructure - NASA History Office  

Science.gov (United States)

Automated Transport. Not Studied in Detail. Earth's Neighborhood. Simplified Infrastructure. Mars. Earth-. Moon L. 1. Gateway. Moon. Earth-Sun L. 2. Science ...

49

Polysilicon TFT fabrication on plastic substrates  

Energy Technology Data Exchange (ETDEWEB)

Processing techniques utilizing low temperature depositions and pulsed lasers allow the fabrication of polysilicon thin film transistors (TFT`s) on plastic substrates. By limiting the silicon, SiO2, and aluminum deposition temperatures to 100(degrees)C, and by using pulsed laser crystallization and doping of the silicon, we have demonstrated functioning polysilicon TFT`s fabricated on polyester substrates with channel mobilities of up to 7.5 cm2/V-sec and Ion/Ioff current ratios of up to 1x10(to the 6th power).

1997-08-06

50

Outgassing study of thin films used for poly-SiGe based vacuum packaging of MEMS  

British Library Electronic Table of Contents (United Kingdom)

Thermal desorption spectroscopy (TDS) was used to study outgassing from polycrystalline SiGe (poly-SiGe), SiC and SiO"2 films used for poly-SiGe-based MEMS thin film vacuum package technology. Primary desorption products were found to be H"2, H"2O and CO"2. The CO"2 outgassing could be correlated with CF"4 plasma interface cleaning used for thick SiGe PECVD, which can leave carbon at the CF"4-plasma-cleaned interface.

2011-01-01

51

Nanocrystalline #beta#-sialon by reactive sintering of a SiO_2-AlN mixture subjected to high-energy ball milling  

International Nuclear Information System (INIS)

A mixture of powders of silica and aluminum nitride is subjected to high-energy ball milling for different milling times. This material is subsequently compacted by uniaxial pressing and sintered at 1450 deg. C. The resulting pellets are crushed and analysed by X-ray diffraction. For short milling times, the amount of phase transformation is minimal and the resulting material mostly consists of cristobalite and aluminum nitride. For long milling times, nanocrystalline #beta#-SiAl_2O_2N_2 is mainly produced.

2005-04-05

52

Ionizing radiation hardening procedure of CCD's  

International Nuclear Information System (INIS)

The procedure of charge-coupled devices (CCD) are investigated by using MOS capacitors for enhancing their ionizing radiation tolerance. Authors have found that the gate oxidation temperature, thickness of SiO_2 gate insulator and high temperature processes after gate oxidation are crucial for determining the radiation tolerance of the devices, and proposed to decrease the thickness of gate insulator, perform gate oxidation at 1000 deg C by means of dry oxidation and minimize the number of high temperature procedure steps after gate oxidation. All stated above is a necessary preparation for priducing radiation hardened charge-coupled devices.

53

Inorganic astatine chemistry: Formation of complexes of astatine  

International Nuclear Information System (INIS)

The nature and properties of inorganic "2"1"1At-species formed in aqueous solutions under alkaline, neutral, acidic and oxidative conditions are studied through extraction of At with a variety of organic solvents, followed by the determination of the chromatographic, re-extraction and interaction behaviour of the extracted activity. It is concluded from the Rsub(f) values (on SiO_2) and the different affinities for a large amount fo additives, that the extracted activity - formerly denoted as At-zero - exists of AtX compounds that may form AtXLsub(u) complexes, depending on the kind of solvent (L) used. (orig.).

54

CMOS/SOI hardening at 100 MRAD (SiO_2)  

International Nuclear Information System (INIS)

Hardened CMOS/SOI 29101 microprocessor, elementary cells and transistor shave been irradiated at levels between 10 Mrad(SiO_2) and 1 Grad(SiO_2) ("6"0Co and 10 keV x-rays). SIMOX buried oxide behavior in the range of 100 Mrad(SiO_2) and a channel-stopped MOS/SOI structure avoiding lateral leakage current are presented. These two items indicate the feasibility of a CMOS/SOI technology operating in the hundred Mrad(SiO_2) range.

1990-07-16

55

Amplified spontaneous emission from ZnO in n-ZnO/ZnO nanodots-SiO_2 composite/p-AlGaN heterojunction light-emitting diodes  

International Nuclear Information System (INIS)

This study demonstrates amplified spontaneous emission (ASE) of the ultraviolet (UV) electroluminescence (EL) from ZnO at #lambda##approx#380 nm in the n-ZnO/ZnO nanodots-SiO_2 composite/p- Al_0_._1_2Ga_0_._8_8N heterojunction light-emitting diode. A SiO_2 layer embedded with ZnO nanodots was prepared on the p-type Al_0_._1_2Ga_0_._8_8N using spin-on coating of SiO_2 nanoparticles followed by atomic layer deposition (ALD) of ZnO. An n-type Al-doped ZnO layer was deposited upon the ZnO nanodots-SiO_2 composite layer also by the ALD technique. High-resolution transmission electron microscopy (HRTEM) reveals that the ZnO nanodots embedded in the SiO_2 matrix have diameters of 3-8 nm and the wurtzite crystal structure, which allows the transport of carriers through the thick ZnO nanodots-SiO_2 composite layer. The high quality of the n-ZnO layer was manifested by the well crystallized lattice image in the HRTEM picture and the low-threshold optically pumped stimulated emission. The low ...

2009-04-22

59

Visible Earth: Food Additives  

Science.gov (United States)

Feb 25, 2008 ... NASA's Visible Earth catalog of NASA images and animations of our home planet.

60

Damage process and luminescent characteristics in silica glasses under ion irradiation  

International Nuclear Information System (INIS)

Full text of publication follows: Understanding the dynamic irradiation effects on silica glasses is important for developing the diagnostic systems used in fusion and fission environments. While fundamental defects having an un-pared electron such as the E' center have been extensively studied, the neutral oxygen deficiency defects have been insufficiently clarified for lack of the detection methods. The ion induced luminescence is one of the probes that can be used to detect non-paramagnetic defects, and to observe creation and annihilation behavior dynamically. In the present study, we examined the characteristics of the ion induced luminescence such as energy, fluence flux and temperature dependence of the luminescence efficiency to analyze damage process quantitatively. Samples of SiO2 glasses were commercially available fused and synthesized silica glasses, produced by Toshiba Ceramics, Co. Ltd.. A thin films of SiO2 deposited on a Si wafer was used to determine the luminescence ...

2007-12-10

61

Characterisation of thin films on rough steel substrates by FTIR microscopy and imaging  

International Nuclear Information System (INIS)

Complete text of publication follows. According to the new European regulations (Restrictions of Hazardous Substance Directive), there is an emerging demand for environmental friendly metal treatments instead on formerly used chromate conversion coating technique. The aim of the present investigations was to characterise and compare silicon containing protective thin layers on roughened galvanized steel surfaces (with average roughness of 0.7 microns), using FTIR microscopy and imaging techniques. The silicon containing coatings were produced either by Chemical Vapour Deposition (CVD) or by wet chemical treatment using liquid silane. FTIR techniques offer new possibilities in the characterisations and chemical mapping of differently coated thin films, besides SEM+EDS, AFM, nanoindentation, XPS measurements (P. Nemeth et al., Materials Science Forum, 589 (2008) 433-438). All measurements were carried out by a Varian FTS-7000 spectrometer with a 'Stingray' microscope configuration ...

62

Recent progress in the storage ring NIJI-IV free electron laser  

International Nuclear Information System (INIS)

A compact storage ring NIJI-IV free electron laser (FEL) is being developed as a tunable light source which covers a wide wavelength range from the VUV to the IR. To shorten the FEL wavelength in the VUV region, the optical cavity mirror was improved and the original loss of Al_2O_3/SiO_2 multilayer mirror around 195nm was decreased 30% compared with that of the previous one. New optical cavity system equipped with two remotely interchangeable mirrors was installed for the UV/VUV FEL to stabilize the laser and also to extend the tuning range. As for construction of the IR FEL, modification of the beam transport system to make space for installation of the optical cavity was completed. (author)

2006-08-01

63

Pd based membrane reactor for ultra pure hydrogen production through the dry reforming of methane. Experimental and modeling studies  

British Library Electronic Table of Contents (United Kingdom)

A dense Pd-Ag membrane reactor (MR) with 100% hydrogen selectivity packed with either Rh/La2O3 or Rh/La2O3-SiO2 as catalysts was used to carry out the dry reforming of methane. The membrane reactor simulation was performed using a well-known reactor model. For this purpose, we employed the equations derived from complete kinetic studies of the dry reforming of methane reaction in connection with both catalysts. In addition, we developed the kinetic equation for the reverse water gas shift reaction (RWGS). The combination of detailed kinetic studies with the measured permeation flux for the Pd-Ag membrane allowed a complete comparison between experimental and simulated operation variables. The variables studied for both catalysts were methane conversion and hydrogen permeation as a function...

2011-01-01

64

NAME=\\  

Wastenet

...Synthesis of low-temperature, fast, single-firing body for porcelain stoneware tiles with coal gangue Synthesis of low-temperature, fast, single-firing body for porcelain stoneware ... tiles with coal gangue Synthesis of low-temperature, fast, single-firing body for porcelain stoneware tiles with coal gangue Wei et al.,... Article Synthesis of low-temperature, fast, single-firing body for porcelain stoneware tiles with coal gangue Qiangwei Wei1, Wenyuan Gao1*, and Xinguo ...According to phase diagram theory, a low-temperature, fast, single-firing body mix for porcelain stoneware tiles was designed in the quaternary system CaO-MgO-Al2O3-SiO2, using ...

65

Long range ordering in self-assembled Ni arrays on patterned Si  

International Nuclear Information System (INIS)

We have succeeded in aligning self-assembled structures by using a lithographically defined stripe. The 140 nm wide by 100 nm high SiO_2 strip is shown to guide the assembly of 500 nm latex spheres so that spheres are aligned along the strip and are in registration on either side of the strip. This method can be used to increase long-range ordering in magnetic storage systems without compromising the density. Inverse sphere Ni arrays were made by electrodeposition through the latex template. We also show that the hexagonal symmetry of the resulting inverse sphere Ni arrays can be simulated using the approach presented below.

2007-09-01

66

Long range ordering in self-assembled Ni arrays on patterned Si  

British Library Electronic Table of Contents (United Kingdom)

We have succeeded in aligning self-assembled structures by using a lithographically defined stripe. The 140nm wide by 100nm high SiO2 strip is shown to guide the assembly of 500nm latex spheres so that spheres are aligned along the strip and are in registration on either side of the strip. This method can be used to increase long-range ordering in magnetic storage systems without compromising the density. Inverse sphere Ni arrays were made by electrodeposition through the latex template. We also show that the hexagonal symmetry of the resulting inverse sphere Ni arrays can be simulated using the approach presented below.

2007-01-01

67

Influences of poly(ether urethane) introduction on poly(ethylene oxide) based polymer electrolyte for solvent-free dye-sensitized solar cells  

International Nuclear Information System (INIS)

A poly(ether urethane) (PEUR)/poly(ethylene oxide) (PEO)/SiO2 based nanocomposite polymer is prepared and employed in the construction of high efficiency all-solid-state dye-sensitized nanocrystalline solar cells. The introduction of low-molecular weight PEUR prepolymer into PEO electrolyte has greatly enhance the electrolyte performance by both improving the interfacial contact properties of electrode/electrolyte and decreasing the PEO crystallization, which were confirmed by XRD and SEM characteristics. The effects of polymer composition, nano SiO2 content on the ionic conductivity and I3- ions diffusion of polymer-blend electrolyte are investigated. The optimized composition yields an energy conversion efficiency of 3.71% under irradiation by white light (100 mW cm-2).

2009-11-01

68

In situ Raman spectroscopy investigation of bioactive glass reactivity: Simulated body fluid solution vs TRIS-buffered solution  

British Library Electronic Table of Contents (United Kingdom)

In the present contribution, the innovative in situ Raman micro-spectroscopy was applied to investigate the in vitro reactivity of various bioactive glasses. All the investigated glasses belonged to the Na2O\\K2O-CaO-P2O5-SiO2 system, but contained sensibly different percentages of network modifiers. The glasses were immersed for increasing times, up to 96h, in simulated body fluid (SBF) and in tris-buffered (TRIS) solution. In this way, two fundamental items were addressed, i.e. the effect of the glass composition and the nature of the soaking fluid on the overall reactivity. As regards the SBF, all the glasses were able to promote the formation of a hydroxyl-carbonate apatite (HCA) surface layer in very short times. The reaction rate was particularly quick for the 45S5 Bioglass and for it...

2011-01-01

69

Improved Output Power of GaN-Based Vertical Light Emitting Diodes Fabricated with Current Blocking Region Formed by O2 Plasma Treatment  

Science.gov (United States)

We report on the formation of current blocking regions by O2 plasma treatment to reduce current crowding at the active region above the p-type electrodes of GaN-based vertical light emitting diodes (LEDs). The forward voltage and reverse current (at -5 V) of the plasma-treated LEDs slightly increase with increasing aging time. The output power (at 350 mA) of the plasma-treated LEDs is enhanced by 26% as compared to that of reference LEDs and is comparable to that of LEDs with SiO2 current blocking layers. It is shown that the output power (at 700 mA) of the plasma-treated LEDs is degraded by less than 2% of the initial value after 500 h.

2011-07-01

70

Formation of O'/#beta#' sialon in the presence of yttria  

International Nuclear Information System (INIS)

Synthesis of O'/#beta#' SiAlON composites was studied. As starting materials, Si_3N_4, Al_2O_3 and SiO_2 powders were used. Pressureless sintering was applied as consolidation technique and was performed at 1400-1700 C. Densification and reaction taking place during sintering were followed. Microstructure of O'/#beta#' composites is discussed. It was found that without additives liquid phase amount formed within the samples was below critically needed for full densification, but promoted reaction of O' and #beta#' formation. Using yttria as additive densification was enhanced. O'/#beta#' ratio decreased while H_V and K_I_c increased with increasing amount of additive. (orig.).

1993-10-04

71

Alkaline treatment of biomass fly ash for reactive dye removal from aqueous solution  

British Library Electronic Table of Contents (United Kingdom)

Biomass fly ash was treated with alkaline solution to enhance its adsorption capacity of Reactive Black 5 dye. The results revealed that the alkaline concentration, solution to fly ash ratio, treatment temperature and treatment time had a positive effect on the dye adsorption capacity of the treated fly ash (TFA), due to dissolving SiO2 and increasing the proportion of unburned carbon. In addition, the dye adsorption behavior of the TFA in aqueous solution was investigated. The effects of various experimental parameters (initial pH, initial dye concentration and contact time) were determined spectrophotometrically. The dye adsorption capacity of the TFA was maximized at an alkaline pH (8.2-10.4). The adsorption capacity of dye by the TFA increased with increasing initial dye concentration....

2010-01-01

72

A novel electrogenerated chemiluminescence sensor for pyrogallol with core-shell luminol-doped silica nanoparticles modified electrode by the self-assembled technique  

British Library Electronic Table of Contents (United Kingdom)

The core-shell luminol-doped SiO2 nanoparticles were synthesized and immobilized on the surface of chitosan film coating graphite electrode by the self-assembled technique. Then, a novel electrogenerated chemiluminescence (ECL) sensor for pyrogallol was developed based on its ECL enhancing effect for the core-shell luminol-doped silica nanoparticles. The ECL analytical performances and the sensing mechanism of this ECL sensor for pyrogallol were investigated in detail. The corresponding results showed that: compared with the conventional ECL reaction procedures by luminol ECL reaction system, the electrochemical (EC) reaction of pyrogallol and its subsequent chemiluminescence (CL) reaction occurred in the different spatial region whilst offering a high efficiency to couple the EC with the ...

2006-01-01

73

Osseointegration of zirconia implants: an SEM observation of the bone-implant interface  

UK PubMed Central (United Kingdom)

BackgroundThe successful use of zirconia ceramics in orthopedic surgery led to a demand for dental zirconium-based implant systems. Because of its excellent biomechanical characteristics,...Full Text Available

74

Optical and Structural Characteristics of Heavily Boron-Implanted CdTe.  

Science.gov (United States)

Cadmium telluride single crystals were subjected to multiple-energy boron ion implants with total doses up to 1.5 x 10 sq cm. Various diagnostic techniques were used to assess the structural and electronic properties of these crystals in their as-implante...

1988-01-01

75

Music perception in cochlear implant users and its relationship with psychophysical capabilities  

UK PubMed Central (United Kingdom)

This article describes issues concerning music perception with cochlear implants, discusses why music perception is usually poor in cochlear implant users, reviews relevant data, and describes...Full Text Available

2008-01-01

76

Complications of NewColorIris implantation in phakic eyes: a review  

UK PubMed Central (United Kingdom)

Purpose:To provide a literature review of implant related complications from bilateral NewColorIris implantation (Kahn Medical Devices, Panama City, Panama).Methods:A...Full Text Available

2011-01-01

77

Osseointegration of zirconia implants compared with titanium: an in vivo study  

UK PubMed Central (United Kingdom)

BackgroundTitanium and titanium alloys are widely used for fabrication of dental implants. Since the material composition and the surface topography of a biomaterial play a fundamental...Full Text Available

78

Neural Tissues from the Implanted Stem Cells  

International Science & Technology Center (ISTC)

Morphological, Electrophysiological and Behavioral Investigations of the Nervous Tissue Developed from the Embryonic Matrix Zone Cells of the Dorsolateral Walls of Lateral Ventricles, Implanted into the Lesioned Regions of the Adult Rat's Brain

79

Behavior of osteoblastic cells cultured on titanium and structured zirconia surfaces  

UK PubMed Central (United Kingdom)

BackgroundOsseointegration is crucial for the long-term success of dental implants and depends on the tissue reaction at the tissue-implant interface. Mechanical properties and biocompatibility...Full Text Available

80

Aphakic macular oedema following prosthetic lens implantation.  

UK PubMed Central (United Kingdom)

Fluorescein angiography of the iris was performed on patients with plastic lens implants with cystoid oedema of the macula, and the nature of the vascular changes was compared with controls provided...Full Text Available

1977-05-01

81

Visible Earth: Haitian Deforestation - Visible Earth - NASA  

Science.gov (United States)

Jun 8, 2006 ... It also reflects the large amount of deforestation that has occurred on the Haitian side of the border. One can easily see from satellite imagery ...

82

Visible Earth: Deforestation in Sumatra - Visible Earth - NASA  

Science.gov (United States)

Feb 25, 2008 ... In the two Landsat scenes shown above, the pattern of deforestation can be clearly discerned. Deep green in these images shows lush ...

83

Tropical Deforestation : Feature Articles - NASA Earth Observatory  

Science.gov (United States)

Mar 30, 2007 ... Tropical forests are home to half the Earth's species, and their trees are an immense standing reservoir of carbon. Deforestation will have ...

84

Rare Earth Doped Yttrium Aluminum Garnet (YAG ... - GLTRS - NASA  

Science.gov (United States)

films and cylinders of rare earth doped yttrium aluminum garnets. ... We knew that yttrium aluminum garnet (YAG) could be doped with ...

85

ENGLISH R. PD.-SNOW-ICE - The Gateway to Astronaut Photography of ...  

Science.gov (United States)

Jul 26, 2011 ... The Gateway to Astronaut Photography of Earth hosts the best and most complete online collection of astronaut photographs of the Earth.

86

Addt'l. Earth Fill-McMurdo  

Science.gov (United States)

... of this material is, however, outside the currently approved earth fill materials collection area ... fill material suitable for its intended use. The currently approved site contains material that is ...

87

Investigation on corrosion and wear behaviors of nanoparticles reinforced Ni-based composite alloying layer  

International Nuclear Information System (INIS)

In order to investigate the role of amorphous SiO2 particles in corrosion and wear resistance of Ni-based metal matrix composite alloying layer, the amorphous nano-SiO2 particles reinforced Ni-based composite alloying layer has been prepared by double glow plasma alloying on AISI 316L stainless steel surface, where Ni/amorphous nano-SiO2 was firstly predeposited by brush plating. The composition and microstructure of the nano-SiO2 particles reinforced Ni-based composite alloying layer were analyzed by using SEM, TEM and XRD. The results indicated that the composite alloying layer consisted of ?-phase and amorphous nano-SiO2 particles, and under alloying temperature (1000 deg. C) condition, the nano-SiO2 particles were uniformly distributed in the alloying layer and still kept the amorphous structure. The corrosion resistance of composite alloying layer was investigated by an electrochemical method in 3.5%NaCl solution. Compared with single alloying layer, the amorphous nano-SiO2 ...

2008-04-30

88

Co-operative downconversion luminescence in Tm3+/Yb3+ : SiO2-Al2O3-LiF-GdF3 glasses  

International Nuclear Information System (INIS)

Oxyfluoride aluminosilicate glasses in the composition of 50SiO2-20Al2O3-20LiF-10GdF3-0.5TmF3-xYbF3 (x = 0, 1.0, 2.5, 5, 7.5, 10, 15, 20, 25 and 30 mol%) have been prepared to study their thermal and optical properties. From the differential thermal analysis measurements, glass transition temperatures and onset crystallization temperatures have been evaluated and from them glass stability factors were calculated. Glass stabilities decreased gradually with fluoride content increment in all the studied glasses. The photoluminescence and decay measurements have also been carried out for all these glasses. In these glasses, an efficient near infrared quantum cutting with optimal quantum efficiency approaching 187% has been demonstrated, by exploring the co-operative downconversion mechanism from Tm3+ to Yb3+, with 467 nm (Tm3+ : 3H6 ? 1G4) excitation wavelength. These glasses are promising materials to achieve high efficiency silicon based solar cells by means of downconversion in the ...

2008-09-07

92

Pitting corrosion resistance of silicon-implanted stainless steels  

International Nuclear Information System (INIS)

The pitting corrosion resistance of three different types of stainless steel implanted with silicon is investigated using the potentiokinetic polarization technique. The specimens are tested in 3% NaCl and 0.1 N HCl solutions. Silicon ion implantation inhibits pitting corrosion of the steels in both aqueous media. The corrosion resistance depends on the silicon dose. Post implantation annealing only slightly alters the localized corrosion. (author).

93

Multi-functional Biocompatible Coatings  

International Science & Technology Center (ISTC)

Multi-functional Bioactive Nano-structured Coatings for Load-Bearing Implants

94

Modeling of defect-phosphorus pair diffusion in phosphorus-implanted silicon  

International Nuclear Information System (INIS)

The point-defect-impurity pair diffusion model proposed recently by Mulvaney and Richardson is adopted and modified to simulate the coupled diffusion of phosphorus and self-interstitials in phosphorus-implanted silicon. The assumption of implantation-induced, but empirically determined initial interstitial distributions of Gaussian shape allows a simulation of the net effect of transient enhanced diffusion. As a result an improved modeling of phosphorus diffusion in silicon is achieved for a broad range of ion-implantation and annealing conditions. (author).

100

Proceedings of the workshop on high resolution computed microtomography (CMT)  

Energy Technology Data Exchange (ETDEWEB)

The purpose of the workshop was to determine the status of the field, to define instrumental and computational requirements, and to establish minimum specifications required by possible users. The most important message sent by implementers was the remainder that CMT is a tool. It solves a wide spectrum of scientific problems and is complementary to other microscopy techniques, with certain important advantages that the other methods do not have. High-resolution CMT can be used non-invasively and non-destructively to study a variety of hierarchical three-dimensional microstructures, which in turn control body function. X-ray computed microtomography can also be used at the frontiers of physics, in the study of granular systems, for example. With high-resolution CMT, for example, three-dimensional pore geometries and topologies of soils and rocks can be obtained readily and implemented directly in transport models. In turn, these geometries can be used to calculate fundamental physical ...

1997-02-01

101

Retrospective analysis of porcelain failures of metal ceramic crowns and fixed partial dentures supported by 729 implants in 152 patients: Patient-specific and implant-specific predictors of ceramic failure  

British Library Electronic Table of Contents (United Kingdom)

Statement of problem Porcelain fracture associated with an implant-supported, metal ceramic crown or fixed partial denture occurs at a higher rate than in tooth-supported restorations, according to the literature. Implant-specific and patient-specific causes of ceramic failure have not been fully evaluated. Purpose The purpose of this retrospective study was to evaluate the potential statistical predictors for porcelain fracture of implant-supported, metal ceramic restorations. Material and Methods Over a 6-month period, a consecutive series of patients having previously received implant-supported, metal ceramic fixed restorations were examined during periodic recall appointments. The number of supporting implants, number of dental units, type of restoration, date of prosthesis insertion, ...

2009-01-01

102

Electrical properties of focused-ion-beam boron-implanted silicon  

International Nuclear Information System (INIS)

Electrical properties of 16 keV, focused-ion-beam (FIB) (beam diameter: 1 #mu#m, current density: 50 mA/cm"2) boron-implanted silicon layers have been investigated as a function of beam scan speed and ion dose, and compared with those obtained by conventional implantation (current density: 0.4 #mu#A/cm"2). High electrical activation of the FIB implanted layers is obtained by annealing below 800"0C as a result of the increase in amorphous zones created in the implanted layers. Amorphous zone overlapping is assumed to occur at FIB implantation doses of 3 - 4 x 10"1"5 ions/cm"2 from the results of electrical activation and the carrier profile of implanted regions annealed at low temperature, if beam scan speed is lowered to about 10"-"2 cm/s. (author).

103

Effect of Al and Be ions pre-implantation on formation and growth of helium bubbles in SiC/SiC composites  

Energy Technology Data Exchange (ETDEWEB)

The effect of Al and Be ions pre-implantation on microstructural change and, the formation and growth of He bubbles in SiC/SiC composite was investigated. Four kinds of ion implanted specimens were prepared with 100 appm Al, 1000 appm Al, 100 appm Be and 1000 appm Be implanted. No microstructural change was observed in the matrices and fibers of SiC/SiC composites implanted with Al or Be ions up to 1000 appm. The un-implanted and Al or Be pre-implanted SiC/SiC composites were simultaneously irradiated to 10 dpa using triple ion-beams (6.0-MeV Si{sup 2+}, 1.0-MeV He{sup +} and 340-keV H{sup +}) at 1000 deg. C. Helium bubbles were formed in every matrix and fiber irradiated by triple ion-beams. The size of He bubbles in the matrix was increased by implanting Al or Be ions and increased with increasing amount of implanted ...

2007-03-15

104

Effect of Al and Be ions pre-implantation on formation and growth of helium bubbles in SiC/SiC composites  

International Nuclear Information System (INIS)

The effect of Al and Be ions pre-implantation on microstructural change and, the formation and growth of He bubbles in SiC/SiC composite was investigated. Four kinds of ion implanted specimens were prepared with 100 appm Al, 1000 appm Al, 100 appm Be and 1000 appm Be implanted. No microstructural change was observed in the matrices and fibers of SiC/SiC composites implanted with Al or Be ions up to 1000 appm. The un-implanted and Al or Be pre-implanted SiC/SiC composites were simultaneously irradiated to 10 dpa using triple ion-beams (6.0-MeV Si"2"+, 1.0-MeV He"+ and 340-keV H"+) at 1000 deg. C. Helium bubbles were formed in every matrix and fiber irradiated by triple ion-beams. The size of He bubbles in the matrix was increased by implanting Al or Be ions and increased with increasing amount of implanted Al or Be ions. ...

2007-03-01

105

The influence of ground slope to the lightning screen failure of high voltage transmission lines  

Energy Technology Data Exchange (ETDEWEB)

The electrogeometric model cannot consider the influence of some parameters on the screening of the wire conductor of the H.V. lines. For analysing the influence of these parameters (the conductor potential, the influence of the distance from phase conductor to earth wire, the influence of the reducing factor of the striking earth distance, the earth slope, etc.), the Monte Carlo method is preferable. The influence of the earth slope on the screening effect of the wire conductor for different conditions is presented in this paper. (author)

1999-07-01

106

Population and Global Warming  

Science.gov (United States)

Description of how global warming could be disastrous for much of the earth's population....

108

Geoengineering the Earth's Climate  

ScienceCinema

...global warming situation is more than evaporation around ...background red ? which was the global warming the ...

110

High current implantation of negative copper ions into silica glasses  

Energy Technology Data Exchange (ETDEWEB)

High-current implantation of Cu{sup {minus}} ions into silica glasses has been demonstrated using mA-class negative ion beams at 60 keV. Negative ion implantation has an advantage to alleviate specimen charging for insulating substrates and has attained high dose rates, up to 260 {micro}A/cm{sup 2}. Spherical Cu colloids form in the silica glasses without additional thermal annealing. Optical absorption and reflection of the implanted specimens vary with the current density, even at a fixed dose level. A beam-induced surface plasma may affect the high current implantation.

1997-12-01

111

XPS study of passive films formed on molybdenum-implanted austenitic stainless steels  

Energy Technology Data Exchange (ETDEWEB)

Austenitic stainless steels have been implanted with molybdenum ions (Mo[sup +], 100 keV, 2.5 x 10[sup 16] atoms cm[sup -2]). The implanted material has been characterized by XPS and RBS. The implanted region has a thickness of [approx] 1000 A with a maximum molybdenum concentration of [approx] 9 at.% Mo located at [approx] 210 A from the surface. The effects of implanted molybdenum on the passivation of the alloy in 0.5 M H[sub 2]SO[sub 4] have been investigated by electrochemistry and XPS. After XPS analysis the samples were transferred without exposure to air into a glove-box with an inert atmosphere. The electrochemical behaviour of the alloy is significantly modified by the implanted molybdenum. The major effect is that the activation peak disappears. A bilayer structure (outer hydroxide/inner oxide) of the passive film is observed for both the implanted ...

1992-06-01

112

XPS study of passive films formed on molybdenum-implanted austenitic stainless steels  

International Nuclear Information System (INIS)

Austenitic stainless steels have been implanted with molybdenum ions (Mo"+, 100 keV, 2.5 x 10"1"6 atoms cm"-"2). The implanted material has been characterized by XPS and RBS. The implanted region has a thickness of #approx# 1000 A with a maximum molybdenum concentration of #approx# 9 at.% Mo located at #approx# 210 A from the surface. The effects of implanted molybdenum on the passivation of the alloy in 0.5 M H_2SO_4 have been investigated by electrochemistry and XPS. After XPS analysis the samples were transferred without exposure to air into a glove-box with an inert atmosphere. The electrochemical behaviour of the alloy is significantly modified by the implanted molybdenum. The major effect is that the activation peak disappears. A bilayer structure (outer hydroxide/inner oxide) of the passive film is observed for both the implanted and ...

1991-10-01

113

Corrosion behaviour of molybdenum-implanted stainless steel  

Energy Technology Data Exchange (ETDEWEB)

A low-molybdenum austenitic stainless steel (UNS S30100) has been surface implanted with molybdenum ions, using various doses of 50 keV and 140 keV ions at room temperature. It is found that in aqueous sulphate/chloride solutions similar to the constitution of sea-waters the implantation does not affect the potentiostatically-determined critical pitting potential, but does change the density and morphology of corrosion pits. Pitting initiation after the addition of chloride at a fixed potential indicates little change in the time for measurable current increase, but the rate of increase of the current is much lower for implanted material. Detailed examination using optical microscopy, scanning electron microscopy, transmission electron microscopy and selected area diffraction suggests that the pits produced in implanted material are hemispherical with smooth covers of unattacked alloy. The use of ...

1990-01-01

114

Corrosion behaviour of molybdenum-implanted stainless steel  

International Nuclear Information System (INIS)

A low-molybdenum austenitic stainless steel (UNS S30100) has been surface implanted with molybdenum ions, using various doses of 50 keV and 140 keV ions at room temperature. It is found that in aqueous sulphate/chloride solutions similar to the constitution of sea-waters the implantation does not affect the potentiostatically-determined critical pitting potential, but does change the density and morphology of corrosion pits. Pitting initiation after the addition of chloride at a fixed potential indicates little change in the time for measurable current increase, but the rate of increase of the current is much lower for implanted material. Detailed examination using optical microscopy, scanning electron microscopy, transmission electron microscopy and selected area diffraction suggests that the pits produced in implanted material are hemispherical with smooth covers of unattacked alloy. The use of ...

1989-09-01

115

The characteristics of surface oxidation and corrosion resistance of nitrogen implanted zircaloy-4  

International Nuclear Information System (INIS)

This work is concerned with the development and application of ion implantation techniques for improving the corrosion resistance of zircaloy-4. The corrosion resistance in nitrogen implanted zircaloy-4 under a 120 keV nitrogen ion beam at an ion dose of 3 x 10"1"7 cm"-"2 depends on the implantation temperature. The characteristics of surface oxidation and corrosion resistance were analyzed with the change of implantation temperature. It is shown that as implantation temperature rises from 100 to 724 C, the colour of specimen surface changes from its original colour to light yellow at 100 C, golden at 175 C, pink at 300 C, blue at 440 C and dark blue at 550 C. As the implantation temperature goes above 640 C, the colour of surface changes to light black, and the surface becomes a little rough. The corrosion resistance of zircaloy-4 implanted ...

116

Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator  

Energy Technology Data Exchange (ETDEWEB)

The indium implant damage and diffusion behavior in thin silicon-on-insulator (SOI) with a 200 nm top silicon layer were studied for different implantation energies and doses. Rutherford backscattering spectrometry in the channeling mode (RBS/C) was used to characterize the implant damage before and after annealing. Secondary ion mass spectrometry (SIMS) was used to study the indium transient enhanced diffusion (TED) behavior in the top Si layer of the SOI structure. An anomalous redistribution of indium after relatively high energy (200 keV) and dose (1 x 10{sup 14} cm{sup -2}) implantation was observed in both bulk Si and SOI substrates. However, there exist differences in these two substrates that are attributable to the more predominant out-diffusion of indium as well as the influence of the buried oxide layer in the SOI structure.

2004-12-15

117

Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator  

International Nuclear Information System (INIS)

The indium implant damage and diffusion behavior in thin silicon-on-insulator (SOI) with a 200 nm top silicon layer were studied for different implantation energies and doses. Rutherford backscattering spectrometry in the channeling mode (RBS/C) was used to characterize the implant damage before and after annealing. Secondary ion mass spectrometry (SIMS) was used to study the indium transient enhanced diffusion (TED) behavior in the top Si layer of the SOI structure. An anomalous redistribution of indium after relatively high energy (200 keV) and dose (1 x 10"1"4 cm"-"2) implantation was observed in both bulk Si and SOI substrates. However, there exist differences in these two substrates that are attributable to the more predominant out-diffusion of indium as well as the influence of the buried oxide layer in the SOI structure.

2004-12-15

118

Diffusion modeling of ion implanted boron in Si during RTA: Correlation of extended defect formation and annealing with the enhanced diffusion of boron  

International Nuclear Information System (INIS)

Accurate modeling of the enhanced diffusion of boron during rapid thermal annealing has been accomplished by incorporating the effects of extended defect formation and annealing on enhanced diffusion into a multizone, semiempirical model. The multizone model divides the implant profile into three zones defining regions of different defects and diffusion enhancements. The model also contains the initial enhanced diffusion and the transient diffusion effects associated with the dissolution of defect clusters and the annealing of extended defects, respectively. The saturation time for transient-enhanced diffusion contains an exponential function of implant dose in order to model the increase in point defect generated with higher implant dose. As a result, the model accurately simulates the boron diffusion profile over a wide range of implant doses and also shows the immobile boron peak of precipitated ...

119

A study on yellow luminescence in O and C ion implanted GaN  

International Nuclear Information System (INIS)

The effects of O and C ion implantation with different implantation doses on the yellow luminescence (YL) from unintentional doped n-type GaN have been studied by the photoluminescence (PL) spectra. O and C ions were implanted in the GaN samples with different doses from 1.0 x l013 to 1.0 x l017cm-2. Post-annealing was done in a quartz open-tube furnace under flowing N2 gas for 30 min at 950 degree C. By comparing with N ion implanted samples, it is assumed that different deep-level centers involving in the YL were produced in GaN after O and C ion implantation. In addition, with a dose of 1017 cm-2, the concentration of deep C centers involving in the YL was enhanced markedly. (authors)

2008-08-01

120

Visco-elastic energy dissipation in a SiAlON ceramic: Quantification and implications for fatigue resistance  

International Nuclear Information System (INIS)

In this letter a method to estimate the visco-elastic response of monolithic ceramics to cyclic loading conditions at high temperatures is proposed. A relation is observed between the visco-elastic energy dissipation measured for two silicon nitride materials, and the structural characteristics of their respective intergranular phases. Some consequences for the fatigue resistance of the tested materials, and of non-transforming monolithic ceramics in general, are discussed. Two batches (G for glassy and C for crystalline) of SiAlON have been studied. The G-batch is obtained by pressureless sintering of silicon nitride powder with Y_2O_3 (6 wt%) and 6AlN-SiO_2 (5 wt%) as sintering additives. The main phase after sintering is #beta#-sialon. Upon cooling from the sintering temperature the amorphous intergranular residues of the sintering additives and of SiO_2, which is unavoidably present as a thin layer on the silicon nitride powder, crystallize partially into YAM (Y_2Al_4O_9), which is ...

121

The effect of oxide additives on the synthesis and sintering of x-Sialon  

International Nuclear Information System (INIS)

The effect is reported of seven inorganic oxide additives on both the formation mechanism and the densification of X-Sialon prepared by a silicothermal process. The oxides were added to the starting mixture of halloysite clay, alumina and elemental silicon at a level of 1 wt% of the calculated final product, and fired in nitrogen at 1200-1500 deg C. The formation of X-Sialon was monitored by thermal analysis, powder XRD and 2"7"Al and "2"9Si solid state MAS NMR The effects of the additives are temperature dependent and influence the various stages of the reaction by differing degrees. The oxides which best promote the formation of crystalline X-Sialon (Y_2O_3, CaO and MgO) are also those which facilitate the conversion of initially-formed Si_3N_4 to SiO_2N_2 and SiO_3N units. Densification is most enhanced by Y_2O_3 CaO and CeO_2; MgO exerts its maximum effect on sintering at lower temperatures. Copyright (1998) Australasian Ceramic Society

1998-09-28

122

Polypropylene obtained through zeolite supported catalysts  

International Nuclear Information System (INIS)

Propylene polymerizations were carried out with #phi#_2C(Flu)(Cp)ZrCl_2 and SiMe_2(Ind)2ZrCl_2 catalysts supported on silica, zeolite sodic mordenite (NaM) and acid mordenite (HM). The polymerizations were performed at different temperatures and varying aluminium/zirconium molar ratios ([Al]/[Zr]). The effect of these reaction parameters on the catalyst activity was investigated using a proposed statistical experimental planning. In the case of f_2C(Flu)(Cp)ZrCl_2, SiO_2 and NaM were used as support and the catalyst performance evaluated using toluene and pentane as polymerization solvent. The molecular weight, molecular weight distribution, melting point and crystallinity of the polymers were examined. The results indicate very high activities for the syndiospecific heterogeneous system. Also, the polymers obtained had superior Mw and stereo regularity. (author)

2004-01-01

123

New plasma chemistries for dry etching of InGaAlP alloys: BI_3 and BBr_3  

International Nuclear Information System (INIS)

Inductively coupled plasma etching of InGaP, AlInP and AlGaP in BI_3 or BBr_3 discharges was investigated as a function of source power, dc chuck bias and plasma composition. InGaP etches at the fastest rates (>6000 Angstrom min"-"1) in both chemistries, followed by AlGaP. It is found that AlInP provides an excellent etch stop for the other two materials in both mixtures. The InGaP surface morphology improves with increasing BI_3 or BBr_3 content, and with increasing dc chuck bias. The etched features for this material are highly anisotropic. Etch selectivities for InGaP over SiO_2 and SiN_x of #>=#8 are obtained in both plasma chemistries, and there is no etch incubation time with either mixture, indicating that both can scavenge the native oxide on InGaP, AlGaP and AlInP. copyright 1998 American Vacuum Society.

1998-09-01

124

Nanocontact heteroepitaxy of thin GaSb and AlGaSb films on Si substrates using ultrahigh-density nanodot seeds.  

Science.gov (United States)

A film of GaSb grown epitaxially on a Si substrate is a direct transition semiconductor useful for application as a light source in Si photonics and channel material in next-generation field effect transistors because its energy bandgap is close to the optical fibre communication wavelength and it possesses high carrier mobility. Here, we report a novel method for heteroepitaxial growth of high-quality GaSb/Si films, despite having a lattice mismatch as large as ? 12%, using elastically strain-relaxed GaSb nanodots with ultrahigh density as seed crystals for film growth. The nanodot seed crystals were grown epitaxially by restricted contact with the Si substrate through nanowindows in an ultrathin SiO(2) film on the Si substrate. A light-emitting diode containing GaSb/Si films with a thickness of ? 90 nm fabricated by this method operated at room temperature. The growth method was also used to fabricate AlGaSb films of high quality. Our method provides a new avenue for heteroepitaxial ...

2011-05-17

125

Micro and nano patterning by focused ion beam enhanced adhesion  

International Nuclear Information System (INIS)

We report a new method of generating nano and micro patterns using focused ion beam (FIB) induced adhesion. The method utilizes selective irradiation of thin metallic films grown on substrates by focused ion beam followed by peel off. After peel off of the irradiated thin film it is observed that the ion beam scanned portions are retained on the substrate, creating nano and micro patterns. The method is suitable for materials of which the adhesion to the substrate can be improved by ion bombardment. The phenomenon has been demonstrated by creating gold nano patterns of different shapes and sizes ranging from 500 nm to 5 #mu#m on SiO_2-Si substrate using 10-30 keV Ga FIB at beam currents up to 10 pA. The mechanism involved in the process has been discussed. The technique could be utilized to prepare micro and nano patterns of thin films deposited on an appropriate substrate for optical, plasmonic and sensor related applications.

2009-05-01

126

Influence of some processing factors on susceptibility to caustic stress corrosion cracking of modified alloy 800  

International Nuclear Information System (INIS)

The influence of some processing factors such as cold work and heat treatment on the susceptibility to caustic stress corrosion cracking (SCC) of modified alloy 800, referred to alloy 800 M, in a boiling solution of 50%NaOH + 0.3%SiO_2+0.3%Na_2S_2O_3 was investigated by means of microstructure examination, tensile test, stress analysis, SCC test of C-rings, Auger electron spectroscopy (AES) and corrosion mode. Cold work led to lengthening of grains, decrease in ductility, increase in strength, residential stress and susceptibility to SCC. With increasing temperature of heat treatment on alloy 800 M after cold work, grains became bigger, ductility increased but strength, residential stress and susceptibility to SCC decreased. SCC cracks on C-ring specimens initiated from pitting and propagated along grain boundaries. AES analysis indicates that the surface films on alloy 800M are enriched in nickel and depleted in iron and chromium. (authors)

2005-07-01

127

Influence of metallurgical factors on corrosion and electrochemical behavior of structural materials  

International Nuclear Information System (INIS)

An analysis of the passive films formed on amorphous alloys of the system Fe-10% Cr-5% Mo-P-metalloid and Fe-10% Cr-5% Mo-B-Si revealed that they are more markedly enriched with chromium in silicon-free alloys. In silicon-containing amorphous alloys the passive films were highly enriched with silicon, which occurred in these films in the form of a corrosion product close to SiO_2. As shown by the investigations of a study of the anodic behavior of Fe_4_0Ni_4_0P_1_4B_6 and Fe_4_0Ni_3_8Mo_4B_1_8, phosphorus facilitates the passivation of amorphous alloys by reducing the solution current in the active state and enriching the surface layers of the metal in the form of a black prepassivation film which also contains nickel and iron. The behavior of Fe-Ni amorphous alloys containing only boron as metalloid additive differs little from that of crystalline alloys of similar composition but without the boron. The authors note that in this survey they have considered the influence of only some ...

1986-01-01

128

Glass-ceramic sealants for solid oxide fuel cells: Part I. Physical properties  

International Nuclear Information System (INIS)

A family of sealant materials has been developed for use in the solid oxide fuel cell (SOFC) and in other applications in the temperature range of 800 endash 1000 degree C. These materials are based on glasses and glass-ceramics in the SrO endash La_2O_3 endash Al_2O_3 endash B_2O_3 endash SiO_2 system. The coefficients of thermal expansion (CTE) for these materials are in the range of 8 endash 13x10"-"6/degree C, a good match with those of the SOFC components. These sealant materials bond well with the ceramics of the SOFC and, more importantly, form bonds that can be thermally cycled without failure. At the fuel cell operating temperature, the sealants have viscosities in the range of 10"4-10"6 Pa-s, which allow them to tolerate a CTE mismatch of about 20% among the bonded substrates. The gas tightness of a sample seal was demonstrated in a simple zirconia-based oxygen concentration cell. copyright 1996 Materials Research Society.

129

Fabrication of nanometer structures by means of a fine-focused ion beam  

International Nuclear Information System (INIS)

Focused Ion Beams are an important approach for nanostructure fabrication in the semiconductor industry and material sciences. Applications in sputtering and ion induced deposition of materials are investigated. The IMSA FIB system equipped with the high resolution Orsay Physics CANION M31plus ion column with current densities up to 10 A/cm"2 including a gas injection system is applied. In this work the ion beam induced chemical vapour deposition of tungsten, wherefore tungsten hexacarbonyl as precursor gas is used for a first investigation. Conductive tungsten-nanowires with smallest cross-section upon a substrate of Si and SiO_2 are produced. The ion beam parameters of this focused ion beam system are optimized for the metal deposition. A short insight in the theory of layer nucleation and growth induced by the ion beam during the metal deposition is given. The layer quality is determined by Auger electron analysis which shows the components in atomic percent like 80% W, 5% O, 6% C ...

2000-03-01

130

Ellipsometry studies on nitrogenated diamond-like carbon (DLC) thin films produced by RF magnetron sputtering  

International Nuclear Information System (INIS)

Nitrogen doped Diamond-like carbon thin films were deposited on n-Si and SiO_2 substrates by rf magnetron sputtering using pure graphite (99.999%) as the target material and mixtures of Ar, N_2 and H_2 for plasma generation. The dependence of structural and optical properties on nitrogen content was investigated using XPS, Raman spectroscopy, FT-IR spectroscopy, and Ellipsometry studies. It was found that as the nitrogen content was increased in the plasma, sp"2 bonding favored. Also it was observed that oxygen contamination increased with nitrogen content. Typical C-H stretching modes connected with diamond-like carbon could be seen in FT-IR spectra. The I_D and I_G bands were well defined and it was observed that as nitrogen content increased I_G band was enhanced. Ellipsometry studies revealed that the optical constants like refractive index (n) and extinction co-efficient (k) increased with increase in nitrogen content as well as substrate temperature. (author)

2003-03-01

131

Effective removal of Ga residue from focused ion beam using a plasma cleaner  

International Nuclear Information System (INIS)

Samples prepared using the focused ion beam (FIB) inevitably contain the surface damage induced by energetic Ga"+ ions. An effective method of removing the surface damage is demonstrated using a plasma cleaner, a device which is widely used to minimize the surface contamination in scanning transmission electron microscopy (STEM). Surface bombardment with low-energy Ar"+ ions was induced by biasing the sample immersed in the plasma source, so as to etch off the surface materials. The etch rates of SiO_2, measured with a bias voltage of 100-300 V, were found to vary linearly with both the time and bias and were able to be controlled from 1.4 to 9 nm/min. The removal of the Ga residue was confirmed using energy dispersive spectroscopy (EDS) after the plasma processing of the FIB-prepared sample. When the FIB-prepared sample was processed via plasma etching for 10 min with a bias of 150 V, the surface Ga damage was completely removed.

132

Catalytic behavior of Co/(Nanob-Zeolite) bifunctional catalysts for Fischer-Tropsch reactions  

British Library Electronic Table of Contents (United Kingdom)

Cobalt supported on Beta zeolite catalysts were prepared by impregnation of metal salts in aqueous solution and were tested for the Fischer Tropsch reaction. The support consisted of a Beta zeolite composed by crystallites of nanometric dimensions and a SiO2/Al2O3 molar ratio of about 50. This support was impregnated with Co(NO3)2 aqueous solution using different metal loads of 7.5, 10, 15 and 20wt% Co. These materials were characterized by X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), N2 adsorption (BET), thermal programmed reduction (TPR) and FTIR of adsorbed pyridine (i.e., surface acid sites distribution). All the catalysts showed a significant catalytic activity for the F-T reaction from synthesis gas (CO+2H2), in a continuous fixed bed reactor sys...

2011-01-01

133

Whole-mount specimens in the analysis of en bloc samples obtained from revisions of resurfacing hip implants  

UK PubMed Central (United Kingdom)

BackgroundModern metal-on-metal hip resurfacing implants are being increasingly used for young and active patients, although the long-term outcome and failure mechanisms of these...Full Text Available

2010-06-01

134

Transient enhanced diffusion of Sb and B due to MeV silicon implants  

Energy Technology Data Exchange (ETDEWEB)

We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si{sup +} ion implants at very high doses ({approx}10{sup 16}cm{sup {minus}2}). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation ({approx}700 at 740{degree}C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of {l_brace}311{r_brace} defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV ...

1997-06-01

135

Transient enhanced diffusion of Sb and B due to MeV silicon implants  

International Nuclear Information System (INIS)

We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si"+ ion implants at very high doses (#approx#10"1"6cm"-"2). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation (#approx#700 at 740 degree C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of #left brace#311#right brace# defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV implant ...

136

Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides  

International Nuclear Information System (INIS)

In this paper, we report the systematic investigation on the melt characteristics of silicon during laser thermal processing (LTP) of amorphous silicon (a-Si) gates on ultrathin gate oxides. LTP is used to reduce the gate depletion effect in advanced semiconductor devices. The influence of implantation-induced damage and chemical inhomogeneities on the melt behavior of ion-implanted a-Si is studied using in situ time-resolved reflectance (TRR) measurements and ex situ secondary ion mass spectrometry. The results from TRR measurements indicate the presence of a buried melt for a-Si implanted with B"+ at a subamorphizing dose. In contrast, such a melt behavior is not observed during LTP of undoped a-Si and a-Si implanted with As"+ at an amorphizing dose. We attribute the marked difference in the melt characteristics to the competitive effects between compositional inhomogeneities and the extent of ...

2004-06-01

137

Sensitivity of psychophysical measures to signal processor modifications in cochlear implant users  

UK PubMed Central (United Kingdom)

Experienced users of the Clarion cochlear implant were tested acutely with the HiResolution (HiRes) and HiRes Fidelity120 (F120) processing strategies. Three psychophysically-based tests were...Full Text Available

2010-04-01

138

Production and stability of implanted Pd-Si hydride  

Energy Technology Data Exchange (ETDEWEB)

Combining in situ Rutherford backscattering and electrical transport measurements on low-temperature hydrogen-implanted amorphous Pd/sub 80/Si/sub 20/ films, we have studied the correlation between the hydrogen content and the resistivity.

1983-05-01

139

Paying for treatments? Influences on negotiating clinical need and decision-making for dental implant treatment  

UK PubMed Central (United Kingdom)

BackgroundThe aim of this study is to examine how clinicians and patients negotiate clinical need and treatment decisions within a context of finite resources. Dental implant treatment...Full Text Available

140

Patient-specific reconstructed anatomies and computer simulations are fundamental for selecting medical device treatment: application to a new percutaneous pulmonary valve  

UK PubMed Central (United Kingdom)

Nowadays, percutaneous pulmonary valve implantation is a successful alternative to surgery for patients requiring treatment of pulmonary valve dysfunction. However, owing to the wide variety of implantation...Full Text Available

2010-06-28

141

Noise Susceptibility of Cochlear Implant Users: The Role of Spectral Resolution and Smearing  

UK PubMed Central (United Kingdom)

The latest-generation cochlear implant devices provide many deaf patients with good speech recognition in quiet listening conditions. However, speech recognition deteriorates rapidly as the level of...Full Text Available

2005-03-01

142

Mechanism for the reduction of interstitial supersaturations in MeV-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

We demonstrate that the excess vacancies induced by a 1 MeV Si implant reduce the excess interstitials generated by a 40 keV Si implant during thermal annealing when these two implants are superimposed in silicon. It is shown that this previously observed reduction is dominated by vacancy annihilation and not by gettering to deeper interstitial-type extended defects. Interstitial supersaturations were measured using B doping superlattices (DSL) grown on a silicon-on-insulator (SOI) substrate. Implanting MeV and keV Si ions into the B DSL/SOI structure eliminated the B transient enhanced diffusion normally associated with the keV implant. The buried SiO{sub 2} layer in the SOI substrate isolates the deep interstitials-type extended defects of the MeV implant, thereby eliminating the possibility that these defects getter the interstitial excess induced by the keV ...

1999-03-01

143

Effects of Semantic Context and Feedback on Perceptual Learning of Speech Processed through an Acoustic Simulation of a Cochlear Implant  

UK PubMed Central (United Kingdom)

The effect of feedback and materials on perceptual learning was examined in normal hearing listeners exposed to cochlear implant simulations. Generalization was most robust when feedback paired...Full Text Available

2010-02-01

144

Early Wound Healing Following One-Stage Dental Implant Placement With and Without Antibiotic Prophylaxis: A Pilot Study  

UK PubMed Central (United Kingdom)

BackgroundOne-stage implant placement has clinically acceptable treatment outcomes. Among other advantages, it may allow investigation of early wound healing. The...Full Text Available

2008-10-01

145

Discrimination of Schroeder-Phase Harmonic Complexes by Normal-Hearing and Cochlear-Implant Listeners  

UK PubMed Central (United Kingdom)

The temporal fine structure (TFS) of sound contributes significantly to the perception of music and speech in noise. The evaluation of new strategies to improve TFS delivery in cochlear implants (CIs)...Full Text Available

2008-03-01

146

Calcification of subcutaneously implanted type I collagen sponges. Effects of formaldehyde and glutaraldehyde pretreatments.  

UK PubMed Central (United Kingdom)

Although collagen-containing implants are widely used in various surgical applications, there has been relatively little attention paid to the possibility that this type of biomaterial may undergo pathologic...Full Text Available

1986-01-01

147

Observation of a surface peak in low energy implant depth profiles in silicon  

Energy Technology Data Exchange (ETDEWEB)

In situ Auger sputter depth profiles of saturation implants of 3 keV N/sub 2//sup +/ in silicon at room temperature exhibit a sharp peak in the nitrogen concentration in the outermost layers, followed by a monotonic decrease. No broad plateau was observed. The energy of the Auger line corresponding to the Si(2p) core electron excitation, monitored throughout the profiling, exhibits a chemical shift of up to 7 eV at the surface peak concentration. Inert gas ion post-bombardment of unsaturated implants significantly modifies the profile, and supports the suggestion that the surface peak arises through radiation enhanced diffusion of implanted atoms.

1984-03-01

148

NEUROPLASTICITY and INNOVATION  

Science.gov (United States)

OF VOCALIZED SPEECH THROUGH. ANALYSIS OF NEURAL SIGNALS. " SYNTHETIC TELEPATHY- WIRELESS. TRANSMISSION OF DECODED. THOUGHTS. " IMPLANTABLE MEMORY-ELIMINATES ...

149

Interstitial injection in silicon after high-dose, low-energy arsenic implantation and annealing  

International Nuclear Information System (INIS)

In this work, we investigate the interstitial injection into the silicon lattice due to high-dose, low-energy arsenic implantation. The approach consists in monitoring the diffusion of the arsenic profile as well as of the boron profile in buried #delta#-doped layers, when amounts of the as-implanted arsenic profile are removed by low-temperature wet silicon etching. The experimental results indicate that the contribution of the implantation damage to the transient enhanced diffusion of boron, and thus the interstitial injection, is not the main one. On the contrary, interstitial generation due to arsenic clustering seems to be more important for the present conditions.

2005-11-14

150

Guidance for Industry  

Science.gov (United States)

... central venous catheters (tunneled [eg, Hickman], subcutaneously implanted [eg, Porta-cath], and nontunneled), peripherally inserted central venous catheters ...

151

Alignment accuracy of focused ion beam implantation  

Energy Technology Data Exchange (ETDEWEB)

The theoretical alignment limit for focused ion beam (FIB) implantation was deduced from the calculated resolution for the detection of an alignment mark. The alignment resolution varies with the signal to noise ratio and there is an optimum current which gives the best resolution. The alignment resolution epsilon/sub sigma/ is approximately 0.006 ..mu..m for a 160 keV Si/sup ++/ beam from our FIB implanter. The measured alignment error is approximately 0.06 ..mu..m and the main reason of this discrepancy is vibration. The ultimate limit on the alignment error can be reached through improvements in the implanter system.

1987-06-01

152

the earth observer - Earth Observing System - NASA  

Science.gov (United States)

of satellite, aircraft and ground-based observations. In ..... swarm traps by Utah Department of Food and Agriculture (DAF) personnel. Preliminary Results ..... the 150th anniversary of the book's publication and the 200th anniversary of Darwin's birth. ...... cold war submarine missions to find that Arctic Ocean ...

153

Reuse Working Group - Earth Science Data Systems Working Groups - NASA  

Science.gov (United States)

Al Fleig, PITA Analytic Sciences. 7th Earth Science Data Systems Working Group Meeting ..... The Reuse Industry in Brazil, CESAR, and the Reuse in Software ...

154

Physical and optical properties of rare earth cobalt magnets  

Energy Technology Data Exchange (ETDEWEB)

Rare Earth Cobalt (REC) permanent magnets have unique properties that permit solutions to some optical tasks that cannot be accomplished with conventional magnets. A review of design and of performance characteristics of these magnets includes an analytical description of the three dimensional fringe fields of REC quadrupoles.

1980-08-01

155

Mean distance of closest approach of alkaline-earth metals ions in aqueous solutions: Experimental and theoretical calculations  

British Library Electronic Table of Contents (United Kingdom)

The estimation of numerical values of the mean distance of closest approach of ions, a, of alkaline-earth metal ion salts in aqueous solutions, determined from activity coefficients, as well as from different theoretical approaches, is presented and discussed.

2010-01-01

156

Host Your Own Tweetup! Sun-Earth Day 2011 - Sun-Earth Day - NASA  

Science.gov (United States)

(Like using solar cookers to make hot dogs! Yummm!) How many people do you want to attend? 5? 30? 200?!? (Ambitious aren't we?) ...

157

FAQ: Earthquakes, Faults, Plate Tectonics, Earth Structure  

Science.gov (United States)

This frequently-asked-questions feature provides answers about earthquakes, faults, plate tectonics, and earth structure. Maps and diagrams are provided with some answers, and links to additional information and to related topics are included.

158

Earth Resources NASA SP-7041 (18) - NASA Technical Reports Server  

Science.gov (United States)

The Grover S and X-band dual-wavelength radar system has been ...... A. H. Watkins (U.S. Geological Survey, Earth Resources. Observation Systems Data Center ...

159

Do energetic heavy nuclei penetrate deeply into Earth's atmosphere?  

UK PubMed Central (United Kingdom)

We calculate the expected fluxes of cosmic ray nuclei with charge 5 ≤ Z ≤ 28 at various depths in the earth's atmosphere, taking into account the initial charge distribution,...Full Text Available

1980-01-01

160

Solutions to defect-related problems in implanted silicon by controlled injection of vacancies by high-energy ion irradiation  

Energy Technology Data Exchange (ETDEWEB)

Amorphization and a dual implant technique have been used to manipulate residual defects that persist following implantation and post-implant thermal treatments. Residual defects can often be attributed to ion-induced defect excesses. A defect is considered to be excess when it occurs in a localized region at a concentration greater than its complement. Sources of excess defects include spatially separated Frenkel pairs, excess interstitials resulting from the implanted atoms, and sputtering. Preamorphizing prior to dopant implantation has been proposed to eliminate dopant broadening due to ion channeling as well as dopant diffusion during subsequent annealing. However, transient-enhanced diffusion (TED) of implanted boron has been observed in pre-amorphized Si. The defects driving this enhanced boron diffusion are thought to be the extended interstitial-type ...

1999-06-01

161

Solutions to defect-related problems in implanted silicon by controlled injection of vacancies by high-energy ion irradiation  

International Nuclear Information System (INIS)

Amorphization and a dual implant technique have been used to manipulate residual defects that persist following implantation and post-implant thermal treatments. Residual defects can often be attributed to ion-induced defect excesses. A defect is considered to be excess when it occurs in a localized region at a concentration greater than its complement. Sources of excess defects include spatially separated Frenkel pairs, excess interstitials resulting from the implanted atoms, and sputtering. Preamorphizing prior to dopant implantation has been proposed to eliminate dopant broadening due to ion channeling as well as dopant diffusion during subsequent annealing. However, transient-enhanced diffusion (TED) of implanted boron has been observed in pre-amorphized Si. The defects driving this enhanced boron diffusion are thought to be the extended interstitial-type ...

1999-06-01

162

On the theory of transient enhanced diffusion in boron-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

Transient enhanced diffusion in boron-implanted silicon is interpreted as being due to the fact that during rapid thermal annealing a relaxation process takes place, associated with quasi-chemical reactions including defects. A simple analytical model makes it possible to describe the annealing mechanism on a microscopic scale in terms of reaction-diffusion processes. The measured dependences of the boron diffusion coefficient of the enhanced diffusion on time, temperature and implantation energy are satisfactorily explained. (author).

1991-01-01

163

On the theory of transient enhanced diffusion in boron-implanted silicon  

International Nuclear Information System (INIS)

Transient enhanced diffusion in boron-implanted silicon is interpreted as being due to the fact that during rapid thermal annealing a relaxation process takes place, associated with quasi-chemical reactions including defects. A simple analytical model makes it possible to describe the annealing mechanism on a microscopic scale in terms of reaction-diffusion processes. The measured dependences of the boron diffusion coefficient of the enhanced diffusion on time, temperature and implantation energy are satisfactorily explained. (author).

164

Improvement of the parameters of shallow p"+-n-junctions in silicon by additional carbon implantation and step-by-step thermal treatments  

International Nuclear Information System (INIS)

In this article carbon co-implantation and step-by-step thermal treatments of shallow p"+-n-junctions formation were used with the purpose of extended defect suppression and reduction of boron transient enhanced diffusion. A substantial improvement of the structural and electrical parameters of shallow p"+-n-junctions has been achieved by using the additional carbon implantation and step-by-step thermal treatments. (authors)

165

Implantation-plasma treatment of martensitic steel and titanium alloy  

Energy Technology Data Exchange (ETDEWEB)

One of the effective methods of deep modification of the surface of steels and alloys is the combination of ion implantation and plasma nitriding. In this work, the long-range effect is demonstrated in the case of combination of the effect of high- and low-energy ions of nitrogen on a martensitic steel for each ion implantation is usually not effective, and a titanium alloy used widely in industry.

2001-07-01

166

Recovery of rare earths from red mud  

International Nuclear Information System (INIS)

The prospect for the recovery of rare earths from red mud, the bauxite tailings from the production of alumina is examined. The Jamaican red mud by far has the higher trace concentrations of lanthanum, cerium, neodymium, and yttrium. Scandium is also present. The dissolution of the rare earth is a major extraction problem because of the large volume of other materials. The recovery processes that have been proposed include the production of co-products such as iron, alumina, and titanium concentrates, with the rare earths going with the titanium. In this paper a critical examination of the possible processes are presented with the recommended research projects to be carried out.

1992-03-01

167

Moment of inertia calculations for some even-even rare earth nuclei  

International Nuclear Information System (INIS)

... angular momentum cranking model even-even nuclei gadolinium 156 governor

168

Glory Mission Overview  

National Aeronautics and Space Administration (NASA)

NASA's Glory spacecraft is equipped to survey and map aerosols in Earth's atmosphere during a mission marking the return to flight of the Taurus XL rocket.

2011-02-22

169

A small particle selective emitter for thermophotovoltaic energy conversion  

Energy Technology Data Exchange (ETDEWEB)

This paper presents an analysis of the performance of a selective emitter using small particles of rare earth compounds stable at high temperatures in a low emittance inert gas stream. An expression for the spectral emissive power excluding radiation scattering was derived to include the radiation in the emission band, produced by electronic transitions of the rare earth ion, and the continuum radiation outside the emission band produced by the rare earth host. Preliminary results suggest that a selective emitter based on suspended rare earth oxide particles will have high efficiency and merits further experimental investigation. {copyright} {ital 1996 American Institute of Physics.}

1996-02-01

170

25th Space Simulation Conference. Environmental Testing: The Earth-Space Connection  

Science.gov (United States)

Topics covered include: Methods of Helium Injection and Removal for Heat Transfer Augmentation; The

2008-01-01

171

The rare earth antimonates: spectroscopic properties, crystal field and paramagnetic susceptibility simulations  

International Nuclear Information System (INIS)

The rare earth antimonates RE_3Sb_5O_1_2 constitute an isostructural series, where the rare earth site symmetry is S_4. The spectroscopic properties of pure or doped compounds of this family are studied in order to derive their energy level schemes and to simulate them through the crystal field theory, by using the approximated D_2_d potential. The paramagnetic susceptibilities are calculated with the derived wavefunctions and compared to experiment.

1990-09-01

172

Energy transfer processes in rare-earth compounds  

International Nuclear Information System (INIS)

In this thesis the results are described of an investigation into the radiationless transfer of electronic excitation energies in various Eu"3"+ and Tb"3"+ compounds, which show structural peculiarities in the rare-earth sublattice. These peculiarities are an one-dimensional sublattice as well as two different crystallographic locations for the rare-earth ion. 154 refs.; 43 figs.; 12 tabs.

1999-01-01

173

Earth Matter Effects in Detection of Supernova Neutrinos  

CERN Document Server

We calculated the matter effect, including both the Earth and supernova, on the detection of neutrinos from type II supernovae at the proposed Daya Bay reactor neutrino experiment. It is found that apart from the dependence on the flip probability P_H inside the supernova and the mass hierarchy of neutrinos, the amount of the Earth matter effect depends on the direction of the incoming supernova neutrinos, and reaches the biggest value when the incident angle of neutrinos is around 93^\\circ. In the reaction channel \\bar{\

2006-01-01

174

The effect of excimer laser pretreatment on diffusion and activation of boron implanted in silicon  

International Nuclear Information System (INIS)

We have investigated the effect of excimer laser annealing (ELA) on transient enhanced diffusion (TED) and activation of boron implanted in Si during subsequent rapid thermal annealing (RTA). It is observed that ELA with partial melting of the implanted region causes reduction of TED in the region that remains solid during ELA, where the diffusion length of boron is reduced by a factor of #approx#4 as compared to the as-implanted sample. This is attributed to several mechanisms such as liquid-state annealing of a fraction of the implantation induced defects, introduction of excess vacancies during ELA, and solid-state annealing of the defects beyond the maximum melting depth by the heat wave propagating into the Si wafer. The ELA pretreatment provides a substantially improved electrical activation of boron during subsequent RTA.

2005-11-07

175

Status and progress in ion implantation technology for semiconductor device manufacturing  

International Nuclear Information System (INIS)

Rapid growth in implant applications in the fabrication of semiconductors has encouraged a dramatic increase in the range of energies, beam currents and ion species used. The challenges of a wider energy range, higher beam currents, continued reduction in contamination, improved angle integrity and larger substrates have motivated the development of many innovations. Advanced processes in submicron device production uses up to twenty implantation steps. Thus the outstanding growth of this industry has led to the evolution of a thriving business of hundreds of implantation equipment systems each year with very specific requirements. The present paper reviews the principal process requirements which resulted in the evolution of the equipment technology, and describes the recent trends in the ion implanter technology all three principal categories: high current, medium current and high energy. (author)

1998-12-08

176

RHEED, AES and XPS studies of the passive films formed on ion implanted stainless steel  

International Nuclear Information System (INIS)

P-implantation (10"1"7 ions cm"-"2, 40 KeV) into 304 stainless steel (ss) has been carried out, and an amorphous surface alloy was formed. Polarization studies in deaerated 1N H_2SO_4+ 2% NaCl showed that P-implantation improved both the general and localized corrosion resistance of 304 ss. A comparative study has been carried out between the implanted and unimplanted steel to determine what influence P-implantation has upon the properties of the passive film formed 1N H_2SO_4. The influence of Cl ions on pre-formed passive films was also studied. RHEED, XPS and AES were used to evaluate the nature of the passive films formed in these studies.

2005-05-26

177

RHEED, AES and XPS studies of the passive films formed on ion implanted stainless steel  

Energy Technology Data Exchange (ETDEWEB)

P-implantation (10/sup 17/ ions cm/sup -2/, 40 KeV) into 304 stainless steel (ss) has been carried out, and an amorphous surface alloy was formed. Polarization studies in deaerated 1N H/sub 2/SO/sub 4/+ 2% NaCl showed that P-implantation improved both the general and localized corrosion resistance of 304 ss. A comparative study has been carried out between the implanted and unimplanted steel to determine what influence P-implantation has upon the properties of the passive film formed 1N H/sub 2/SO/sub 4/. The influence of Cl ions on pre-formed passive films was also studied. RHEED, XPS and AES were used to evaluate the nature of the passive films formed in these studies.

1981-12-01

178

Photosensitivity and imaging characteristics of ion-implanted PLZT ceramics  

International Nuclear Information System (INIS)

We reported in previous papers that both the near-uv and the visible photosensitivities of ferroelectric-phase PLZT (lead lanthanum zirconate titanate) ceramics are increased by as much as four orders of magnitude by ion implantation or a combination of thermal diffusion of Al and ion implantation. New results are presented here on high-energy (1 MeV) implants of Al and Ni and coimplants of Al + Ne and Ni + Ne, and these results are compared with earlier 500 keV implants of Al and Cr and coimplants of Al + Ne and Cr + Ne as surface modification techniques for increasing the visible photosensitivity of PLZT. The important role of grain size in determining optimum contrast and resolution of stored optical information is described in terms of new experimental results.

1985-08-12

179

Ion implantation into concave polymer surface  

Energy Technology Data Exchange (ETDEWEB)

A new technique for ion implantation into concave surface of insulating materials is proposed and experimentally studied. The principle is roughly described by referring to modifying inner surface of a PET (polyethylene terephthalate) bottle. An electrode that is supplied with positive high-voltage pulses is inserted into the bottle. Both plasma formation and ion implantation are simultaneously realized by the same high-voltage pulses. Ion sheath with a certain thickness that depends on plasma parameters is formed just on the inner surface of the bottle. Since the plasma potential is very close to that of the electrode, ions from the plasma are accelerated in the sheath and implanted perpendicularly into the bottle's inner surface. Laser Raman spectroscopy shows that the inner surface of an ion-implanted PET bottle is modified into DLC (diamond-like carbon). Gas permeation measurement shows ...

2006-01-15

180

Influence of substitutional carbon incorporation on implanted-indium-related defects and transient enhanced diffusion  

International Nuclear Information System (INIS)

It has been demonstrated that, by incorporating a thin #approx#20 nm Si_1_-_yC_y (with y as low as 0.1%) layer at the deep indium implant end-of-range (EOR) region, the EOR defects and enhanced diffusion behavior associated with indium implant can be eliminated. The Si_1_-_yC_y layer was grown epitaxially followed by a silicon epitaxy cap of 60 nm. Indium implantations were performed at 1x10"1"4 cm"-"2 at 115 keV followed by spike annealing at 1050 deg. C. The experimentally observed EOR defect and enhanced diffusion elimination are explained based on the undersaturation of implantation-induced silicon interstitials with the presence of substitutional carbon at the Si_1_-_yC_y layer.

2003-11-17

181

In-vitro evaluation of corrosion resistance of nitrogen ion implanted titanium simulated body fluid  

International Nuclear Information System (INIS)

Titanium and its alloy Ti6Al4V enjoy widespread use in various biomedical applications because of favourable local tissue response, higher corrosion resistance and fatigue strength than the stainless steels and cobalt-chromium alloy previously used. The study reported in this paper aims to optimize the conditions of nitrogen ion implantation on commercially pure titanium and to correlate the implantation parameters to the corrosion resistance. X-ray photoelectron spectroscopy was used to analyse surface concentration and the implantation processes. An improvement in the electrochemical behaviour of the passive film was shown to occur with nitrogen ion implantation on titanium, in simulated body fluids. (UK).

182

Implantation processing of Si: A unified approach to understanding ion-induced defects and their impact  

Energy Technology Data Exchange (ETDEWEB)

A model is presented to account for the effects of ion-induced defects during implantation processing of Si. It will be shown that processing is quite generally affected by the presence of defect excesses rather than the total number of defects. a defect is considered excess if it represents a surplus locally of one defect type over its compliment. Processing spanning a wide range of implantation conditions will be presented to demonstrate that the majority of the total defects played little or no role in the process. This is a direct result of the ease with which the spatially correlated Frenkel pairs recombine either dynamically or during a post-implantation annealing. Based upon this model, a method will be demonstrated for manipulating or engineering the excess defects to modify their effects. In particular high-energy, self-ions are shown to inject vacancies into a boron implanted region resulting ...

1997-05-01

183

Effect of recoil implantation of oxygen on boron enhanced diffusion in silicon  

International Nuclear Information System (INIS)

In device fabrication, dopants are frequently implanted into silicon through silicon dioxide masks. A consequence of this technique is the co-implantation of recoiled oxygen into the substrate. This study investigates the effect of recoiled oxygen on the widely observed transient enhanced boron diffusion. Comparison of the spreading resistance profiles of annealed through-oxide and directly implanted samples reveals that transient enhanced diffusion of boron can be suppressed by the former process. Continued annealing of the through-oxide implanted silicon recovers the enhanced diffusion of boron. This behavior is believed to be due to precipitation of recoiled oxygen. The mechanisms leading to the above observations are discussed and transmission electron microscopy support presented. 11 refs., 5 figs.

1989-04-25

184

Bacterial adhesion reduction on a biocompatible Si^+ ion implanted austenitic stainless steel  

British Library Electronic Table of Contents (United Kingdom)

The colonization of an implant surface by bacteria is an extremely important medical problem, which often leads to the failure of medical devices. Modern surface modification techniques, such as ion implantation, can confer to the surfaces very different properties from those of the bulk underlying material. In this work, austenitic stainless steel 316 LVM has been superficially modified by Si^+ ion implantation. The effect of surface modification on the biocompatibility and bacterial adhesion to 316 LVM stainless steel has been investigated. To this aim, human mesenchymal stem cells (hMSCs), as precursor of osteoblastic cells, and bacterial strains relevant in infections related to orthopedic implants, i.e., Staphylococcus aureus and Staphylococcus epidermidis, have been assayed. For the ...

2011-01-01

185

Annealing of silicon implanted with arsine and hydrogen ions  

Energy Technology Data Exchange (ETDEWEB)

Arsenic and hydrogen ions produced from a mixture of arsine and hydrogen gas were implanted with a dose of 3 x 10{sup 15} As{sup +} ions/cm{sup 2} into silicon using an ion-shower implanter. The dominant ionic species implanted into the silicon were As{sub 2}H{sup +}, AsH{sup +}, H{sub 5}{sup +}, and H{sub 3}{sup +} ions. Arsenic atoms diffused into the silicon with large diffusion coefficients during annealing at 700 and 800 C. However, when the implanted silicon was annealed at 900 C, the arsenic atoms diffused into a deeper region in the silicon with a very small diffusion coefficient that was independent of concentration. (Abstract Copyright [2003], Wiley Periodicals, Inc.)

2003-01-01

186

XPS study of the passive films formed on nitrogen-implanted austenitic stainless steels  

Energy Technology Data Exchange (ETDEWEB)

Austenitic stainless steels (304-type) have been implanted with nitrogen ions in order to investigate the effects of implanted nitrogen on their electrochemical behaviour and on the nature of the passive film formed on the steels in acid (0.5M H{sub 2}SO{sub 4}). Alloys with two nitrogen doses have been prepared (2.5x10{sup 16} and 2x10{sup 17} N atoms/cm{sup 2}). The implanted alloys have been characterized by {sup 15}N-NRA (nuclear reaction analysis) and XPS (X-ray photoelectron spectroscopy). Alloy surfaces with well-defined N concentrations were prepared, prior to the electrochemical measurements, by argon-ion sputtering of the implanted material for a fixed time in order to reach a well-defined point on the nitrogen depth profile. The samples were then transferred without exposure to air to an electrochemical cell mounted in an inert gas glove box. The implanted nitrogen ...

1992-05-01

187

XPS study of the passive films formed on nitrogen-implanted austenitic stainless steels  

International Nuclear Information System (INIS)

Austenitic stainless steels (304-type) have been implanted with nitrogen ions in order to investigate the effects of implanted nitrogen on their electrochemical behaviour and on the nature of the passive film formed on the steels in acid (0.5M H_2SO_4). Alloys with two nitrogen doses have been prepared (2.5x10"1"6 and 2x10"1"7 N atoms/cm"2). The implanted alloys have been characterized by "1"5N-NRA (nuclear reaction analysis) and XPS (X-ray photoelectron spectroscopy). Alloy surfaces with well-defined N concentrations were prepared, prior to the electrochemical measurements, by argon-ion sputtering of the implanted material for a fixed time in order to reach a well-defined point on the nitrogen depth profile. The samples were then transferred without exposure to air to an electrochemical cell mounted in an inert gas glove box. The implanted nitrogen modifies the electrochemical ...

1992-01-01

188

Modification of the passivity of iron based alloys through ion implantation  

International Nuclear Information System (INIS)

As an unconventional surface alloying process, ion implantation has been utilized to improve the active-passive behavior and the pitting resistance of martensitic M50 engineering alloy. In a field simulation study, Cr-implantation only at 150 kev to a fluence of 2 x 10"1"7 ions/cm"2 prevented pitting. The best pitting resistance of the steel was obtained with multiple implantations of Cr and Mo. The intermixing effect of high fluence P-implantation into 304 stainless produced an amorphous surface alloy. The removal of the grain boundaries and the uniformity of the resulting structure had a great influence on corrosion properties. REED analysis indicated that the anodic passive films formed on P-implanted 304 stainless steel at 250 mV (SCE) in 0.5M H_2SO_4 was amorphous. Phosphorus and boron were implanted into 316 stainless steel to study the passivity of 316 ...

1764-01-01

189

Treatment of a waste salt delivered from an electrorefining process by an oxidative precipitation of the rare earth elements  

British Library Electronic Table of Contents (United Kingdom)

For the reuse of a waste salt from an electrorefining process of a spent oxide fuel, a separation of rare earth elements by an oxidative precipitation in a LiCl-KCl molten salt was tested without using precipitate agents. From the results obtained from the thermochemical calculations by HSC Chemistry software, the most stable rare earth compounds in the oxygen-used rare earth chlorides system were oxychlorides (EuOCl, NdOCl, PrOCl) and oxides (CeO2, PrO2), which coincide well with results of the Gibbs free energy of the reaction. In this study, similar to the thermochemical results, regardless of the sparging time and molten salt temperature, oxychlorides and oxides were formed as a precipitant by a reaction with oxygen. The structure of the rare earth precipitates was divided into two sha...

2009-01-01

190

The sorption recovery of rare earth elements, yttrium and aluminium from the red mud  

International Nuclear Information System (INIS)

The extraction of rare earth elements, yttrium and aluminium from red mud resulting from alumina production with the ion-exchange resin KU-2-8n was studied. Experimental results are presented. The technology of hydrometallurgical processing of pulps obtained by sorption extraction of scandium from red mud is developed. It is shown that in the process of precipitation from sulfate sulfuric acid desorbate it became possible to obtain a high degree of rare earths deposition. The use of sodium hydroxide makes it possible to obtain a maximum deposition of rare earths and aluminium - 99.9 %. Aluminium leaching from crude composite concentrate gives a possibility to get concentrates which 15 - 20 times richer in yttrium and rare earths

2002-08-01

191

Galactic Cosmic Rays - Clouds Effect and Bifurcation Model of the Earth Global Climate. Part 1. Theory  

CERN Document Server

The possible physical linkage between galactic cosmic rays intensity and the Earth's cloud cover is discussed using the analysis of the first indirect aerosol effect (Twomey effect) and its experimental representation as the dependence of average cloud droplet effective radius on aerosol index characterizing the aerosol concentration in the atmospheric air column of unit section. It is shown that the basic kinetic equation of the Earth's climate energy-balance model is described by the bifurcation equation (with respect to the temperature of the Earth's surface) in the form of fold catastrophe with two governing parameters defining the variations of insolation and Earth's magnetic field (or galactic cosmic rays intensity in the atmosphere), respectively. The principle of hierarchical climatic models construction, which consists in the structural invariance of balance equations of these models evolving ...

2008-01-01

192

Modelisation of boron diffusion from ultra-low-energy implantation in crystalline silicon  

Energy Technology Data Exchange (ETDEWEB)

We have investigated and modeled the boron diffusion in silicon following ultra-low-energy implantation (500 eV). It is well known that reducing implant energies is an effective way to eliminate transient enhanced diffusion due to the excess of interstitials from the implant. However, for sub-keV B implants diffusion remains enhanced. This enhancement is linked to the presence of a silicon boride layer located at the silicon surface which creates interstitials. This phenomenon is named 'boron enhanced diffusion' (BED). The BED effect is of obvious interest since it counteracts the advantage obtained by reducing the ion implantation energy. For these reasons, we have investigated the diffusion of low-energy boron implanted in crystalline silicon and tested a complete simulation program, which takes into account the effect of boron precipitation ...

2003-12-31

193

Implantation damage and anomalous diffusion of implanted boron in silicon through SiO[sub 2] films  

Energy Technology Data Exchange (ETDEWEB)

Boron is implanted in crystalline silicon through oxide layers with different thicknesses. The implantation is carried out at various doses and energies of interest in ultra large scale integration (ULSI) application. Rapid thermal annealings (RTA) are used to obtain shallow junctions and electrical activation of the B atoms. However, transient enhanced diffusion induced by implantation damage can be observed. The boron concentration profiles before and after annealing are obtained with secondary ion mass spectrometry (SIMS). It is found that the diffusion transient in the tail region of the boron profile increases with decreasing oxide thickness. Even more, if the implantation damage concerns mostly the oxide, i.e. when the concentration peak is located in this oxide, the oxygen knocked into the silicon substrate could play this way an important role in restricting the boron diffusion, which is good to ...

1993-07-16

194

Enhanced diffusion of dopants in vacancy supersaturation produced by MeV implantation  

Energy Technology Data Exchange (ETDEWEB)

The diffusion of Sb and B markers has been studied in vacancy supersaturations produced by MeV Si implantation in float zone (FZ) silicon and bonded etch-back silicon-on-insulator (BESOI) substrates. MeV Si implantation produces a vacancy supersaturated near-surface region and an interstitial-rich region at the projected ion range. Transient enhanced diffusion (TED) of Sb in the near surface layer was observed as a result of a 2 MeV Si{sup +}, 1 {times} 10{sup 16}/cm{sup 2}, implant. A 4{times} larger TED of Sb was observed in BESOI than in FZ silicon, demonstrating that the vacancy supersaturation persists longer in BESOI than in FZ. B markers in samples with MeV Si implant showed a factor of 10{times} smaller diffusion relative to markers without the MeV Si{sup +} implant. This data demonstrates that a 2 MeV Si{sup +} implant injects vacancies into the near ...

1997-04-01

195

Doping of silicon carbide by ion implantation  

Energy Technology Data Exchange (ETDEWEB)

A brief survey is given of some recent results on doping of 4H- and 6H-SiC by ion implantation. The doses and energies used are between 10{sup 9} and 10{sup 15} cm{sup -2} and 100 keV and 5 MeV, respectively, and B and Al ions (p-type dopants) are predominantly studied. After low dose implantation ({<=}10{sup 10} cm{sup -2}) a strong compensation is observed in n-type samples and this holds irrespective of implantation temperature up to 600 C. However, at higher doses (10{sup 14}-10{sup 15} Al/cm{sup 2}) the rate of defect recombination (annihilation) increases substantially during hot implants ({>=}200 C), and in these samples one type of structural defect dominates after post-implant annealing at 1700-2000 C. The defect is identified as a dislocation loop composed of clustered interstitial atoms inserted on the basal plane in the hexagonal crystal structure. Finally, ...

2001-07-01

196

Treatment of a waste salt delivered from an electrorefining process by an oxidative precipitation of the rare earth elements  

Energy Technology Data Exchange (ETDEWEB)

For the reuse of a waste salt from an electrorefining process of a spent oxide fuel, a separation of rare earth elements by an oxidative precipitation in a LiCl-KCl molten salt was tested without using precipitate agents. From the results obtained from the thermochemical calculations by HSC Chemistry software, the most stable rare earth compounds in the oxygen-used rare earth chlorides system were oxychlorides (EuOCl, NdOCl, PrOCl) and oxides (CeO{sub 2}, PrO{sub 2}), which coincide well with results of the Gibbs free energy of the reaction. In this study, similar to the thermochemical results, regardless of the sparging time and molten salt temperature, oxychlorides and oxides were formed as a precipitant by a reaction with oxygen. The structure of the rare earth precipitates was divided into two shapes: small cubic (oxide) and large plate-like (tetragonal) structures. The conversion efficiencies of ...

2009-02-28

197

Treatment of a waste salt delivered from an electrorefining process by an oxidative precipitation of the rare earth elements  

International Nuclear Information System (INIS)

For the reuse of a waste salt from an electrorefining process of a spent oxide fuel, a separation of rare earth elements by an oxidative precipitation in a LiCl-KCl molten salt was tested without using precipitate agents. From the results obtained from the thermochemical calculations by HSC Chemistry software, the most stable rare earth compounds in the oxygen-used rare earth chlorides system were oxychlorides (EuOCl, NdOCl, PrOCl) and oxides (CeO2, PrO2), which coincide well with results of the Gibbs free energy of the reaction. In this study, similar to the thermochemical results, regardless of the sparging time and molten salt temperature, oxychlorides and oxides were formed as a precipitant by a reaction with oxygen. The structure of the rare earth precipitates was divided into two shapes: small cubic (oxide) and large plate-like (tetragonal) structures. The conversion efficiencies of the rare ...

2009-02-28

198

Study on a recovery of rare earth oxides from a LiCl-KCl-RECl3 system  

British Library Electronic Table of Contents (United Kingdom)

Radioactive rare earth chlorides in waste LiCl-KCl molten salts have to be separated as a stable form to minimize waste volume and to achieve stable solidification. In this work, thermal behavior of rare earth chlorides (CeCl3, GdCl3, NdCl3, PrCl3) was investigated in an oxygen condition to recover rare earth oxides from a LiCl-KCl-RECl3 system. The rare earth chlorides in the LiCl-KCl molten salts were smoothly converted to an oxychloride form at a higher temperature than 650degreeC, except for CeCl3. CeCl3 was totally converted to an oxide from at a higher temperature than 450degreeC. The rare earth oxychlorides (GdOCl, NdOCl, PrOCl) were effectively converted to oxide forms at a higher temperature than 1100degreeC. It was confirmed that rare earth oxides can be recovered from a LiCl-KCl...

2011-01-01

199

Investigation of the evaporation of rare earth chlorides in a LiCl-KCl molten salt  

International Nuclear Information System (INIS)

Uranium dendrites which were deposited at a solid cathode of an electrorefiner contained a certain amount of salts. These salts should be removed for the recovery of pure metal using a cathode processor. In the uranium deposits from the electrorefining process, there are actinide chlorides and rare earth chlorides in addition to uranium chloride in the LiCl-KCl eutectic salt. The evaporation behaviors of the actinides and rare earth chlorides in the salts should be investigated for the removal of salts in the deposits. Experiments on the salt evaporation of rare earth chlorides in a LiCl-KCl eutectic salt were carried out. Though the vapor pressures of the rare earth chlorides were lower than those of the LiCl and KCl, the rare earth chlorides were co-evaporized with the LiCl-KCl eutectic salt. The Hertz-Langmuir relation was applied for this evaporation, and also the evaporation ...

2011-02-01

200

A ~5 M_earth Super-Earth Orbiting GJ 436?: The Power of Near-Grazing Transits  

CERN Document Server

Most of the presently identified exoplanets have masses similar to that of Jupiter and therefore are assumed to be gaseous objects. With the ever-increasing interest in discovering lower-mass planets, several of the so-called super-Earths (i.e., with masses in the interval 1 M_earth < M < 10 M_earth), which are predicted to be rocky, have already been found. Here we report the possible discovery of a planet around the M-type star GJ 436 with a minimum mass of 4.8+/-0.6 M_earth and a true mass of ~5 M_earth, which makes it the least massive planet around a main-sequence star found to date. In contrast with other discoveries, the planet is identified from its perturbations on an inner Neptune-mass transiting planet (GJ 436b), by pumping eccentricity and producing secular variations in the orbital inclination. Analysis of published radial velocity measurements indeed reveals a ...

2008-01-01

201

Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5{times}10{sup 12} to 1{times}10{sup 14}/cm{sup 2} evolves into a distribution of {l_brace}311{r_brace} interstitial agglomerates during the initial annealing stages at 670{endash}815{degree}C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of ...

1997-05-01

202

Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon  

International Nuclear Information System (INIS)

Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5x10"1"2 to 1x10"1"4/cm"2 evolves into a distribution of #left brace#311#right brace# interstitial agglomerates during the initial annealing stages at 670 endash 815 degree C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of interstitials from ...

203

Retrospective individual dosimetry using luminescence and EPR after radiation accidents  

International Nuclear Information System (INIS)

In areas where radiation dose monitoring has not been performed, it is essential to use material available in the environment be able to rapidly assess doses to individuals for immediate emergency medical care or for general estimation of the radiological consequences. It was shown that certain types of telephone cards containing microchips have the potential to be used as individual radiation dosimeters in emergency situations to detect doses over 250 mGy by luminescence measurements. In order to understand the dosimetric properties of chip cards, the components obtained from INFINIEON Company at various stages of production were used for luminescence measurements. It is found that the protecting layer used above the chips so called 'globe top' is the main source of radiation induced signal in chip cards. The globe top produced by INFINIEON at that stage is found to contain SiO2 and Epoxy. In order to improve the dosimetric properties of the chip cards, the raw material of the globe ...

204

Understanding and controlling transient enhanced dopant diffusion in silicon  

Energy Technology Data Exchange (ETDEWEB)

Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during initial annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, the authors have used B doping marker layers in Si to probe the injection of interstitials from near-surface, non-amorphizing Si implants during annealing. The in-diffusion of interstitials is limited by trapping at impurities and has an activation energy of {approximately}3.5 eV. Substitutional C is the dominant trapping center with a binding energy of 2--2.5 eV. The high interstitial supersaturation adjacent to the implant damage drives substitutional B into metastable clusters at concentrations below the B solid solubility limit. Transmission electron microscopy shows that the interstitials driving TED are emitted from {l_brace}311{r_brace} defect clusters in the damage region at a rate which ...

1995-12-31

205

Understanding and controlling transient enhanced dopant diffusion in silicon  

International Nuclear Information System (INIS)

Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during initial annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, the authors have used B doping marker layers in Si to probe the injection of interstitials from near-surface, non-amorphizing Si implants during annealing. The in-diffusion of interstitials is limited by trapping at impurities and has an activation energy of #approx#3.5 eV. Substitutional C is the dominant trapping center with a binding energy of 2--2.5 eV. The high interstitial supersaturation adjacent to the implant damage drives substitutional B into metastable clusters at concentrations below the B solid solubility limit. Transmission electron microscopy shows that the interstitials driving TED are emitted from #left brace#311#right brace# defect clusters in the damage region at a rate which ...

206

The effect of boron implant energy on transient enhanced diffusion in silicon  

Energy Technology Data Exchange (ETDEWEB)

Transient enhanced diffusion (TED) of boron in silica after low energy boron implantation and annealing was investigated using boron-doping superlattices (DSLs) grown by low temperature molecular beam epitaxy. Boron ions were implanted at 5, 10, 20, and 40 keV at a constant dose of 2{times}10{sup 14}/cm{sup 2}. Subsequent annealing was performed at 750{degree}C for times of 3 min, 15 min, and 2 h in a nitrogen ambient. The broadening of the boron spikes was measured by secondary ion mass spectroscopy and simulated. Boron diffusivity enhancement was quantified as a function of implant energy. Transmission electron microscopy results show that {l_angle}311{r_angle} defects are only seen for implant energies {ge}10 keV at this dose and that the density increases with energy. DSL studies indicate the point defect concentration in the background decays much slower when {l_angle}311{r_angle} defects are ...

1997-02-01

207

Reversible downregulation of endocrine and germinative testicular function (hormonal castration) in the dog with the GnRH-Agonist Azagly-Nafarelin as a removable implant "Gonazon"; a preclinical trial  

British Library Electronic Table of Contents (United Kingdom)

Downregulation of anterior pituitary GnRH-receptors by application of a slow release GnRH-implant offers an effective and reversible alternative to surgical castration of the male dog. Aim of the present study was to test the efficacy and the underlying mechanisms of a new non-biodegradable controlled-release device implant (Gonazon, Intervet, containing 18.5mg of the GnRH-agonist Azagly-Nafarelin). Eight male beagle dogs were implanted s.c. at the para-umbilical region. In four dogs implant removal was after 180 days (group 1), in the other four dogs after 365 days (group 2). Eleven weeks after implantation availability of LH was reduced (p<0.0001) by 70%. After an initial increase lasting for about 4 days, testosterone (T) and estradiol (E2) concentrations decreased (p<0.0001) to basal l...

2009-01-01

208

Reduction of transient diffusion from 1{endash}5 keV Si{sup +} ion implantation due to surface annihilation of interstitials  

Energy Technology Data Exchange (ETDEWEB)

The reduction of transient enhanced diffusion (TED) with reduced implantation energy has been investigated and quantified. A fixed dose of 1{times}10{sup 14} cm{sup {minus}2} Si{sup +} was implanted at energies ranging from 0.5 to 20 keV into boron doping superlattices and enhanced diffusion of the buried boron marker layers was measured for anneals at 810, 950, and 1050{degree}C. A linearly decreasing dependence of diffusivity enhancement on decreasing Si{sup +} ion range is observed at all temperatures, extrapolating to {approximately}1 for 0 keV. This is consistent with our expectation that at zero implantation energy there would be no excess interstitials from the implantation and hence no TED. Monte Carlo modeling and continuum simulations are used to fit the experimental data. The results are consistent with a surface recombination length for interstitials of {lt}10 nm. The data presented here ...

1997-11-01

209

Reduction of transient diffusion from 1 endash 5 keV Si"+ ion implantation due to surface annihilation of interstitials  

International Nuclear Information System (INIS)

The reduction of transient enhanced diffusion (TED) with reduced implantation energy has been investigated and quantified. A fixed dose of 1x10"1"4 cm"-"2 Si"+ was implanted at energies ranging from 0.5 to 20 keV into boron doping superlattices and enhanced diffusion of the buried boron marker layers was measured for anneals at 810, 950, and 1050 degree C. A linearly decreasing dependence of diffusivity enhancement on decreasing Si"+ ion range is observed at all temperatures, extrapolating to #approx#1 for 0 keV. This is consistent with our expectation that at zero implantation energy there would be no excess interstitials from the implantation and hence no TED. Monte Carlo modeling and continuum simulations are used to fit the experimental data. The results are consistent with a surface recombination length for interstitials of <10 nm. The data presented here demonstrate that in the range of ...

210

Low temperature formation of shallow p{sup +}n junctions by BF{sub 2}{sup +} implantation into thin Pd{sub 2}Si films on Si substrates  

Energy Technology Data Exchange (ETDEWEB)

Excellent silicided shallow p{sup +}n junctions have been successfully achieved by the implantation of BF{sub 2}{sup +} ions into thin Pd{sub 2}Si films on Si substrates to a dose of 5 {times} 10{sup 15} cm{sup {minus}2} and subsequent low temperature (even at 550 C) furnace annealing. The formed junctions have been characterized for respective implantation conditions. In this experiment, the implant energy is the key role in obtaining a low leakage diode. Reverse current density of about 3 nA/cm{sup 2} and an ideality factor of about 1.05 can be attained by the implantation of BF{sub 2}{sup +} ions at 80 keV and subsequent annealing at 550 C. The junction depth is about 0.09 {mu}m, measured by the spread resistance method. As compared with the results of unimplanted specimens, the implantation of BF{sub 2}{sup +} ions into a thin Pd{sub 2}Si layer can stabilize the silicide film ...

1995-05-01

211

Low energy boron implantation in silicon: (1) reduction of channeling tail by careful alignments. (2) Transient diffusion during rapid thermal annealing  

Energy Technology Data Exchange (ETDEWEB)

An attempt was made to minimize the channeling tail by implantation along a random equivalent direction following a careful alignment of the target. In order to analytically determine the random equivalent directions, critical angles for channeling were mapped on a stereogram. Boron ions with energies of 17 and 45 keV are implanted along specified directions determined from the map. The depth distribution of the dopant is profiled by SIMS and the effects of water orientation upon the channeling tail are noted. Industrial common use of a 7/sup 0/ tilt is not optimum. However, implantation with the wafer tilted at 5.5 +/- 0.5/sup 0/ from the surface normal and rotated at 7.0 +/- 0.5/sup 0/ from a (100) plane shows the least channel-tail compared to implantation along other directions. Rapid thermal annealing (RTA) is a promising annealing method for shallow junction formation. Transient enhanced diffusion ...

1985-01-01

212

Low energy boron implantation in silicon: (1) reduction of channeling tail by careful alignments. (2) Transient diffusion during rapid thermal annealing  

International Nuclear Information System (INIS)

An attempt was made to minimize the channeling tail by implantation along a random equivalent direction following a careful alignment of the target. In order to analytically determine the random equivalent directions, critical angles for channeling were mapped on a stereogram. Boron ions with energies of 17 and 45 keV are implanted along specified directions determined from the map. The depth distribution of the dopant is profiled by SIMS and the effects of water orientation upon the channeling tail are noted. Industrial common use of a 7"0 tilt is not optimum. However, implantation with the wafer tilted at 5.5 +/- 0.5"0 from the surface normal and rotated at 7.0 +/- 0.5"0 from a (100) plane shows the least channel-tail compared to implantation along other directions. Rapid thermal annealing (RTA) is a promising annealing method for shallow junction formation. Transient enhanced diffusion of ...

213

Human bone matrix gelatin as a clinical alloimplant. A retrospective review of 160 cases.  

Science.gov (United States)

Bone matrix gelatin, prepared by sequential chemical treatment including decalcification with 0.6 N hydrochloric acid [9], was used as an alloimplant for the treatment of benign bone tumours, tumorous conditions of bone, acetabular dysplasia, delayed union, traumatic bone defects and other disorders. The bone matrix gelatin implanted into bone defects was incorporated successfully in 98% of implantations, excluding cases of infection, tumour recurrence and recurrence of tumorous conditions. The material was also implanted into ten bone sites as an onlay but in five it was resorbed without new bone formation. The incorporation of the bone matrix gelatin into the recipient bed was completed from 6 to 33 months (average 14.9 months) after implantation. Wound infection complicated 5 of 165 implantations (3%) in previously uninfected sites. Low grade fever persisting after the tenth ...

1985-01-01

214

Electrical and structural properties of ion-implanted and post-annealed silicide films  

Energy Technology Data Exchange (ETDEWEB)

The changes in the electrical and structural properties of metal-silicide films caused by ion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800/sup 0/C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10/sup 16/ Ar-ions/cm/sup 2/, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd/sub 2/Si to ...

1982-05-01

215

Electrical and structural properties of ion-implanted and post-annealed silicide films  

International Nuclear Information System (INIS)

The changes in the electrical and structural properties of metal-silicide films caused byion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi"2, NiSi"2 and Pd"2Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800_0C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi"2, NiSi"2 and Pd"2Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10_1_6 Ar-ions/cm_2, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd"2Si to PdSi was also observed in the high-temperature ...

216

Diffusion modeling of ion implanted boron in Si during RTA: Correlation of extended defect formation and annealing with the enhanced diffusion of boron. [Rapid Thermal Annealing  

Energy Technology Data Exchange (ETDEWEB)

Accurate modeling of the enhanced diffusion of boron during rapid thermal annealing has been accomplished by incorporating the effects of extended defect formation and annealing on enhanced diffusion into a multizone, semiempirical model. The multizone model divides the implant profile into three zones defining regions of different defects and diffusion enhancements. The model also contains the initial enhanced diffusion and the transient diffusion effects associated with the dissolution of defect clusters and the annealing of extended defects, respectively. The saturation time for transient-enhanced diffusion contains an exponential function of implant dose in order to model the increase in point defect generated with higher implant dose. As a result, the model accurately simulates the boron diffusion profile over a wide range of implant doses and also shows the immobile boron peak of precipitated ...

1993-01-01

217

Defects induced by focused ion beam implantation in GaAs  

Energy Technology Data Exchange (ETDEWEB)

The characteristics of defects induced by Si and Ga focused ion beam (FIB) implantation in n-GaAs have been investigated by means of deep-level transient spectroscopy (DLTS), C--V carrier profiling, and resistance measurements. The DLTS spectra of Si and Ga FIB implanted samples annealed at temperatures up to 500 /sup 0/C are apparently identical to one another and show three different electron traps with an activation energy between 0.25 and 0.6 eV. The resistance increases by more than five orders of magnitude by Si and Ga FIB implantation due to the induced defects. However, it is restored to initial values after annealing at 600 /sup 0/C, except for a sample of Ga implantation with a dose higher than 10/sup 14/ cm/sup 2/ . For annealing of induced defects, there are no intrinsic problems for FIB implantation with a dose lower than 10/sup 13/ cm/sup 2/ .

1988-05-01

218

Defects induced by focused ion beam implantation in GaAs  

International Nuclear Information System (INIS)

The characteristics of defects induced by Si and Ga focused ion beam (FIB) implantation in n-GaAs have been investigated by means of deep-level transient spectroscopy (DLTS), C--V carrier profiling, and resistance measurements. The DLTS spectra of Si and Ga FIB implanted samples annealed at temperatures up to 500 "0C are apparently identical to one another and show three different electron traps with an activation energy between 0.25 and 0.6 eV. The resistance increases by more than five orders of magnitude by Si and Ga FIB implantation due to the induced defects. However, it is restored to initial values after annealing at 600 "0C, except for a sample of Ga implantation with a dose higher than 10"1"4 cm"2 . For annealing of induced defects, there are no intrinsic problems for FIB implantation with a dose lower than 10"1"3 cm"2.

219

Current trends in ion implantation  

Energy Technology Data Exchange (ETDEWEB)

As semiconductor device dimensions continue to shrink, the drive beyond 250 nm is creating significant problems for the device processor. In particular, trends toward shallower-junctions, lower thermal budgets and simplified processing steps present severe challenges to ion implantation. In parallel with greater control of the implant process goes the need for a better understanding of the physical processes involved during implantation and subsequent activation annealing. For instance, the need for an understanding of dopant-defect interaction is paramount as defects mediate a number of technologically important phenomena such as transient enhanced diffusion and impurity gettering. This paper will outline the current trends in the ion implantation and some of the challenges it faces in the next decade, as described in the semiconductor roadmap. It will highlight some recent positron annihilation work ...

2001-07-01

220

Anomalous phosphorus diffusion in Si during postimplantation annealing  

Energy Technology Data Exchange (ETDEWEB)

The transient behavior of P diffusion in Si implanted with As or Ge above the amorphizing threshold has been investigated. Annealing at 720{degree}C after Ge implantation induces extensive P segregation into the extended defect layer formed by implantation damage. This segregation is attributed to P trapping to end-of-range {l_brace}311{r_brace} defects and dislocation loops. For As implantation, P segregation was also observed only after 1 min annealing. However, in contrast to the Ge implantation, in the As-implanted samples, significant P depletion occurs in the As-tail region after further annealing. Nonequilibrium simulation that takes into account both Fermi-level and electric field effects shows the P depletion during transient enhanced diffusion. Furthermore, simulation results based on the coexistence of neutral and positively charged ...

2001-06-11

221

Annealing and diffusion characteristics of boron-through-oxide implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

The author investigates the diffusion and damage-annealing characteristics as a result of boron implantation through a surface oxide into the silicon, a process that is commonly realized in the fabrication of p-n junctions. Defect structures were examined using plan-view and cross-section transmission-electron microscopies. It is shown that recoil-implanted oxygen plays a critical role in determining the above annealing characteristics. For instance, transient-enhanced diffusion of boron, as is widely observed for boron-implanted silicon, does not occur in the case of through-oxide implantation. The initial suppression of the defect-enhanced diffusion lasts for a limited period of time after which enhanced diffusion occurs again. The so-called incubated enhanced diffusion' is characterized as due to recoiled-oxygen precipitation-emitting point defect that enhances boron motion. The incubation ...

1991-01-01

222

Annealing and diffusion characteristics of boron-through-oxide implanted silicon  

International Nuclear Information System (INIS)

The author investigates the diffusion and damage-annealing characteristics as a result of boron implantation through a surface oxide into the silicon, a process that is commonly realized in the fabrication of p-n junctions. Defect structures were examined using plan-view and cross-section transmission-electron microscopies. It is shown that recoil-implanted oxygen plays a critical role in determining the above annealing characteristics. For instance, transient-enhanced diffusion of boron, as is widely observed for boron-implanted silicon, does not occur in the case of through-oxide implantation. The initial suppression of the defect-enhanced diffusion lasts for a limited period of time after which enhanced diffusion occurs again. The so-called incubated enhanced diffusion' is characterized as due to recoiled-oxygen precipitation-emitting point defect that enhances boron motion. The incubation time ...

223

A detailed physical model for ion implant induced damage in silicon  

Energy Technology Data Exchange (ETDEWEB)

A unified physically based ion implantation damage model has been developed which successfully predicts both the impurity profiles and the damage profiles for a wide range of implant conditions for arsenic, phosphorus, BF{sub 2}, and boron implants into single-crystal silicon. In addition, the amorphous layer thicknesses predicted by this new damage model are also in excellent agreement with experimental measurements. This damage model is based on the physics of point defects in silicon, and explicitly simulates the defect production, diffusion, and their interactions which include interstitial-vacancy recombination, clustering of same type of defects, defect-impurity complex formation, emission of mobile defects from clusters, and surface effects for the first time. New computationally efficient algorithms have been developed to overcome the barrier of the excessive computational requirements. In addition, the new model ...

1998-06-01

224

A detailed physical model for ion implant induced damage in silicon  

International Nuclear Information System (INIS)

A unified physically based ion implantation damage model has been developed which successfully predicts both the impurity profiles and the damage profiles for a wide range of implant conditions for arsenic, phosphorus, BF_2, and boron implants into single-crystal silicon. In addition, the amorphous layer thicknesses predicted by this new damage model are also in excellent agreement with experimental measurements. This damage model is based on the physics of point defects in silicon, and explicitly simulates the defect production, diffusion, and their interactions which include interstitial-vacancy recombination, clustering of same type of defects, defect-impurity complex formation, emission of mobile defects from clusters, and surface effects for the first time. New computationally efficient algorithms have been developed to overcome the barrier of the excessive computational requirements. In addition, the new model has ...

1998-06-01

225

Study of penetration depth for V"+ with low energy implanted in peanut seeds  

International Nuclear Information System (INIS)

The penetration depth and concentration distribution for vanadium ions with low energy implanted into the dry peanut seeds is determined by scanning electron microscope and X-ray energy dispersion spectrometer. The results show that the depth-concentration distribution is a Gaussian distribution with a long tail and the maximum penetration depth is about 13.6 #mu#m for V"+ with 200 keV in cotyledon of the peanut. The experimental result of the implanted V"+ range in the peanut seeds is compared with the calculating value of the TRIM95

2002-11-01

226

Self-interstitial supersaturation during Ostwald ripening of end-of-range defects in ion-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

Modified Ostwald ripening theory is used to calculate the time evolution of the size distribution function of extended end-of-range defects in ion implanted silicon. This allows the authors to compare the time dependent self-interstitial supersaturation during post-implantation annealing in the presence of Frank-type stacking faults with that in the presence of {l_brace}311{r_brace}-defects. It is shown that the latter affect self-interstitial concentrations up to the point where they dissolve whereas the former are irrelevant from the point of view of transient enhanced diffusion.

1996-12-01

227

Precipitation, phase transformation, and enhanced diffusion in ion-implanted silicon  

International Nuclear Information System (INIS)

This paper describes Z-contrast scanning transmission electron microscopy used to study the connection between dopant precipitation and phase transformation in high dose In"+ and Sb"+ implanted Si. In the case of In, the observations confirm a heterogeneous nucleation model. Images of the precursor precipitates give the first measurement of the diffusion coefficient in amorphous Si, with an enhancement of 10"7 over tracer crystalline values. With Sb"+ implants enhanced homogeneous nucleation is observed. The connection between these results and the transient enhanced diffusion observed in crystallized Si is discussed.

228

Plasma immersion ion implantation. (Latest citations from the EI Compendex*plus database). Published Search  

Energy Technology Data Exchange (ETDEWEB)

The bibliography contains citations concerning plasma immersion ion implantation (PIII) and equipment. PIII is a new technique to implant plasma ions into materials for surface modification and treatment. Topics include plasma nitriding, semiconductor doping, ion energy distribution, ion dose, pulsed plasma, metal plasma, and defect passivation. References also review applications in semiconductor device and integrated circuit manufacture, silicon material fabrication, aerospace bearings, carbon coatings on metals, and ceramic coatings. (Contains 50-250 citations and includes a subject term index and title list.) (Copyright NERAC, Inc. 1995)

1998-01-01

229

Nanostructure of Si-Ge near-surface layers produced by ion implantation and laser annealing  

International Nuclear Information System (INIS)

An annealing with the nanosecond laser light pulse is applied for crystal lattice reconstruction of a disturbed near-surface layer, which was created in semiconductor material as a result of the implantation process. Radiation with energy density higher than the threshold value causes the melting of the surface layer and than the epitaxial recrystallization from the melt on a different substrate. Structural changes occurring in the Ge implanted Si crystals after annealing with different energy densities are investigated by means of the cross-section high-resolution transmission electron microscopy. (author)

2001-09-23

230

Modeling of dislocation loop growth and transient enhanced diffusion in silicon for amorphizing implants  

Energy Technology Data Exchange (ETDEWEB)

It has been observed that dislocation loops form and grow during annealing of silicon wafers implanted at doses above the amorphization threshold. Dislocation loops can act to store interstitials for prolonged periods of anneals, sustaining an interstitial super-saturation and thus causing substantial transient enhanced diffusion (TED). The authors have developed a comprehensive model which, in combination with a model and parameters for {l_brace}311{r_brace} defects from previous work, accounts for the formation and evolution of dislocation loops during ion implant annealing, as well as giving the correct TED behavior.

1997-11-01

231

Modeling of dislocation loop growth and transient enhanced diffusion in silicon for amorphizing implants  

International Nuclear Information System (INIS)

It has been observed that dislocation loops form and grow during annealing of silicon wafers implanted at doses above the amorphization threshold. Dislocation loops can act to store interstitials for prolonged periods of anneals, sustaining an interstitial super-saturation and thus causing substantial transient enhanced diffusion (TED). The authors have developed a comprehensive model which, in combination with a model and parameters for #left brace#311#right brace# defects from previous work, accounts for the formation and evolution of dislocation loops during ion implant annealing, as well as giving the correct TED behavior.

1996-12-02

232

Application of high energy ion beam for the control of boron diffusion  

Energy Technology Data Exchange (ETDEWEB)

For the purpose of optimizing the process of co-implantation of MeV Si ions to reduce boron transient enhanced diffusion and boron-enhanced diffusion in Si, multiple MeV implantations and annealing at different temperatures have been performed. A slight improvement on the suppression of B diffusion is observed by adding a low temperature annealing step after the MeV implantation. No differences in B diffusion are observed when the Si doses are increased from 1 x 10{sup 15} to 1 x 10{sup 16} cm{sup -2}. This dose independent behavior is speculated to be a quasi-steady state of vacancy cluster evaporation.

2006-01-15

233

Application of high energy ion beam for the control of boron diffusion  

International Nuclear Information System (INIS)

For the purpose of optimizing the process of co-implantation of MeV Si ions to reduce boron transient enhanced diffusion and boron-enhanced diffusion in Si, multiple MeV implantations and annealing at different temperatures have been performed. A slight improvement on the suppression of B diffusion is observed by adding a low temperature annealing step after the MeV implantation. No differences in B diffusion are observed when the Si doses are increased from 1 x 10"1"5 to 1 x 10"1"6 cm"-"2. This dose independent behavior is speculated to be a quasi-steady state of vacancy cluster evaporation.

2006-01-01

234

A spatial damage energy distribution calculation for ion-implanted materials  

International Nuclear Information System (INIS)

A simple method allowing easy calculation of the spatial damage energy distributions for ion-implanted materials is presented. The direct procedure takes account of the variation with depth of the lateral spreading of implanted ions, as well as the effects of energy transport by the recoiling target atoms. The subsequent computer program LUPIN-3D provides three-dimensional damage distributions and allows the construction of damage energy mappings. Various substrates of technological interest are investigated and several fields of application of the calculation are envisaged. The density of cascades can therefore be determined and heterogeneous amorphization models can be implemented. (orig.).

1989-01-01

235

Elasto-plastic analysis of settlement of pile foundations. Part 2. ; Prediction of immediate settlement of building. Kui kiso no dansosei chinka kaiseki. 2. ; Kenchikubutsu no sokuji chinka yosoku hoho  

Energy Technology Data Exchange (ETDEWEB)

When the foundations of the building are designed and worked, the prediction calculation of immediate settlement of the building exercised practically is to calculate assuming the earth is a linear elastic body, but the actual stress-strain relationship of the earth is nonlinear and rigidity of the earth becomes lower as strain (or stress) increases. Hence in order to grasp the actual settling behavior of the earth, it is necessary to elucidate the nonlinear relationship between stress and strain. In this article, a prediction method of building settlement is introduced which uses an analytical technique of the multi-layered earth by the linear elasticity theory and takes into consideration strain dependency of rigidity of the earth. Part of the conclusion is as follows which has been obtained by studying the settling behaviors observed in examples of vertical ...

1992-12-25

236

Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.

1985-08-01

237

Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon  

International Nuclear Information System (INIS)

A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.

238

Transient enhanced diffusion and gettering of dopants in ion implanted silicon  

International Nuclear Information System (INIS)

We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As"+ implanted Si.

1984-11-26

239

Transient enhanced diffusion and gettering of dopants in ion implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As/sup +/ implanted Si. 12 references, 12 figures.

1986-01-01

240

Transient enhanced diffusion and gettering of dopants in ion implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As/sup +/ implanted Si.

1984-01-01

241

Transient enhanced diffusion and gettering of dopants in ion implanted silicon  

International Nuclear Information System (INIS)

The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As"+ implanted Si. 12 references, 12 figures.

242

The effect of ion implantation of Ar on the aqueous corrosion resistance of Zr-4 alloy  

International Nuclear Information System (INIS)

The effect of ion implantation on the aqueous corrosion resistance of Zr-4 in deaerated 1N H_2SO_4 was studied with the potentiokinetic technique. The Zr-4 alloy was bombarded with 5x10"1"4-2x10"1"6 Ar/cm"2 of 190 keV. It was found that the passive current density of Zr-4 decreases with increasing implantation dose. Photoelectrochemical results show that the ion implantation of Ar in Zr-4 raises the flatband potential of its passive film. AES was employed to analyze the surface of the passive film of Zr-4. The decrease in passive current density may be attributed to a thickening oxide layer on Zr-4 and a decrease in concentration of oxygen vacancies in its passive film. ((orig.)).

243

Surgeons' beliefs and perceptions about removal of orthopaedic implants  

UK PubMed Central (United Kingdom)

BackgroundThe routine removal of orthopaedic fixation devices after fracture healing remains an issue of debate. There are no evidence-based guidelines on this matter, and little...Full Text Available

244

Suppression of transient enhanced diffusion following {ital in} {ital situ} photoexcitation during boron ion implantation  

Energy Technology Data Exchange (ETDEWEB)

The effect of {ital in} {ital situ} photoexcitation during boron ion implantation on subsequent transient enhanced B diffusion in Si has been investigated. Photoexcitation using a mercury arc lamp was performed during B{sup +} implantation at 35 keV for a dose of 5{times}10{sup 14} cm{sup {minus}2} at 177 K. A reduction in the electrical activation dip, i.e., reverse annealing effect, in the temperature range 550--700 {degree}C was observed. Also, the transient enhanced diffusion of B, measured using SIMS following 800 {degree}C, 30 min annealing, was suppressed. Both effects demonstrate that the creation of self-interstitials during the implantation process is significantly reduced. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.

1995-10-09

245

Suppression of transient enhanced diffusion following in situ photoexcitation during boron ion implantation  

International Nuclear Information System (INIS)

The effect of in situ photoexcitation during boron ion implantation on subsequent transient enhanced B diffusion in Si has been investigated. Photoexcitation using a mercury arc lamp was performed during B"+ implantation at 35 keV for a dose of 5x10"1"4 cm"-"2 at 177 K. A reduction in the electrical activation dip, i.e., reverse annealing effect, in the temperature range 550--700 degree C was observed. Also, the transient enhanced diffusion of B, measured using SIMS following 800 degree C, 30 min annealing, was suppressed. Both effects demonstrate that the creation of self-interstitials during the implantation process is significantly reduced. copyright 1995 American Institute of Physics.

246

Selective radiochemical separation for indium determination at ppb levels in ion-implanted semiconductor-grade silicon  

Energy Technology Data Exchange (ETDEWEB)

A specific radiochemical procedure for indium determination in semiconductor-grade silicon, using an inorganic ion exchanger (cerium oxalate) is proposed.

1982-12-23

248

Plasma processing: a novel method to reduce the transient enhanced diffusion of boron implanted in silicon  

International Nuclear Information System (INIS)

In this paper a novel method is presented, based on the use of plasma processing, to suppress the transient enhanced diffusion of boron implanted in silicon. We found for silicon samples processed with plasma and subsequently boron implanted that the anomalous diffusion of the dopant atoms at the beginning of the annealing process is almost completely suppressed. This phenomenon is interpreted in terms of capture of the ion beam generated interstitials by the dislocations induced by the plasma processing. At room temperature the dislocations are observed to grow in size after the boron implant, attesting their efficiency as trapping centres for interstitials. Moreover, varying the plasma process conditions we can establish a general relation between the presence of the trapping centres induced by the plasma processing and the suppression of the transient diffusion.

1999-01-01

249

Optical and Structural Characteristics of Heavily Boron ...  

Science.gov (United States)

... Abstract : Cadmium telluride single crystals were subjected to multiple-energy boron ion implants with total doses up to 1.5 x 10 sq cm. ...

1988-05-24

250

NASA partners with teacher institute NASA strives to improve computers  

Science.gov (United States)

of the digital hearing aid technology that led to the cochlear implant. Former. Marshall Space Flight Center engineers. John Richardson and Joseph Howard ...

251

Microradiographic examination with the mammographic device 'TUR' after enossal implantation of glass ceramics (bio-vitroceramics)  

International Nuclear Information System (INIS)

As to all sinter variations the microradiographic analysis showed that about 86 to 90 % of the implant surface were enclosed split-free with newly formed bone 16 weeks post operationem. A silicat salt addition of the test variation Ap_4_0KS_1_5 and Ap_4_0KS_3_0 did not cause a negative influence on bone regeneration. On the surface of all test implants a double layer was revealed radiologically, consisting of a 30 - 40 #mu#m thick bone near X-ray impermeable area and an X-ray permeable area of maximum 120 #mu#m thickness directed to the nucleus of the implant.

252

Microradiographic examination with the mammographic device 'TUR' after enossal implantation of glass ceramics (bio-vitroceramics)  

Energy Technology Data Exchange (ETDEWEB)

As to all sinter variations the microradiographic analysis showed that about 86 to 90 % of the implant surface were enclosed split-free with newly formed bone 16 weeks post operation. A silicate salt addition of the test variation Ap/sub 40/KS/sub 15/ and Ap/sub 40/KS/sub 30/ did not cause a negative influence on bone regeneration. On the surface of all test implants a double layer was revealed radiologically, consisting of a 30 - 40 ..mu..m thick bone near X-ray impermeable area and an X-ray permeable area of maximum 120 ..mu..m thickness directed to the nucleus of the implant.

1984-01-01

253

Excessive bleeding in the floor of the mouth after endosseus implant placement: a report of two cases  

British Library Electronic Table of Contents (United Kingdom)

Placement of dental implants in the interforaminal region of the edentulous mandible is considered a safe and routine surgical procedure. Hemorrhage in the floor of the mouth has been reported as a rare, potentially life-threatening complication related to the placement of implants in this region. In this case report the authors present an immediate and a delayed case of massive bleeding in the floor of the mouth after implant placement. This highly vascularized region is vulnerable and bleeding can be induced easily by instrumentation, causing a vascular trauma, usually by perforation of lingual periostium. In almost all cases the expanding hematoma formation starts during surgery. The effect of the vasoconstrictive agent in the local anesthesic combined with an injury of the lingual arte...

2010-01-01

254

Enhancement of electrical conductivity of ion-implanted polymer films  

Energy Technology Data Exchange (ETDEWEB)

The electrical conductivity of ion-implanted films of Nylon 66, Polypropylene (PP), Poly(tetrafluoroethylene) (Teflon) and mainly Poly (ethylene terephthalate) (PET) was determined by DC measurements at voltages up to 4500 V and compared with the corresponding values of pristine films. Measurements were made at 21/sup 0/C +/- 1/sup 0/C and 65 +/- 2% RH. The electrical conductivity of PET films implanted with F/sup +/, Ar/sup +/, or As/sup +/ ions at energies of 50 keV increases by seven orders of magnitude as the fluence increases from 1 x 10/sup 18/ to 1 x 10/sup 20/ ions/m/sup 2/. The conductivity of films implanted with As/sup +/ was approximately one order greater than those implanted with Ar/sup +/, which in turn was approximately one-half order greater than those implanted with F/sup +/. The conductivity of the most conductive film approx.1 S/m) was almost 14 orders of ...

1985-01-01

255

Early Loading after 21 Days of Healing of Nonsubmerged Titanium Implants with a Chemically Modified Sandblasted and Acid-Etched Surface: Two-Year Results of a Prospective Two-Center Study  

British Library Electronic Table of Contents (United Kingdom)

ABSTRACT Purpose: The aim of this two-center study was to evaluate screw-type titanium implants with a chemically modified, sandblasted and acid-etched surface when placed in the posterior maxilla or mandible, and loaded 21 days after placement. Material and Methods: All 56 patients met strict inclusion criteria and provided informed consent. Each patient displayed either a single-tooth gap, an extended edentulous space, or a distal extension situation in the posterior mandible or maxilla. Eighty-nine dental implants (SLActive, Institut Straumann AG, Basel, Switzerland) were inserted according to an established nonsubmerged protocol and underwent undisturbed healing for a period of 21 days. Where appropriate, the implants were loaded after 21 days of healing with provisional restorations i...

2010-01-01

256

Diffusion of antimony in silicon in the presence of point defects  

Energy Technology Data Exchange (ETDEWEB)

We have investigated the diffusion of Sb in Si in the presence of defects injected by high-energy implantation of Si ions at room temperature. MeV ion implantation increases the concentrations of vacancies, which induce transient-enhanced diffusion of Sb deposited in Si. We observed a significant enhancement of Sb diffusion. Secondary ions mass spectroscopy has been performed on the implanted samples before and after annealing. Rutherford-backscattering spectrometry has been used to characterize the high-energy implantation damage. By fitting diffusion profiles to a linear diffusive model, information about atomic scale diffusion of Sb, i.e. the generation rate of mobile state Sb and its mean migration length were extracted.

2007-08-15

257

Diffusion of antimony in silicon in the presence of point defects  

International Nuclear Information System (INIS)

We have investigated the diffusion of Sb in Si in the presence of defects injected by high-energy implantation of Si ions at room temperature. MeV ion implantation increases the concentrations of vacancies, which induce transient-enhanced diffusion of Sb deposited in Si. We observed a significant enhancement of Sb diffusion. Secondary ions mass spectroscopy has been performed on the implanted samples before and after annealing. Rutherford-backscattering spectrometry has been used to characterize the high-energy implantation damage. By fitting diffusion profiles to a linear diffusive model, information about atomic scale diffusion of Sb, i.e. the generation rate of mobile state Sb and its mean migration length were extracted.

2007-08-01

258

Depth Profiling of N and C in Ion Implanted ZnO and Si Using Deuterium Induced Nuclear Reaction Analysis  

International Nuclear Information System (INIS)

Nuclear Reaction Analysis (NRA) with deuteron ion beams has been used to probe for ion implanted nitrogen and carbon with high sensitivity in zinc oxide and silicon single crystals. The ion implanted N was measured using 1.4 MeV deuteron ion beams and was found to be in agreement with calculated values. The limit of detection for N in ZnO is 8x1014 ions cm-2. Raman measurements of the ion implanted samples showed three additional modes at 275, 504, and 644 cm-1 compared to the un-implanted ZnO crystals. The NRA and Raman results provided information on the N concentration, depth distribution, and structural changes that occur in dependence on the nitrogen ion fluences. The deuterium induced 12C(d,p)13C reaction was used to measure the carbon impurity/dose in ion implanted silicon. It was found that the use of a large cold shield (liquid nitrogen trap) in the ion ...

2008-11-03

259

Crystal Chemistry of Ceramic/Mineral Systems  

Science.gov (United States)

... 1. Reeber, RR, Kusy, RP, Yu, N. and Chu, WK " Formation of a Solid Lubricant in Boron Carbide by Nitrogen Ion Implantation and Laser Annealing ...

1992-12-08

260

Creation of nitrogen-vacancy centres in diamond with high resolution  

International Nuclear Information System (INIS)

Nowadays, diamond and the nitrogen-vacancy (NV) colour centres constitute the best solid-state system in view of quantum-computing applications. It has also been shown recently that single NV centres could be used as nanoscale magnetic sensors. Such applications require the creation of single NV centres with very high resolution and with a high efficiency. The nano-implanter at the university of Bochum provides low energy nitrogen ions which can be implanted through a hole pierced in the tip of an atomic force microscope. Ultrapure diamond samples have been implanted with spot sizes of 50nm and less. Stimulated Emission Depletion (STED) microscopy has been used to characterise and resolve the implanted spots.

2010-03-21

261

Boron-enhanced-diffusion of boron: The limiting factor for ultra-shallow junctions  

Energy Technology Data Exchange (ETDEWEB)

Reducing implant energy is an effective way to eliminate transient enhanced diffusion (TED) due to excess interstitials from the implant. It is shown that TED from a fixed Si dose implanted at energies from 0.5 to 20 keV into boron doping-superlattices decreases linearly with decreasing Si ion range, virtually disappearing at sub-keV energies. However, for sub-keV B implants diffusion remains enhanced and x{sub j} is limited to {ge} 100 nm at 1,050 C. The authors term this enhancement, which arises in the presence of B atomic concentrations at the surface of {approx} 6%, Boron-Enhanced-Diffusion (BED).

1997-12-01

263

#left brace#311#right brace# Defects in ion-implanted silicon: The cause of transient diffusion, and a mechanism for dislocation formation  

International Nuclear Information System (INIS)

Ion implantation is used at several critical stages of Si integrated circuit manufacturing. The authors show how #left brace#311#right brace# defects arising after implantation are responsible for both enhanced dopant diffusion during annealing, and stable dislocations post-anneal. They observe #left brace#311#right brace# defects in the earliest stages of an anneal. They subsequently undergo rapid Ostwald ripening and evaporation. At low implant doses evaporation dominates, and they can quantitatively relate the interstitials emitted from these defects to the transient enhancement in diffusivity of dopants such as B and P. At higher doses Ostwald ripening is significant, and they observe the defects to undergo a series of unfaulting reactions to form both Frank loops and perfect dislocations. They demonstrate the ability to control both diffusion and dislocations by the addition of small amounts of carbon impurities.

1995-03-20

264

The rare earth antimonates: spectroscopic properties, crystal field and paramagnetic susceptibility simulations  

Energy Technology Data Exchange (ETDEWEB)

The rare earth antimonates RE{sub 3}Sb{sub 5}O{sub 12} constitute an isostructural series, where the rare earth site symmetry is S{sub 4}. The spectroscopic properties of pure or doped compounds of this family are studied in order to derive their energy level schemes and to simulate them through the crystal field theory, by using the approximated D{sub 2d} potential. The paramagnetic susceptibilities are calculated with the derived wavefunctions and compared to experiment.

1991-01-01

265

NMR at earth's magnetic field using para-hydrogen induced polarization  

British Library Electronic Table of Contents (United Kingdom)

A method to achieve NMR of dilute samples in the earth's magnetic field by applying para-hydrogen induced polarization is presented. Maximum achievable polarization enhancements were calculated by numerically simulating the experiment and compared to the experimental results and to the thermal equilibrium in the earth's magnetic field. Simultaneous 19F and 1H NMR detection on a sub-milliliter sample of a fluorinated alkyne at millimolar concentration (1018 nuclear spins) was realized with just one single scan. A highly resolved spectrum with a signal/noise ratio higher than 50:1 was obtained without using an auxiliary magnet or any form of radio frequency shielding.

2011-01-01

266

Chiral crystallization and the origin of chiral life on earth  

British Library Electronic Table of Contents (United Kingdom)

Abstract The creation of chirality on Earth and the development of chiral life have been discussed in this highlight. Convincing evidence for the introduction of chirality on Earth is still fragmentary. We believe that by a combination of chiral crystallization and formation of helical polymers with preferred chiral conformational structure is the key to this question. This concept of macromolecular asymmetry has inspired ideas and resulted in possible rules for how chiral life as we know it, could have been introduced. These investigations needed the understanding of the requirements for chiral crystallization, for the stereochemistry of the initial formation of helical polymers, the measurements of optical activity of solids and their coordination with the fundamentals of chirality. Spac...

2011-01-01

267

Worldwide Report, Telecommunications Policy, Research and ...  

Science.gov (United States)

... 80 Briefs New Television Transmitter 81 Matadi Satellite Earth Station Inaugurated (Kinshasa AZAP, various dates) 82 Ramazani Marks Opening ...

1985-12-31

268

Viscosity of the Earth's inner core: Constraints from nutation observations  

British Library Electronic Table of Contents (United Kingdom)

The gravitational torque applied on the Earth by the other celestial bodies generates periodic variations in the orientation of the Earth's rotation axis in space which are called nutations. Observations of Earth's nutations allow for insights into the physical properties of the inner core because of the presence of a normal mode, the Free Inner Core Nutation (FICN), which is characterized by a tilt of the inner core figure and rotation axes with respect to the mantle and outer core. The frequency of the FICN is controlled by the strength of the mechanical coupling acting at the inner core boundary (ICB) and by the ability of the inner core to deform under the action of centrifugal and gravitational forces. Attenuation of the FICN reflects energy dissipated by electromagnetic (EM) and visc...

2011-01-01

269

View larger image for ISS022-E-26137 - Earth Sciences and Image ...  

Science.gov (United States)

The Asarco-Mission complex (image left) is an active producer of copper and molybdenum (important in making steel and other metal alloys), ...

270

VOLUME I11 IMISSION SYSTEM PERFORMANCE - NASA Technical Report ...  

Science.gov (United States)

Nov 8, 2010 ... Ihring Mission 11, the radiation dosimetry measurement system functioned normally and provided data on the Earth's trapped radiation belts ...

271

Typhoon Aere : Image of the Day - NASA Earth Observatory  

Science.gov (United States)

Aug 25, 2004 ... The Tropical Rainfall Measuring Mission or TRMM satellite provided this image of Typhoon Aere over the western Philippine Sea as it was ...

272

Treatment of LiCl-KCl eutectic waste salt delivered from pyroprocessing of spent oxide fuel  

Energy Technology Data Exchange (ETDEWEB)

An oxidative precipitation reaction of rare-earth chlorides in a LiCl-KCl molten salt was successfully carried out by a lab-scale apparatus. The conversion efficiency of the used rare earth chlorides into the insoluble precipitates was increased with the sparging time and temperature and was affected on oxygen sparger type. In the conditions of 700 .deg. C molten salt temperature and above 540min sparging time, the final conversion efficiencies were over 99% for all the experimented rare-earth chlorides. The hydrodynamic characteristics of an oxygen-molten salt two phase flow system are very important for a co-oxidative precipitation of rare earth elements.

2008-08-15

273

Treatment of LiCl-KCl eutectic waste salt delivered from pyroprocessing of spent oxide fuel  

International Nuclear Information System (INIS)

An oxidative precipitation reaction of rare-earth chlorides in a LiCl-KCl molten salt was successfully carried out by a lab-scale apparatus. The conversion efficiency of the used rare earth chlorides into the insoluble precipitates was increased with the sparging time and temperature and was affected on oxygen sparger type. In the conditions of 700 .deg. C molten salt temperature and above 540min sparging time, the final conversion efficiencies were over 99% for all the experimented rare-earth chlorides. The hydrodynamic characteristics of an oxygen-molten salt two phase flow system are very important for a co-oxidative precipitation of rare earth elements

2008-08-01

274

The Shifty Nature of Grains  

Science.gov (United States)

... Astronomy & Space Biology Chemistry & Materials Computing Earth & Environment Education ... Materials Research Center at the University of Chicago, one of nearly 30 NSF-supported Materials ...

275

TIGER in Antarctica - Q&A - Misc. Antarctic Topics - NASA  

Science.gov (United States)

Jan 5, 2004 ... Even if dinosaurs were cold-blooded, in the Mesozoic Era (when dinosaurs roamed the Earth), Antarctica was warm enough to have them. ...

276

Science Directed Spacecraft Autonomy for Mars Missions - detail  

Science.gov (United States)

The rapidly growing field of remote sensing is beginning to supply massive amounts of high resolution imagery of the earth and other planets. ...

277

STS067-703D-090 Kinshasa ... - Earth from Space - Image Information  

Science.gov (United States)

... rivers of the world, the Zaire is not an efficient transportation link because of many rapids and falls to negotiate between Kinshasa and the port city of Matadi. ...

278

Rio Negro Floodplain, Patagonia, Argentina - NASA Earth Observatory  

Science.gov (United States)

Feb 15, 2010 ... This astronaut photo from January 4, 2010, shows meander scars and oxbow lakes in the floodplain of the Rio Negro in South America.

279

Remarks of Obama on space exploration in 21st century  

Science.gov (United States)

Apr 22, 2010 ... I believe that space exploration is not a ... plan for space exploration, especially in .... space exploration beyond low Earth orbit. ...

280

Regulators to Vote on Ocean Trawling Plan : News - NASA Earth ...  

Science.gov (United States)

Federal regulators were set to vote on a plan to protect deep water corals and other sensitive fish habitats that will likely include a permanent ban on ...

281

Preliminary representation of world population by spherical harmonics.  

UK PubMed Central (United Kingdom)

The geographical arrangement of people on the surface of the earth is approximated by a mathematical equation of 361 terms. This is a convenient form for comparison with other distributions and for...Full Text Available

1992-07-15

282

Optimal haulage routing of off-road dump trucks in construction and mining sites using Google Earth and a modified least-cost path algorithm  

British Library Electronic Table of Contents (United Kingdom)

This study presents new software, called Google Earth-based Optimal HAulage RouTing System (GEOHARTS), to improve the functionality of Google Earth for optimal haulage routing of off-road dump trucks in construction and mining sites. A modified least-cost path algorithm, which is applicable to working areas with both paved and unpaved temporary roads and can consider the effects of terrain relief and curves along a route on the route planning, was proposed and utilized for the software development. GEOHARTS can determine optimal haulage routes between loaders and dumps that ensure the least travel time or fuel consumption of off-road dump trucks and can visualize the results using an embedded 3D render window of Google Earth. The application to the Pasir open-pit coal mine in Indonesia dem...

2011-01-01

284

News - NASA Earth Observatory  

Science.gov (United States)

Satellite Observations of the Southeast Pacific Intertropical Convergence Zone During 1993-1998, Halpern, D.; Hung, C.-W., Journal of Geophysical Research ? ...

285

New remote sensing techniques for the detection and quantification of earth surface CO2 degassing  

British Library Electronic Table of Contents (United Kingdom)

Earth degassing specifically of carbon dioxide CO2 is of increasing interest with respect to the global carbon budget, related climate effects, earthquake and volcano eruption mechanisms, as well as plant physiological reactions in gas-rich environments. Investigations in all of these disciplines require the detection of surface CO2 degassing structures and quantification of their emissions. We introduce minimal thermal change detection based on infrared imaging as a new remote sensing tool for the detection of earth surface thermal anomalies suiting among others to discover earth degassing locations of any origin. The method allows for seamless areal search and monitoring of degassing structures in any terrain. As proof of concept infrared imaging measurements were performed at the Bossol...

2008-01-01

286

NASA's Next Major Space Observatory - Flight Projects - NASA  

Science.gov (United States)

of Earth Science data and information management capabilities. Dale Schulz/400 . For your exceptional achievement in leading the joint LaRC/GSFC team in ...

287

Impact of Ionospheric Scintillations on Space-Based ...  

Science.gov (United States)

... Zinn, J., Hoerlin, H., and Petschek, AG, "The Motion of Bomb Debris Follow- ing the Starfish Test," Radiation Trapped in the Earth's Magnetic Field ...

1991-06-01

288

ISS020-E-9861 - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

The portion of the Waterpocket Fold illustrated in this image includes layered rocks formed during the Mesozoic Era (~ 250 65 million years ago) the oldest ...

289

General Disclaimer One or more of the Following Statements may ...  

Science.gov (United States)

Hie synthesis of diverse biologically important compounds, under condi- tions which existed on the earth in the initial period of its evolution, ha; ...

290

GLYDER - Earth Science Technology Office (ESTO) - NASA  

Science.gov (United States)

goals for multisensor co-registration and fusion. 6 - 12.5 Km ..... Beta-Test toolkit for cyclogenesis and early evolution of cyclones ...

291

Five Special Types of Orbits Around Mars  

CERN Document Server

The abstract is additional with repect to the paper published in JGCD. Ordinary Earth satellites are usually placed into five categories of special orbits: sun-synchronous orbits, orbits at the critical inclination, frozen orbits, repeating ground track orbits, and geostationary orbits. This paper investigates their counterparts around Mars and examines the basic nature of these orbits, which are of special interest for missions conducted around Mars, including Mars reconnaissance. Mars' gravity field is much more complicated, with relatively smaller J2, compared to Earth's, which makes the behaviors of these Martian orbits different from those of Earth. Analytical formulations and numerical simulations are used to analyze these Martian orbits and compare them with their Earth counterparts. First, mean element theory is employed to describe variations of orbital elements and give the constraint ...

2011-01-01

292

Far-out Pathways to Space: Great Guns? - ISTP  

Science.gov (United States)

The SHARP cannon. Hydrogen is compressed in the tube on top, the gun barrel is on bottom. When Jules Verne wrote in 1865 "From Earth to the Moon" he ...

293

Far-out Pathways to Space: Great Guns?  

Science.gov (United States)

Turbine Afterword The SHARP cannon. Hydrogen is compressed in the tube on top, the gun barrel is on bottom. When Jules Verne wrote in 1865 "From Earth to the Moon" he envisioned...

2011-09-03

294

Extraction of rare earths by carbonic acids melts  

Energy Technology Data Exchange (ETDEWEB)

Extraction of rare earths (La, Ce, Pr, Eu, Gd, Er, Yb) from nitrate solutions by melts of carboxylic acids of the C/sub 17/-C/sub 20/ fraction and stearic acid with paraffin, depending on the temperature (60-90 deg), phase contact time and their volume ratio (O:B from 1:5 up to 1:100), pH of the aqueous phase (2-6), rare earth concentration (10/sup -6/-10/sup -3/ m) is studied. It is shown that in the whole concentration range investigated rare earths are extracted quantitatively into the carboxylic acid melt of C/sub 17/-C/sub 20/ fraction at the equilibrium value of pH>=3.8, while into the melt of 0.1 M stearic acid in paraffin at pH>=4.5.

1980-10-01

295

Electric and magnetic dipole transitions in odd-proton rare-earth nuclei  

International Nuclear Information System (INIS)

... gamma cascades kev range 10-100 lifetime lutetium 171 lutetium 173 lutetium

1972-05-01

296

Earthquakes, Hurricanes and Stubborn ... - NASA Earth Observatory  

Science.gov (United States)

Aug 23, 2011 ... Earthquakes, Hurricanes and Stubborn Instruments ... And if earthquakes and stubborn instruments aren't enough, there's this giant hurricane ...

297

Deforestation in Mato Grosso, Brazil - NASA  

Science.gov (United States)

Deforestation in Mato Grosso, Brazil. atom_author. atom_name, Jesse Allen. atom_link. kml_href, http://earthobservatory.nasa.gov/Feeds/GoogleEarth/ ...

298

Deforestation Plays Critical Climate Change Role - NASA Earth ...  

Science.gov (United States)

May 11, 2007 ... "Deforestation in the tropics accounts for nearly 20 per cent of carbon emissions due to human activities," Dr. Canadell says. ...

299

Deep-sea mud in the Pacific Ocean as a potential resource for rare-earth elements  

British Library Electronic Table of Contents (United Kingdom)

World demand for rare-earth elements and the metal yttrium?which are crucial for novel electronic equipment and green-energy technologies?is increasing rapidly. Several types of seafloor sediment harbour high concentrations of these elements. However, seafloor sediments have not been regarded as a rare-earth element and yttrium resource, because data on the spatial distribution of these deposits are insufficient. Here, we report measurements of the elemental composition of over 2,000 seafloor sediments, sampled at depth intervals of around one metre, at 78 sites that cover a large part of the Pacific Ocean. We show that deep-sea mud contains high concentrations of rare-earth elements and yttrium at numerous sites throughout the eastern South and central North Pacific. We estimate that an a...

2011-01-01

300

DEFORESTATION - Earth from Space - Search Results  

Science.gov (United States)

Features: FOREST, DEFORESTATION, RIO JAMARI Geographic Region: BRAZIL .... Features: DEFORESTATION, TIERRAS BAJAS DEFORESTATION Geographic Region: BOLIVIA ...

301

Compact ... - Earth Science Technology Office (ESTO) - NASA  

Science.gov (United States)

switch when this cavity matching condition is determined. This results is a ... MHz offset is provided by an acousto-optic modulator. (AOM). The AOM will be shut ...

302

BARIUM RELEASES at ALTITUDES BET\\VEEN 200 and 1000 - NASA ...  

Science.gov (United States)

Zinn, John;. Hoerlin,. Herman; and Petschek,. Albert. G.: The Motion of Bomb. Debris. Following the Starfish. Test. Radiation. Trapped in the Earth's ...

303

Study of the thermal plasma etching at atmospheric pressure on silica rods  

International Nuclear Information System (INIS)

Etching of SiO_2 rods has been obtained with a dc torch with argon as the process gas in an air environment at atmospheric pressure; the high temperature of the plasma jet causes vaporization of the exposed area. The apparatus and torch operative parameters have been set up to obtain a depth etch rate of up to 0.6 mm min"-"1 corresponding to 0.826 g min"-"1. An enthalpy probe has been employed to monitor the plasma conditions before the thermal plasma etching process and from the experimental etch rate a surface rod temperature of T_s_u_r = 2057 K has been derived. Etching has been obtained with uniformity over the entire exposed area with peak to peak differences below 1%. The plasma to rod heat transfer has been simulated using a commercial CFD code Fluent (copyright). The model consists of a non-steady two-dimensional simulation for a compressible turbulent fluid, with an adapted grid calculation. Boundary conditions have been set out using the enthalpy probe plasma jet map. In ...

2004-04-21

304

Investigation of (CeO_2)_x(Sc_2O_3)_(_0_._1_1_-_x_)(ZrO_2)_0_._8_9 (x = 0.01-0.10) electrolyte materials for intermediate-temperature solid oxide fuel cell  

International Nuclear Information System (INIS)

Oxide ionic conductivities of (CeO_2)_x(Sc_2O_3)_(_0_._1_1_-_x_)(ZrO_2)_0_._8_9 (x = 0.01-0.10) electrolytes were optimized for the application in intermediate-temperature solid oxide fuel cell (IT-SOFC). Powders with different contents of CeO_2 and Sc_2O_3 were prepared via a co-precipitation method. The obtained powders and pellets were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and impedance spectroscopy. Among all the compositions, (CeO_2)_0_._0_4(Sc_2O_3)_0_._0_7(ZrO_2)_0_._8_9(4Ce7ScZr) gives the highest ionic conductivity of 0.065 S cm"-"1 at 800 "oC. The effects on densification and electrical properties of different sintering additives, such as SiO_2, MgO, Co_3O_4, MoO_3 and Bi_2O_3, were studied and different conducting behavior with these additives were observed. The densification temperatures of CeO_2 and Sc_2O_3 co-doped electrolytes can be reduced by around 280 "oC with the addition of 1 mol% of ...

2010-07-23

305

Fabrication of zircon for disposition of weapons plutonium  

International Nuclear Information System (INIS)

This is the final report of a one-year, Laboratory-Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). In an effort to address the problems of long term storage and nuclear waste minimization, zircon has been proposed as a host medium for plutonium and other actinides recovered from dismantled nuclear weapons. The objective of this work is to investigate the feasibility of large scale fabrication of Pu-bearing zircon. Since PuO_2 is thermodynamically less stable than ZrO_2, it is expected that the process parameters determined for synthesizing ZrSiO_4 (zircon) would be applicable to those for PuSiO_4 (Pu-zircon). Furthermore, since the foremost concern in plutonium processing is the potential for contamination release, this work emphasizes the development of process parameters, using zircon first, to anticipate potential material problems in the containment system for reaction mixtures during processing. Stoichiometric mixtures of ZrO_2 and ...

306

FABRICATION OF BISMUTH NANOWIRE DEVICES USING FOCUSED ION BEAM MILLING  

International Nuclear Information System (INIS)

In this work, a focused ion beam (FIB) milling process has been developed to fabricate 50 nm Bi nanowire and transistor structures using FEI-200 dual beam FIB system. For the fabrication, 50 nm bismuth film was thermally evaporated through EBL patterned PMMA windows onto SiO_2 substrates with pre-defined contact pads. Bi nanowire widths ranging from 30 nm to 100 nm have been successfully fabricated by milling out unwanted areas using 30 KeV Ga+ ion beam. A single-pixel-line ion beam blanking technique has been utilised to fabricate Bi nanowire as small as 30 nm in diameter and few micrometers long. In order to form good ohmic contacts for sub 50 nm bismuth nanowires, a drill-and-fill process has been developed using FIB to sputter away the surface oxide of bismuth after the in-situ platinum nanowire contacts deposition. To our knowledge, this is the first time a focused ion beam process has been used to fabricate bismuth nanowire. The fabricated Bi nanowires were electrically ...

2009-07-23

307

Enhancement of Au nanoparticles formed by in situ electrodeposition on direct electrochemistry of myoglobin loaded into layer-by-layer films of chitosan and silica nanoparticles.  

Science.gov (United States)

In the present work, a new kind of myoglobin (Mb)/Au nanoparticles composite film was fabricated on pyrolytic graphite (PG) electrodes. Oppositely charged chitosan (CS) and silica (SiO(2)) nanoparticles were alternately adsorbed on the PG surface by the electrostatic interaction between them, forming {CS/SiO(2)}(5) layer-by-layer films. Mb and HAuCl(4) in solution were then simultaneously loaded into {CS/SiO(2)}(5) films. The loaded Au(III) in the films were electrochemically reduced into Au nanoparticles, forming nanocomposite films, designated as {CS/SiO(2)}(5)-Mb-Au. Various techniques such as cyclic voltammetry (CV), square wave voltammetry (SWV), quartz crystal microbalance (QCM), electrochemical impedance spectroscopy (EIS), scanning electron microscopy (SEM), and energy dispersive X-ray (EDX) analysis were used to characterize the films. Compared with {CS/SiO(2)}(5)-Mb films without Au nanoparticles inside, the {CS/SiO(2)}(5)-Mb-Au films exhibited much better behavior in ...

2008-12-01

308

Densification behavior and properties of Y_2O_3-containing #alpha#-SiAlON-based composites  

International Nuclear Information System (INIS)

Different SiAlON composites based on #alpha#'-SiAlON are investigated, with respect to the phase relationships, densification behavior, and mechanical properties. The compositions are located on a phase-diagram line parallel to the Si_3N_4-Y_2O_3#centre dot#9AlN compound in the Si_3N_4-SiO_2-AlN-Al_2O_3-Y_2O_3-YN system. Analysis of the reaction sequences shows that the formation of the composites is associated with the transient appearance of Y_4Al_2O_9 (YAM), yttrium-aluminum-garnet (YAG), melilite, and a nitrogen-rich liquid phase. The small shift of compositions on the Si_3N_4-Y_2O_3#centre dot#9AlN compound phase-diagram line toward the Al_2O_3-rich side offers the advantage of a higher sinterability and the removal of the melilite phase from a wide range of compositions containing #alpha#'-SiAlON and polytypes. The #alpha#'/#beta#'-SiAlON composites show better mechanical properties in comparison to pure #alpha#'-SiAlON and composites of #alpha#'-SiAlON and polytypes. A ...

309

Comparative studies on titanium and tantalum oxides thin film structures for laser mirrors, deposited by ion assisted gun  

International Nuclear Information System (INIS)

For obtaining radiation less damagable laser mirrors, a preliminary optimization of film fabrication suitable for the analysis of laser damage mechanism has been done as the first step. Here, the optimization requires not only the stable fabrication process but also the ideal film structure i.e., the amorphous and smooth film structure simultaneously, eliminating latently unwanted secondary effects such as light scattering during laser damage test. For this purpose, we adopted the ion assisted deposition (IAD) method and modified the deposition conditions for titanium and tantalum oxide films, both of which compose typical high index layers, and where SiO_2 layers are also chosen as low index layers because of their amorphous and smooth nature, in alternative multilayer laser mirrors. Surface and cross sectional film structures and film crystallinity are compared and characterized, using a high resolution SEM and a x-ray diffractometer, respectively. The fabrication process and the ...

1996-10-07

310

Comparative investigation on chemical looping combustion of coal-derived synthesis gas containing H2S over supported NiO oxygen carriers  

Energy Technology Data Exchange (ETDEWEB)

Chemical looping combustion (CLC) of simulated coal-derived synthesis gas was conducted with NiO oxygen carriers supported on SiO2, ZrO2, TiO2, and sepiolite. The effect of H2S on the performance of these samples for the CLC process was also evaluated. Five-cycle thermogravimetric analysis (TGA) tests at 800 C indicated that all oxygen carriers had a stable performance at 800 C, except NiO/SiO2. Full reduction/oxidation reactions of the oxygen carrier were obtained during the five-cycle test. It was found that support had a significant effect on reaction performance of NiO both in reduction and oxidation rates. The reduction reaction was significantly faster than the oxidation reaction for all oxygen carriers, while the oxidation reaction is fairly slow due to oxygen diffusion on NiO layers. The reaction profile was greatly affected by the presence of H2S, but there was no effect on the capacity due to the presence of H2S in synthesis gas. The presence of H2S decreased reduction ...

2010-01-01

311

Study of silicon damage caused by ultra-low energy boron implantation  

International Nuclear Information System (INIS)

Ultra-shallow junction formation in deep submicron Si devices is limited by anomalous diffusion of the dopant, which is related to the release of interstitials from defect clusters formed during the implantation of energetic ions or the subsequent annealing. The work described in this dissertation is concerned with the effects of low energy B ion implantation, especially damage formation, clustering and its annealing. After a review of the stopping and ranges of energetic ions in Si, the formation of implant damage, in particular of point defects, their migration, agglomeration and annihilation, including the involvement of dopant ions, is considered. A description of the Salford ultra low energy implanter is given and the main analysis technique, medium ion energy scattering (MEIS) reviewed. Additional analytical techniques used, such as secondary ion mass spectrometry (SIMS), 4-point probe and cross ...

312

Transient enhanced diffusion from decaborane molecular ion implantation  

Energy Technology Data Exchange (ETDEWEB)

Transient enhanced diffusion (TED) from implantation of 5thinspkeVthinspB{sub 10}H{sub 14} and 0.5 keV B ions has been quantified and compared for nominal boron doses of 10{sup 14} and 10{sup 15}thinspcm{sup {minus}2}. Boron diffusivity during annealing was extracted from secondary ion mass spectroscopy depth profiles of diffused marker layers in boron doping-superlattices and the actual implanted B dose was independently measured by nuclear reaction analysis. Comparable enhancements were observed from both ions. Transmission electron microscopy analysis revealed that both boron- and decaborane-implanted samples were amorphized at a nominal 10{sup 15}thinspcm{sup {minus}2}thinspB dose. A comparison with data from low energy Si implants revealed a similar dependence of diffusivity enhancement on implant dose. These findings are consistent with the understanding that TED is caused by ...

1998-10-01

313

Transient enhanced diffusion from decaborane molecular ion implantation  

International Nuclear Information System (INIS)

Transient enhanced diffusion (TED) from implantation of 5keVB_1_0H_1_4 and 0.5 keV B ions has been quantified and compared for nominal boron doses of 10"1"4 and 10"1"5cm"-"2. Boron diffusivity during annealing was extracted from secondary ion mass spectroscopy depth profiles of diffused marker layers in boron doping-superlattices and the actual implanted B dose was independently measured by nuclear reaction analysis. Comparable enhancements were observed from both ions. Transmission electron microscopy analysis revealed that both boron- and decaborane-implanted samples were amorphized at a nominal 10"1"5cm"-"2B dose. A comparison with data from low energy Si implants revealed a similar dependence of diffusivity enhancement on implant dose. These findings are consistent with the understanding that TED is caused by the interstitial supersaturation resulting from a number of excess ...

1998-10-01

314

Transient enhanced diffusion and deactivation of ion-implanted As in strained Si  

International Nuclear Information System (INIS)

First results on the effects of strain on transient enhanced diffusion and deactivation of As-implanted ultrashallow junctions are presented. A significant effect of strain on the magnitude and timescale of transient enhanced diffusion is observed, which is consistent with the stabilization of interstitial-type defects by tensile strain. Our results show no significant impact of strain on As electrical activity during the deactivation timescale accessed in this study.

2005-08-01

315

The Significance of Clopidogrel Low-Responsiveness on Stent Thrombosis and Cardiac Death Assessed by the Verifynow P2Y12 Assay in Patients With Acute Coronary Syndrome Within 6 Months After Drug-Eluting Stent Implantation  

UK PubMed Central (United Kingdom)

Background and ObjectivesClopidogrel resistance or low-responsiveness may be associated with recurrent atherothrombotic events after drug-eluting stent (DES) implantation. We prospectively...Full Text Available

2009-12-01

316

Simulation of arsenic diffusion during rapid thermal annealing of silicon layers doped with low-energy high-dose ion implantation  

International Nuclear Information System (INIS)

The model of transient enhanced diffusion of ion-implanted As is formulated and the finite-difference method for numerical solution of the system of equations obtained is developed. The nonuniform distribution of point defects near the interface and more accurate description of arsenic clustering are simultaneously taken into account. Simulation of As diffusion during rapid annealing gives a reasonable agreement with the experimental data. (authors)

2005-09-01

317

Recommendations and quality control in brachytherapy; Recommandations pour le controle de qualite en curietherapie  

Energy Technology Data Exchange (ETDEWEB)

Brachytherapy consists of sealed radioactive source implantation. The diversity in the nature of radioelements, in their energy and activity requires strict implantation and utilization rules. These rules include radioactive source physical parameters check, after-loading machine and treatment planning system quality assurance and safe and reproducible dosimetric systems. Patient and medical workers information guarantee radioprotection and prevention of accidental exposures. (authors)

2002-11-01

318

Pitting and intergranular corrosion resistances of nitrogen ion implanted type 304 stainless steel  

International Nuclear Information System (INIS)

Type 304 stainless steel (SS) specimens sensitised at 873 K and 973 K for 1, 10 and 100 hours respectively were ion implanted using a 150 keV accelerator at an energy of 70 keV in two different doses of nitrogen namely 1 x 10"1"6 to 1 x 10"1"7 ions/cm"2. Ion implantation at 1 x 10"1"6 ions/cm"2 did not show any improvement in pitting resistance, however, the specimens implanted at 1 x 10"1"7 ions/cm"2 showed significant increase in pitting corrosion resistance when potentiodynamic anodic polarisation studies were carried out in acidic chloride medium. For specimens aged at 873 K, nitrogen ion implantation at 1 x 10"1"6 ions/cm"2 increased the intergranular corrosion susceptibility compared to that of unimplanted specimens. However, at the dose of 1 x 10"1"7 ions/cm"2, insignificant IGC attack was noticed. The IGC resistance increased with increase in the dose for all the specimens aged at 973 K, and the ...

1998-05-24

319

Outcome of in-the-bag implanted square-edge polymethyl methacrylate intraocular lenses with and without primary posterior capsulotomy in pediatric traumatic cataract  

UK PubMed Central (United Kingdom)

Purpose:To study the outcome of in-the-bag implanted square-edge polymethyl methacrylate (PMMA) intraocular lenses (IOL) with and without primary posterior capsulotomy in...Full Text Available

2011-09-01

320

Optical image storage in ion implanted PLZT ceramics  

International Nuclear Information System (INIS)

We have demonstrated that optical images can be stored in transparent lead-lanthanum-zirconate-titanate (PLZT) ceramics by exposure to near-UV light with photon energies greater than the band gap energy of approx. equal to 3.35 eV. The image storage process relies on optically induced changes in the switching properties of ferroelectric domains (photoferroelectric effect). Stored images are nonvolatile but can be erased by uniform UV illumination and simultaneous application of an electric field. Although high quality images, with contrast variations of >= 100:1 and spatial resolution of approx. equal to 10 #mu#m, can be stored using the photoferroelectric effect, relatively high exposure energies (approx. equal to 100 mJ/cm"2) are required to store these images. This large exposure energy severely limits the range of possible applications of nonvolatile image storage in PLZT ceramics. We have recently found from studies of H, He and Ar implanted PLZT that the ...

321

Introduction to corrosion of bioimplants  

British Library Electronic Table of Contents (United Kingdom)

The review provides a general idea about the types of metallic alloys and the pure metals used as implant materials in dental and orthopedic surgery. Their corrosive behavior in both real solutions and various media that model human biological fluids is described. Based on the literature data, it is concluded that multicomponent alloys containing titanium, niobium, zirconium, tungsten, molybdenum, aluminum, and silicon are the most resistant to corrosion. Implants made of different types of stainless steel are preferred when manufacturing orthopedic devices for short-term use.

2011-01-01

322

Boron uphill diffusion during ultrashallow junction formation  

International Nuclear Information System (INIS)

The recently observed phenomenon of boron uphill diffusion during low-temperature annealing of ultrashallow ion-implanted junctions in silicon has been investigated. It is shown that the effect is enhanced by preamorphization, and that an increase in the depth of the preamorphized layer reduces uphill diffusion in the high-concentration portion of boron profile, while increasing transient enhanced diffusion in the tail. The data demonstrate that the magnitude of the uphill diffusion effect is determined by the proximity of boron and implant damage to the silicon surface.

2003-05-26

323

A study of palladium silicide formed by focused ion beam implantation of palladium ions  

Science.gov (United States)

The formation and properties of Pd{sub 2}Si formed by focused ion beam implantation of Pd ions into Si is presented in this thesis. An extensive microstructural study using transmission electron microscopy was undertaken and the as-implanted as well as annealed microstructure is shown. Results of other analysis techniques such as Rutherford back scattering and secondary ion mass spectrometry etc. are also presented. Kinetic information on the growth of Pd{sub 2}Si obtained by both microstructural and resistance measurements indicates that the activation energy for growth of the silicide is around 0.36 to 0.39 eV. This can be compared with the normally reported value of 1.5 eV for Pd{sub 2}Si formed by annealing thin film Pd on Si. The growth of the silicide was found to follow t{sup 1/2} kinetics. Microstructural observation of the as-implanted samples showed extensive in-situ formation of Pd{sub 2}Di and also surprisingly ...

1989-01-01

324

A study of palladium silicide formed by focused ion beam implantation of palladium ions  

International Nuclear Information System (INIS)

The formation and properties of Pd_2Si formed by focused ion beam implantation of Pd ions into Si is presented in this thesis. An extensive microstructural study using transmission electron microscopy was undertaken and the as-implanted as well as annealed microstructure is shown. Results of other analysis techniques such as Rutherford back scattering and secondary ion mass spectrometry etc. are also presented. Kinetic information on the growth of Pd_2Si obtained by both microstructural and resistance measurements indicates that the activation energy for growth of the silicide is around 0.36 to 0.39 eV. This can be compared with the normally reported value of 1.5 eV for Pd_2Si formed by annealing thin film Pd on Si. The growth of the silicide was found to follow t"1"/"2 kinetics. Microstructural observation of the as-implanted samples showed extensive in-situ formation of Pd_2Di and also surprisingly few defect structures. ...

325

5.6-nm p"+/n junction formation for sub-0.05-#mu#m PMOSFETs by using low-energy B_1_0H_1_4 ion implantation  

International Nuclear Information System (INIS)

Decaborane (B_1_0H_1_4) cluster ions were implanted into n-Si(100) substrates to fabricate shallow p"+/n junctions. Implant energies of 2 keV, 5 keV, and 20 keV, equivalent to implant energies of the monomer boron ion of 174 eV, 435 eV, and 1.74 keV, respectively, were used at dosages of 1 X 10"1"2 /cm"2 and 1 X 10"1"3 /cm"2. The implanted samples were then subjected to activation annealing at 800 .deg. C, 900 .deg. C, and 1000 .deg. C for 10 s. By using secondary ion mass spectrometry (SIMS) depth profiles, we determined that the depth of the shallow junction (D_s) at a dosage of 1 X 10"1"3 /cm"2 was in the range 12 nm - 45 nm after annealing at 1000 .deg. C. D_s and transient enhanced diffusion (TED) were greatly reduced at implant energies lower than 5 keV, but thermal diffusion (TD) smoothly decreased. In particular, TED was suppressed in the p"+/n junction ...

2004-06-01

326

Third order optical nonlinearity of colloidal metal nanoclusters formed by MeV ion implantation  

Energy Technology Data Exchange (ETDEWEB)

We report the results of characterization of nonlinear refractive index of the composite material produced by MeV Ag ion implantation of LiNbO{sub 3} crystal (z-cut). The material after implantation exhibited a linear optical absorption spectrum with the surface plasmon peak near 430 nm attributed to the colloidal silver nanoclusters. Heat treatment of the material at 500 C caused a shift of the absorption peak to 550 nm. The nonlinear refractive index of the sample after heat treatment was measured in the region of the absorption peak with the Z-scan technique using a tunable picosecond laser source (4.5 ps pulse width). The experimental data were compared against the reference sample made of MeV Cu implanted silica with the absorption peak in the same region. The nonlinear index of the Ag implanted LiNbO{sub 3} sample produced at five times less fluence is on average two times greater than that of the ...

1998-05-01

327

The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding  

International Nuclear Information System (INIS)

In this paper, we show that boron transient enhanced diffusion can be reduced to different extents by varying the distribution of nitrogen atoms in the junction. This is attributed to the relative location of nitrogen atoms with respect to boron profile and end-of-range defect band, affecting the interactions between dopants and defects upon annealing. In addition, variations in boron dopant activation and deactivation are also observed. Similar to fluorine co-implantation, it is proposed that nitrogen atoms react with vacancy point defects to form nitrogen-vacancy clusters that will trap the interstitials emitted from end-of-range defects. However, we report that the interstitial sink efficiency of nitrogen atoms is not as good as the co-implanted carbon atoms, which is noticed from the dopant deactivation curves. In terms of extended defect evolution, the results clearly indicate that end-of-range defects can be stabilized by choosing the ...

2008-12-05

328

Metallic implants and exposure to radiofrequency radiation  

International Nuclear Information System (INIS)

There is increasing use of radiofrequency radiation (RFR) in industry for communications, welding, security, radio, medicine, navigation etc. It has been recognised for some years that RFR may interact with cardiac pacemakers and steps have been taken to prevent this interference. It is less well recognised that other metallic implants may also act as antennas in an RFR field and possibly cause adverse health effects by heating local tissues. There are a large and increasing number of implants having metal components which may be found in RFR workers. These implants include artificial joints, rods and plates used in orthopaedics, rings in heart valves, wires in sutures, bionic ears, subcutaneous infusion systems and (external) transdermal drug delivery patches"1. The physician concerned with job placement of such persons requires information on the likelihood of an implant interacting with RFR so as to ...

329

Mechanism for transient-enhanced diffusion in ion-implanted silicon  

International Nuclear Information System (INIS)

High-dose ion implantation followed by solid-phase-epitaxial (SPE) growth is now a well-established technique for the production of supersaturated silicon alloys. However, these alloys also contain a high supersaturation of silicon interstitials, which give rise to transient, greatly enhanced dopant diffusion with subsequent heating. In this contribution, the authors present a study of a series of Si-Sb alloys of various concentrations which were made by Sb implantation under various conditions to deduce the origin of the observed transient diffusion. A multiple implant scheme was employed to produce samples with an approximately uniform dopant concentration from 40 to 150 nm in depth, but with the amorphous layer extending to a depth of 380 nm. By scaling the implant doses, alloys with different concentrations in the uniform region were produced, allowing an accurate measure of diffusion coefficients ...

1985-03-01

330

Formation of high resistivity regions in [ital p]-type Al[sub 0. 5]In[sub 0. 5]P by ion implantation  

Science.gov (United States)

Ion implantation has been applied to magnesium-doped Al[sub 0.5]In[sub 0.5]P to produce high resistivity regions for the first time. Hydrogen, oxygen, and argon ions were implanted at a base dose ranging from 5[times]10[sup 12] to 5[times]10[sup 14] cm[sup [minus]2] and annealed from 400 to 900 [degree]C. Hydrogen did not appreciably compensate the In[sub 0.5]Al[sub 0.5]P layer while oxygen and argon produced sheet resistances up to 1[times]10[sup 9] [Omega]/[open square]. After annealing at 800 [degree]C, regions with high dose oxygen implants maintained a sheet resistance above 1[times]10[sup 7] [Omega]/[open square], while regions with high dose argon implants recovered most of the unimplanted conductivity.

1993-12-06

331

Experimental studies on reconstruction of peripheral arteries by high voltage cathode ray irradiated allografts  

International Nuclear Information System (INIS)

The use of cathode ray irradiated arterial allografts on the reconstruction of small peripheral arteries is described. The fate of irradiated arterial allografts implanted subcutaneously in rats was compared histologically with that of allografts which were fresh, frozen or stored in 70% alcohol. Follow-up studies were made of 10 dogs in which irradiated arterial allografts had been implanted in the femoral artery to be evaluated; long term patency by arteriography, gross and histologic changes of the implanted allografts, and the luminal surface of the implanted allografts by scanning electron microscopic studies. For the purpose of antigenic studies, extracts of canine arteries which had been irradiated, frozen or stored in 70% alcohol, were prepared and tested by the following immunological methods: precipitation, Ouchterlony gel diffusion, and passive cutaneous anaphylaxis. From the results obtained ...

1976-01-01

332

Effect of silicon ion implantation upon the structure and corrosion resistance of the surface layer of stainless steel 316L, Vitalium and titanium alloy Ti6Al14V  

International Nuclear Information System (INIS)

Samples of 316L stainless steel, Vitalium and Ti6A14V titanium alloy have been implanted with doses of 1.5, 3, and 4.5 x 10"1"7 Si"+/cm"2. Transmission electron microscopy shows that during ion implantation amorphous layers are formed. When samples of titanium alloy were implanted with a dose of 0.5 x 10"1"7 Si"+/cm"2, the implanted layer consisted of a dispersion of fine silicide crystallites instead of being amorphous. The corrosion resistance was analyzed by electrochemical techniques in 0.9% NaCl at the temperature of 37 C. The increase of corrosion resistance has been observed as a result of structural modifications of the surface layer. (author). 7 refs, 4 tabs.

333

Dependence of anomalous phosphorus diffusion in silicon on depth position of defects created by ion implantation  

Energy Technology Data Exchange (ETDEWEB)

Transient enhanced diffusion of phosphorus in silicon has been investigated for implants below and above the threshold for a complete amorphization. Rapid thermal processes (electron beam) and conventional furnaces have been used for the annealing. In the case of implants below amorphization, a strong enhanced diffusion, proportional to the amount of damage produced, has been observed. The extent of the phenomenon is practically independent of the damage depth position. In contrast to this, the formation of extended defects at the original amorphous-crystalline interface makes the diffusivity strongly dependent on depth in the case of post-amorphized samples. No enhanced diffusion effect is observed if the dopant is confined in the amorphous layer, while a remarkable increase in the diffusivity is detected for the dopant located in the crystalline region beyond the amorphous-crystalline interface. Damage distribution after ...

1989-03-01

334

Comparative study of the osseointegration of dental implants after different bone augmentation techniques: vascularized femur flap, non-vascularized femur graft and mandibular bone graft  

British Library Electronic Table of Contents (United Kingdom)

Abstract Objectives: The purpose of this study was to evaluate the osseointegration of the dental implants placed into the mandible augmented with different techniques in pigs. Material and methods: Four adult domestic pigs were used. Horizontal augmentation of the mandible was performed in animals by using vascularized femur flap (VFF), non-vascularized femur graft (NVFG) and monocortical mandibular block graft (MG). After 5 months of healing 10 dental implants were placed into each augmented site. The pigs were sacrificed after 3 months of healing. Undecalcified sections were prepared for histomorphometric analysis. Results: Mean bone-implant contact (BIC) values for implants placed into MG, NVFG and VFF were 57.38 11.97%, 76.5 7.88%, 76.53 8.15%, respectively. The BIC values of NVFG and...

2011-01-01

335

Atomistic modeling of the effects of dose and implant temperature on dopant diffusion and amorphization in Si  

International Nuclear Information System (INIS)

We discuss atomistic simulations of ion implantation and annealing of Si over a wide range of ion dose and substrate temperatures. The DADOS Monte Carlo model has been extended to include the formation of amorphous regions, and this allows simulations of dopant diffusion at high doses. As the dose of ions increases, the amorphous regions formed by cascades eventually overlap, and a continuous amorphous layer is formed. In that case, most of the excess interstitials generated by the implantation are swept to the surface as the amorphous layer regrows, and do not diffuse in the crystalline region. This process reduces the amount of transient enhanced diffusion (TED) during annealing. This model also reproduces the dynamic annealing during high temperature implants. In this case, the local amorphous regions regrow as the implant proceeds, without the formation of a continuous amorphous layer. For ...

2001-06-01

336

A study of corrosion resistance behavior for W + C dual implanted H13 steel  

International Nuclear Information System (INIS)

The surface layer optimized in resistance of corrosion and wear has been obtained by W + C dual implantation on H13 steel. The electrochemical polarization measurements show that the peak current density I_D is increased and then saturated with increasing of voltage scanning loops. The I_D is 100 times smaller than that of H13 steel, and 2-3 times smaller than that of tungsten. Then influence of dual implantation order on corrosion resistance is also studied. The I_D for W_5C_8 implanted first with W is half of that for C_5W_5 implanted first with C. The corrosion resistance structure of the samples after corrosion is observed by SEM. The X-ray analysis indicates that the structure consists of disperse phases of WC, W_2C, FeW, Fe_2W, FeW_2C and iron carbides. It is shown from Auger analysis that the optimum complex layer for corrosion resistance consists of thin carbon film on surface, disperse phases ...

337

A kinetic Monte Carlo annealing assessment of the dominant features from ion implant simulations  

International Nuclear Information System (INIS)

Ion implantation and subsequent annealing are essential stages in today's advanced CMOS processing. Although the dopant implanted profile can be accurately predicted by analytical fits calibrated with SIMS profiles, the damage has to be estimated with a binary collision approximation implant simulator. Some models have been proposed, like the '+n', in an attempt to simplify the anneal simulation. We have used the atomistic kinetic Monte Carlo dados to elucidate which are the implant modeling features most relevant in the simulation of transient enhanced diffusion (TED). For the experimental conditions studied we find that the spatial correlation of the I, V Frenkel pairs is not critical in order to yield the correct I supersaturation, that can be simulated just taking into account the net I-V excess distribution. In contrast to, simulate impurity clustering/deactivation when there is an impurity ...

2004-12-15

338

Supernova Neutrinos Detection On Earth  

CERN Document Server

In this paper, we first discuss the detection of supernova neutrino on Earth. Then we propose a possible method to acquire information about $\\theta_{13}$ smaller than $1.5^\\circ$ by detecting the ratio of the event numbers of different flavor supernova neutrinos. Such an sensitivity cannot yet be achieved by the Daya Bay reactor neutrino experiment.

2009-01-01

339

Radioactive and stable isotope geology  

Energy Technology Data Exchange (ETDEWEB)

Aimed at post-graduate and post-doctoral researchers in geochemistry, this book reflects the rapid changes in the applications of radioactive and stable isotope analysis to a range of geological and geochemical problems. Isotropic chemistry and methods used in mass spectroscopy are discussed initially. The second section deals with radiometric dating methods. The role of isotopes in climate and environmental research is also explored. The book closes with a section on extra-terrestrial matter, geothermometry and the isotopic geochemistry of the Earth`s lithosphere. (UK).

1997-10-01

340

Molar extinction coefficients in aqueous solutions of some alkaline earth chlorides  

International Nuclear Information System (INIS)

Molar extinction coefficients for the solid solutes in aqueous solutions of some alkaline earth chlorides such as MgCl_2.6H_2O, CaCl_2, SrCl_2.6H_2O and BaCl_2.2H_2O have been determined at 81, 356, 511, 662, 1173 and 1332 keV energies in different concentration using the narrow beam transmission methods. (author)

1999-12-21

341

Mineralogy of clay and zeolite dusts (exclusive of 1:1 layer silicates)  

Energy Technology Data Exchange (ETDEWEB)

Clays and zeolites are among the most important of natural dusts by virtue of their occurrence through out the world on the earth`s surface and their important industrial uses. (The 1:1 layer silicates, including the serpentine and kaolin minerals, are not addressed in this chapter.) This chapter provides basic information on a variety of important aspects of each mineral, including crystal structure diagrams of each and references to more detailed discussions. 110 refs., 20 figs.

1993-12-31

342

Magnetic properties of heavy rare-earth tungstates  

International Nuclear Information System (INIS)

Measurement of the magnetic susceptibility of powder samples of heavy rare-earth (Tb, Dy, Ho, Er, Tm and Yb) tungstates have been reported in the temperature range 300 to 900 K. Curie-Weiss law behaviour has been observed for all samples. The Curie constant, paramagnetic Curie temperature and magneton number for the magnetic ions have also been evaluated for each material. (author).

1978-12-01

343

How common are Earths? How common are Jupiters?  

CERN Document Server

Among the billions of planetary systems that fill the Universe, we would like to know how ours fits in. Exoplanet data can already be used to address the question: How common are Jupiters? Here we discuss a simple analysis of recent exoplanet data indicating that Jupiter is a typical massive planet rather than an outlier. A more difficult question to address is: How common are Earths? However, much indirect evidence suggests that wet rocky planets are common.

2002-01-01

344

Earth Sciences Division annual report 1980  

Energy Technology Data Exchange (ETDEWEB)

Summaries of the highlights of programs in the Earth Sciences Division are presented under four headings; Geosciences, Geothermal Energy Development, Nuclear Waste Isolation, and Marine Sciences. Utilizing both basic and applied research in a wide spectrum of topics, these programs are providing results that will be of value in helping to secure the nation's energy future. Separate abstracts have been prepared for each project for inclusion in the Energy Data Base. (DMC)

1981-07-01

345

BUBL LINK: Space observation  

Wastenet

...Observatory Edinburgh SkyView Virtual Observatory Solar System Simulator Space Telescope Science Institute Space Weather : A Research Perspective Subaru Telescope Project Two Micron All ...Universities for Research in Astronomy Subjects: space observation DeweyClass: 522 Resource type: index Space Weather : A Research Perspective Documents discussing space weather , the ...elements of near-Earth space, Earth-space meteorology and practical consequences of space weather . Glossary included. Author: National Academy of ...

346

BUBL LINK: Oceanographic data  

Wastenet

...6 Resource type: reference data Global Change Master Directory An extensive source of information about satellite and in situ Earth science data, with broad coverage of the atmosphere, hydrosphere, oceans, solid earth, and biosphere. Author: NASA Subjects: climatology, global change, oceanographic data DeweyClass: 551.6 Resource type: documents, news International ...

347

A New DC Breaker Used as Metallic Return Transfer Breaker.  

Energy Technology Data Exchange (ETDEWEB)

When a bipolar HVDC transmission system is operating monopolar using the earth as a return path, it is often desired to divert the return current from the earth to the line from the unused pole. To do so requires either that the system be shut down temporarily or that a dc circuit breaker be used. This paper describes the development of such a new dc circuit breaker, and its application on the Pacific Intertie as a Metallic Return Transfer Breaker (MRTB).

1982-10-01

348

A nuclear powered pulsed inductive plasma accelerator as a viable propulsion concept for advanced OTV space applications  

International Nuclear Information System (INIS)

An electric propulsion concept suitable for delivering heavy payloads from low earth orbit (LEO) to high energy earth orbit is proposed. The system consists of a number of pulsed inductive plasma thrusters powered by a 100 kWe space nuclear power system. The pulsed plasma thruster is a relatively simple electrodeless device. It also exhibits adequate conversion to thrust power in the desired I sub sp regime of 1500 to 3000 seconds for optimal payload transfer from low earth to high earth orbit. Because of these features and the fact that the nuclear power unit will be capable of delivering sustained high power levels throughout the duration of any given mission, the system presented appears to be a very promising propulsion candidate for advanced orbital transfer vehicle (OTV) applications. An OTV, which makes use of this propulsion system and which has been designed to lift a 9000-lb payload into ...

349

55 Cancri: Stellar Astrophysical Parameters, a Planet in the Habitable Zone, and Implications for the Radius of a Transiting Super-Earth  

CERN Document Server

The bright star 55 Cancri is known to host five planets, including a transiting super-Earth. The interferometric study presented here yields directly determined values for 55 Cnc's stellar astrophyiscal parameters: $R=0.943 \\pm 0.010 R_{\\odot}$, $T_{\\rm EFF} = 5196 \\pm 24$ K. We use isochrone fitting to determine 55 Cnc's age to be 10.2 $\\pm$ 2.5 Gyr, implying a stellar mass of $0.905 \\pm 0.015 M_{\\odot}$. Our analysis of the location and extent of the system's habitable zone (0.67--1.32 AU) shows that planet f ($M \\sin i = 0.155 M_{Jupiter}$) spends the majority of the duration of its elliptical orbit in the circumstellar habitable zone, where, with moderate greenhouse heating, it could harbor liquid water. Finally, our direct value for 55 Cancri's stellar radius allows for a model-independent calculation of the physical diameter of the transiting super-Earth 55 Cnc e ($\\sim 2.05 \\pm 0.15 R_{\\earth}$), which, ...

2011-01-01

350

Ultra shallow P+/N junctions using plasma immersion ion implantation and laser annealing for sub 0.1#mu#m CMOS devices  

International Nuclear Information System (INIS)

Classical beam line ion implantation is limited to low energies and cannot achieve P+/N junctions requested for <45nm ITRS node. RTA (rapid thermal annealing) needs to be improved for dopants activation and damage reductions. Spike annealing process also induces a large diffusion mainly due to TED (transient enhanced diffusion). Compared to conventional beam line ion implantation limited to a minimum energy implantation of 200eV, plasma immersion ion implantation (PIII) is an emerging technique to get ultimate shallow profiles (as-implanted) due to no lower limitation of energy and high dose rate. On the another hand, laser thermal processing (LTP) allows to obtain very shallow junction with no TED, abrupt profile and activated depth control. In this paper, we show the implementation of the BF_3 PIII associated with the LTP. Ions from BF_3"+ plasma have been ...

2005-08-01

351

The effects of cosmic radiation on implantable medical devices  

Energy Technology Data Exchange (ETDEWEB)

Metal oxide semiconductor (MOS) integrated circuits, with the benefits of low power consumption, represent the state of the art technology for implantable medical devices. Three significant sources of radiation are classified as having the ability to damage or alter the behavior of implantable electronics; Secondary neutron cosmic radiation, alpha particle radiation from the device packaging and therapeutic doses(up to 70 G{gamma}) of high energy radiation used in radiation oncology. The effects of alpha particle radiation from the packaging may be eliminated by the use of polyimide or silicone rubber die coatings. The relatively low incidence of therapeutic radiation incident on an implantable device and the use of die coating leaves cosmic radiation induced secondary neutron single event upset (SEU) as the main pervasive ionising radiation threat to the reliability of implantable devices. A ...

1996-12-31

352

Impurity and clustering effects on defect evolution in ion-implanted Si  

Energy Technology Data Exchange (ETDEWEB)

A detailed investigation of the damage formation and evolution in ion-implanted crystalline Si is presented. Deep-level transient spectroscopy has been used to monitor room temperature migration of point defect complexes and evolution from simple point-like defect complexes to defect clusters and even extended defects. Si samples were implanted with Si or He ions with energies of 145 keV-3MeV, to fluences in the range 5x10[sup 8]-5x10[sup 13]cm[sup -2]. The effects of thermal annealing, in the range 100-680 C and 10 min-15h, were also explored. A systematic comparison of defect complexes formation and evolution in ion-implanted or electron-irradiated Si samples with a different impurity content were used to assess the role of impurities (C and O), extra implanted ion and defect clustering on the nature and thermal stability of residual damage. In particular, an interstitial excess directly resulting ...

1998-10-01

353

Effects of mesh-assisted carbon plasma immersion ion implantation on the surface properties of insulating silicon carbide ceramics  

International Nuclear Information System (INIS)

Plasma immersion ion implantation (PIII) is an effective materials modification and synthesis technique but has seldom been applied to ceramic materials due to the high electrical resistance that reduces the ion bombardment energy and sometimes causes serious electrical arcing in the instrument. Even in cases where PIII is applicable, the surface properties of the implanted insulating materials can be seriously affected due to the low ion energy and materials damage from electrical arcing. In order to enhance the surface and mechanical properties such as wear resistance of ceramic materials used in many industrial applications, surface modification is needed. In this work, we conduct carbon implantation into sintered #alpha#-SiC (silicon carbides that are widely used in vacuum ceramic bearings) using mesh-assisted plasma immersion ion implantation to enhance the surface properties. The use of a ...

2004-03-01

354

Ultrashallow P{sup +}/N junction formation by plasma ion implantation  

Energy Technology Data Exchange (ETDEWEB)

We investigated the electrical characteristics and the junction depth of ultra-shallow junctions formed by using the plasma-doping method. Compared with ultra-low energy boron-ion implantation at 500 eV, the junctions formed with the plasma-doping process exhibited shallow junction depths and low sheet resistances. The junction depths of the plasma-doped samples were 150 A and 330 A after annealing for 10 s at 900 .deg. C and 950 .deg. C, respectively. For the same junction depth, the sheet resistance of the B{sub 2}H{sub 6} plasma-doped sample was an order of magnitude less than that of the 500-eV B-ion implanted sample. Cross-sectional transmission electron microscopy and deep level transient spectroscopy showed that the defects formed by the B{sub 2}H{sub 6} plasma-doping process could be removed by annealing at 950 .deg. C for 10 s. The scaling of metal-oxide-semiconductor field-effect-transistor (MOSFET) device channel lengths for ...

2000-12-01

355

Ultrashallow P"+/N junction formation by plasma ion implantation  

International Nuclear Information System (INIS)

We investigated the electrical characteristics and the junction depth of ultra-shallow junctions formed by using the plasma-doping method. Compared with ultra-low energy boron-ion implantation at 500 eV, the junctions formed with the plasma-doping process exhibited shallow junction depths and low sheet resistances. The junction depths of the plasma-doped samples were 150 A and 330 A after annealing for 10 s at 900 .deg. C and 950 .deg. C, respectively. For the same junction depth, the sheet resistance of the B_2H_6 plasma-doped sample was an order of magnitude less than that of the 500-eV B-ion implanted sample. Cross-sectional transmission electron microscopy and deep level transient spectroscopy showed that the defects formed by the B_2H_6 plasma-doping process could be removed by annealing at 950 .deg. C for 10 s. The scaling of metal-oxide-semiconductor field-effect-transistor (MOSFET) device channel lengths for high-speed application ...

2000-12-01

356

Vacancy engineering by optimized laser irradiation in boron-implanted, preamorphized silicon substrate  

International Nuclear Information System (INIS)

In this letter, the effect of vacancies generated by preirradiated laser on dopant diffusion and activation in preamorphized silicon substrate has been studied. Laser-induced melting in silicon was used to generate excess vacancies near the maximum melt depth before silicon substrate amorphization and subsequent boron implantation. We demonstrate that by matching the preirradiated laser melt depth with the implant amorphize depth, it can effectively reduce the silicon self-interstitials released from the end-of-range defect band. The results show great suppression in boron transient enhanced diffusion and significant removal of end-of-range defects. This is attributed to the recombination of laser-generated excess vacancies with preamorphizing induced free silicon interstitials at the end-of-range region.

2008-05-19

357

Transient enhanced diffusion in B/sup +/ and P/sup +/ implanted silicon  

International Nuclear Information System (INIS)

The authors report the transient enhanced diffusion of supersaturated phosphorous in ion-implanted SPE grown Si. Precipitation proceeds rapidly to a metastable SiP phase, which can be converted to an orthorhombic form or re-dissolved by subsequent heat treatment. The effects are strongly temperature dependent, and consistent with the trapped interstitial model. The behavior of different dopants follow their relative interstitialcy diffusion coefficients. The results suggest that ion implantation induced point defects dominate over thermally activated point defects during low temperature and certain rapid thermal processing, controlling dopant deactiviation and diffusion in crystalline or amorphous silicon, and can also affect the SPE growth rate.

358

The fraction of substitutional boron in silicon during ion implantation and thermal annealing  

Energy Technology Data Exchange (ETDEWEB)

We present results from a kinetic Monte Carlo simulation of boron transient enhanced diffusion (TED) in silicon. Our approach avoids the use of phenomenological fits to experimental data by using a complete and self-consistent set of values for defect and dopant energetics derived mostly from {ital ab initio} calculations. The results predict that, during annealing of 40 keV B-implanted Si at 800{degree}C, there exists a time window during which all the implanted boron atoms are substitutional. At earlier or later times, the interactions between free silicon self-interstitials and boron atoms drive the growth of boron clusters and result in an inactive boron fraction. The results show that the majority of boron TED takes place during the growth period of interstitial clusters and not during their dissolution. {copyright} {ital 1998 American Institute of Physics.}

1998-05-01

359

The fraction of substitutional boron in silicon during ion implantation and thermal annealing  

International Nuclear Information System (INIS)

We present results from a kinetic Monte Carlo simulation of boron transient enhanced diffusion (TED) in silicon. Our approach avoids the use of phenomenological fits to experimental data by using a complete and self-consistent set of values for defect and dopant energetics derived mostly from ab initio calculations. The results predict that, during annealing of 40 keV B-implanted Si at 800 degree C, there exists a time window during which all the implanted boron atoms are substitutional. At earlier or later times, the interactions between free silicon self-interstitials and boron atoms drive the growth of boron clusters and result in an inactive boron fraction. The results show that the majority of boron TED takes place during the growth period of interstitial clusters and not during their dissolution. copyright 1998 American Institute of Physics.

1998-05-01

360

Study of point defect detectors in Si  

International Nuclear Information System (INIS)

The importance of point defects in semiconductor and function materials has been studied in detail, but effective means for detecting point defects has not been available for a long time. The end of range defects in Si, produced by 140 keV Ge"+ implantation, were investigated as detectors for measuring the interstitial concentration created by 42 keV B"+ implantation. The concentration of interstitial resulting from the B"+ implantation and the behavior of the interstitial flux under different annealing condition were given. The enhanced diffusion in the boron doped EPI marker, resulting from mobile non-equilibrium interstitials was demonstrated to be transient. Interstitial fluxes arising from processing can be detected by transient enhanced diffusion (TED) of doped marker layers as well

1999-05-01

361

Redistribution of implanted dopants after metal-silicide formation  

Science.gov (United States)

The redistribution of implanted As and Sb following metal-silicide formation of Pt, Pd, and Ni has been studied. The phases of the silicides used were PtSi, Pd/sub 2/Si, and NiSi. Investigations with Rutherford backscattering analysis showed that after the formation of the silicides, the Sb was always found in the silicide layer near the surface of the samples, whereas PtSi and Pd/sub 2/Si caused a partial rejection of As for implanted doses of 2 x 10/sup 15/ cm/sup -2/ and higher. No rejection of As was found after the formation of NiSi. The results are discussed in terms of solid solubilities and impurity-metal compound formation. The data presented has implications in the fabrication of Ohmic contacts and the adjustments of the heights of Schottky barriers on silicon.

1978-12-01

362

Redistribution of implanted dopants after metal-silicide formation  

International Nuclear Information System (INIS)

The redistribution of implanted As and Sb following metal-silicide formation of Pt, Pd, and Ni has been studied. The phases of the silicides used were PtSi, Pd_2Si, and NiSi. Investigations with Rutherford backscattering analysis showed that after the formation of the silicides, the Sb was always found in the silicide layer near the surface of the samples, whereas PtSi and Pd_2Si caused a partial rejection of As for implanted doses of 2 x 10"1"5 cm"-"2 and higher. No rejection of As was found after the formation of NiSi. The results are discussed in terms of solid solubilities and impurity-metal compound formation. The data presented has implications in the fabrication of Ohmic contacts and the adjustments of the heights of Schottky barriers on silicon.

363

Prediction of transient-enhanced diffusion during rapid thermal annealing of ion-implanted silicon  

International Nuclear Information System (INIS)

There have been several reports of transient-enhanced diffusion during furnace or rapid thermal annealing of ion-implanted silicon and some reports of no enhancement. In this contribution, the authors show that many of the observed effects can be accounted for by an interstitial trapping mechanism, in which large numbers of Si atoms are trapped by group V dopant atoms in the amorphous material during implantation. These trapped atoms are retained during solid-phase-epitaxial (SPE) growth, but can be released later during thermal processing to give the transient-enhanced diffusion. The authors present a model which can predict the transient effects (or lack of them) for any concentration of Sb, Bi, or As dopants sufficient to amorphize the silicon and any thermal processing technology which relies on SPE growth (furnace, cw laser, or rapid thermal annealing).

1985-03-01

364

Microstructure, mechanical properties and fracture behavior of #alpha# particle irradiated type 316 stainless steel  

International Nuclear Information System (INIS)

The present work is a research of the effect of helium on the microstructure, mechanical properties and fracture behaviors of a type 316 austenitic steel. Helium implantation was performed by 30-MeV #alpha#-particle injection on very small size specimens, using a cyclotron. Average helium content in a He-deposited region was up to 2000 appm He. In the case of 2000appm He implantation, intergranular fracture was sometimes observed on the helium deposited region after tensile test at room temperature. At elevated temperature test, however, this material showed the transition of fracture mode from transgranular-ductile fracture at 773K to intergranular fracture at 873. In the case of 500 appm He implantation, the transition of fracture mode was recognized at a temperature range of 873K to 973K. (author).

365

Mechanical properties and fracture behavior of #alpha# particle irradiated type 316 stainless steel at high temperature  

International Nuclear Information System (INIS)

The effect of helium on the mechanical properties and fracture behaviors of a type 316 austenitic steel is presented. Helium implantation was performed by 30-MeV #alpha#-particle injection on very small, thin specimens, using a cyclotron accelerator. Average helium content in the He-deposited region was 50 to 2000 appm He. These specimens showed the transition of fracture mode from transgranular to intergranular fracture in elevated temperature tests. The transition temperature decreased with increase in the amount of implanted helium. For example, in the case of 2000 appm and 500 appm He implantation, the transition temperatures were between 773 and 873 K and 873 and 973 K, respectively. (orig.).

366

Long-term changes in graft height after maxillary sinus floor elevation with different grafting materials: radiographic evaluation with a minimum follow-up of 4.5 years  

British Library Electronic Table of Contents (United Kingdom)

Abstract Objective: To compare the vertical dimensional changes with regard to graft height in a long-term follow-up in patients treated with two different grafting materials used in maxillary sinus floor elevation procedures. Material and methods: Twenty consecutive patients were included. One group was grafted with autogenous bone from the mandible (chin area), and the other group was augmented with a 100%b-tricalcium phosphate (b-TCP). During a 4- to 5-year period, in each patient, at least five panoramic radiographs were made. These panoramic radiographs were used for morphometric measurements, at three different locations. The three locations were the first bone to implant contact at the distal side of the second most posterior implant (L1), halfway between this implant and the most p...

2009-01-01

367

Intestinal Ischemia for estenosis of the superior mesenteric artery, Treatment with angioplastia and stent implant  

International Nuclear Information System (INIS)

Chronic mesenteric arterial ischemia is an uncommon condition associated a high morbidity and mortality. It is most Commonly caused by atherosclerotic occlusive disease. Patients may suffer epigastric or periumbilical postprandial pain ten to thirty minutes after eating. A case of chronic mesenteric artery stenosis, the diagnosis was performance with colonoscopy and biopsy. We present a case report of a patient with chronic mesenteric ischemia. Mesenteric arteriography was performed and documented estenosis of the mesenteric superior artery. Then percutaneous arteriography with angioplasty and implant of stent was performed. The patients became completely asymptomatic and normal colon mucous is observed in control colonoscopy. The purpose of this report is to present the case endoscopy, clinic and radiological features and to describe the percutaneous angioplasty and implant of stent. We believe that angioplasty treatment offers and improvement ...

368

Influence of fluorine on the simulation of the transient enhanced diffusion of 15 keV BF_2"+ ion implantation into silicon  

International Nuclear Information System (INIS)

We have simulated the transient enhanced diffusion (TED) of boron fluoride (BF_2"+) implanted in crystalline and germanium amorphized silicon. Based on recently published models, the effect of fluorine on boron diffusion in silicon has been introduced and a modelling has been suggested. In order to simulate the boron experimental profiles, we have assumed that fluorine forms clusters involving interstitial boron which reduces the junction depth. Experimental results indicate that fluorine behaviour depends on amorphization energy. Moreover, even no germanium preamorphization is performed, silicon is still amorphized by fluorine species. Hence, BF_2"+ implantation leads to an amorphous/crystalline (a/c) interface near the surface. An improvement of published models is suggested taking into account fluorine effects. The simulations satisfactory reproduce the SIMS experimental profiles for a large scale of experimental conditions.

2002-01-01

369

Effect of zinc and its form of supply on production and quality of coffee beans  

British Library Electronic Table of Contents (United Kingdom)

Abstract BACKGROUND: In Brazil, the usual forms of zinc (Zn) supply to coffee plants have limitations that compromise the element availability to the plant. This study proposes to test an alternative approach to supplying the nutrient to Coffea arabica L. using trunk implanted zinc tablets. Additionally, the effect of Zn on the production and quality of coffee beans was also evaluated. RESULTS: The highest total coffee bean production was recorded in plants implanted with Zn tablets (TA), while the lowest was recorded in the control treatment, without zinc supply (WZn), reaching a bianual production of 188.2 and 130.1 60-kg bags of processed beans per hectare, respectively. In the treatments where Zn were applied as tablet implantation or as foliage spraying (SZn); the bean size was larger...

2011-01-01

370

Characterization of polysilicon thin-film transistors with asymmetric source/drain implantation  

Energy Technology Data Exchange (ETDEWEB)

The effect of asymmetry tilt angle ion implantation on polysilicon thin-film transistors (TFTs) device characteristics are investigated. This asymmetric source/drain (S/D) TFTs structure exhibits low leakage current and suppressed kink effect due to the relief of higher electric field near the drain junction side. It is shown that the optimal implantation tilt angle is 30 deg. in our annealing condition. And the anomalous off-state current is more than two orders of magnitude lower than that of the conventional TFTs. By well controlled the LDD region, this structure can act as a conventional structure in the on-state and the turn-on current will not be degraded. Besides, the device under severe hot carrier bias stress shows better hot carrier endurance.

2005-08-01

371

Balloon dilatation and balloon-expandable stents for PTA of proximal venous stenoses in haemodialysis patients. Dilatation und ballonexpandierbare Stents zur Therapie zentralvenoeser Stenosen bei Dialysepatienten  

Energy Technology Data Exchange (ETDEWEB)

On 10 dialysis patients we performed 12 balloon dilatations, 2 catheter lyses, 6 stent implants (Palmaz stent) and one atherectomy of central venous stenoses or occlusions (v. subclavia, v. brachiocephalica) at the shunt arm of the patient. The primary success rate was, in balloon PTA and lysis, 12/14 interventions, and in stent placement and atherectomy 7/7. The angiographical and clinical primary result after stent implantation was significantly better than after conventional dilatation. After 66% of the balloon dilatations recidivation occurred within the first year; this can be treated by means of repeated PTA. Whether long-term exclusion of recurrence can be achieved by stent implantation, must be established by means of follow-up studies that are at present in progress. (orig.).

1990-09-01

372

Atomic scale models of Ion implantation and dopant diffusion in silicon  

Energy Technology Data Exchange (ETDEWEB)

We review our recent work on an atomistic approach to the development of predictive process simulation tools. First principles methods, molecular dynamics simulations, and experimental results are used to construct a database of defect and dopant energetics in Si. This is used as input for kinetic Monte Carlo simulations. C and B trapping of the Si self- interstitial is shown to help explain the enormous disparity in its measured diffusivity. Excellent agreement is found between experiments and simulations of transient enhanced diffusion following 20-80 keV B implants into Si, and with those of 50 keV Si implants into complex B-doped structures. Our simulations predict novel behavior of the time evolution of the electrically active B fraction during annealing.

1999-03-01

373

Anti-Infection Dip Suggestions for the Coloplast Titan Inflatable Penile Prosthesis in the Era of the Infection Retardant Coated Implant  

British Library Electronic Table of Contents (United Kingdom)

Abstract Introduction.- Infection is the worst complication seen with inflatable penile prosthesis (IPP). Both the American Medical Systems (AMS) and Coloplast IPP have infection retardant coatings. AMS is coated at the factory with rifampicin and minocycline (InhibiZone). The Coloplast IPP has a hydrophilic coating covalently bonded to its components that will absorb any aqueous solution before implantation and provides increased surface lubricity to decrease bacterial adherence. Aim.- We tested several antibiotic dips comparing zones of inhibition (ZOI) against five commonly infecting bacteria with coated Coloplast implants. Results were compared with those ZOI created with strips of an AMS IPP precoated with InhibiZone. Methods.- Pieces of sterile Coloplast Titan IPP were dipped in (i) ...

2011-01-01

374

Towards atomic scale engineering of rare-earth-doped SiAlON ceramics through aberration-corrected scanning transmission electron microscopy  

British Library Electronic Table of Contents (United Kingdom)

Direct visualization of rare earths in @a- and @b-SiAlON unit-cells is performed through Z-contrast imaging technique in an aberration-corrected scanning transmission electron microscope. The preferential occupation of Yb and Ce atoms in different interstitial locations of @b-SiAlON lattice is demonstrated, yielding higher solubility for Yb than Ce. The triangular-like host sites in @a-SiAlON unit cell accommodate more Ce atoms than hexagonal sites in @b-SiAlON. We think that our results will be applicable as guidelines for many kinds of rare-earth-doped materials.

2011-01-01

375

Three-dimensional modeling of heat transport in deep hydrothermal reservoirs  

British Library Electronic Table of Contents (United Kingdom)

The need for alternative energy increases steadily???especially due to the climate change and the limited availability of fossil fuels. Geothermal power uses the intrinsic heat which is stored in the accessible part of the Earth???s crust. Its importance among the renewable energy resources originates from the almost unlimited energy supply of the Earth and its independence from external influences such as seasonal or even daily climatic variability. Nevertheless, there are risks which have to be assessed. From a mathematical point of view there are four building blocks of the characterization of deep geothermal systems: seismic exploration, gravimetry, modeling transport processes, and modeling the stress field. In particular, local depletion poses a significant risk during the industrial...

2011-01-01

376

The 'glass earth' - geochemical frontiers in exploration through cover  

International Nuclear Information System (INIS)

'Glass Earth' represents a number of current and planned projects within CSIRO aimed at making 'transparent' the top 1000 m of the Earth's crust It builds upon current technologies developed within a number of CSIRO divisions as well as the Australian Mineral Exploration Technologies CRC (AMET CRC), the Australian Geodynamics CRC (AG CRC) and the CRC for Landscape Evolution and Mineral Exploration (CRC LEME). New geophysical and geochemical technologies will be developed to complement these, together with new capabilities in modelling, data integration and visualisation, including hydrogeochemistry, hydrogeology, surface geochemistry and isotope geochemistry, modelling of chemical, fluid and heat flows in rock and regolith, advanced visualisation and data fusion. This paper describes some recent work in the field of isotope geochemistry, with the principal aim of 'seeing through' cover to understand basement geology and detect hidden ore ...

1999-09-24

377

Production of rare-earth atomic negative ion beams in a cesium-sputter-type negative ion source  

International Nuclear Information System (INIS)

The desire to study negative ion structure and negative ion-photon interactions has spurred the development of ion sources for use in research and industry. The many different types of negative ion sources available today differ in their characteristics and abilities to produce anions of various species. Thus the importance of choosing the correct type of negative ion source for a particular research or industrial application is clear. In this study, the results of an investigation on the production of beams composed of negatively-charged rare-earth ions from a cylindrical-cathode-geometry, cesium-sputter-type negative ion source are presented. Beams of atomic anions have been observed for most of the first-row rare-earth elements, with typical currents ranging from hundreds of picoamps to several nanoamps.

2007-08-01

378

Paramagnetic properties of the RCo_2 compounds (R = rare earth)  

International Nuclear Information System (INIS)

The paramagnetic susceptibilities of all the RCo_2 compounds for which measurements are available are found to obey a Curie-Weiss law consistent with the modified indirect exchange model. The rare-earth ions are in a well defined tripositive valence state. Paramagnetic moments and paramagnetic Curie temperatures are obtained for these materials for the first time. The paramagnetic moments of these materials are changed from their free-ion values by the effects of itinerant electron polarisation, an effect which is particularly large for SmCo_2 whose paramagnetic moment is almost three times greater than the free-ion value. The modified indirect exchange model is found to be able to give a full description of the magnitude of the rare-earth, cobalt and diffuse moments in polarised neutron experiments. The band structures of the light RCo_2 compounds are found to be distinctly different to those of the heavy RCo_2 compounds. (author).

1984-03-01

379

Interaction of rare earths with orthanyl K and its spectrophotometric determination in binary mixtures  

International Nuclear Information System (INIS)

A study has been made of the colour reaction involved in the interaction or rare-earth elements with the reagent orthanyl K, the optimum conditions for the reaction being: pH=4.0-4.5 and lambda=660-670 nm. The ratio of components in the complex is Me:R=1:2. Consideration of the relative optical density values of the complex solutions as a function of the serial number of the rare-earth elements made it possible to recommend orthanyl K as a selective reagent for determining La, Ce, Pr and Nb in a mixture of Tu, Yb, Lu and Y oxides. The molar extinction coefficients, the sensitivity of the reaction and the concentration limits where Beer's law applies were calculated. Lanthanum was determined in a binary mixture with thulium and yttrium. (author).

1975-01-01

380

Development of a through-the-earth monitor system. Open file report (final) Oct 77-Dec 80  

Energy Technology Data Exchange (ETDEWEB)

The object of this program was to design and build a self-contained system for remote monitoring of the atmosphere in mines. The system developed uses the mine pager phone line as the primary communication channel and also has the capability of using 208 Hz in the ELF band for wireless transmission through the earth. The depth for through-the-earth transmission is expected to be about 80 to 90 meters in high conductivity soil and is limited by the noise level in the ELF band-pass filters. The underground components of the TEM System are energized by mine power through a battery charger-storage battery power supply. In the event of mine power failure the battery capacity is more than sufficient for 1 week's operation with interrogations every 4 hours.

1980-12-01

381

Comparative planetology, climatology and biology of Venus, Earth and Mars  

British Library Electronic Table of Contents (United Kingdom)

Spacecraft studies of the three terrestrial planets with atmospheres have made it possible to make meaningful comparisons that shed light on their common origin and divergent evolutionary paths. Early in their histories, all three apparently had oceans and extensive volcanism; Mars and Earth, at least, had magnetic fields, and Earth, at least, had life. All three currently have climates determined by energy balance relationships involving carbon dioxide, water and aerosols, regulated by solar energy deposition, atmospheric and ocean circulation, composition, and cloud physics and chemistry. This paper addresses the extent to which current knowledge allows us to explain the observed state of each planet, its planetology, climatology and biology, within a common framework. Areas of ignorance...

2011-01-01

382

Assessment of periodic sub-diurnal Earth rotation variations at tidal frequencies through transformation of VLBI normal equation systems  

British Library Electronic Table of Contents (United Kingdom)

We present an empirical model for periodic variations of diurnal and sub-diurnal Earth rotation parameters (ERPs) that was derived based on the transformation of normal equation (NEQ) systems of Very Long Baseline Interferometry (VLBI) observing sessions. NEQ systems that contain highly resolved polar motion and UT1-TAI with a temporal resolution of 15?min were generated and then transformed to the coefficients of the tidal ERP model to be solved for. To investigate the quality of this model, comparisons with empirical models from the Global Positioning System (GPS), another VLBI model and the model adopted by the conventions of the International Earth Rotation and Reference Systems Service (IERS) were performed. The absolute coefficients of these models agree almost completely within 7.5?...

2011-01-01

383

Visual and refractive outcome of one-site phacotrabeculectomy compared with temporal approach phacoemulsification  

UK PubMed Central (United Kingdom)

BackgroundWe aimed to compare visual and refractive outcome following phacoemulsification and intraocular lens implant (IOL) and combined one-site phacotrabeculectomy.MethodWe...Full Text Available

2008-09-01

384

Use of cephalometric analysis for implant placement in a patient with an edentulous maxilla with a severe Class III intermaxillary relationship.  

Science.gov (United States)

A patient with a totally edentulous maxilla and a seVere Class III intermaxillary relationship in the anterior region was treated by implants. In the mandible, there were 10 teeth between the second premolars. The inclination and width of the maxillary anterior residual bone were measured on cephalometric X-ray film obtained before treatment. The results of cephalometric analysis did not support clockwise rotation of the mandible or lingual angling of the maxillary anterior teeth by use of prosthesis to improve the Class III relationship. Ten implants were simultaneously placed in the maxilla. Then, a maxillary temporary full bridge was seated after reduction of the crown lengths of the mandibular anterior teeth. An apically positioned flap operation was performed to eliminate periodontal pockets and to obtain clinically suitable crown lengths of the mandibular anterior teeth. A noncemented, screw-retained maxillary full bridge and a ...

2004-01-01

385

Transient enhanced diffusion in ion-implanted silicon  

Energy Technology Data Exchange (ETDEWEB)

We discuss the transient-enhanced diffusion of Sb, As, P, In, Ga, and B in ion-implanted Si, where the near-surface region has been amorphized by the dopant or by a self-implantation process. With Sb, a large transient diffusion enhancement is observed proportional to dopant concentration. For Sb, As, P, and In, the enhancement follows the relative interstitialcy diffusion coefficient. We believe this behavior is caused by stable implantation-induced point defects present in the amorphous surface layer, which decay during thermal processing to release high concentrations of self-interstitials. This process occurs in competition with the solid phase epitaxial (SPE) growth process, and for high dopant concentrations can occur in the amorphous phase ahead of the crystallization front. We believe this may be the origin of the dopant redistribution which can occur during SPE growth, which sets the upper limit to the dopant ...

1987-03-01

386

Transcatheter stent implantation to treat aortic coarctation in infancy.  

UK PubMed Central (United Kingdom)

A ten week old girl who had previously undergone a palliative procedure for the hypoplastic left heart syndrome had unrelieved aortic coarctation that did not respond to standard balloon dilatation....Full Text Available

1993-01-01

387

The inhibition of staphylococcus epidermidis biofilm formation by vancomycin-modified titanium alloy and implications for the treatment of periprosthetic infection  

UK PubMed Central (United Kingdom)

Peri-prosthetic infections are notoriously difficult to treat as the biomaterial implant is ideal for bacterial adhesion and biofilm formation, resulting in decreased antibiotic sensitivity....Full Text Available

2008-12-01

388

The effect of preamorphization energy on ultrashallow junction formation following ultrahigh-temperature annealing of ion-implanted silicon  

International Nuclear Information System (INIS)

High-power arc lamp design has enabled ultrahigh-temperature (UHT) annealing as an alternative to conventional rapid thermal processing (RTP) for ultrashallow junction formation. The time duration of the UHT annealing technique is significantly reduced from those obtained through conventional RTP. This difference in time may offer the ability to maintain a highly activated ultrashallow junction without being subjected to transient enhanced diffusion (TED), which is typically observed during postimplant thermal processing. In this study, two 200-mm (100) n-type Czochralski-grown Si wafers were preamorphized with either a 48- or a 5-keV Ge"+ implant to 5x10"1"4 cm"2, and subsequently implanted with 3-keV BF_2"+ molecular ions to 6x10"1"4 cm"2. The wafers were sectioned and annealed under various conditions in order to investigate the effects of the UHT annealing technique on the resulting junction characteristics. The main point of the paper is ...

2005-02-15

389

The development of multiple probe microdialysis sampling in the stomach  

UK PubMed Central (United Kingdom)

A multiple probe approach of implanting microdialysis probes into each separate tissue layer would better represent sampling from the stomach. Presently, microdialysis sampling experiments are...Full Text Available

2008-09-10

390

The association between metal allergy, total hip arthroplasty, and revision  

UK PubMed Central (United Kingdom)

Background and purpose It has been speculated that the prevalence of metal allergy may be higher in patients with implant failure. We compared the prevalence and cause of revisions following...Full Text Available

2009-12-04

391

The Use of Particulate Bone Grafts From the Mandible for Maxillary Sinus Floor Augmentation Before Placement of Surface-Modified Implants: Results From Bone Grafting to Delivery of the Final Fixed Prosthesis  

British Library Electronic Table of Contents (United Kingdom)

PurposeThis prospective study followed 61 patients who were partially dentulous and considered to have insufficient bone volume for routine implant treatment and consequently underwent sinus inlay bone grafting.Patients and MethodsThe patients were treated with maxillary sinus floor augmentation with particulated autogenous bone from the mandibular ramus/corpus. After a healing period, dental implants (n = 180) were installed.ResultsRadiographic examination revealed average residual vertical bone heights of 6.5 mm in the first premolar region, 3.8 mm in the second premolar region, 3.5 mm in the first molar region, and 2.6 mm in the second molar region. The average implant lengths were 12 mm in the first premolar region and 11 mm in the second premolar, first, and second molar regions. All ...

2008-01-01

392

The Oxidation Behavior of CoCrAlY, CoCrAl and Yttrium ...  

Science.gov (United States)

... ADD137758. Title : The Oxidation Behavior of CoCrAlY, CoCrAl and Yttrium-Implanted CoCrAl Alloys Compared and Contrasted,. ...

1987-11-01

393

Temporal Interactions during Paired-Electrode Stimulation in Two Retinal Prosthesis Subjects  

UK PubMed Central (United Kingdom)

Purpose.Since 2002, six blind patients have undergone implantation of an epiretinal 4 × 4 electrode array designed to directly stimulate the remaining cells of the retina...Full Text Available

2011-01-01

394

Simulation of p-type diffusion in compound semiconductor: the case of beryllium implanted in InGaAs  

Energy Technology Data Exchange (ETDEWEB)

A system of equations describing transient enhanced diffusion of beryllium in InGaAs due to kick-out mechanism or due to formation, migration, and dissociation of the pairs ''beryllium atom-group III self-interstitial'' is proposed and analyzed. Simulation of coupled diffusion of beryllium atoms and self-interstitials in InGaAs during rapid thermal annealing was done for the case of dual implantation. For the experiment under consideration the first ion implantation of phosphorus atoms produced the region of extended defects that led to ''uphill'' diffusion of implanted Be in the defect region and in the vicinity of the surface. The suggested reason of ''uphill'' diffusion could be related to the nonuniform distribution of group III self-interstitials that was formed due to the absorption of point defects on the ...

2006-10-15

395

Removable Partial Denture in a Cleft Lip and Palate Patient: A Case Report  

UK PubMed Central (United Kingdom)

This clinical report described the oral rehabilitation of a cleft lip and palate patient with removable partial denture. Although implant-supported fixed treatment was presented as part of the optimum...Full Text Available

2008-10-01

396

Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy  

Energy Technology Data Exchange (ETDEWEB)

Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly ...

1997-09-01

397

Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy  

International Nuclear Information System (INIS)

Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly ...

1996-09-15

398

Prospective randomized controlled trial of an injectable esophageal prosthesis versus a sham procedure for endoscopic treatment of gastroesophageal reflux disease  

UK PubMed Central (United Kingdom)

BackgroundThis study aimed to assess whether endoscopic implantation of an injectable esophageal prosthesis, the Gatekeeper Reflux Repair System (GK), is a safe and effective therapy...Full Text Available

2010-06-01

399

Previous heat treatment inducing different plasma nitriding behaviors in martensitic stainless steels  

International Nuclear Information System (INIS)

In this work we report a study of the induced changes in structure and corrosion behavior of martensitic stainless steels nitrided by plasma immersion ion implantation (PI"3) at different previous heat treatments. The samples were characterized by x-ray diffraction and glancing angle x-ray diffraction, scanning electron microscopy, energy dispersive x-ray spectroscopy, and potentiodynamic measurements. Depending on the proportion of retained austenite in the unimplanted material, different phase transformations are obtained at lower and intermediate temperatures of nitrogen implantation. At higher temperatures, the great mobility of the chromium yields CrN segregations like spots in random distribution, and the #alpha#"'-martensite is degraded to#alpha#-Fe (ferrite). The nitrided layer thickness follows a fairly linear relationship with the temperature and a parabolic law with the process time. The corrosion resistance depends strongly on ...

2006-09-01

400

Plasma immersion ion implantation (PIII) of metals; Plasmaimmersionsionenimplantation metallischer Werkstoffe  

Energy Technology Data Exchange (ETDEWEB)

Plasma Immersion Ion Implantation (PIII) is a new hybrid technology for surface treatment of materials based on the principles of plasma nitriding and ion implantation. The equipment and the operation of the system are introduced. As well as providing an alternate method of ion implantation, it is possible to combine energetic ion bombardment with plasma nitriding. Different metal materials and treatment conditions have been studied. The capability of PIII-treatment to improve the properties of a wide range of metals has been proven. Application for forming tools and their industrial test has been successful. (orig.) [Deutsch] Die Plasmaimmersionsimplantation (PIII) ist eine neue Hybridtechnologie zur Behandlung von Werkstoffoberflaechen und basiert auf den Prinzipien des Plasmanitrierens und der Ionenimplantation. Die Anlagentechnik und die Arbeitsweise werden vorgestellt. Verfahrensspezifische Vorteile entstehen durch die ...

1995-01-01

401

Palliation of malignant esophageal obstruction and fistulas with self expandable metallic stents  

UK PubMed Central (United Kingdom)

AIM: To evaluate the efficacy of self expandable metallic stents (SEMS) in patients with malignant esophageal obstruction and fistulas.METHODS: SEMS were implanted in the presence of fluoroscopic...Full Text Available

2010-12-07

402

Oxygen-concentration dependent enhancement of positive secondary ion emission from silicon  

Energy Technology Data Exchange (ETDEWEB)

The enhancement of positive secondary ion yields of silicon due to the presence of oxygen has been investigated quantitatively by low-energy (5 keV) oxygen implantation. Implantation and sputter profiling with 9 keV In/sup +/ were performed in the same ion microprobe instrument. Depth profiles of substrate and implanted oxygen atoms were measured for fluences ranging from 5x10/sup 15/ to 4x10/sup 16/ O-atoms/cm/sup 2/. The oxygen concentration, c(O), in the sample was deduced from the implanted fluence and the range distribution in the Gaussian approximation. It was found that the oxygen-enhanced Si/sup +/ intensity is proportional to c(O)sup(x) (with x=1.4) in the concentration regime, 1.5<=c(O)<=30 at%. The O/sup +/ intensity shows a similar dependence for c(O)> or approx.20 at.%.

1983-12-15

403

Neointimal hyperplasia persists at six months after sirolimus-eluting stent implantation in diabetic porcine  

UK PubMed Central (United Kingdom)

BackgroundObservational clinical studies have shown that patients with diabetes have less favorable results after percutaneous coronary intervention compared with the non-diabetic...Full Text Available

404

Morbidity using subcutaneous ports and efficacy of vancomycin flushing in cancer.  

UK PubMed Central (United Kingdom)

An evaluation of totally implanted venous access systems inserted in 163 consecutive children with cancer is reported. From 1988 to 1994, 180 subcutaneous ports were inserted in children more than 1...Full Text Available

1995-04-01

405

MRT in differentiation between tumour and implant material in the postoperative sella. Differenzierung zwischen Tumor und Implantatmaterial in der postoperativen Sella mit der MRT  

Energy Technology Data Exchange (ETDEWEB)

MRT criteria have been developed to distinguish between tumour and implant material following examination of 50 patients who had transsphenoidal hypophysectomies for tumours. Judgements were based on the postoperative hormonal status and the operation notes. Following contrast injection of Gd-DTPA and using T[sub 1] weighted spin-echo sequences, implant material appeared as sandwich-like, linear or circular structures. Residual recurrent tumour produced homogenous or non-homogenous aspects without marginal enhancement in 84% of cases. Postoperative displacement of the infundibulum to the opposite side was observed in 73% of patients with tumour remnants. Sensitivity of MRT was 70%, specificity 95%. There was a positive predictive value of 94% and a negative predictive value of 72% with an accuracy of 81%. This provides assistance in differentiating between tumour remnants and implant material. MRT is recommended as a method ...

1993-06-01

406

MRT in differentiation between tumour and implant material in the postoperative sella  

International Nuclear Information System (INIS)

MRT criteria have been developed to distinguish between tumour and implant material following examination of 50 patients who had transsphenoidal hypophysectomies for tumours. Judgements were based on the postoperative hormonal status and the operation notes. Following contrast injection of Gd-DTPA and using T_1 weighted spin-echo sequences, implant material appeared as sandwich-like, linear or circular structures. Residual recurrent tumour produced homogenous or non-homogenous aspects without marginal enhancement in 84% of cases. Postoperative displacement of the infundibulum to the opposite side was observed in 73% of patients with tumour remnants. Sensitivity of MRT was 70%, specificity 95%. There was a positive predictive value of 94% and a negative predictive value of 72% with an accuracy of 81%. This provides assistance in differentiating between tumour remnants and implant material. MRT is recommended as a method of ...

407

Left Main Stent Thrombosis Complicated by Eptifibatide-Induced Acute Thrombocytopenia  

UK PubMed Central (United Kingdom)

A 57-year-old man with a history of coronary artery disease and placement of an implantable cardioverter-defibrillator presented at our emergency room with an anterior ST-elevation myocardial infarction....Full Text Available

2011-01-01

408

Heterotopic transcatheter tricuspid valve implantation: first-in-man application of a novel approach to tricuspid regurgitation  

UK PubMed Central (United Kingdom)

AimsTranscatheter treatment of heart valve disease is well established today. However, for the treatment of tricuspid regurgitation (TR), no effective catheter-based approach is...Full Text Available

2011-05-01

409

Expression of calbindin-D28k and its regulation by estrogen in the human endometrium during the menstrual cycle  

UK PubMed Central (United Kingdom)

Human endometrium resists embryo implantation except during the 'window of receptivity'. A change in endometrial gene expression is required for the development of receptivity. Uterine calbindin-D28k...Full Text Available

410

Experiments on the formation of the A 15-compounds Nb-Sn and Nb-Ge by ion implantation  

International Nuclear Information System (INIS)

Nb_3Sn films (Tsub(c)=17.8 K) were obtained by implantation of Sn"+ ions into Nb films (1500 A thick) after subsequent annealing. The annealing temperature required for the formation of the A15 phase in the implanted films was about 100 K higher than for Nb-Sn sandwich films evaporated at 300 K. The influence of the Sn concentration and of the annealing temperature was studied by measuring the sample resistance. The Nb-Sn compounds formed during the annealing process were analysed by measurements of the Moessbauer-effect of "1"1"9Sn. The implantation method was also used to produce Nb-Ge films with a ratio Ge/Nb approximately 1/3. The Ge-concentration and the temperature of the Nb-target (300-1070 K) were varied. These variations as well as subsequent annealing at 600-850"0C did not lead to superconducting transition temperatures above 8 K. (Auth.).

411

Effects of introducing low-frequency harmonics in the perception of vocoded telephone speech1  

UK PubMed Central (United Kingdom)

Several studies have demonstrated that telephone use presents a challenge for most cochlear implant (CI) users, and this is attributed mainly to the narrow bandwidth (300–3400 Hz) introduced...Full Text Available

2010-09-01

412

Effects of an Alpha-4 Integrin Inhibitor on Restenosis in a New Porcine Model Combining Endothelial Denudation and Stent Placement  

UK PubMed Central (United Kingdom)

Restenosis remains the main complication of balloon angioplasty and/or stent implantation. Preclinical testing of new pharmacologic agents preventing restenosis largely rely on porcine models, where...Full Text Available

413

Effect of energy and dose on transient-enhanced diffusion and defect microstructure in low energy high dose As{sup +} implanted Si  

Energy Technology Data Exchange (ETDEWEB)

(001) CZ silicon wafers were implanted with arsenic (As{sup +}) at energies of 10--50 keV to doses of 2 {times} 10{sup 14} to 5 {times} 10{sup 15}/cm{sup 2}. All implants were amorphizing in nature. The samples were annealed at 700 C for 16 hrs. The resultant defect microstructures were analyzed by XTEM and PTEM and the As profiles were analyzed by SIMS. The As profiles showed significantly enhanced diffusion in all of the annealed specimens. The diffusion enhancement was both energy and dose dependent. The lowest dose implant/annealed samples did not show As clustering which translated to a lack of defects at the projected range. At higher doses, however, projected range defects were clearly observed, presumably due to interstitials generated during As clustering. The extent of enhancement in diffusion and its relation to the defect microstructure is explained by a combination of factors including surface recombination of ...

1997-11-01

414

Effect of energy and dose on transient-enhanced diffusion and defect microstructure in low energy high dose As"+ implanted Si  

International Nuclear Information System (INIS)

(001) CZ silicon wafers were implanted with arsenic (As"+) at energies of 10--50 keV to doses of 2 x 10"1"4 to 5 x 10"1"5/cm"2. All implants were amorphizing in nature. The samples were annealed at 700 C for 16 hrs. The resultant defect microstructures were analyzed by XTEM and PTEM and the As profiles were analyzed by SIMS. The As profiles showed significantly enhanced diffusion in all of the annealed specimens. The diffusion enhancement was both energy and dose dependent. The lowest dose implant/annealed samples did not show As clustering which translated to a lack of defects at the projected range. At higher doses, however, projected range defects were clearly observed, presumably due to interstitials generated during As clustering. The extent of enhancement in diffusion and its relation to the defect microstructure is explained by a combination of factors including surface recombination of point defects, As ...

1996-12-02

415

Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon  

Energy Technology Data Exchange (ETDEWEB)

Several models have been proposed for the simulation of boron diffusion during annealing after implantation in silicon. It has been shown that transient enhanced diffusion (TED) tends to disappear at sub-keV implant energies. Under these conditions boron concentration is higher than the boron solubility limit value, precipitation phenomena occur. Extended defects ({l_brace}3 1 1{r_brace}, EOR) formation and boron precipitation affect both the redistribution during the annealing and activation of the boron. For these reasons, we have investigated the diffusion of low energy boron implanted in crystalline silicon and tested a complete simulation program which takes into account the effects of type I defects as a sink for self-interstitials and of boron precipitation. Experimental results have been simulated and consistent parameters have been found to fit the data. Boron enhanced diffusion effect has been studied. Model ...

2004-02-01

416

Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon  

International Nuclear Information System (INIS)

Several models have been proposed for the simulation of boron diffusion during annealing after implantation in silicon. It has been shown that transient enhanced diffusion (TED) tends to disappear at sub-keV implant energies. Under these conditions boron concentration is higher than the boron solubility limit value, precipitation phenomena occur. Extended defects (#left brace#3 1 1#right brace#, EOR) formation and boron precipitation affect both the redistribution during the annealing and activation of the boron. For these reasons, we have investigated the diffusion of low energy boron implanted in crystalline silicon and tested a complete simulation program which takes into account the effects of type I defects as a sink for self-interstitials and of boron precipitation. Experimental results have been simulated and consistent parameters have been found to fit the data. Boron enhanced diffusion effect has been studied. ...

2004-02-01

417

Diffusion mechanism of implanted Be in GaAs  

Energy Technology Data Exchange (ETDEWEB)

The transient enhanced diffusion of low and high dose implanted beryllium in undoped gallium arsenide during post-implant rapid thermal annealing in the temperature range of 700-900 C for 60-240 s has been studied and successfully simulated by the kick-out diffusion model, involving singly positively charged Be interstitials and doubly positively charged Ga self-interstitials. Using the ''plus one'' approach for Ga interstitial generation after implantation with the local Ga interstitial sink concept as well as the appropriate initial and boundary conditions for involved mobile species, and taking into account Fermi-level and built-in electric field effects, the obtained partial differential equations have been solved numerically by means of an explicit finite difference method. The thermal equilibrium concentrations and the diffusivities of Be and Ga interstitials, all as a function of ...

2008-01-15

418

Diagnostic possibilities following implantation of carbon-fibre-reinforced plastic (CFRP) total hip arthroplasty  

International Nuclear Information System (INIS)

Introduction: There are many problems in the radiological diagnosis of aseptic loosening in total hip arthroplasty. Computed tomography (CT) and magnetic resonance tomography (MRT) are not usable for metallic implants (stainless steel, cobalt alloy, titanium alloy). Material and Methods: From April 1993 to December 1993 15 CFRP non-cemented hip prostheses have been implanted. In a prospective clinical study plane radiographs, CT and MRT have been analysed. Results: Three stems were revised (1 femoral fracture, 1 severe thigh pain, 1 aseptic loosening). CFRP are not visible in plane radiographs. There was a complete (two-third of the cases) or nearly complete (one-third of the cases) small sclerotic interface between the prosthesis and the bone, these were apparent in CT and MRT in stable implant cases and did not have any clinical correlations. Discussion: The small sclerotic interface is quite different in comparison to so ...

419

Develop techniques for ion implantation of PLZT [lead-lanthanum-zirconate-titanate] for adaptive optics  

International Nuclear Information System (INIS)

Research was conducted at Pacific Northwest Laboratory to develop high photosensitivity adaptive optical elements utilizing ion implanted lanthanum-doped lead-zirconate-titanate (PLZT). One centimeter square samples were prepared by implanting ferroelectric and anti-ferroelectric PLZT with a variety of species or combinations of species. These included Ne, O, Ni, Ne/Cr, Ne/Al, Ne/Ni, Ne/O, and Ni/O, at a variety of energies and fluences. An indium-tin oxide (ITO) electrode coating was designed to give a balance of high conductivity and optical transmission at near uv to near ir wavelengths. Samples were characterized for photosensitivity; implanted layer thickness, index of refraction, and density; electrode (ITO) conductivity; and in some cases, residual stress curvature. Thin film anti-ferroelectric PLZT was deposited in a preliminary experiment. The structure was amorphous with x-ray diffraction showing the beginnings of ...

420

Corrosion and histopathological studies on anode materials for implantable power sources. [In vivo corrosion studies on anode material  

Science.gov (United States)

The biocompatibility and corrosion resistance of various materials for use as sacrificial anodes in in vivo hybrid fuel cells were studied. Aluminium, zinc, and magnesium alloy AZ31B were studied, and the results are discussed.

1974-01-01

421

Comparison and co-relation of invasive and noninvasive methods of ejection fraction measurement.  

UK PubMed Central (United Kingdom)

BACKGROUND: Accurate estimation of left ventricular ejection fraction (LVEF) has assumed great significance in the era of automatic implantable cardioverter defibrillators (AICDs), and a low EF may...Full Text Available

2007-11-01

422

CoSi_2 nanostructures by writing FIB ion beam synthesis  

International Nuclear Information System (INIS)

A mass separated focused ion beam (FIB) is a very useful tool to fabricate nanostructures by writing implantation within an ion beam synthesis process. In these investigations the IMSA-OrsayPhysics FIB, equipped with a Co_3_6Nd_6_4 alloy liquid metal ion source, was applied. Si(100) and (111) wafers were implanted with 60 keV Co"+"+ ions in the dose range of 2 . 10"1"6 to 2 . 10"1"7 cm"-"2. Implantation parameters were investigated, like pixel dwell time, relaxation time (time between two cycles), dose rate as well as the pixel overlapping factor. The subsequent annealing was done in a two step process, namely 600 deg. C for 60 min and 1000 deg. C for 30 min in a N_2 ambient. The results obtained by SEM investigations in terms of continuous nanowire structures following the direction and interrupted CoSi_2 pattern in the direction show a clear dependence on the time scale as well as the scanning mode of the irradiation. ...

2006-07-01

423

Circulation, bone scans, and tetracycline labeling in microvascularized and vascular bundle implanted rib grafts  

Energy Technology Data Exchange (ETDEWEB)

The circulation in microvascularized rib grafts has been compared with that in conventional rib grafts and in those augmented by a direct vascular bundle implantation into the bone grafts. A new experimental model has been designed to correlate vascular perfusion, bone scan patterns, tetracycline labeling, and histological findings in these bone grafts. Posterior microvascularized rib grafts were found to have a circulatory pattern identical to that of the normal rib. Failed microvascularized rib grafts were revascularized more slowly than conventional rib grafts. Vascular bundles implanted into rib grafts remained patent and increased the rate of revascularization. The stripping or preservation of periosteum had no observable effects on the rate or pattern of conventional rib graft revascularization. The circulation in rib grafts was accurately reflected in technetium 99 bone scans, as was the patency of the anastomoses of microvascularized ...

1984-11-01

424

Characterization of iron nitrides prepared by spark erosion, plasma nitriding, and plasma immersion ion implantation  

Energy Technology Data Exchange (ETDEWEB)

The effect of the nitrogen uptake in {alpha}-iron upon spark erosion in gaseous and liquid ammonia, plasma nitriding, and plasma immersion ion implantation is studied. The resulting phases and hyperfine parameters, measured by the Moessbauer spectroscopy, are discussed from the point of view of initial conditions of their preparation and subsequent heat and/or mechanical treatment. Spark erosion in the ammonia gas produces fine particles with the dominating ferromagnetic {alpha}-Fe phase (50%). The 20% of specimen volume form {alpha}'-Fe and {alpha}''-Fe{sub 16}N{sub 2} phases. The last 30% occupy the {gamma}'-Fe{sub 4}N, ferro- and paramagnetic {epsilon} phases, and {gamma}-Fe(N). Nitriding in the liquid ammonia allows to incorporate the higher content of nitrogen into {alpha}-iron particles which results in the formation of paramagnetic {epsilon}({zeta})-Fe{sub 2}N phase. This phase also dominates the surface of {alpha}-iron ...

2001-09-01

425

Characterization of iron nitrides prepared by spark erosion, plasma nitriding, and plasma immersion ion implantation  

International Nuclear Information System (INIS)

The effect of the nitrogen uptake in #alpha#-iron upon spark erosion in gaseous and liquid ammonia, plasma nitriding, and plasma immersion ion implantation is studied. The resulting phases and hyperfine parameters, measured by the Moessbauer spectroscopy, are discussed from the point of view of initial conditions of their preparation and subsequent heat and/or mechanical treatment. Spark erosion in the ammonia gas produces fine particles with the dominating ferromagnetic #alpha#-Fe phase (50%). The 20% of specimen volume form #alpha#'-Fe and #alpha#''-Fe_1_6N_2 phases. The last 30% occupy the #gamma#'-Fe_4N, ferro- and paramagnetic #epsilon# phases, and #gamma#-Fe(N). Nitriding in the liquid ammonia allows to incorporate the higher content of nitrogen into #alpha#-iron particles which results in the formation of paramagnetic #epsilon#(#zeta#)-Fe_2N phase. This phase also dominates the surface of #alpha#-iron specimen implanted by nitrogen using ...

2001-09-01

426

Case series of maxillary sinus augmentation with biphasic calcium phosphate: a clinical and radiographic study  

UK PubMed Central (United Kingdom)

PurposeThe aim of this study was to evaluate 3.5 years-cumulative survival rate of implants placed on augmented sinus using Osteon, a bone graft material, and to assess the height...Full Text Available

2011-04-01

427

Case Reports: Fractures of Threaded Cups: Rare Complications of a Well-established Implant  

UK PubMed Central (United Kingdom)

The use of cementless threaded cups in THA is a well-established treatment. Fractures of the cups are rare complications recorded in individual cases with material defects being discussed as the primary...Full Text Available

2009-03-01

428

Boron-enhanced diffusion of boron from ultralow-energy ion implantation  

Energy Technology Data Exchange (ETDEWEB)

We have investigated the diffusion enhancement mechanism of boron-enhanced diffusion (BED), wherein boron diffusivity is enhanced four to five times over the equilibrium diffusivity at 1050&hthinsp;{degree}C in the proximity of a silicon layer containing a high boron concentration. It is demonstrated that BED is driven by excess interstitials injected from the high boron concentration layer during annealing. For evaporated layers, BED is observed above a threshold boron concentration between 1{percent} and 10{percent}, though it appears to be closer to 1{percent} for B-implanted layers. For sub-keV B implants above the threshold, BED dominates over the contribution from transient-enhanced diffusion to junction depth. For 0.5 keV B, this threshold implantation dose lies between 3{times}10{sup 14} and 1{times}10{sup 15} cm{sup {minus}2}. It is proposed that the excess interstitials responsible for BED are produced during ...

1999-04-01

429

Boron-enhanced diffusion of boron from ultralow-energy ion implantation  

International Nuclear Information System (INIS)

We have investigated the diffusion enhancement mechanism of boron-enhanced diffusion (BED), wherein boron diffusivity is enhanced four to five times over the equilibrium diffusivity at 1050 ampersand hthinsp;degree C in the proximity of a silicon layer containing a high boron concentration. It is demonstrated that BED is driven by excess interstitials injected from the high boron concentration layer during annealing. For evaporated layers, BED is observed above a threshold boron concentration between 1% and 10%, though it appears to be closer to 1% for B-implanted layers. For sub-keV B implants above the threshold, BED dominates over the contribution from transient-enhanced diffusion to junction depth. For 0.5 keV B, this threshold implantation dose lies between 3x10"1"4 and 1x10"1"5 cm"-"2. It is proposed that the excess interstitials responsible for BED are produced during the formation of a silicon boride phase in the ...

1999-04-01

430

Atomistic calculations of ion implantation in Si: Point defect and transient enhanced diffusion phenomena  

Energy Technology Data Exchange (ETDEWEB)

A new atomistic approach to Si device process simulation is presented. It is based on a Monte Carlo diffusion code coupled to a binary collision program. Besides diffusion, the simulation includes recombination of vacancies and interstitials, clustering and re-emission from the clusters, and trapping of interstitials. We discuss the simulation of a typical room-temperature implant at 40 keV, 5{times}10{sup 13} cm{sup {minus}2} Si into (001)Si, followed by a high temperature (815{degree}C) anneal. The damage evolves into an excess of interstitials in the form of extended defects and with a total number close to the implanted dose. This result explains the success of the {open_quote}{open_quote}+1{close_quote}{close_quote} model, used to simulate transient diffusion of dopants after ion implantation. It is also in agreement with recent transmission electron microscopy observations of the number of interstitials stored in ...

1996-01-01

431

Atomistic calculations of ion implantation in Si: Point defect and transient enhanced diffusion phenomena  

International Nuclear Information System (INIS)

A new atomistic approach to Si device process simulation is presented. It is based on a Monte Carlo diffusion code coupled to a binary collision program. Besides diffusion, the simulation includes recombination of vacancies and interstitials, clustering and re-emission from the clusters, and trapping of interstitials. We discuss the simulation of a typical room-temperature implant at 40 keV, 5x10"1"3 cm"-"2 Si into (001)Si, followed by a high temperature (815 degree C) anneal. The damage evolves into an excess of interstitials in the form of extended defects and with a total number close to the implanted dose. This result explains the success of the open-quote open-quote+1 close-quote close-quote model, used to simulate transient diffusion of dopants after ion implantation. It is also in agreement with recent transmission electron microscopy observations of the number of interstitials stored in (311) defects. copyright 1996 ...

432

Annealing behavior of radiation damages in metal-silicides  

International Nuclear Information System (INIS)

The annealing behavior of the radiation damage in epitaxial Pd_2Si and NiSi_2 films on Si, due to the implantation of 100 keV Ar ions, is investigated by using the channeling technique with "4He ions. (U.K.).

433

Toward a predictive atomistic model of ion implantation and dopant diffusion in silicon  

Energy Technology Data Exchange (ETDEWEB)

We review the development and application of kinetic Monte Carlo simulations to investigate defect and dopant diffusion in ion implanted silicon. In these type of Monte Carlo models, defects and dopants are treated at the atomic scale, and move according to reaction rates given as input principles. These input parameters can be obtained from first principles calculations and/or empirical molecular dynamics simulations, or can be extracted from fits to experimental data. Time and length scales differing several orders of magnitude can be followed with this method, allowing for direct comparison with experiments. The different approaches are explained and some results presented.

1998-09-18

434

Reduced boron diffusion under interstitial injection in fluorine implanted silicon  

International Nuclear Information System (INIS)

Point defect injection studies are performed to investigate how fluorine implantation influences the diffusion of boron marker layers in both the vacancy-rich and interstitial-rich regions of the fluorine damage profile. A 185 keV, 2.3x10"1"5 cm"-"2 F"+ implant is made into silicon samples containing multiple boron marker layers and rapid thermal annealing is performed at 1000 deg. C for times of 15-120 s. The boron and fluorine profiles are characterized by secondary ion mass spectroscopy and the defect structures by transmission electron microscopy (TEM). Fluorine implanted samples surprisingly show less boron diffusion under interstitial injection than those under inert anneal. This effect is particularly noticeable for boron marker layers located in the interstitial-rich region of the fluorine damage profile and for short anneal times (15 s). TEM images show a band of dislocation loops around the range of the fluorine ...

2007-12-01

435

Randomization of heavily damaged regions in annealed low energy Ge{sup +}-implanted (0 0 1)Si  

Energy Technology Data Exchange (ETDEWEB)

Apparent growth of amorphous layers during low temperature annealing was observed in low energy Ge{sup +}-implanted (0 0 1)Si by high-resolution transmission electron microscopy. The occurrence of abnormal growth is due to the randomization of heavily damaged regions beneath the original amorphous/crystalline interfaces. The randomization process is attributed to the strain, incurred by the presence of a high density of large Ge atoms in the heavily damaged Si substrate, relaxation to lower the free energy of the systems. The randomization upon annealing may be fruitfully applied to minimize the transient enhanced diffusion in shallow junction formation.

2004-01-15

436

Randomization of heavily damaged regions in annealed low energy Ge"+-implanted (0 0 1)Si  

International Nuclear Information System (INIS)

Apparent growth of amorphous layers during low temperature annealing was observed in low energy Ge"+-implanted (0 0 1)Si by high-resolution transmission electron microscopy. The occurrence of abnormal growth is due to the randomization of heavily damaged regions beneath the original amorphous/crystalline interfaces. The randomization process is attributed to the strain, incurred by the presence of a high density of large Ge atoms in the heavily damaged Si substrate, relaxation to lower the free energy of the systems. The randomization upon annealing may be fruitfully applied to minimize the transient enhanced diffusion in shallow junction formation.

2004-01-01

437

Plasma source ion implantation of ammonia into electroplated chromium  

Energy Technology Data Exchange (ETDEWEB)

Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.

1995-02-01

438

Low temperature proton irradiation of amorphous Pd/sub 80/Si/sub 20/ prepared by ion implantation  

Energy Technology Data Exchange (ETDEWEB)

The damage induced by low-temperature proton irradiation in amorphous Pd/sub 80/Si/sub 20/ prepared by ion implantation is studied via electrical resistivity measurements. Our experimental results concerning the initial damage rate and the resistivity saturation are compared to the results obtained for electron and high energy /sup 16/O irradiation of amorphous Pd/sub 80/Si/sub 20/ quenched from the melt. The resistivity curve is analyzed in terms of irradiation-induced point defects.

1984-05-01

439

Implantation of single-impurity Fe and its magnetic coupling in Er studied by TDPAD  

Energy Technology Data Exchange (ETDEWEB)

Single Fe impurities were implanted in an Er single crystal and found to occupy both substitutional and interstitial sites, below a temperature of 200 K. The local susceptibility of Fe on both sites follows a Curie-Weiss law and exhibits a positive local Curie constant, indicating an antiferromagnetic coupling between the Fe and the surrounding Er moments. The corresponding nuclear spin relaxation rates follow a Korringa law as a function of temperature, confirming the dominance of local magnetism and the formation of local moments on each of the sites occupied by Fe.

2004-05-01

440

Implantation of an electronic system for real time neutron graphic images acquisition at the IPEN/CNEN Argonaut reactor  

International Nuclear Information System (INIS)

The aim of this work is the implantation and characterization of a neutron radiography system that uses an electronic device for attainment of images in real time, for its implementation in the nuclear research reactor Argonauta at IEN/CNEN (Nuclear Engineering Institute of the Brazilian Nuclear Energy Commission). The Electronic Imaging System in Real Time is composed by a scintillator screen for neutron, a video camera (CCD), a digital plate and a computer with specific computational programs for digital processing of the images. The System in installed real time is apt to carry through neutron radiography inspections of static and dynamic events of several types of samples. (author)

2004-04-01

441

Free electron laser (FEL) annealing of diamond  

International Nuclear Information System (INIS)

Free Electron Laser (FEL) with wide wavelength tunability has been developed and used for various applications. We report the structural-changes in P-ion-implanted diamond when we can achieve resonant excitation of the vibrations of specific bonds in the lattice of target (P-C) by using FEL. The change of property was analyzed by SIMS and Raman spectroscopy. After 5.8 #mu#m-FEL irradiation, we observed the crystallization of amorphous structure which was induced by P-ion-implantation. These results indicated the FEL annealing of diamond at room temperature. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)

1998-09-02

442

Effects of avalanche hole injection in fluorinated SiO[sub 2] MOS capacitors  

Energy Technology Data Exchange (ETDEWEB)

Significantly improved immunity to hot-hole damage of the SiO[sub 2]/Si structure is achieved by a shallow fluorine implantation into the poly-Si gate of MOS capacitors followed by a drive-in process. Compared to the nonfluorinated control, the fluorinated samples exhibit a dramatic reduction of both hole trapping probability and interface-trap generation under avalanche hole injection conditions. The degree of such an improvement increases monotonically as a function of the F implantation dose (up to 10[sup 16]/cm[sup 2]). Significant decrease of the hole detrapping rate is also observed in fluorinated samples. Possible mechanisms are discussed.

1993-04-01

443

Dextranomer/hyaluronic acid copolymer (Deflux) implants mimicking distal ureteral calculi on CT  

Energy Technology Data Exchange (ETDEWEB)

Periureteral or subtrigonal injection of dextranomer/hyaluronic acid (Dx/HA) copolymer (Deflux, Q-Med, Uppsala, Sweden) is an increasingly common endoscopic treatment for vesicoureteral reflux. We report a confusing radiographic finding of bilateral calcified Dx/HA injections initially thought to represent bilateral distal ureteral stones in a boy who presented with intermittent periumbilical pain. Urologists, radiologists, and emergency room physicians should be aware of the potential for calcification of ureteral implants of Dx/HA, and of the potentially confusing radiographic images that may result. (orig.)

2008-01-15

444

ch3 - NASA History Office  

Science.gov (United States)

Incoming solar energy had to be assimilated to sustain it. .... Roll stability was achieved with an Earth sensor mounted on the directional antenna. .... Once more a rocket becomes the means of producing a vector change in velocity. ...

445

Wildlife Monitoring Program Plan - NASA Technical Report Server (NTRS)  

Science.gov (United States)

Wildlife Monitoring System Schematic .......................... 40 ...... sentinel species - healthy fish are placed in an environment of water (where they arc not .... The way ir! which data for the fnre mdor study groups will be gathered tor managciacilt ...... Earth Resources Aircraft Program (ERAP) Camera ...

446

Transcriptome Profiling of a Toxic Dinoflagellate Reveals a Gene-Rich Protist and a Potential Impact on Gene Expression Due to Bacterial Presence  

UK PubMed Central (United Kingdom)

BackgroundDinoflagellates are unicellular, often photosynthetic protists that play a major role in the dynamics of the Earth's oceans and climate. Sequencing of dinoflagellate nuclear...Full Text Available

447

Topographic Map Creation  

Science.gov (United States)

In this activity, students create two- and three-dimensional maps by using a data grid of an imaginary section of Earth's surface. They are challenged to create six different maps of various surface features and answer questions about them.

2005-01-01

448

Time Travel Through A Trail Of ... - Near-Earth Object Program - NASA  

Science.gov (United States)

Dolores Beasley Headquarters, Washington, DC July 19, 2000 (Phone: 202/358- 1753) Bill Steigerwald Goddard Space Flight Center, Greenbelt, MD (Phone: ...

449

The Goddard Library - Goddard Projects Directory - NASA  

Science.gov (United States)

Oct 2, 2007 ... The Payload combines some of the most sensitive particle sensors .... provide state-of-the-art measurements of incoming x-ray, ultraviolet, .... It will be launched into a low-Earth orbit on a Delta 7320 rocket in September 2004. ...

450

Spatial confidentiality and GIS: re-engineering mortality locations from published maps about Hurricane Katrina  

UK PubMed Central (United Kingdom)

BackgroundGeographic Information Systems (GIS) can provide valuable insight into patterns of human activity. Online spatial display applications, such as Google Earth, can democratise...Full Text Available

451

Sociology and Space Development  

Science.gov (United States)

As the presence of humans in space expands in scope and duration, the quality of life in space as well as on Earth becomes pertinent. .... Military uses of space, such as the introduction of space-based laser or particle beam weapons, may have a major impact on the way people think and relate to .... AIAA Student Journal. ...

452

Selection of trends for recultivation of land in the Dnieper coal basin  

Energy Technology Data Exchange (ETDEWEB)

Types of disorders in the earth's surface as a result of open pit mining operations are analyzed. Trends for recultivation of lands are defined. Formulas are presented for calculating the economic expediency of the selected direction of recultivation.

1980-01-01

454

Satellite imagery in the study and forecast of malaria  

UK PubMed Central (United Kingdom)

More than 30 years ago, human beings looked back from the Moon to see the magnificent spectacle of Earth-rise. The technology that put us into space has since been used to assess the damage...Full Text Available

2002-02-07

455

Safety limits for utilization of secondary mining operations at deposits  

Energy Technology Data Exchange (ETDEWEB)

A procedure was developed to monitor boundaries within which secondary mining operations can be applied. Principal techniques include instrument and operative-remote observations of earth shifts and aerial photography of displacements on the surface of the trough.

1982-01-01

456

SUBMIT TO: AM105 CONFERENCE TITLE: Earth Observing Systems VI - NASA  

Science.gov (United States)

BAE SYSTEMS Infrared Imaging Systems. MS 209. 2 Forbes Road. Lexington, MA 02421 -7306. (781) 863-3762. (781) 863-4809 (fax) ken.overoye @lmco.com ...

457

SIERRA GORDA - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

ISS022, E, 8269, CHILE, OPEN PIT MINING OPERATIONS E. OF SIERRA GORDA, ROADS, DRAINAGE, -22.9, -69.1, 20091209. ISS022, E, 8270, CHILE, OPEN PIT MINING ...

458

Rocks, minerals, and a dusty world  

Energy Technology Data Exchange (ETDEWEB)

The Earth`s troposphere and hydrosphere contain abundant naturally generated dust. The ultimate source materials from which the terrestrially produced dust is generated are the various rock types exposed at the Earth`s surface. Natural dust is a composite of (1) lithic, primary mineral grains; (2) mineral grains formed by secondary chemical reactions; (3) volcanic ash and dust; (4) salts from sea sprays; (5) extra-terrestrial dust; and (6) biologic materials. In this paper the various pathways to the natural generation of dust (via the hydrologic cycle) will be discussed, and two geologically well-known natural dust sources will be described, paying particular attention to quantitative measurements of the dusts from these areas. General dust studies that provide data on possibly global background levels will be presented as well.. A few general aspects of the mineralogical characterization of dust particles and a discussion of some of the ...

1993-12-31

459

Ranger 8 - NASA - NSSDC - Spacecraft - Details  

Science.gov (United States)

5 days ago... Sun sensors, 2 secondary Sun sensors, and an Earth sensor. ... This continued intermittently until the rocket burn, at which time ... with incoming asymptotic direction at an angle of -13.6 degrees from the lunar equator. ...

460

Radioanalytical methods of rare earth element determination  

International Nuclear Information System (INIS)

Instrumental neutron activation analysis (INAA) and radionuclide X-ray fluorescence analysis (RXFA) were used for the determination of rare earth elements. For INAA, solution obtained by sample decomposition was dripped onto filter paper, enclosed and sealed into a polyethylene foil. The sample was activated in reactor WWR-S over a period of 4 to 6 hours with a neutron fluence of 10"1"3cm"-"2. Gamma radiation measurement was carried out with a planar and a coaxial HP-Ge detector in three decay periods. La, Ce, Nd, Sm, Eu, Gd, Tb, Ho, Tm, Yb and Lu were determined. The advantage of the method is its accuracy and high sensitivity, the disadvantage is the time-consuming analysis. The RXFA method was used as a rapid and operative method for the analysis of loose ore samples, aqueous and organic solutions of rare earth elements. For exciting X-ray radiation, "2"4"1Am was used and the radiation of K-lines was detected with a planar Si(Li) detector. ...

1989-06-01

461

Optical properties of rare earth sodium double molybdates Na[sub 5]RE(MoO[sub 4])[sub 4], RE=Pr, Nd, Eu  

Energy Technology Data Exchange (ETDEWEB)

Absorption and emission measurements at liquid-helium temperature, liquid-nitrogen temperature and room temperature have been performed on tetragonal scheelite-type rare earth sodium double molybdates Na[sub 5]RE(MoO[sub 4])[sub 4] and on RE-doped Na[sub 5]Gd(MoO[sub 4])[sub 4] samples. The rare earth occupies one single crystallographic position with S[sub 4] as point symmetry. The spectra were analysed according to the crystal field theory. From the experimental data, nearly complete energy level schemes of the Pr[sup 3+] and Nd[sup 3+], on the 4f [sup 2] and 4f [sup 3] configurations were derived. Very good correlation was obtained between the experimental and simulated energy level schemes, first for the approximated D[sub 2d] and then for the true S[sub 4] symmetries. The crystal field parameters vary smoothly with the atomic number of the rare earth, when compared with those determined previously for Eu[sup 3+] in the ...

1994-06-01

462

Optical Feshbach Resonances in Alkaline Earth Atoms  

Science.gov (United States)

Recent proposals have shown that a quantum degenerate gas of alkaline earth atoms can be used for a number of novel quantum computing and quantum simulation experiments. Strontium is a good candidate for such experiments because it can be controlled with high precision, as demonstrated in recent atomic clock experiments. Unfortunately, the small scattering length of strontium is not amenable to evaporative cooling techniques that are used to reach quantum degeneracy. Furthermore, increasing the scattering length of alkaline earths with a magnetic Feshbach resonance is not possible due to their spinless electronic ground state configuration. However, recent theoretical and experimental work suggests the possibility of changing scattering lengths in alkaline earths with laser light. Using this optical Feshbach resonance near strontium's narrow ^1S0->^3P1 intercombination transition might allow its scattering length to be ...

2009-10-01

463

Oil Leak from Damaged Well in Gulf of ... - NASA Earth Observatory  

Science.gov (United States)

Apr 25, 2010... oil per day were leaking from an oil well in the Gulf of Mexico in late April, following an explosion at an offshore drilling rig on April 20, 2010. ...

464

October 2010 Notes - Earth Science Data Systems Working Groups - NASA  

Science.gov (United States)

Federated Search (openSearch) (C. Lynnes); Infusion Process (S. Olding) Metrics Planning & Reporting (R. Ramapriyan); Service & Event Casting (B. Wilson) ...

465

Molecular determinants archetypical to the phylum Nematoda  

UK PubMed Central (United Kingdom)

BackgroundNematoda diverged from other animals between 600–1,200 million years ago and has become one of the most diverse animal phyla on earth. Most nematodes are free-living...Full Text Available

466

Medical fund took off like a rocket, but will budget bring it down to earth?  

UK PubMed Central (United Kingdom)

In 18 months the Canadian Medical Discoveries Fund (CMDF) has attracted investments worth $180 million to spend on biotechnology and medical research. Although eight initial investments totalled only...Full Text Available

1996-08-15

467

Mastacembelid eels support Lake Tanganyika as an evolutionary hotspot of diversification  

UK PubMed Central (United Kingdom)

BackgroundLake Tanganyika (LT) is the oldest of the African Rift Lakes and is one of the richest freshwater ecosystems on Earth, with high levels of faunal diversity and endemism....Full Text Available

468

Magnetic excitations studied with time-of-flight spectroscopy  

Energy Technology Data Exchange (ETDEWEB)

An introduction to time-of-flight neutron spectroscopy is presented in the context of the study of magnetic materials. Examples are taken from the class of rare earth and actinide magnetic materials known as `strongly correlated electron` systems. (author) 11 figs., 24 refs.

1996-11-01

469

ISS022-E-8261 - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

Features: CHUQUICAMATA, LARGE OPEN PIT MINING OPERATIONS, ROADS, HILLS Center Point Latitude: -22.3 Center Point Longitude: -68.9 (Negative numbers indicate ...

470

ISS022-E-8260 - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

Features: CHUQUICAMATA, LARGE OPEN PIT MINING OPERATIONS, ROADS, HILLS Center Point Latitude: -22.3 Center Point Longitude: -68.9 (Negative numbers indicate ...

471

Gross Thermodynamics of Heat Engines in Deep Interior of Earth  

UK PubMed Central (United Kingdom)

From the gross conservation laws of thermodynamics in a convecting material we derive a bound on the ratio of the rate of production of mechanical or magnetic energy to the rate of internal radioactive...Full Text Available

1975-04-01

472

Geophysical Remote Sensing - The Remote Sensing Tutorial - NASA  

Science.gov (United States)

It was thus actually the fourth stage of the rocket assembly. ... package, and several temperature sensors - was mounted in the cross-lattice frame. ... Earth's geomagnetic field and incoming charged particles from the Sun and extra-solar space. ...

473

GSFC Earth-Sun Exploration Division - Sciences and Exploration ...  

Science.gov (United States)

retrieve detailed aerosol and cloud particle size distribution and shape ...... but on rain types, and hydrometeor characteristics. ..... of ice streams, decreasing sea ice cover in the Arctic, poleward movement of forest cover, and ...

474

Frequently Asked ... - Precipitation Measurement Missions - NASA  

Science.gov (United States)

... say for sure if the signal is coming from hail, lots of graupel, or some other hydrometeor . ... Precipitation forms when cloud droplets or ice particles in clouds grow and .... A landslide is the movement of rock, debris, or earth down a slope. ...

475

Epilogue - GES DISC - NASA  

Science.gov (United States)

Sep 9, 2009... a French Ariane rocket successfully launched a new Earth-observing satellite ... The payload is a pair of identical sensors known as "high-resolution ... the resulting image) are activated simultaneously by incoming radiation; ...

476

EcoEarth.Info Environment Links: Water/Rivers  

Wastenet

... 03, 2001 | Rate It Lake Superior Streams http://www.lakesuperiorstreams.org/ (1 vote) interactively examine real-time water quality data from 5 ...north shore Lake Superior trout streams and learn about other streams in the region, how they \\

477

Earth and Environment: murray_dobbie_morris  

Wastenet

... In recent years workers in this field have focused on nucleation by nano-porous materials . This was in part motivated by a theoretical study by Page and Sear (2006) who proposed a two step model for nucleation in pores which suggest that there is ...

478

Earth and Environment: Person detail  

Wastenet

...October 2006 - present: University of Leeds, UK PhD Candidate in Geochemistry Thesis Title: Magnetite formation in reducing natural environments Supervisors: Dr Liane G. Benning ...Germany Bachelor of Science in Geosciences and Astrophysics Project Details Project Title: \\

479

ESW 2009: The Ocean's Green Machines  

National Aeronautics and Space Administration (NASA)

One tiny marine plant makes life on Earth possible: phytoplankton. These microscopic photosynthetic drifters form the basis of the marine food web, they regulate carbon in the atmosphere, and are responsible for half of the photosynthesis that takes place on this planet.

2010-03-10

480

Combining Google Earth and GIS mapping technologies in a dengue surveillance system for developing countries  

UK PubMed Central (United Kingdom)

BackgroundDengue fever is a mosquito-borne illness that places significant burden on tropical developing countries with unplanned urbanization. A surveillance system using Google...Full Text Available

481

Charge transfer transitions and location of the rare earth ion energy levels in Ca-#alpha#-SiAlON  

International Nuclear Information System (INIS)

The broad bands in the room-temperature excitation spectra of Sm"3"+-, Dy"3"+- and Tm"3"+-activated Ca-#alpha#-SiAlON phosphors are interpreted as the N"3"--to-rare earth charge transfer transition (CTT). From the energies of the charge transfer transitions and from the optical data presented for the Eu"2"+ ion, the location of the divalent rare earth ion energy levels relative to the valence and the conduction band of Ca-#alpha#-SiAlON is derived. The salient features of the energy-level diagram are shown to be practical in explaining the temperature-dependent variations of the Eu"2"+ and Yb"2"+ luminescence efficiency in Ca-#alpha#-SiAlON. A comparative study pertaining to the nature of the Yb"2"+ and Eu"2"+ ion luminescence in Ca-#alpha#-SiAlON and in SrSi_2O_2N_2 is presented. A tentative energy-level diagram of the trivalent rare earth ions in Ca-#alpha#-SiAlON is also constructed.

2009-06-01

482

Characterization of psychrotrophic microorganisms producing beta-galactosidase activities.  

UK PubMed Central (United Kingdom)

Investigations of psychrotrophic microorganisms have been limited even though the dominant environment of the Earth is cold and enzymes with high activities at low temperatures could have commercial...Full Text Available

1994-01-01

483

CY00 Annual Report - NASA's History Office  

Science.gov (United States)

is approximately 327000 km from the Earth's center (58000 km from the Moon's ...... source (figure 7-4). NEXT developed funding requirements for those ...... Code SF 2. 2101 NASA Rd. 1. Houston, TX 77058. Phone: (281) 483-7224 ...

484

CHUQUICAMATA - The Gateway to Astronaut Photography of Earth  

Science.gov (United States)

ISS022, E, 8260, CHILE, CHUQUICAMATA, LARGE OPEN PIT MINING OPERATIONS, ROADS, HILLS, -22.3, -68.9, 20091209. ISS022, E, 8261, CHILE, CHUQUICAMATA, ...

485

Astronaut Jeff Williams Answers Your Questions  

National Aeronautics and Space Administration (NASA)

Expedition 22 Commander Jeff Williams, aboard the International Space Station 220 miles above Earth, responds to questions posted on YouTube concerning the station's orientation, life in space and the recent butterfly experiment.

2010-03-10

486

Asia - Goddard Earth Science Data and Information Services Center ...  

Science.gov (United States)

Sep 9, 2009 ... You are here: GES DISC Home Geomorphology from Space By Location Landforms by Location: Asia. Info. Landforms by Location: Asia. KEY, ASIA ...

487

Aluminium. Health and Environmental Hazards.  

Science.gov (United States)

Aluminium is an abundant metal consisting about 8 per cent of the earth's crust. It has long been considered as essentially nontoxic and nonabsorbable from the gastrointestinal tract. More recent studies have, however, due to better analytical capabilitie...

1982-01-01

488

AVISO and PODAAC User Handbook IGDR and GDR Jason Products - NASA  

Science.gov (United States)

An ascending node occurs when the subsatellite point crosses the earth's equator going from .... 11dB sigma-naught. This error budget includes the altimeter noise, ...... it is also recommended to filter the data as follows to ...

489

APOD: 2011 January 25 - The Rippled Red Ribbons of SNR 0509  

Science.gov (United States)

blast should have passed the Earth? Like: Follow APOD on Facebook Tomorrow's picture: whirlpool dust < | Archive | Index | Search | Calendar | RSS | Education | About APOD |...

2011-10-07

490

29 CFR 1926.602 - Material handling equipment.  

Science.gov (United States)

...Pneumatic-tired earth-moving haulage equipment (trucks, scrapers, tractors...Pneumatic-Tired Earthmoving Haulage Equipment. An employer may, of course...pneumatic-tired earthmoving haulage equipment, is suspended pending...

2009-07-01

491

Plasma-based ion implantation and deposition: A review of physics,technology, and applications  

Energy Technology Data Exchange (ETDEWEB)

After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and ...

2005-05-16

492

Defect engineering via ion implantation to control B diffusion in Si  

International Nuclear Information System (INIS)

The processes which are currently studied in the fabrication of B-doped ultra shallow junctions (USJ) usually involve a preamorphization step to reduce B channelling effect during implantation and to improve B electrical activation. At this stage a high amount of Si interstitial atoms (Is), which dramatically increases the B diffusivity, is introduced. The introduction of voids in Si is a promising tool to control B transient enhanced diffusion (TED), because of their ability to capture Is. In this work the efficiency of a cavity band to reduce B TED is checked in silicon interstitial supersaturation conditions, obtained by high dose Si implantation. He is implanted either at 10 keV or at 50 keV with a fluence of 5 x 10"1"6 cm"-"2. Conventional techniques to introduce and activate the B (conventional ion implantation and rapid thermal annealing (RTA)) are applied in order to have a better control of the ...

2009-03-15

493

Characterization and wear tests of steel surfaces implanted with oxygen, aluminum, and carbon dioxide  

Energy Technology Data Exchange (ETDEWEB)

A number of screening tests were performed to determine ion species that effectively reduce wear rates when implanted in four industrial steels. Ball bearing steel 100Cr6 (AISI 52100) showed a wear rate reduction by a factor of 20 when implanted with carbon dioxide to a dose of 5x10{sup 17} cm{sup -2} with a non-mass-separated ion beam and by a factor of {>=}20 when implanted with 5x10{sup 17} cm{sup -2} oxygen ions. For the ferritic and martensite steels X90CrMoV18 (AISI 440B, unhardened and hardened) also a strong wear reduction after implantation of oxygen ions was found. Co-implantation of aluminum and oxygen also reduces wear rates of X90CrMoV18, of S6-5-2 (AISI M2), and of 100Cr6, respectively. For comparison, thin oxide layers were grown in a low-temperature thermal oxidation process. These experiments also yielded reduced wear rates by a factor of 10. The surfaces were ...

1991-07-01

494

Boron depth profiles and residual damage following rapid thermal annealing of low-temperature BSi molecular ion implantation in silicon  

Energy Technology Data Exchange (ETDEWEB)

The influence of substrate temperature on both the implantation and post-annealing characteristics of molecular-ion-implanted 5 x 10{sup 14} cm{sup -2} 77 keV BSi in silicon was investigated in terms of boron depth profiles and damage microstructures. The substrate temperatures under investigation consisted of room temperature (RT) and liquid nitrogen temperature (LT). Post-annealing treatments were performed using rapid thermal annealing (RTA) at 1050 deg, C for 25 s. Boron depth profiles and damage microstructures in both the as-implanted and as-annealed specimens were determined using secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM), respectively. The as-implanted results revealed that, compared to the RT specimen, the LT specimen yields a shallower boron depth profile with a reduced tail into the bulk. An amorphous layer containing a smooth amorphous-to-crystalline ...

2007-08-15

495

Spectroscopic study of rare earth chromates: relation to the structure  

International Nuclear Information System (INIS)

The luminescence spectra of trivalent europium ion embedded in various rare earth chromates were analysed. The spectroscopic data in most of chromates are in agreement with the structural determination but for some others the discrepancy between two methods is underlined. Energy level schemes were deducted from the experimental emission spectra and the crystal field simulation has been performed. The maximum splitting of the "7F_1 manifold of the Eu"3"+ ion as a function of N_v, the so-called crystal field strength parameter, is given. This allows us to classify the compounds according to their crystal field extent. (author)

1996-03-24

496

Space activities in the Bolivarian Republic of Venezuela  

British Library Electronic Table of Contents (United Kingdom)

This paper summarizes the establishment and current development of space activities in the Bolivarian Republic of Venezuela. Space activities in Venezuela are focused on the areas of telecommunications, Earth observation and research on the physical properties of the Earth, and have as a primary goal the satisfaction of social needs. Current development of space activities started in 1999 when the new National Constitution recognized the value of outer space as the common heritage of mankind, and the key role of science and technology in promoting human welfare. The Bolivarian Agency for Space Activities (ABAE) was created in 2007. Its legal framework recognizes three key elements that drive its policy: the participation of society, capacity building and human training, and international c...

2011-01-01

497

Simulation of statistical {gamma}-spectra of highly excited rare earth nuclei  

Energy Technology Data Exchange (ETDEWEB)

The statistical {gamma}-spectra of highly excited even-even rare earth nuclei are simulated applying appropriate level density and strength function to a given nucleus. Hindrance effects due to K-conservation are taken into account. Simulations are compared to experimental data from the {sup 163}Dy({sup 3}He,{alpha}){sup 162}Dy and {sup 173}Yb({sup 3}He,{alpha}){sup 172}Yb reactions. The influence of the K quantum number at higher energies is discussed. 21 refs., 7 figs., 2 tabs.

1997-05-01

498

Remote sensing of the atmosphere by resonance Raman LIDAR  

Energy Technology Data Exchange (ETDEWEB)

When in resonance, Raman scattering exhibits strong enhancement ranging from four to six orders of magnitude. This physical phenomenon has been applied to remote sensing of the Earth`s atmosphere. With a 16 inch Cassegrain telescope and spectrometer/ CCD-detector system, 70-150 ppm-m of SO{sub 2} in the atmosphere has been detected at a distance of 0.5 kilometer. This system can be used to detect/monitor chemical effluence in the atmosphere by their unique Raman fingerprints. Experimental result together with detailed resonance Raman and atmospheric laser propagation effects will be discussed.

1994-12-01

499

Radon concentration measurements in the presence of water and its consequences for Earth sciences studies  

Energy Technology Data Exchange (ETDEWEB)

Radon is often used as a natural tracer for geochemical studies. In many cases radon interacts with water. The aim of this study is to assess the time required for radon to dissolve in water and reciprocally to degas from it, and to estimate the partition ratio between the two phases. A special setup has been devised and built for this purpose. Several experiments carried out with this equipment show that both dissolution and degassing are rapidly achieved phenomena. The qualitative consequence of these results in the field of Earth science are shortly discussed in the paper.

2005-06-01

500

Preparation of poly (aryl ether ketones) in the presence of an alkali, alkaline earth of lanthanide metal salt  

Energy Technology Data Exchange (ETDEWEB)

This patent describes a process for preparing poly(aryl ether ketones) by nucleophilic displacement polymerization in the presence of at least one alkali metal base selected from potassium, rubidium or cesium, and fluoride ions, which comprises adding to the polymerization: (a) an effective amount of at least one metal salt selected from lithium, sodium, alkaline earth or lanthanide chloride, bromide, iodide, sulfate, alkyl or aryl carboxylate, cyanide, borate or phosphate to slow or stop advancement of molecular weight and (b) an end-capping agent.

1988-09-27