High Purity Beryllium Production
International Science & Technology Center (ISTC)
Production of High-Purity (>99.99% wt.) Condensed Beryllium
GaAs Blocked-Impurity-Band Detectors for Far-Infrared Astronomy
Energy Technology Data Exchange (ETDEWEB)
High-purity and doped GaAs films have been grown by Liquid-phase epitaxy (LPE) for development of a blocked impurity band (BIB) detector for far-infrared radiation. The film growth process developed has resulted in the capability to grow GaAs with a net active impurity concentration below 1 x 10{sup 13} cm{sup -3}, ideal for the blocking layer of the BIB detector. The growth of n-type LPE GaAs films with donor concentrations below the metal-insulator transition, as required for the absorbing layer of a BIB detector, has been achieved. The control of the donor concentration, however, was found to be insufficient for detector production. The growth by LPE of a high-purity film onto a commercially grown vapor-phase epitaxial (VPE) n-type GaAs doped absorbing layer resulted in a BIB device that showed a significant reduction in the low-temperature dark current compared to the absorbing layer only. Extended ...
2004-12-21
NASA 11x:/,3 '/t.z- - NASA Technical Reports Server
_! Packaging, Cleanlines_, Preparation j Handling ..... 35. 'I. 40. WATER ................ , ......... Sterile, High Purity, Ethylene Glycol-Water Solutions. Requirement For . ...
Energy Technology Data Exchange (ETDEWEB)
A high-purity, intense, fast-neutron source has been developed at our laboratory. We describe two inexpensive, straightforward methods of determining the total number of neutrons produced and we review precautions to be taken in applying these methods. (orig.).
1997-04-01
International Nuclear Information System (INIS)
In recent years intergranular stress corrosion cracking has occurred world-wide in the shrink-fitted discs of low pressure turbine rotors made of low alloy steels. Only in a few cases steam impurities such as NaOH, Na_2CO_3, Na_2SO_4, H_2S or NaCl, which initiate SCC, could be found. To clarify the SCC-behaviour experiments on turbine disc steels with different chemical compositions and yield strength were performed in high purity water. The results show, that chemical composition has no effect on the crack initiation. Under high purity water conditions no crack initiation due to stress corrosion cracking is observed on the steel with a yield strength of 850 N/mm"2. On the steel with a yield strength of 1250 N/mm"2 which is not used in service, crack initiation occurs in pure water. But if sharp cracks already exist, crack propagation occurs in both cases. The investigations showed, that stress ...
Reducing the costs of ultrapure water production - a case study
Energy Technology Data Exchange (ETDEWEB)
The 380 MW combined cycle gas turbine power station in Peterborough changed its water supply from town mains to high purity reverse osmosis permeate in October 2000. The high purity water is produced from secondary treated sewage effluent using advanced membrane technology. Alpheus Environmental and British Gas staff have recently completed a study of the power station's demineralization plant to identify the differences in operating costs associated with the change in feedwater. The results show that the ultrapure water produced after the change to a high purity feed is of improved quality and that the demineralization plant regeneration operating costs have been reduced by over 90%. The demineralization plant availability has increased from 78 to 98% enabling almost 20% more ultra pure water to be produced. The change in feedwater has also improved ...
2002-02-01
Influence of carbon and nitrogen on corrosion resistance of high purity Fe-50mass% Cr alloys
International Nuclear Information System (INIS)
High purity Fe-50mass%Cr alloys containing (C+N) in the range of 30 to 500 mass ppm were prepared and their corrosion resistance was investigated. Pitting potential in a 3.5mass%NaCl solution at 343K rose with reducing (C+N) content. Alloys containing (C+N) at less than 100 mass ppm did not sustain pitting corrosion. However, alloys containing 500 mass ppm (C+N) corroded severely in 6%FeCl_3+1/20N HCl solutions. Heat treatment at 923K was recognized as influencing corrosion resistance due to precipitation of carbonitrides only in the case of the alloy containing 500 mass ppm (C+N). (orig.).
Effects of Yttrium Microalloying on the Epitaxial Grain Growth ...
... Accession Number : ADA137272. Title : Effects of Yttrium Microalloying on the Epitaxial Grain Growth in Ti-6Al-4V Weld Fusion Zones. ...
1983-10-01
UK PubMed Central (United Kingdom)
When high-purity copper (≥99.98%wt) is melted, held in its liquid state for a few hours with iterative thermal cycling, then allowed to resolidify, the ingot surface is found to have...Full Text Available
2009-12-24
Neutron-induced changes in optical properties of MgAl{sub 2}O{sub 4} spinel
Energy Technology Data Exchange (ETDEWEB)
High purity MgAl{sub 2}O{sub 4} spinel specimens irradiated in FFTF-MOTA to very high exposure have been examined by three techniques to determine changes in their optical properties. Significant changes were observed in optical absorption, photoluminescence and radioluminescence.
1994-09-01
Measurement of the half-life of "1"0"1Mo
International Nuclear Information System (INIS)
"1"0"1Mo is an important radionuclide to determine the burn-up of nuclear fuels, but its half-life reference values had marked differences. It is described in detail the principles and processes of the position normalization method by two high purity germanium detectors to determinate the half-life of "1"0"1Mo. (authors)
2006-11-01
International Nuclear Information System (INIS)
Large, complex, high purity ceramic shapes are required by a variety of emerging technologies for their electrical insulation and high temperature strength properties coupled with their refractoriness and purity. Ceramic sealant bonding, using crystalline and vitreous sealant materials, has recently shown significant potential for joining technical ceramics to form the required shapes. Materials and techniques for joining technical ceramics including alumina, magnesia, zirconia and thoria are discussed. (orig.).
International Nuclear Information System (INIS)
The purpose of this study was to reveal the mechanism of wafer touch polishing using a high purity colloidal silica slurry containing organic surfactants such as hydroxyl-ethyl cellulose. The effect of the surfactant concentration on wafer touch polishing was studied to improve the roughness of wafer surfaces after polishing. The haze level and the micro-roughness decreased with decreasing surfactant concentration.
2006-04-01
Effect of aging on the pitting corrosion behavior in Al-Li alloys
Energy Technology Data Exchange (ETDEWEB)
In the present work, electrochemical measurements and corrosion tests in NaCl solutions were carried out to study the effect of aging treatments on pitting corrosion behavior in a 8090 alloy and its high purity Al-Li binary alloy analogue. The pitting corrosion characteristics and corrosion resistance of the 8090 alloy have been determined in relation to precipitation microstructures. (orig.).
1990-06-01
Recycling of AZ31 Mg alloy with high purity Mg deposition layer by hot working (solid recycling)
Energy Technology Data Exchange (ETDEWEB)
Solid recycling of AZ31 Mg alloy with vapor deposition coating layer of high purity Mg was evaluated. In the open die forging experiments, two AZ31 Mg alloy specimens with the pure Mg layer were sufficiently bonded by forging at 673 K. Furthermore, the Al and Zn of the AZ31 substrate diffused up to the center of the pure Mg layer. By the theoretical analysis, it is suggested that the grain boundary diffusion enhanced by grain refinement due to hot forging contributes to the solid state bonding of the specimens. Also, the solid recycled specimen was fabricated from the AZ31 Mg substrate with pure Mg layer by hot extrusion at 673 K. The solid recycled specimen showed almost the same tensile properties as the virgin extruded specimen. This is probably related not only to the grain boundary diffusion but also severe plastic deformation by hot extrusion. (orig.)
2003-07-01
Stress corrosion cracking of Alloy 600 using the constant strain rate test
International Nuclear Information System (INIS)
Nuclear grade production tubing of Alloy 600 was evaluated for stress corrosion cracking (SCC) susceptibility in high purity water at 365, 345, 325, and 290 C. Reverse tube U-bend specimens provided crack initiation data and constant extension rate tests were employed to determine the crack velocities experienced in th crack propagation stage. Initial results indicate that a linear extrapolation of data received from high temperature tests can be used to predict the service life of steam generator tubing that has been plastically deformed or is continually deforming by ''denting.''.
Production of pure yellow cake by ion-exchange processes employing sulphate elution
International Nuclear Information System (INIS)
Recovery of uranium by ion-exchange processes from impure acid leach liquors is described, which produce a concentrated and pure eluate employing 10% sulphuric acid elution. In situations where resin is loaded to 45 g/ltr or more the acid consumption at ambient temperature is less than 4 kg of H_2SO_4 per kilogram of U_3O_8. Precipitation with an alkali such as ammonia or magnesia produces a yellow cake of high purity. (author).
1979-06-08
Etching characteristics of high-purity aluminum in hydrochloric acid solutions
Energy Technology Data Exchange (ETDEWEB)
We investigated the effects of additives to the etching solution of 1 M hydrochloric acid on the electrochemical etching behavior for aluminum electrolytic capacitors, using scanning and transmission electron microscopy, and AC impedance spectroscopy. For the addition of 1 M sulfuric acid or 5% ethylene glycol to the hydrochloric acid solution, the distribution of etch tunnels was more uniform with high density of etch pits compared with that without addition. The highest specific surface area was obtained from the electrolyte with 5% ethylene glycol additive. The correlation of internal morphologies of etched foils with impedance parameters was interpreted by impedance techniques.
2007-03-25
Effect of porosity on the superplasticity of an alumina
Energy Technology Data Exchange (ETDEWEB)
To evaluate the effect of porosity on superplasticity behavior, it is essential to use materials of similar initial grain sizes. This can be achieved by HIPing, which provides an effective way of reducing initial porosity while avoiding appreciable grain growth; various levels of porosity can be achieved for similar grain sizes. This note is concerned with the influence of porosity on superplasticity tensile deformation of a fine grained high-purity alumina doped with copper oxide and containing a grain growth inhibitor. Specimens were prepared by slip casting to net-shape and sintering; some presintered specimens were HIPed to reduce porosity. The subsequent superplasticity behavior is related to porosity in the material.
1994-02-01
Discharging-ionization of tellurium in nitric acid electrolytes in the presence of tartrate ions
The authors investigated the influence of tartaric acid, which possesses complex-forming properties. In order to establish the optimum system of possible refinement of tellurium, the authors study the kinetics of both the cathodic and the anodic processes. The investigation of processes of discharging-ionization of tellurium from nitric acid electrolytes in the presence of tartrate ions showed the possibility of preparing a nitric-tartaric acid electrolyte which can be used for commercial purposes and from which a high-purity raffinate was obtained from technical tellurium.
1986-03-20
Energy Technology Data Exchange (ETDEWEB)
The CASTOC project addresses environmentally assisted cracking (EAC) phenomena in low alloy steels used for pressure boundary components in both Western type boiling water reactors (BWR) and Russian type pressurised water reactors (VVER). It comprises the four work packages (WP): inter-laboratory comparison test (WP1); EAC behaviour under static load (WP2), EAC behaviour under cyclic load and load transients (WP3); evaluation of the results with regard to their relevance for components in practice (WP4). The use of sophisticated test facilities and measurement techniques for the on-line detection of crack advances have provided a more detailed understanding of the mechanisms of environmentally assisted cracking and provided quantitative data of crack growth rates as a function of loading events and time, respectively. The effect of several major parameters controlling EAC was investigated with particular emphasis on the transferability of the results to components in service. The ...
2004-07-01
Aspects of the contamination with oxygen in obtaining low enriched uranium fuel
International Nuclear Information System (INIS)
The manufacturing of TRIGA fuel rods with low enriched uranium follows in principle the same route as high-enriched uranium. The high purity of the primary metals (uranium, zirconium and erbium) is important for determining the equilibrium metal-hydrogen phases. The impurities from the metal, on the surface and from hydrogen may have an important influence on the hydriding process. This paper presents the aspects of the fuel contamination with oxygen during the manufacturing process of the low enriched uranium fuel. The continuous control of the oxygen concentration in the working zone ensures avoidance of the accidental contamination. Key words: manufacturing, fuel, oxygen, contamination. (authors)
2009-10-12
International Nuclear Information System (INIS)
Engineering ceramics have excellent properties such as high strength, high hardness and high heat resistance compared with metallic materials. To apply the ceramic in fast reactor environment, it is necessary to evaluate the sodium compatibility and the influence of sodium on the mechanical properties of ceramics. In this study, the influence of high temperature sodium on the mechanical properties of sintered ceramics of conventional and high purity Al_2O_3, SiC, SiAlON, AlN and unidirectional solidified ceramics of Al_2O_3/YAG eutectic composite were investigated by means of flexure tests. Test specimens were exposed in liquid sodium at 823K and 923K for 3.6Ms. There were no changes in the flexural strength of the conventional and high purity Al_2O_3, AlN and Al_2O_3/YAG eutectic composite after the sodium exposure at 823K. On the contrary, the decrease in the flexural strength was observed in SiC and ...
By gas-source molecular-beam epitaxy, we obtained a device-quality GaInP epitaxial layer lattice matched to (100)-GaAs substrates, with a photoluminescence efficiency comparable to that of a crystal grown by liquid-phase epitaxy. A GaInP/AlInP double heterostructure laser with a GaInP active layer was fabricated, and pulsed lasing operation was achieved at room temperature for, we believe, the first time.
1989-11-01
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films
Energy Technology Data Exchange (ETDEWEB)
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films are investigated using Rutherford backscattering and channelling techniques. Epitaxial growth of Pd/sub 2/Si films was observed at room temperature by argon ion implantation into as-deposited Pd/Si(111) structures and furnace-annealed Pd/sub 2/Si(polycrystalline)/Pd/sub 2/Si(epitaxial)/Si(111) structures. Some additional experiments to check the growth mechanisms are also presented, in which the implantation energies, substrate orientations and dose rates were changed. Finally, the stability of the ion-beam-induced epitaxial Pd/sub 2/Si films on subsequent furnace annealing is studied.
1982-06-11
Growth meachnisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films
Energy Technology Data Exchange (ETDEWEB)
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films are investigated using Rutherford backscattering and channelling techniques. Epitaxial growth of Pd/sub 2/Si films was observed at room temperature by argon ion implantation into as-deposited Pd/Si(111) structures and furnace-annealed Pd/sub 2/Si(polycrystalline)/Pd/sub 2/Si(epitaxial)/Si(111) structures. Some additional experiments to check the growth mechanisms are also presented, in which the implantation energies, substrate orientations and dose rates were changed. Finally, the stability of the ion-beam-induced epitaxial Pd/sub 2/Si films on subsequent furnace annealing is studied.
1982-06-11
Energy Technology Data Exchange (ETDEWEB)
The use of high-performance ion exchangers allows a trace-matrix-separation (SMT) directly followed by an ion chromatographic (IC) separation of the analytes. Based on the principles described in Part 1, a combined procedure IC-SMT-IC for metallic impurities in Mo and W is presented. Up to 12 metal traces (Fe, Cu, Pb, Zn, Ni, Co, Cd, Ca, Mn, Sr, Mg and Ba) can be determined in one run with 35 min. A special method for traces of U and Th is also given. Detection limits are typically 10-100 ng g{sup -1} in the metal sample. (author). 14 refs.; 10 figs.; 6 tabs.
1992-01-31
Energy Technology Data Exchange (ETDEWEB)
Elemental analysis of some medicinal plants used in the Indian Ayurvedic system was performed by employing instrumental neutron activation analysis (INAA) and atomic absorption spectroscopy (AAS) techniques. The samples were irradiated with thermal neutrons in a nuclear reactor and the induced activity was counted by gamma ray spectrometry using an efficiency calibrated high resolution high purity germanium (HPGe) detector. Most of the medicinal plants were found to be rich in one or more of the elements under study. The variation in elemental concentration in same medicinal plants samples collected in summer, winter and rainy seasons was studied and the biological effects of these elements on human beings are discussed. (orig.)
2009-07-01
British Library Electronic Table of Contents (United Kingdom)
Size-controllable Ag nanoparticle ultrathin films, which were fabricated by vacuum deposition method from high purity Ag wire onto cleaned indium tin oxide conducting glass, have different color fabricated by variation of preparation conditions. The UV/Vis spectra showed that optical absorption peak of these Ag nanoparticle films can be tuned in a range from 457nm to >650nm. Scanning electron microscopy images showed that with increasing film thickness Ag particle size was larger. Ag/WO3 composite films were prepared by cathodic electrodeposition of WO3 onto the surface of Ag nanoparticle films. Spectroelectrochemistry and electrochromic properties of the resulting composite films were characterized. It was found that the electrochemical and electrochromatic properties of the composite fil...
2010-01-01
Energy Technology Data Exchange (ETDEWEB)
Ag nanoparticles were prepared in a water-phase system with a mixture of silver-ammonia complex, sodium borohydride, and lauric acid according to molar feed ratio of approximately 6:3:1. The mechanism of preparation and separation by chemical reduction-protection method was explored. The as-synthesized Ag nanoparticles were characterized by transmission electron microscopy (TEM), X-ray diffraction (XRD) and UV-vis spectroscopy, respectively. It was found that the size of high purity Ag particles was ranging from 30 to 50 nm with slight agglomeration. In addition, the as-synthesized wet Ag nanoparticles were dispersed stably in organic vehicle to formulate electrically conductive nanopaste. Upon direct-written and sintered, the array pattern of the nanopaste with the resolution of about 30 {mu}m was achieved with the electrical resistivity in the order of magnitude of 10{sup -5} {Omega} cm.
2010-04-02
Separation of rubidium from irradiated aluminum-encapsulated uranium
International Nuclear Information System (INIS)
A procedure was developed for separating rubidium from irradiated aluminum encapsulated uranium. The separations procedure produces a final ultra-high purity RbCl product for subsequent high performance mass spectrometric analysis. The procedure involves first removing most of the macro-components and fission products by strong base anion exchange using, first, concentrated HCl, then oxalic acid media and second, selectively separating rubidium from alkaline-earth ions and other alkali-metal ions, including cesium, using Bio-Rex-40 cation-exchange resin. The resultant RbCl is then put through a final vacuum sublimation step. Ultra-pure reagents and specially clean glassware are used throughout the procedure to minimize contamination by naturally-occurring rubidium.
1993-05-01
Separation of rubidium from irradiated aluminum-encapsulated uranium
Energy Technology Data Exchange (ETDEWEB)
A procedure was developed for separating rubidium from irradiated aluminum encapsulated uranium. The separations procedure produces a final ultra-high purity RbCl product for subsequent high performance mass spectrometric analysis. The procedure involves first removing most of the macro-components and fission products by strong base anion exchange using, first, concentrated HCl, then oxalic acid media and second, selectively separating rubidium from alkaline-earth ions and other alkali-metal ions, including cesium, using Bio-Rex-40 cation-exchange resin. The resultant RbCl is then put through a final vacuum sublimation step. Ultra-pure reagents and specially clean glassware are used throughout the procedure to minimize contamination by naturally-occurring rubidium.
1982-01-01
Energy Technology Data Exchange (ETDEWEB)
Passive films formed on stainless steels in a borate buffer solution (pH 9.2) have been investigated by capacitance measurements and photoelectrochemistry. The study was carried out on films formed on AISI type 304 and 316 stainless steels and high purity alloys with differing chromium, nickel, and molybdenum contents. Complementary research by Auger analysis shows that the passive films are composed essentially of an inner chromium region in contact with the metallic substrate and an outer iron oxide region developed at the film/electrolyte interface. The semiconducting properties of the passive films are determined by those of the constituent chromium and iron oxides which are of p-type and n-type, respectively. Thus the influence of the alloying elements on the semiconducting properties of the passive films is explained by changes in the electronic structure of each of these two oxide regions.
1998-11-01
Energy Technology Data Exchange (ETDEWEB)
From their genesis by weathering and sedimentation, bauxites, the principal aluminium ores, contain appreciable amounts of uranium and thorium. High resolution gamma spectrometry with a high purity germanium detector was used for an analysis of four industrially used bauxites from Gondama, Sierra Leone; Boke, Guinea; Weipa, Queensland, Australia; Gove, Northern Territory, Australia. Significant differences in uranium to thorium ratios and in activities of the uranium and thorium daughters were observed for the four bauxites. It was found that the bauxite from Gondama, Sierra Leone has an activity of only 10% compared with the others. Red mud tailings from such a bauxite may well be used as an additive to bricks, which is now illegal for normal red mud from more active bauxites. (author).
1992-01-01
International Nuclear Information System (INIS)
From their genesis by weathering and sedimentation, bauxites, the principal aluminium ores, contain appreciable amounts of uranium and thorium. High resolution gamma spectrometry with a high purity germanium detector was used for an analysis of four industrially used bauxites from Gondama, Sierra Leone; Boke, Guinea; Weipa, Queensland, Australia; Gove, Northern Territory, Australia. Significant differences in uranium to thorium ratios and in activities of the uranium and thorium daughters were observed for the four bauxites. It was found that the bauxite from Gondama, Sierra Leone has an activity of only 10% compared with the others. Red mud tailings from such a bauxite may well be used as an additive to bricks, which is now illegal for normal red mud from more active bauxites. (author).
Formation conditions, chloride content, and stability of passive films on an iron-chromium alloy
Energy Technology Data Exchange (ETDEWEB)
Passive films were formed on a high purity Fe-23 Cr alloy in acid sulfate solutions in the presence and absence of chloride ion. The resulting film composition was investigated by Auger depth profiling. The passivated samples were exposed to a 1M NaCl solution at a constant potential slightly above the critical pitting potential, and the current-time transient was measured in order to compare the relative stability of the different films. The results obtained suggest that the formation conditions influence the chloride content of the passive film and the breakdown behavior. Passive films formed in the presence of chloride contain and are slightly less stable towards breakdown. No chloride was found in films formed in sulfate and subsequently exposed to chloride well below the pitting potential.
1993-07-01
Fission neutron damage rates and efficiencies in several metals
International Nuclear Information System (INIS)
Initial rates of resistivity-measured low-temperature damage production by fission-spectrum fast neutrons have been determined for 14 metals in the same very well characterized irradiation facility. Six of these metals were fcc, 5 bcc, and 3 hcp. Most were of quite high purity. Observed damage rates, after correction for all known extraneous resistivity-producing effects, were compared with rates predicted by the damage calculation code RECOIL, using parameters chosen from the literature. These parameters, effective displacement threshold energy, E/sub d/, and Frenkel-pair resistivity, rho/sub F/, were in many cases only best estimates, the further refinement of which may be aided by the present results. Damage efficiencies (measured/predicted rates) follow the same trends by crystal classes as seen in other fast-neutron studies.
2003-04-01
International Nuclear Information System (INIS)
#alpha#/#beta# sialon based composites containing silicon nitride whisker and silicon carbide platelet were fabricated by hot pressing. Effect of the reinforcing agents on the #alpha# to #beta# phase transformation of the sialon as well as on the mechanical properties was investigated. Silicon nitride whisker and silicon carbide platelet promoted the phase transformation. TEM/EDS analysis revealed that the grain containing the whisker had 'core-rim' structure; core being high purity Si_3N_4 whisker and rim being #beta#-sialon. Flexural strength of the composite decreased with the reinforcement addition which, on the other hand, improved fracture toughness of it. High temperature strength was measured at 1300 deg C to be about 130 MPa lower than that measured at RT for the whisker reinforced composite. (author).
Development of Ultra-Fast Silicon Switches for Active X-Band High Power RF Compression Systems
Energy Technology Data Exchange (ETDEWEB)
We present the recent results of our research on the high power ultra-fast silicon RF switches. This switch is composed of a group of PIN diodes on a high purity silicon wafer. The wafer is inserted into a cylindrical waveguide under TE{sub 01} mode, performing switching by injecting carriers into the bulk silicon. Our current design uses a CMOS compatible process and the device was fabricated at SNF (Stanford Nanofabrication Facility). 300 ns switching time has been observed, while the switching speed can be improved further with 3-D device structure and faster driving circuit. Power handling capacity of the switch is at the level of 10 MW. The switch was designed for active X-band RF pulse compression systems--especially for NLC, but it is also possible to be modified for other applications and other frequencies.
2006-03-06
Energy Technology Data Exchange (ETDEWEB)
Leafy samples often used as medicine in the Indian Ayurvedic system and vegetables were analyzed for 20 elements (As, Ba, Br, Ca, Ce, Cr, Cs, Co, Eu, Fe, K, La, Na, Rb, Sb, Sc, Sm, Sr, Th, Zn) by employing Instrumental Neutron Activation Analysis (INAA). The samples were irradiated at the 100 kW TRIGA-MAINZ nuclear reactor and the induced activities were counted by gamma ray spectrometry using an efficiency calibrated high resolution High Purity Germanium (HPGe) detector. The concentration of the elements in the medicinal and vegetable leaves and their biological effects on human beings are discussed.
1999-05-01
Energy Technology Data Exchange (ETDEWEB)
The concentrations of {sup 137}Cs and {sup 134}Cs in Malaysian marine sediments were measured by gamma-ray spectrometry with a high-purity germanium (HPGe) detector connected to a multichannel analyzer. In general, the {sup 137}Cs concentration in Malaysian marine sediments has been found to be very low and less than 5 Bq/kg dry weight with the exception of those from a few sampling locations. The concentration of {sup 134}Cs was found to be less than the minimum detectable activity for the measuring condition used. Data reported in this paper were found to be comparable with results from within the region and thus can be used as reference data for the country.
2007-12-15
Chemically produced nanostructured ODS-lanthanum oxide-tungsten composites sintered by spark plasma
British Library Electronic Table of Contents (United Kingdom)
High purity W and W-0.9La2O3 (wt.%) nanopowders were produced by a wet chemical route. The precursor was prepared by the reaction of ammonium paratungstate (APT) with lanthanum salt in aqueous solutions. High resolution electron microscopy investigations revealed that the tungstate particles were coated with oxide precipitates. The precursor powder was reduced to tungsten metal with dispersed lanthanum oxide. Powders were consolidated by spark plasma sintering (SPS) at 1300 and 1400degreeC to suppress grain growth during sintering. The final grain size relates to the SPS conditions, i.e. temperature and heating rate, regardless of the starting powder particle size. Scanning electron microscopy revealed that oxide phases were mainly accumulated at grain boundaries while the tungsten matrix ...
2011-01-01
Characterizations of passive films formed on stainless steel in high temperature water
International Nuclear Information System (INIS)
Surface study techniques were used to investigate films on Type 304 stainless steel which were formed during exposure to high purity water at 288"0C. The results indicated that the film chemistry depended strongly upon the concentration of the dissolved O_2 in the water. Films formed in water having 8 ppm O_2 were stoichiometric mixed oxides; whereas those formed in water with 10 ppb O_2 were highly defective oxyhydroxides. The latter films are not as protective as the stoichiometric oxides. Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) were used to investigate the films. (Auth.).
1983-06-03
International Nuclear Information System (INIS)
The study of passive films formed on a nickel base alloy type Inconel 600 is performed by capacitance measurements (Mott-Schottky approach). This research is supported by the passivation study of the alloying elements Ni, Cr, Fe and high purity alloys Ni-Cr, Ni-Fe, Ni-Cr-Fe. The results obtained show that the capacitive behaviour of the Inconel 600 in the passive state is similar to that on a p-n heterojunction to which a barrier zone of nickel oxide is added. The individual or combined action of alloying elements on the development of this kind of electronic structure is discussed. (authors). 5 refs., 6 figs.
1994-01-01
Burn-up measurement of irradiated nuclear fuel by means of micro-gamma scanning
International Nuclear Information System (INIS)
The Cs-137 radioactivity of a neutron-irradiated nuclear fuel sample has been measured by means of a micro-gamma scanning system which is associated with a high purity Ge detector. Subsequently the burn-up has been calculated from the Cs-137 radioactivity data and then compared with the values from the theoretical computation and chemical anaylsis. The burn-up value obtained with the gamma-scanning system seems to be reasonably agreeable with that of the chemical anaylsis provided that the statistical error in the experiments is taken into account. It is revealed that the burn-up data from the theoretical approach is slightly higher than those of micro-gamma scanning and chemical analysis methods. (Author).
Excitonic transitions in InGaP/InAlGaP strained quantum wells
Excitonic transitions in metalorganic vapor phase epitaxially grown In[sub [ital x
1993-08-30
Electrodeposition and corrosion resistance of Ni-W-B coatings
International Nuclear Information System (INIS)
A ternary nickel-base alloy Ni-W-B has been developed for surface corrosion and wear resistance to replace chromium plating, which uses environmentally hazardous solutions. The deposition conditions used an alkaline bath and insoluble anodes. The as-deposited alloy typically contains 40 wt% W and 1 wt% B and has an amorphous or partially amorphous structure. These deposits compare favorably with hexavalent chromium deposits in throwing power, color uniformity, and reflectivity. The corrosion resistance of Ni-W-B alloy was compared with hexavalent chromium and electroless nickel deposits in a variety of acids, including hydrochloric, sulfuric, fluoroboric, and phosphoric. In all cases, best results were obtained with the Ni-W-B deposits.
The creep and intergranular cracking behavior of Ni-Cr-Fe-C alloys in 360 degree C water
International Nuclear Information System (INIS)
Mechanical testing of controlled-purity Ni-xCr-9Fe-yC alloys at 360 C revealed an environmental enhancement in IG cracking and time-dependent deformation in high purity and primary water over that exhibited in argon. Dimples on the IG facets indicate a creep void nucleation and growth failure mode. IG cracking was primarily located at the interior of the specimen and not necessarily linked to direct contact with the environment. Controlled potential CERT experiments showed increases in IG cracking as the applied potential decreased, suggesting that hydrogen is detrimental to the mechanical properties. It is proposed that the environment, through the presence of hydrogen, enhances IG cracking by enhancing the matrix dislocation mobility. This is based on observations that dislocation-controlled creep controls the IG cracking of controlled-purity Ni-xCr-9Fe-yC in argon at 360 C and grain boundary cavitation and sliding results that show the ...
1995-03-26
Energy Technology Data Exchange (ETDEWEB)
The high-purity-oxygen activated sludge process will be used to expand secondary treatment capacity and improve water quality in Santa Monica Bay. The facility is operated by the city of Los Angeles Department of Public Works` Bureau of Sanitation. The overall Hyperion Full Secondary Project is 30% complete, including a new headworks, a new primary clarifier battery, an electrical switch yard, and additional support facilities. The upgrading of secondary facilities is 50% complete, and construction of the digester facilities, the waste-activated sludge thickening facility, and the second phase of the three-phase modification to existing primary clarifier batteries has just begun. The expansion program will provide a maximum monthly design capacity of 19,723 L/s(450 mgd). Hyperion`s expansion program uses industrial treatment techniques rarely attempted in a municipal facility, particularly on such a large scale, including: a user-friendly intermediate pumping ...
1993-09-01
X-ray diffraction studies of palladium silicide thin films
Energy Technology Data Exchange (ETDEWEB)
The solid state reaction between a Pd thin film and a Si substrate produces a single new phase, Pd/sub 2/Si, for temperatures <700/sup 0/C. When the substrate is a single crystal of (111) surface orientation, this process is particularly interesting because the silicide grows epitaxially. Growth of epitaxial interfacial Pd/sub 2/Si was the focus of this study using X-ray diffraction techniques.
1985-01-01
International Nuclear Information System (INIS)
Radioactive "3"1Si(Tsub(1/2) = 2.62 h) and Rutherford backscattering were used to study Ni_2Si, Pd_2Si and Pt_2Si formation, silicon self-diffusion in silicides and silicon epitaxy in the Si(100)/Pd_2Si/Si (amorphous) system. (Auth.).
MOVPE of (AlGaIn)P under the carrier gas nitrogen for LED structures
International Nuclear Information System (INIS)
This thesis dealt with the metal-organic gas phase epitaxy with nitrogen as carrier gas. For this first by means of three-dimensional modelings of the epitaxy process the influence of the carrier gas on the processes was explained. The optimization of the growth parameter for the whole light-emitting-diode structure in double-hetero arrangement resulted that an a temperature of 770 C and a V/ III-ratio of 150 layers with a high crystal quality could be reached.
Thin film GaAs solar cells on glass substrates by epitaxial liftoff
Energy Technology Data Exchange (ETDEWEB)
In this work, we describe the fabrication and operating characteristics of GaAs/AlGaAs thin film solar cells processed by the epitaxial liftoff (ELO) technique. This technique allows the transfer of these cells onto glass substrates. The performance of the lifted-off solar cell is demonstrated by means of electrical measurements under both dark and illuminated conditions. We have also optimized the light trapping conditions in this direct-gap material. The results show that good solar absorption is possible in active layers as thin as 0.32 {mu}m. In such a thin solar cell, the open circuit voltage would be enhanced. We believe that the combination of an epitaxial liftoff thin GaAs film, and nano-texturing can lead to record breaking performance. {copyright} {ital 1997 American Institute of Physics.}
1997-02-01
Energy Technology Data Exchange (ETDEWEB)
We report the influence of a small quantity of Cl[sub 2], which enhanced the selectivity of silicon-selective epitaxial growth (Si-SEG) in UHV-CVD using Si[sub 2]H[sub 6], on both the epitaxial growth rate and the B-doping properties for each Si and Si[sub 1-x]Ge[sub x] film. The small quantity of Cl[sub 2] inhibited the Si, Ge and B incorporation, while the selectivity was enhanced. However, it was found, in the case of Si[sub 1-x]Ge[sub x]-SEG using Cl[sub 2], that the reduction ratio of both the growth rate and the B incorporation were smaller than those of Si-SEG with the selectivity still more enhanced. (orig.)
1993-02-01
Epitaxial bain path in transition metals
Energy Technology Data Exchange (ETDEWEB)
Epitaxial films grown pseudomorphically on substrates provide a way to stabilise non-equilibrium structures of materials. Obviously, there always is a certain lattice misfit between substrate and film material in its bulk equilibrium structure. In the pseudomorphic regime, this misfit can either lead to the growth of films in a strained bulk structure or even yield structures that are not stable in the bulk. Large misfits do not necessarily imply large lateral stress. Theory can help to predict e.g. geometry, stress and magnetic properties of pseusomorphically grown metal films. In this work, we considered the fcc-bcc epitaxial Bain path of 3d, 4d, and 5d transition metals, which provides a reasonable description of tetragonally distorted films on substrates. We carried out density functional calculations in the implementation of the full potential local orbital program package FPLO. Emphasis is put on similarities among the transition metals.
2010-07-01
Yields of short-lived fission products produced following "2"3"5U(n_t_h,f)
International Nuclear Information System (INIS)
Measurements of gamma-ray spectra, following the thermal neutron fission of "2"3"5U have been made using a high purity germanium detector at the University of Massachusetts Lowell (UML) Van de Graaff facility. The gamma spectra were measured at delay times ranging from 0.2 s to nearly 10000 s following the rapid transfer of the fission fragments with a helium-jet system. On the basis of the known gamma transitions, forty isotopes have been identified and studied. By measuring the relative intensities of these transitions, the relative yields of the various precursor nuclides have been calculated. The results are compared with the recommended values listed in the ENDF/B-VI fission product data base (for the lifetimes and the relative yields) and those published in the Nuclear Data Sheets (for the beta branching ratios). This information is particularly useful for the cases of short-lived fission products with lifetimes of the order of fractions ...
1998-08-01
Energy Technology Data Exchange (ETDEWEB)
Known trace-matrix-separation and enrichment procedures for the refractory metals Mo and W use very time-consuming batch-techniques. This paper presents the application of a quasicontinuous liquid chromatographic (LC) technique as a step towards automated ultratrace separation. The anionic peroxo complexes from Mo(VI) and W(VI) are used for the trace-matrix-separation. Optimization of the peroxide concentration permits a complete removal of all cationic analyte traces on the HPLC-suitable cation exchanger Nucleosil SA. The high chromato-graphic efficiency also allows a direct ion chromatographic separation of the removed traces. This leads to conclusions about the contribution of the analyte traces on the trace-matrix-separation column and the limits of determination. (author). 13 refs.; 12 figs.; 5 tabs.
1991-11-20
Thermodynamics and stability of the mixed-conducting Sr-Fe-Co-O system.
Energy Technology Data Exchange (ETDEWEB)
Mixed-conducting Sr-Fe-Co oxides have potential applications in dense ceramic membranes for high-purity oxygen separation and/or methane conversion to produce syngas (CO + H{sub 2}), because of their combined high electronic/ionic conductivity and significant oxygen permeability. We studied the crystal structure and microstructure of the system in X-ray diffraction experiments and by using scanning electron microscopy, respectively. Thermogravimetric analysis was conducted on the SrFeCo{sub 0.5}O{sub x} sample in environments of various oxygen partial pressures (pO{sub 2}). Conductivity increased while weight decreased with increasing temperature. Activation energy decreased while conductivity increased with increasing pO{sub 2}. The pO{sub 2}-dependent conducting behavior of the SrFeCo{sub 0.5}O{sub x} system can be understood by considering the trivalent-to-divalent transition of transition-metal ions.
1999-04-28
Thermal Design and Performance of the Gamma-Ray Spectrometer for the MESSENGER Spacecraft
Energy Technology Data Exchange (ETDEWEB)
A gamma-ray spectrometer (GRS) has been built and delivered to the Mercury MESSENGER spacecraft which launched on August 3, 2004, from Cape Canaveral, Florida. The GRS, a part of seven scientific instruments on board MESSENGER, is based on a coaxial high-purity germanium detector. Gamma-ray detectors based on germanium have the advantage of providing excellent energy resolution, which is critical to achieving the science goals of the mission. However, germanium has the disadvantage that it must operate at cryogenic temperatures (typically {approx}80 K). This requirement is easy to satisfy in the laboratory but difficult near Mercury, which has an extremely hot thermal radiation environment. To cool the detector, a Stirling cycle mechanical cooler is employed. In addition, radiation and conduction techniques a are used to reduce the GRS heat load. Before delivering the flight sensor, a complete thermal prototype was built and tested. The results of these test, ...
2004-10-13
Synthesis and characterization of #beta#-SiAlON with a rare earth concentrate as sintering aid
International Nuclear Information System (INIS)
Silicon nitride-based ceramics behavior is strongly influenced by microstructural parameters, which, in turn are determined by chosen densification method. Highly covalent Si-N bond hind are the silicon nitride densification. Therefore, metal oxides are used in order to get high density. However, such oxides must be carefully selected, because they affect the general macroscopic properties of sintered bodies. In the present work, the viability of rare earth concentrate use to produce #beta#--Si_6_-_xAl_xO_xN_8_-_x and its effect on mechanical properties of the sintering ceramics are studied. Additive composition, heating rate, soaking time and sintering temperature were took as variables. Hardness, fracture toughness, Young's modulus and flexural strength were investigated. Lattice parameter compositional dependence and secondary phases crystallized after past-sintering heat treatment were also determined. The results show that rare earth concentrate works very well as sintering aid, ...
Research progress in the electrochemical synthesis of ferrate(VI)
International Nuclear Information System (INIS)
There is renewed interest in the +6 oxidation state of iron, ferrate (VI) (FeVIO42-), because of its potential as a benign oxidant for organic synthesis, as a chemical in developing cleaner ('greener') technology for remediation processes, and as an alternative for environment-friendly battery cathodes. This interest has led many researchers to focus their attention on the synthesis of ferrate(VI). Of the three synthesis methods, electrochemical, wet chemical and thermal, electrochemical synthesis has received the most attention due to its ease and the high purity of the product. Moreover, electrochemical processes use an electron as a so-called clean chemical, thus avoiding the use of any harmful chemicals to oxidize iron to the +6 oxidation state. This paper reviews the development of electrochemical methods to synthesize ferrate(VI). The approaches chosen by different laboratories to overcome some of the difficulties associated with the ...
2009-04-01
Nuclear Reactor Sharing Program
Energy Technology Data Exchange (ETDEWEB)
The Ohio State University Research Reactor (OSURR) is licensed to operate at a maximum power level of 500 kW. A pool-type reactor using flat-plate, low enriched fuel elements, the OSURR provides several experimental facilities including two 6-inch i.d. beam ports, a graphite thermal column, several graphite-isotope-irradiation elements, a pneumatic transfer system (Rabbit), various dry tubes, and a Central Irradiation Facility (CIF). The core arrangement and accessibility facilitates research programs involving material activation or core parameter studies. The OSURR control room is large enough to accommodate laboratory groups which can use control instrumentation for monitoring of experiments. The control instrumentation is relatively simple, without a large amount of duplication. This facilitates opportunities for hands-on experience in reactor operation by nuclear engineering students making reactor parameter measurements. For neutron activation analysis and analyses of natural ...
1994-09-01
Microstructure engineering from metallic powder blends for enhanced mechanical properties
International Nuclear Information System (INIS)
The present work focuses on the transformation of high-purity Ni powder blends of controlled volume fractions (40 and 60 %) of nanometre-sized (100 nm) and micrometre-sized (544 nm) particles into bulk samples as part of a strategy for producing ultrafine-grained materials usefully exhibiting both strength and ductility. The process involved cold isostatic pressing at 1.5 GPa and sintering. The resulting bulk samples had relative densities near 95 %, were texture-free, and exhibited two different grain size distributions with an average value of 600 #+-# 30 nm. The mechanical properties were investigated by compression and microhardness tests, both at room temperature, and compared to the behaviour of a sample processed from micrometre-sized powder only. Samples prepared from the blends exhibited high yield stresses of 440 and 550 MPa after compression, and they did sustain work hardening. Tests conducted before and after compression up to 50 % deformation showed ...
2010-07-01
Microstructure and magnetic properties of nanocrystalline Fe75Si20M5 (M = Al, B, Cr) powders
International Nuclear Information System (INIS)
Nanocrystalline Fe75Si20M5 (M = Al, B and Cr) powders were synthesized by mechanical alloying in a planetary ball mill from high purity elemental powders. Evolution of non-equilibrium solid solutions of ?-Fe[Si,(Al, B, Cr)] with a nanocrystalline structure was accompanied by the introduction of a large number of dislocation defects in the course of the milling process. Fe sites get substituted by Si and M (M = Al, B, Cr) atoms during the milling process. The structural change and the resulting disorder are reflected in the changes in the lattice parameter and average magnetic moment of the powders milled for various time periods. The effective magnetic anisotropy increases linearly with the milling time. An increase in coercivity with increasing milling time was observed which could be attributed to the introduction of dislocations and the reduction in the powder particle size during milling. The presence of dislocations and grain boundaries ...
2008-08-21
British Library Electronic Table of Contents (United Kingdom)
Ultra fine tungsten carbide and cobalt powders were milled by high energy planetary ball mill at different ball to powder weight ratios (BPR) to produce particles of WC-10wt%Co hard metal in nanometer scale size. Microstructural characterizations by TEM show that the particle size of tungsten carbide was achieved to 32nm after milling at 15 BPR during 10h. In order to reduce the WC grain growth during the sintering process, tantalum carbide was added to the hard metal as a WC grain growth inhibitor. The nano hard metal powders were compacted at 200MPa pressure and sintered at 1370-1450degreeC temperatures in a high purity hydrogen atmosphere. The results show that the addition of 0.6wt% of TaC improves the hardness and fracture toughness from 1493 HV30 and 11.8MPam (for TaC free sample) to...
2009-01-01
Measurement of the "1"0"9Cd half-life
International Nuclear Information System (INIS)
The half-life of "1"0"9Cd was measured by following the decay of sources from a radiochemically pure solution with two different measuring systems: an ionisation chamber and a high-purity germanium (HPGe) detector. The measurements were performed over a period of 3.6 years, i.e. about 2.8 half-lives of "1"0"9Cd. The resulting half-life values and detailed uncertainty budgets (k=1) are presented for both systems. The result obtained with the ionisation chamber, 462.36 (33) days, and the one obtained with the HPGe detector, 461.92 (76) days, are mutually consistent. The weighted mean of our measured values, T_1_/_2("1"0"9Cd)=462.29 (30) days, is consistent with the currently recommended values of 461.4 (12) days and 462.0 (3) days. From a set of selected experimental values published after 1970, a 'partially weighted mean' of T_1_/_2("1"0"9Cd)=462.36 (39) days was calculated. More measurements are needed to resolve the discrepancies among literature data and to ...
2011-05-01
Energy Technology Data Exchange (ETDEWEB)
Supermetal with critical characteristics is under advanced investigation for further improvement of metal materials. Although iron is most frequently used as structural material among various metals, it should be used more carefully and effectively because of resource limitation and global environmental problem. It is essential to draw various excellent properties much more from iron and to improve recyclability. In particular, the best way to meet these requirements is achievement of more fine structure and higher purity. Since the lowest crystalline grain size is now limited to nearly 10{mu}m, metallic structure composed of grains below 1{mu}m is expected by mesoscopic control. Various methods have been studied to achieve ultra-fine crystalline structure, and study of precise heat treatment control and ultra-strength metallurgy is required. Heat treatment in magnetic field and layered structure by mechanical alloying are also promising. Drastic enhancement of characteristics is ...
1996-03-01
Irradiation-induced electrical conductivity of AlN and Al{sub 2}O{sub 3} at 450 C
Energy Technology Data Exchange (ETDEWEB)
The electrical conductivity of Vitox-alumina (99.2%), Wesgo-alumina (99.9%) and AlN (99.6%) has been measured during and after irradiation with an experimental set-up which allows fusion relevant loading conditions. All irradiations were performed in high vacuum at 450 C using a 104 MeV {alpha}-particle beam with an applied DC electric field of 100 kV/m. In the high purity Vitox-alumina the in-situ and postirradiation bulk conductivities {sigma} and {sigma}{sub 0} show the highest irradiation induced electrical breakdown ever observed. The saturation level near 4 x 10{sup -2} ({Omega}m){sup -1}, reached already after 0.015 dpa (O-sublattice), is already above the critical value necessary to avoid MHD pressure drop with 10 {mu}m coatings in flowing liquid metal coolants. Under the same conditions no radiation induced electrical degradation at all has been found in Wesgo-alumina and AlN. (orig.).
1995-12-31
Iofetamine HCI {sup 123}I (IMP)
Energy Technology Data Exchange (ETDEWEB)
Iofetamine HCI {sup 123}I is the generic name for the hydrochloride salt of N-isopropyl-p-iodoamphetamine labeled with {sup 123}I, commonly called IMP. Iofetamine HCI {sup 123}I is prepared by isotopic exchange with [{sup 123}I]Nal and is formulated in isotonic aqueous NaCl solution containing 1 mCi/ml iofetamine HCI I 123, 0.15 mg/ml iofetamine HCI carrier, and phosphate buffer for pH control. The radiochemical purity is >97%, and the product is stable for more than 24 hours; the commercial product distributed today is prepared with high purity {sup 123}I with >98% radionuclidic purity. Two radioiodinated agents have seen significant clinical application for functional brain imaging: iofetamine HCI (IMP) (1) and N,N,N{prime}-trimethyl-N{prime}-(2-hydroxy-3-methyl-5-iodobenzyl)-1,3-propanediamine HIPDM (2). lofetamine HCI {sup 123}I is commercially available in the United States, Europe, and Japan. Although their primary use is for ...
1991-12-31
Improvement of leaching characteristics of TOC from condensate demineralizers
International Nuclear Information System (INIS)
Recent nuclear power plants require high purity water to protect nuclear reactors or steam generators from SCC and maintain in good condition. In this connection, it is especially important to minimize sulfate, which is a corrosive chemical originated from oxidative degradation of cation exchange resins during operation. Recently, uniform particle size (UPS) strong acid cation gel resin with 14% cross-linkage, which has excellent stability against oxidization, has been applied to several condensate purification systems. For further improvement of water quality, some methods for changing the configuration of condensate demineralizer's resin bed have been examined. For example, these methods correspond to anion under layer and cation over layer. We have tested these methods by cold column tests. Furthermore, we have developed the newly anion exchange resin having higher efficiency and capacity for absorbing leachables from cation exchange resins. ...
2009-10-01
Electrometallurgical treatment of aluminum-matrix fuels
Energy Technology Data Exchange (ETDEWEB)
The electrometallurgical treatment process described in this paper builds on our experience in treating spent fuel from the Experimental Breeder Reactor (EBR-II). The work is also to some degree, a spin-off from applying electrometallurgical treatment to spent fuel from the Hanford single pass reactors (SPRs) and fuel and flush salt from the Molten Salt Reactor Experiment (MSRE) in treating EBR-II fuel, we recover the actinides from a uranium-zirconium fuel by electrorefining the uranium out of the chopped fuel. With SPR fuel, uranium is electrorefined out of the aluminum cladding. Both of these processes are conducted in a LiCl-KCl molten-salt electrolyte. In the case of the MSRE, which used a fluoride salt-based fuel, uranium in this salt is recovered through a series of electrochemical reductions. Recovering high-purity uranium from an aluminum-matrix fuel is more challenging than treating SPR or EBR-II fuel because the aluminum- matrix fuel is typically -90% ...
1996-08-01
Energy Technology Data Exchange (ETDEWEB)
Substantial roles of precipitates such as Zr-Fe-Cr type intermetallic compounds on uniform corrosion and hydrogen pickup of zirconium alloys in pure water autoclave tests were investigated from an electrochemical point of view. In the previous paper, corrosion mechanism was elucidated by the anodic protection-precipitates degradation model. This paper describes the roles on hydrogen pickup. 633 K pure water autoclave test was performed on high purity zirconium, Zr-0.2Fe, Zr-0.2Cr, and Zr-0.1Fe-0.1Cr alloys. Hydrogen analysis after the corrosion test showed that hydrogen pickup ratio of Zr-0.2Fe alloy was about 80%. It was much higher than about 30% of pure Zr and about 10% of both Zr-0.2Cr and Zr-0.1Fe-0.1Cr alloys. Larger hydrogen content was introduced into Zr-0.2Fe alloy than the other ones by the cathodic hydrogen charging under coulombic equivalence. The precipitates at metal-oxide interface could act not only as cathodic sites in the ...
2000-08-01
International Nuclear Information System (INIS)
Substantial roles of precipitates such as Zr-Fe-Cr type intermetallic compounds on uniform corrosion and hydrogen pickup of zirconium alloys in pure water autoclave tests were investigated from an electrochemical point of view. In the previous paper, corrosion mechanism was elucidated by the anodic protection-precipitates degradation model. This paper describes the roles on hydrogen pickup. 633 K pure water autoclave test was performed on high purity zirconium, Zr-0.2Fe, Zr-0.2Cr, and Zr-0.1Fe-0.1Cr alloys. Hydrogen analysis after the corrosion test showed that hydrogen pickup ratio of Zr-0.2Fe alloy was about 80%. It was much higher than about 30% of pure Zr and about 10% of both Zr-0.2Cr and Zr-0.1Fe-0.1Cr alloys. Larger hydrogen content was introduced into Zr-0.2Fe alloy than the other ones by the cathodic hydrogen charging under coulombic equivalence. The precipitates at metal-oxide interface could act not only as cathodic sites in the ...
2000-08-01
Controlled grain boundary structures in superconductors. Final report 1 Jan 77-31 Dec 81
Energy Technology Data Exchange (ETDEWEB)
Theoretical work supported by this grant has lead to the concept of the specific pinning force Q and the development of new methods to sum elementary interaction forces to find Q. Pinning due to changes in transition temperature or thermodynamic critical field in thin layers (e.g., a grain boundary), is greatly reduced due to the proximity effect and the stress field interaction due to the dislocations in the grain boundary has been shown to be negligible. The crystalline anisotropy (CA) and electron scattering (ES) interactions have been computed for the first time for an arbitrary boundary. Experiments on niobium bicrystals, polycrystalline niobium thin foils doped with oxygen, lead-bismuth alloy thin films and lead-bismuth alloy films in which either lead or thallium has been allowed to diffuse down the grain boundaries and out into the grains provide evidence that confirms the predictions of the theory. These results suggest that further improvements in grain boundary pinning in ...
1982-03-01
Energy Technology Data Exchange (ETDEWEB)
The study of passive films formed on a nickel base alloy type Inconel 600 is performed by capacitance measurements (Mott-Schottky approach). This research is supported by the passivation study of the alloying elements Ni, Cr, Fe and high purity alloys Ni-Cr, Ni-Fe, Ni-Cr-Fe. The results obtained show that the capacitive behaviour of the Inconel 600 in the passive state is similar to that on a p-n heterojunction to which a barrier zone of nickel oxide is added. The individual or combined action of alloying elements on the development of this kind of electronic structure is discussed. (authors). 5 refs., 6 figs.
1994-08-01
Energy Technology Data Exchange (ETDEWEB)
In order to gain a wider knowledge of corrosion phenomena in OFHC (oxygen free high conductivity) copper pipes of the stator cooling circuit of a power plant turboalternator, a research program was laid out which is based on the use of an experimental loop simulating real operating conditions as closely as possible. The samples examined were either copper foils or hollow conductors of the type that is normally used in the stator cooling system, and the circulating fluid was high purity water with controlled O/sub 2/, H/sub 2/ and C0/sub 2/ contents. Investigations were focused on the kinetics of O/sub 2/ removal through catalytic resins covered with metallic palladium (at different temperatures and pressures) and on the kinetics of CO/sub 2/ removal through mixed bed resins. Subsequently, attention was directed to the corrosion of copper (in the form of foils or hollow conductors) under different experimental conditions simulating either ...
1991-12-31
Abrasive waterjet cutting of high purity uranium metal: Topical report
The Abrasive Waterjet Cutting process was evaluated to determine if the equivalent could be utilized for cutting uranium metal at the Feed Materials Production Center (FMPC). In the process, a thin stream of ultrahigh pressure water carried grit material through a designated piecepart. In order to be acceptable for use at the FMPC, the equipment must be cost effective, minimize waste, and be adaptableto operating in an enclosure, and improve health and safety conditions. Observation of the cutting process showed that health and safety aspects could be optimized with an enclosed ventilated system. Also the equipment can be easily automated. The cutting action produced sparks similar to the sparks caused by a grinding operation. The sparks are captured in a water container under the workpiece that not only catches the sparks, but also serves to dissipiate the stream of water and residues produced by the cut. Metallographic tests performed on the cut surface of the block of depleted ...
1988-01-01
A water calorimeter for high energy x-rays and electrons
The current primary standards at NPL for the measurement of absorbed dose to water in high energy photon and electron beams are graphite calorimeters. However, the quantity of interest in radiation dosimetry is absorbed dose to water. Therefore, a new absorbed dose to water standard based on water calorimetry has been developed for use in high energy photon and electron beams. The calorimeter operates at 4 deg C, with temperature control being provided by liquid cooling. The sealed glass inner vessel of the calorimeter was designed to minimise the effect of non-water materials on the measurement of absorbed dose. The temperature sensing thermistor probes were designed and constructed so that glass is the only material in contact with high purity water inside the vessel. Initial measurements of absorbed dose to water made in 6, 10, and 19 MV photons, and 16 MeV electrons agreed, within the measurement uncertainties of approximately 1.5% (95% ...
2000-01-01
Energy Technology Data Exchange (ETDEWEB)
AlGaInP epitaxial layers grown at 690 {degree}C by atmospheric pressure organometallic vapor phase epitaxy are investigated by transmission electron microscopy. For the first time, compositionally modulated and ordered structures are simultaneously observed in AlGaInP alloys. The ordering is of the CuPt type with ordering along the {l brace}111{r brace} directions. The ordered regions appear as plate-like microdomains, while the composition modulation takes the form of a fine columnar constrast oriented along the growth direction. In addition, from the results of (001) plan-view diffraction contrast examination, the principal strain direction associated with the modulation structures is found to be perpendicular to the growth direction and lies in the surface plane. Thus, it is concluded that the spinodal decomposition is initiated and developed on the surface during the growth of the AlGaInP epitaxial layers and, finally, ...
1990-04-09
International Nuclear Information System (INIS)
AlGaInP epitaxial layers grown at 690 degree C by atmospheric pressure organometallic vapor phase epitaxy are investigated by transmission electron microscopy. For the first time, compositionally modulated and ordered structures are simultaneously observed in AlGaInP alloys. The ordering is of the CuPt type with ordering along the #left brace#111#right brace# directions. The ordered regions appear as plate-like microdomains, while the composition modulation takes the form of a fine columnar constrast oriented along the growth direction. In addition, from the results of (001) plan-view diffraction contrast examination, the principal strain direction associated with the modulation structures is found to be perpendicular to the growth direction and lies in the surface plane. Thus, it is concluded that the spinodal decomposition is initiated and developed on the surface during the growth of the AlGaInP epitaxial layers and, ...
Annealing behavior of radiation damages in metal-silicides
International Nuclear Information System (INIS)
The annealing behavior of the radiation damage in epitaxial Pd_2Si and NiSi_2 films on Si, due to the implantation of 100 keV Ar ions, is investigated by using the channeling technique with "4He ions. (U.K.).
Visible semiconductor lasers with the AlGaInP materials system
International Nuclear Information System (INIS)
The AlGaInP materials system has recently supported the development of a variety of visible diode laser devices at wavelengths ranging from yellow to red. Presently, the majority of published results are with materials prepared by organometallic vapor phase epitaxy (OMVPE). Many issues with such materials exist, including impurity doping, the role of crystal ordering, defect formation during epitaxial growth, and the proper quantum well heterostructure design required for best device results. This paper addresses these topics and reviews the present state of the art, and projects the anticipated results when the materials' problems have been solved.
1988-11-02
Review of the application of molecular beam epitaxy for high efficiency solar cell research
Energy Technology Data Exchange (ETDEWEB)
In the last two years, rapid progress has been made in the energy conversion efficiencies of GaAs solar cells fabricated from molecular beam epitaxy (MBE) material. The efficiencies of cells fabricated from MBE material are now comparable with those fabricated from metal-organic chemical vapor deposition material, even for cells of dimension 2 cmx4 cm. This paper reviews the progress in MBE cell efficiencies. Also discussed is the role oval defects play in GaAs diode and solar cell performance. (orig.).
1991-05-01
Energy Technology Data Exchange (ETDEWEB)
This thesis dealt with the metal-organic gas phase epitaxy with nitrogen as carrier gas. For this first by means of three-dimensional modelings of the epitaxy process the influence of the carrier gas on the processes was explained. The optimization of the growth parameter for the whole light-emitting-diode structure in double-hetero arrangement resulted that an a temperature of 770 C and a V/ III-ratio of 150 layers with a high crystal quality could be reached.
2001-10-01
HTSC devices fabricated by selective epitaxial growth
International Nuclear Information System (INIS)
The use of a selective epitaxial growth technique for fabricating YBCO thin-film microstructures is described. No film post-deposition processing is required; hence damage to the structure is minimized. The technique is compatible with a passivation process to protect the structure without exposure to air. The microbridges, Josephson junctions and rf SQUIDs protected by an amorphous YBCO passivation have long lifetime even after severe accelerated aging tests. Rf SQUIDs fabricated by this technique show a significant reduction of low-frequency noise when operating in weak magnetic fields compared with SQUIDs fabricated by the conventional ion beam etching technique. (author)
1999-04-01
Growth of epitaxial LaAlO{sub 3} and CeO{sub 2} films using sol-gel precursors
Energy Technology Data Exchange (ETDEWEB)
LaAlO{sub 3} and CeO{sub 2} films have been successfully grown using sol-gel precursors. LaAlO{sub 3} precursor solution has been prepared from a metal alkoxide route and spun-cast on a SrTiO{sub 3} (100) single crystal to yield an epitaxial film following pyrolysis at 800{degrees}C in a rapid thermal annealer. A CeO{sub 2} precursor solution has been made using both an aqueous and an alkoxide route.
1996-04-01
A modified epitaxial design leads to straightforward implementation of short (1{lambda}) optical cavities and the use of C as the sole {ital p}-type dopant in AlGaInP/AlGaAs red vertical-cavity surface-emitting lasers (VCSELs). Red VCSELs fabricated into simple etched air posts operate continuous wave at room temperature at wavelengths between 670 and 690 nm, with a peak output power as high as 2.4 mW at 690 nm, threshold voltage of 2.2 V, and peak wallplug efficiency of 9%. These values are all significant improvements over previous results achieved in the same geometry with an extended optical cavity epitaxial design. The improved performance is due primarily to reduced optical losses and improved current constriction and dopant stability. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.
1995-07-17
Epitaxial stabilization of MnO(111) overlayers on a Pd(100) surface
International Nuclear Information System (INIS)
The growth of epitaxial MnO(100) and MnO(111) layers on Pd(100) surface has been investigated by spot-profile analysis low-energy electron diffraction, dynamic atomic force microscopy, photoemission and high-resolution electron energy loss spectroscopy, and density functional theory. We have found that despite the large lattice mismatch to the Pd(100) substrate, the MnO(100) layers are kinetically stabilized at low temperatures (?350 deg. C) and at oxygen pressures between 2x10-7 and 5x10-7 mbar. Annealing in ultrahigh vacuum at 650 deg. C or, alternatively, deposition of manganese metal in oxygen pressure -7 mbar causes the transformation of the MnO(100) to a polar MnO(111) surface, which is decorated by triangular pyramids with (100) side facets. It is suggested that the growth of MnO(111) layers is energetically preferred over MnO(100) due to the epitaxial stabilization at the metal-oxide interface.
2007-06-01
Energy Technology Data Exchange (ETDEWEB)
We report on the elimination of defect formation which is associated with high dose indium implantations under solid phase epitaxial regrowth (SPER) annealing conditions of 650-800 deg. C. This is achieved by incorporating a layer of epitaxially grown Si{sub 1-y}C {sub y} layer, strategically located at the end-of-range (EOR) of the implant profile. An indium implant of 115 keV at 1 x 10{sup 14} cm{sup -2} was performed followed by annealing at temperature ranges of 650-800 deg. C. Samples with the Si{sub 1-y}C {sub y} layer revealed the elimination of secondary EOR defects with effectively suppressed indium transient enhanced diffusion (TED), indicating the function of carbon as an efficient sink for silicon interstitials at reduced annealing temperatures, in the SPER dopant activation regime.
2006-05-10
International Nuclear Information System (INIS)
The DLTS technique was employed to study deep defect centers in Si doped epitaxial layers of Al_0_._3_7Ga_0_._1_6In_0_._4_7P grown by MOCVD as a part of epitaxial structure GaAs/AlGaInP/GaAs on GaAs substrates. A high concentration of DX centers located in a region near the inverted interface GaAs/Al_0_._3_7Ga_0_._1_6In_0_._4_7P was found. The width of this region with the maximum DX center concentration ranges from 5 to 20 nm. By filling the DX centers in the whole region, the activation energy for electron emission was found to be 0.48 eV. However, it is shown for the first time, that the activation energy of the DX center increases with increasing the distance from the GaAs/Al_0_._3_7Ga_0_._1_6In_0_._4_7P inverted interface. A nonuniform of the DX center concentration on the wafers is also observed. The concentration varies in the range of 1#centre dot#10"1"7 cm"-"3 - 10"1"8 cm"-"3. (author)
Photoluminescences from Al{sub x}Ga{sub 1{minus}x}P liquid phase epitaxial layers
Homogenous Al{sub x}Ga{sub 1{minus}x}P liquid phase epitaxial layers have been obtained with the temperature difference method under controlled vapor pressure (TDM-CVP). Very clear fine structures near band edge in photoluminescence spectra have been observed at 77 K for the first time. Photoluminescence measurement results confirmed that the free exciton recombination without phonon assistance plays an important role in the luminescence at 77 K and becomes dominant at room temperature. It is considered that Zero-phonon assisted free exciton recombination is intensified by some local perturbations to electrical potentials against carriers or excitons introduced by Al atoms in Al{sub x}Ga{sub 1{minus}x}P layers, which can give momentum change necessary for recombination.
1999-10-01
Observation of strain-enhanced electron-spin polarization in photoemission from InGaAs
International Nuclear Information System (INIS)
Electron-spin polarization in excess of 70% has been observed in photoemission from a 0.1-#mu#m-thick epitaxial layer of In_xGa_1_-_xAs with x#approx#0.13 grown on a GaAs substrate. Under these conditions, the epitaxial layer is expected to be highly strained by the 0.9% lattice mismatch. The electron polarization and the quantum efficiency have been measured as a function of the excitation photon energy from 1.25 to 2.0 eV. A significant enhancement of the electron polarization occurs in the vicinity of 1.33 eV where the expected strain-induced level splitting permits optical excitation of a single-band transition.
Ion beam induced charge imaging of epitaxial GaN detectors
Energy Technology Data Exchange (ETDEWEB)
We report the use of ion beam induced charge imaging to characterise the charge signal uniformity of epitaxial gallium nitride radiation detectors. The detectors were fabricated from 2 {mu}m thick semi-insulating gallium nitride, grown by MOCVD on a sapphire substrate. A carrier concentration of 1.4x10{sup 15} cm{sup -3} was measured using capacitance-voltage measurements. Ion beam induced charge imaging was carried out with a 2 MeV alpha particle beam focussed to a 3 {mu}m diameter and raster scanned across the device. The resulting ion beam images show excellent charge signal uniformity in this material with no evidence of material defects or polycrystalline structure on the micrometer length scale. No evidence of charge signal trapping was observed in these devices.
2004-09-21
Investigation of lattice strains in layered structures containing porous silicon
International Nuclear Information System (INIS)
Silicon layered structures containing porous silicon modified with various thermal treatments and epitaxial layers deposited on porous layers were studied with a number of complementary X-ray diffraction methods using synchrotron source. The methods of characterization included recording of rocking curves for reflections with various asymmetry as well as projection, section and micro-Laue topography. It was found that oxidizing and sintering of porous silicon seriously modified the strains in the porous layer and in some cases even inverting the sense of strain with respect to that in initially formed porous layer. Consequently the deposited epitaxial layer usually was not laterally coherent with the substrate. Some of investigated layers were not stable in time and after few months period exhibited significant lost of coherence of porous skeleton. (author)
2001-09-23
International Nuclear Information System (INIS)
It has been demonstrated that, by incorporating a thin #approx#20 nm Si_1_-_yC_y (with y as low as 0.1%) layer at the deep indium implant end-of-range (EOR) region, the EOR defects and enhanced diffusion behavior associated with indium implant can be eliminated. The Si_1_-_yC_y layer was grown epitaxially followed by a silicon epitaxy cap of 60 nm. Indium implantations were performed at 1x10"1"4 cm"-"2 at 115 keV followed by spike annealing at 1050 deg. C. The experimentally observed EOR defect and enhanced diffusion elimination are explained based on the undersaturation of implantation-induced silicon interstitials with the presence of substitutional carbon at the Si_1_-_yC_y layer.
2003-11-17
Energy Technology Data Exchange (ETDEWEB)
Stability and decomposition of PtSi, NiSi, and PdSi in contact with single crystal or amorphous Si is examined. PtSi, PdSi and NiSi are thermally stable both with Si, but are unstable in contact with metal film. It is shown that epitaxial Si layers can be obtained using both Pd and Al as metal film and layers can be electrically doped by the addition of a doping layer to the thin film structure prior to the heat treatment or by inclusion of Al atoms so that n/sup +/ and p/sup +/ conductivity can be achieved in the grown epilayer. The effects of impurities, substrate orientation on the growth kinetics are also discussed. (LEW)
1981-01-01
High power GaInP-AlGaInP quantum-well lasers grown by solid source molecular beam epitaxy
AlGaInP-based quantum-well laser diodes operating at wavelengths near 680 nm have been grown by all solid source molecular beam epitaxy (SSMBE). The lowest room temperature threshold current densities obtained from shallow rid structures were 300 A/cm{sup 2} and 330 A/cm{sup 2} for pulsed and continuous wave operation, respectively. The dependences of the differential quantum efficiency and threshold current density on the cavity length were also studied in this preliminary SSMBE work. The internal quantum efficiency of 87--89% and the internal losses of 7--10 cm{sup {minus}1} were obtained.
1996-03-01
Heteroepitaxial Growth of NSMO on Silicon by Pulsed Laser Deposition
Energy Technology Data Exchange (ETDEWEB)
The following is the optimized pulsed laser deposition (PLD) procedure by which we prepared the final samples that were sent to LLNL. These samples are epitaxial multilayer structures of Si/YSZ/CeO/NSMO, where the abbreviations are explained in the following table. In this heterostructure, YSZ serves as a buffer layer to prevent deleterious chemical reactions, and also serves to de-oxygenate the amorphous SiO{sub 2} layer to generate a crystalline template for epitaxy. CeO and BTO serve as template layers to minimize the effects of thermal and lattice mismatch strains, respectively. More details on the buffer and template layer scheme are included in the manuscript [Yong et al., 2008] attached to this report.
2008-06-25
International Nuclear Information System (INIS)
The authors discuss several aspects of defect formation in epitax heterostructures based on solid solutions of A"3B"5 semiconductor compounds; these heterstructures were prepared by liquid phase epitaxy by cooling suitable high-temperature solutions from the initial growth temperature. An analysis shows that the regions near heterojunctions are regions of increased defect density even in compositions based on Al /SUB x/ Ga /SUB 1-x/ As-GaAs, Al /SUB x/ Ga /SUB 1-x/ P-GaP, Al /SUB x/ Ga /SUB 1-x/ Sb-GaSb, where the differences in lattice parameters of the contacting materials are a minimum.
The phase stability of silicides of Ni, Pt and Pd in contact with single crystal or amorphous silicon is examined. The presence of a particular silicide phase is identified by X-ray diffraction, and Rutherford backscattering is used to study composition. It is concluded that Pt or Pd silicides are suitable for Schottky barriers. Layers of silicon can be grown quickly by solid phase epitaxy at temperatures of 300-500C and using an intermediate metal film. Experimental results are reported. Doped layers have been obtained which have electrical characteristics suitable for the junctions in solar cells. The effects of impurities and orientation of the substrate on the growth kinetics are discussed.
Energy Technology Data Exchange (ETDEWEB)
During the recrystallization by solid-phase-epitaxial (SPE) growth of supersaturated silicon alloys, a high concentration of interstitials is trapped. These are released by subsequent heating causing a transient (greatly enhanced) diffusion of the substitutional dopant by an interstitialcy mechanism. The enhancement may be as much as five orders of magnitude over tracer values, and shows an activation energy of only 1.8 +- 0.2 eV. Following the transient, the interstitials condense into loops, allowing an independent estimate to be made of their concentration. From these observations, we propose that during ion implantation, a fraction of the implanted dopants can acquire their natural valency, and retain it as the crystallization interface passes. For group V dopants this creates the trapped interstitials, giving transient enhanced diffusion when they are released by subsequent annealing.
1984-08-01
1. 55 [mu]m buried ridge stripe laser diodes grown by gas source molecular beam epitaxy
Energy Technology Data Exchange (ETDEWEB)
Buried ridge stripe lasers have been grown on InP in two steps by gas source molecular beam epitaxy. The active structure consists of a compressively strained layer multi quantum well with an equivalent wavelength emission at 1.5 [mu]m. The stripe was defined by reactive ion etching. A threshold current of 22 mA was reproducibly obtained on a laser length of 500 [mu]m. A CW output power of 48 mW per facet was achieved. In addition, preliminary accelerated aging tests have shown the high reliability the structure. (orig.)
1993-02-01
International Nuclear Information System (INIS)
The total interaction cross sections (#sigma#_t) of some sugars and amino acids and five elements: lithium, carbon, oxygen, aluminium and calcium have been measured for 6.4 keV, 13.95 keV, 14.4 keV, 17.74 keV, 24.14 keV, 30.8 keV, 35 keV, 59.54 keV, 81 keV, 122 keV and 136 keV photons in a narrow beam good geometry set up, by using high resolution detectors such as a Si-PIN diode detector and a high purity germanium detector. The #sigma#_t values have been used in a matrix method to evaluate the effective atomic numbers Z_e_f_f of the samples from their effective atomic cross sections #sigma#_a. The effective atomic cross section of a sample #sigma#_a is the total interaction cross section divided by the total number of atoms of all types in it. Further, a quantity called the effective atomic weight A_e_f_f of a sample was defined as the ratio of the molecular weight A to the total number of atoms of all types in it. The variation of Z_e_f_f ...
2007-09-28
Technology of iodine-131 production and its application
International Nuclear Information System (INIS)
Full text: Production: This radio iodine produced by three methods: 1) Wet method: The irradiated tellurium is dissolved in an oxidizing mixture which also converts iodine in to iodide. This is a chemical method and iodine that it produced with this method has low purity and efficiency. 2). Dry Method: The irradiated tellurium is dissolved in furnace (750 deg. C) with sublimation method and iodine absorbed in sodium solution . In this case we have more than 99.5 % purity and 80 % efficiency. We are using this type in Iran. 3) Fission fragment method: In this case the iodine separated from fission fragment directly and we have high purity (career free) and specific activity of iodine. Application: Iodine is a versatile tracer element. It is used to determine thyroid cancer metastases, and size, shape and activity of the thyroid gland. Critical organ of iodine is thyroid gland. One of the common diagnostic procedures for determining thyroid ...
Energy Technology Data Exchange (ETDEWEB)
(methine-{sup 3}H)1,1-Di-(4-chlorophenyl)-2,2,2-trichloroethane ((methine-{sup 3}H)DDT) and its di-(4-nitrophenyl) analog, both of high purity with a moderately high specific activity were prepared. Chloro-benzene was condensed with (1-{sup 3}H)1-(4-chlorophenyl)-2,2,2-trichloro-ethanol, which has been synthesized by sodium boro({sup 3}H)hydride reduction of 4-chlorophenyl trichloromethyl ketone. The purified ({sup 3}H)DDT had a specific activity of 0.77 Ci/mmol (28.49 GBq/mmol). (methine-{sup 3}H)1,1-Diphenyl-2,2,2-trichloroethane was similarly synthesized and was nitrated to give (methine-{sup 3}H)1,1-di-(4-nitrophenyl)-2,2,2-trichloro-ethane of 1.63 Ci/mmol (60.31 GBq/mmol). Dehydrochlorination with housefly enzyme (glutathione-dependent DDT dehydrochlorinase) showed a remarkable isotope effect. For DDT, the observed tritium isotope effect on V{sub max}/K{sub m} was 11.51{plus minus}0.52. For the nitro-analog, the value was 11.3{plus ...
1989-08-01
International Nuclear Information System (INIS)
Three copper-based alloys, CDA 102 (oxygen-free, high-purity copper), CDA 613 (aluminum bronze), and CDA 715 (Cu-30Ni), are candidates for the fabrication of high-level radioactive-waste disposal containers. Waste will include spent fuel assemblies from reactors as well as borosilicate glass, and will be sent to the prospective repository site at Yucca Mountain in Nye County, Nevada. The decay of radionuclides will result in the generation of substantial heat and in fluxes of gamma radiation outside the containers. In this environment, container materials might degrade by atmospheric oxidation, general aqueous phase corrosion, localized corrosion (LC), and stress corrosion cracking (SCC). This volume is a critical survey of available data on pitting and crevice corrosion of the copper-based candidates. Pitting and crevice corrosion are two of the most common forms of LC of these materials. Data on the SCC of these alloys is surveyed in Volume 4. Pitting usually ...
1991-07-01
Structure and property relationship in the mixed-conducting Sr-Fe-Co-O system.
Energy Technology Data Exchange (ETDEWEB)
Mixed-conducting ceramic oxides have potential uses in high-temperature electrochemical applications such as solid oxide fuel cells, advanced batteries, sensors, and oxygen-permeable membranes. The Sr-Fe-Co-O system combines high electronic/ionic conductivity with appreciable oxygen permeability at elevated temperatures. Dense ceramic membranes made of this material can be used to separate high-purity oxygen from air without the need for external electrical circuitry, or to partially oxidize methane to produce syngas. Samples of Sr{sub 2}Fe{sub 3{minus}x}Co{sub x}O{sub y} (with x = 0, 0.6, 1.0, and 1.4) were prepared by solid-state reaction in atmospheres with various oxygen partial pressures (pO{sub 2}) and were characterized by X-ray diffraction, scanning electron microscopy, and electrical conductivity measurements. Phase components of the samples are dependent on cobalt concentration and synthesis pO{sub 2}. Total conductivity increases with increasing ...
1998-05-18
Nonstoichiometry and diffusion in ceria and ceria solid solutions
Energy Technology Data Exchange (ETDEWEB)
Some of the results of property measurements of CeO{sub 2} and its solid solutions were reviewed. The deviation from stoichiometry of undoped and doped CeO{sub 2} was presented in several figures, which suggested that CeO{sub 2} fired at high temperatures in air might be nonstoichiometric in some degree. At low temperatures, the deviation from stoichiometry in doped CeO{sub 2} is higher than undoped CeO{sub 2}. As another interesting property, CeO{sub 2} shows high solubility to trivalent cations such as rare earth elements. A possible reason behind this high solubility was presented. The nonstoichiometric defect in undoped CeO{sub 2} and the trivalent cation in solid solution with CeO{sub 2} have to be compensated by other defects. The possible defect structures in this solid solution were reviewed and the most probable structure was chosen based on density measurement and impurity dependence of oxygen diffusion coefficient. Finally the oxygen diffusion coefficients in this oxide ...
2003-07-01
Large sample NAA facility at GRR-1 research reactor: Design and applications
International Nuclear Information System (INIS)
Full text: A Large Sample Neutron Activation Analysis (LSNAA) facility is under development at GRR-1 research reactor, NCSR 'Demokritos'. The LSNAA facility design incorporates sample irradiation in the reactor's graphite thermal neutron column and subsequent measurement of the activity induced at a gamma spectroscopy system with gamma ray transmission measurement options included. Monte Carlo neutron and photon transport code MCNP-4C was used to model the facility. Appropriate correction factors accounting for neutron field perturbation during sample irradiation, high purity germanium detector efficiency for the volume source and gamma ray self-absorption within the sample itself were derived. The results of the computations were experimentally verified by activation foil measurements for a set of known materials and a range of sample sizes extending up to 10 litters. Moreover, the special issue of large sample analysis of non-homogeneous ...
2003-06-09
International Nuclear Information System (INIS)
Post-irradiation annealing was used to help identify the role of radiation-induced segregation (RIS) in irradiation-assisted stress corrosion cracking (IASCC) by preferentially removing dislocation loop damage from proton-irradiated austenitic stainless steels while leaving the RIS of major and minor alloying elements largely unchanged. The goal of this study is to better understand the underlying mechanisms of IASCC. Simulations of post-irradiation annealing of RIS and dislocation loop microstructure predicted that dislocation loops would be removed preferentially over RIS due to both thermodynamic and kinetic considerations. To verify the simulation predictions, a series of post-irradiation annealing experiments were performed. Both a high purity 304L (HP-304L) and a commercial purity 304 (CP-304) stainless steel alloy were irradiated with 3.2 MeV protons at 360 deg. C to doses of 1.0 and 2.5 dpa. Following irradiation, post-irradiation ...
2002-04-01
Implications of high temperature superconductors for power generation
International Nuclear Information System (INIS)
Superconducting generators for high power applications have been of interest for a number of years. Superconducting generators using low temperature superconductors (LTS) have been manufactured to produce up to 20 MW of electrical power and have been configured in either synchronous alternators which have an AC output that may be subsequently rectified to produce DC and homopolar generators which produce low voltage DC. Typically these generators require scrupulous attention to vacuum integrity for cryogenic insulation at 4.2K and tend to be somewhat fragile because of extensive thermal and magnetic shields that are not required in conventional power generators. Recently, high purity aluminum composites have been developed for a high power AC generator that is cooled by cryogenic hydrogen at 21K. This aluminum generator is very compact and lightweight and is much more robust than a generator made with LTS because extensive thermal and magnetic ...
1991-08-03
Energy Technology Data Exchange (ETDEWEB)
Metal hydrode stores are used as fuel tanks in vehicles or as stationary stores of high-purity hydrogen. Equilibrium isotherms at low pessures were measured in order to validate the laws of Henry or Sievert for hydrogen uptake of the alloy Ti{sub 0.98}Zr{sub 0.02}V{sub 0.43}Fe{sub 0.09}Cr{sub 0.05}Mn{sub 1.5} (patented by Daimler Benz AG, code DB5800). The laws were to provide information on whether hydrogen uptake is atomic or molecular and on the conditions in which isothermal measurements are possible. (orig.) [Deutsch] Metallhydridspeicher werden als Kraftstofftank in Fahrzeuge oder als stationaere Speicher zur Bereitstellung von Reinstwasserstoff verwendet. Fuer diese Arbeit wurden die Gleichgewichtsisothermen bei kleinen Druecken vermessen, um die Gesetze von HENRY oder SIEVERT fuer die Wasserstoffaufnahme in der Legierung Ti{sub 0.98}Zr{sub 0.02}V{sub 0.43}Fe{sub 0.09}Cr{sub 0.05}Mn{sub 1.5} zu pruefen. Anhand dieser Gesetze ist zu entscheiden, ob die ...
1997-11-01
International Nuclear Information System (INIS)
This report summarizes work performed by Argonne National Laboratory (ANL) on fatigue and environmentally assisted cracking (EAC) in light water reactors (LWRs) during the six months from October 1993 to March 1994. EAC and fatigue of piping, pressure vessels, and core components in LWRs are important concerns in operating plants and as extended reactor lifetimes are envisaged. Topics that have been investigated include (a) fatigue of low-alloy steel used in piping, steam generators, and reactor pressure vessels, (b) EAC of wrought and cast austenitic stainless steels (SSs), and (c) radiation-induced segregation and irradiation-assisted stress corrosion cracking (IASCC) of Type 304 SS after accumulation of relatively high fluence. Fatigue tests have been conducted on A302-Gr B low-alloy steel to verify whether the current predictions of modest decreases of fatigue life in simulated pressurized water reactor water are valid for high-sulfur heats that show environmentally enhanced ...
2007-09-01
Activation cross sections of deuteron-induced nuclear reactions on hafnium
International Nuclear Information System (INIS)
Experimental excitation functions for deuteron-induced reactions up to 20 MeV on high purity natural hafnium were measured with the activation method using a stacked foil irradiation technique. Metallic hafnium foils with thickness of 10 #mu#m were stacked together with 50 #mu#m thick aluminium and 12 #mu#m thick titanium foils. The aluminium foils served as energy absorber while the titanium foils were used to monitor the energy and intensity of the bombarding deuteron beam. From a detailed remeasurement of the complete excitation function of the "n"a"tTi(d,x)"4"8V monitor reaction it was possible to adopt the proper incident energy and beam intensity by comparing the results with the recommended values. High resolution off-line gamma-ray spectrometry was applied to assess the activity of each foil. From the measured activity independent and/or cumulative elemental or isotopic cross section data for production of Ta, Hf and Lu radioisotopes by ...
2010-11-15
Energy Technology Data Exchange (ETDEWEB)
Craters were produced in the surface of a Pt-specimen by plasma discharge. Using a Focussed Ion Beam (FIB), TEM-foils of the cross section of the craters were prepared in order to examine the microstructural changes occurring as a result of the discharge impact. The molten material pushed to the edge of the craters was able to be identified. The grains beneath the craters reached the surface of the crater by a mechanism of epitaxial growth. (orig.)
2005-11-01
Energy Technology Data Exchange (ETDEWEB)
Epitaxial cobalt disilicide (CoSi{sub 2}) layers are grown on n-Si{sub 0.83}Ge{sub 0.17}/n-Si(001) using a sacrificial Si capping layer at the growth temperature T{sub s}=650 deg. C by reactive chemical vapor deposition using cyclopentadienyl dicarbonyl cobalt (Co({eta}{sup 5}-C{sub 5}H{sub 5})(CO){sub 2}). Structural and electrical properties of epi-CoSi{sub 2}/Si{sub 0.83}Ge{sub 0.17}/Si(001) were measured by transmission electron microscopy, X-ray diffraction, Auger electron spectroscopy and sheet resistance measurement as a function of annealing temperature. The combined results showed that the epitaxial CoSi{sub 2} phase by the reaction of Co with the Si capping layer was formed in the as-grown layers. Rapid thermal anneals for the investigation of thermal stability of the as-grown layers showed good thermal stability of the epitaxial CoSi{sub 2} layers with the low sheet resistance value as low as congruent with 4.4 ...
2004-06-30
International Nuclear Information System (INIS)
Epitaxial cobalt disilicide (CoSi_2) layers are grown on n-Si_0_._8_3Ge_0_._1_7/n-Si(001) using a sacrificial Si capping layer at the growth temperature T_s=650 deg. C by reactive chemical vapor deposition using cyclopentadienyl dicarbonyl cobalt (Co(#eta#"5-C_5H_5)(CO)_2). Structural and electrical properties of epi-CoSi_2/Si_0_._8_3Ge_0_._1_7/Si(001) were measured by transmission electron microscopy, X-ray diffraction, Auger electron spectroscopy and sheet resistance measurement as a function of annealing temperature. The combined results showed that the epitaxial CoSi_2 phase by the reaction of Co with the Si capping layer was formed in the as-grown layers. Rapid thermal anneals for the investigation of thermal stability of the as-grown layers showed good thermal stability of the epitaxial CoSi_2 layers with the low sheet resistance value as low as congruent with 4.4 #OMEGA#/cm up to the annealing temperature as high as ...
2004-06-30
Quantifying octahedral rotations in strained perovskite oxide films.
Energy Technology Data Exchange (ETDEWEB)
We have measured the oxygen positions in LaNiO{sub 3} films to elucidate the coupling between epitaxial strain and oxygen octahedral rotations. The oxygen positions are determined by comparing the measured and calculated intensities of half-order Bragg peaks, arising from the octahedral rotations. Combining ab initio density-functional calculations with these experimental results, we show how strain systematically modifies both bond angles and lengths in this functional perovskite oxide.
2010-07-20
Pyrolysis of dichlorodithiourea cadmium(II)
Energy Technology Data Exchange (ETDEWEB)
By means of infrared spectroscopy, x-ray diffraction, and differential thermal analysis, the authors investigate the pyrolysis of dichlorodithiourea cadmium, the vapor phase epitaxy of the cadmium sulfide film, and the composition of the solid and gaseous pyrolysis products. Those products are found to include the thiocyanates of guanidine, ammonium, and hydrogen along with cadmium oxides and sulfates and hydrochloric acid.
1987-02-20
ONR-NRL Superconducting Materials Symposium: A forecast
Partial Contents: Ternary Compounds; Granular Superconductors; Superconductivity in (SN)x and its Halogen Derivative (SNBr0.4)x; Studies of cuCl at Elevated Pressures; Superconducting Properties of Hydride Systems; Thin Film Superconducting Materials Research; Synthesis of Superconducting Nb3Si using High Pressures; Synthesis of Unstable A-15 Compounds by Epitaxial Recrystallization of Ion Implanted Layers; and Sputtering of Nb3Si.
1979-01-01
Energy Technology Data Exchange (ETDEWEB)
Studies of naturally occurring radioactive materials (NORM) distribution of {sup 226}Ra, {sup 228}Ra and {sup 40}K in East Malaysia were carried out as part of a marine coastal environment project. The results of measurements will serve as baseline data and background reference level for Malaysia coastlines. Sediments from 21 coastal locations and 10 near shore locations were collected for analyses. The samples were dried, finely ground, sealed in a container and stored for a minimum of 30 days to establish secular equilibrium between {sup 226}Ra and {sup 228}Ra and their respective radioactive progenies. They were counted using a high-purity germanium (HPGe) spectrometer covering the respective progeny energy peak. For {sup 40}K, the presence of this was measured directly via its 1460 keV energy peak. The concentration of {sup 226}Ra, {sup 228}Ra and {sup 40}K in samples obtained from coastal Sarawak ranged between 23 and 41 (mean 30{+-}2) Bq/kg, 27 and 45 (mean ...
2009-04-15
Corrosion by arsenic vapor at 700deg C; Korrosion durch Arsendampf bei 700deg C
Energy Technology Data Exchange (ETDEWEB)
For a wider application of GaAs single crystals for semiconductor devices a cheaper process to grow crystals with high purity and low dislocation density is required. According to todays knowledge the Czochralski method with a hot wall vessel should be the choice. The temperature of the vessel has to be 700deg C to avoid condensation of arsenic which vapourizes from the 1240deg C hot melt. Arsenic vapour is very agressive against all metals. Therefore the corrosion resistance of metals and alloys with a high melting point and also ceramics has been tested. All the alloys under investigation are corroded severely so that they have to be excluded as a material for the vessel. The metals tantalum, molybdenum and tungsten are more resistent, titanium forms initially a thick protection layer and further corrosion is greatly reduced. The ceramics investigated (TiB{sub 2}; ALN; Makor; BN) are not attacked by arsenic though they may store some arsenic. ...
1992-11-01
Strain enhanced electron spin polarization observed in photoemission from InGaAs
International Nuclear Information System (INIS)
Electron spin polarization in excess of 70% has been observed in photoemission from a 0.1 #mu#m-thick epitaxial layer of In_xGa_1_-_xAs with x #approx# 0.13 grown on a GaAs substrate. Under these conditions, the epitaxial layer is expected to be highly strained by the 0.9% lattice mismatch, as confirmed by x-ray diffractometer measurements of the lattice parameter. The electron polarization and the quantum efficiency have been measured as a function of the excitation photon energy from 1.25 to 2.0 eV. A significant enhancement of the electron polarization occurs in the vicinity of 1.33 eV where the expected strain-induced level splitting permits optical excitation of a single band transition. Measurements made on a control sample of 1.14 #mu#m thickness, significantly larger than the critical thickness for pseudomorphic strain, show no polarization enhancement. These measurements represent the first observation of strain-enhanced electron spin ...
1991-05-06
The strain dependence of Si-Ge interdiffusion in epitaxial Si/Si{sub 1-y}Ge{sub y}/Si heterostructures on relaxed Si{sub 1-x}Ge{sub x} substrates has been studied using secondary ion mass spectrometry, Raman spectroscopy, and simulations. At 800 and 880 deg. C, significantly enhanced Si-Ge interdiffusion is observed in Si/Si{sub 1-y}Ge{sub y}/Si heterostructures (y=0.56, 0.45, and 0.3) with Si{sub 1-y}Ge{sub y} layers under compressive strain of -1%, compared to those under no strain. In contrast, tensile strain of 1% in Si{sub 0.70}Ge{sub 0.30} layer has no observable effect on interdiffusion in Si/Si{sub 0.70}Ge{sub 0.30}/Si heterostructures. These results are relevant to the device and process design of high mobility dual channel and heterostructure-on-insulator metal oxide semiconductor field effect transistors.
2006-01-02
International Nuclear Information System (INIS)
The dependence of the photoluminescent properties of In_0_._4_8(Al_yGa_1_-_y)_0_._5_2P alloys (0#<=#y#<=#0.5) on growth temperature and substrate misorientation off GaAs(100) has been studied. Samples were grown using low-pressure metalorganic vapor phase epitaxy. By studying the dependence of ordering behavior in InGaP as a function of substrate misorientation and growth temperature simultaneously, a very large range in low-temperature photoluminescence emission energy---135 meV---has been obtained. The photoluminescence linewidth exhibits a strong, continuous dependence on the extent of atomic ordering (the emission energy) in the alloys. The results indicate that inhomogeneity in the microstructure of the material (i.e., between ''ordered'' domains and the ''disordered'' matrix) is the dominant photoluminescence broadening mechanism. This investigation has allowed a significant optimization of the optical properties of these materials, including the ...
A film of GaSb grown epitaxially on a Si substrate is a direct transition semiconductor useful for application as a light source in Si photonics and channel material in next-generation field effect transistors because its energy bandgap is close to the optical fibre communication wavelength and it possesses high carrier mobility. Here, we report a novel method for heteroepitaxial growth of high-quality GaSb/Si films, despite having a lattice mismatch as large as ? 12%, using elastically strain-relaxed GaSb nanodots with ultrahigh density as seed crystals for film growth. The nanodot seed crystals were grown epitaxially by restricted contact with the Si substrate through nanowindows in an ultrathin SiO(2) film on the Si substrate. A light-emitting diode containing GaSb/Si films with a thickness of ? 90 nm fabricated by this method operated at room temperature. The growth method was also used to fabricate AlGaSb films of high quality. Our method ...
2011-05-17
Monte-Carlo simulations of 2-MeV #alpha#-particle channeling in Si_1_-_xSn_x alloy
International Nuclear Information System (INIS)
Monte-Carlo simulations of 2-MeV #alpha#-particle channeling in Si_1_-_xSn_x alloys with 0#<=#x#<=#1 have been performed. The simulations are compared with measured channeling-angular scans for strained Si_0_._9_5Sn_0_._0_5 layers grown by molecular beam epitaxy (MBE). Agreement between simulated and measured angular scans can only be achieved if we assume a deviation of the crystal structure from the ideal one. This deviation can be attributed to a mosaic structure in the films and to an atomic-scale distortion of the crystal lattice due to an expected difference in the bond lengths between the Si-Si, Si-Sn and Sn-Sn atoms (such a difference in bond lengths has been observed in the epitaxial Si_1_-_xGe_x system). The contributions from both of these imperfections are estimated and discussed.
2000-04-01
GaAs concentrator cell production cost analysis
Energy Technology Data Exchange (ETDEWEB)
The utilization of GaAs in photovoltaic (PV) applications has been hindered by the cost of substrates and processing. This paper examines the cost effectiveness of GaAs cells for use in concentrator modules when produced at the 10 to 50 MW level per year. Information on costs associated with substrates, epitaxial processing, and subsequent device fabrication will be compared to allowable costs as projected by the US Department of Energy (DOE). The high cot of GaAs solar cells can be mitigated by use of low-cost substrates or high-concentration systems. The costs then can be accommodated when the production level is sufficiently high to take advantage of economies of scale in device processing and substrate price benefits when procured at high volumes. We have found that development of processing equipment, both for the epitaxial growth and device processing, is the key to obtaining production costs consistent with DOE goals. Successfully ...
1992-12-01
International Nuclear Information System (INIS)
We present an approach for fabrication of intentionally positioned epitaxial InAs QDs in a micron sized light emitting diode. For site-selective growth, a combination of molecular beam epitaxy (MBE) and focused ion beam (FIB) implantation technology in an all-ultra-high-vacuum (UHV) setup has been employed. Single dot occupancy of almost 55 % on FIB patterned nano-depressions was successfully achieved. Thereafter, carrier injection and subsequent radiative recombination from the positioned InAs/GaAs self-assembled QDs was investigated by embedding these QDs in the intrinsic part of a GaAs-based micron sized p-i-n junction device. Few or single dot are expected to be electrically addressed in these devices. We report results from electroluminescence (EL) measurement which proves the single dot characteristics of our device. The EL spectra consist of sharp emission lines and their dependence on injection current shows linear behavior for exciton ...
2010-03-21
Stresses commonly present in AlGaAs/GaAs laser heterostructures were reduced using Molecular Beam Epitaxy grown Al/sub 0.3/Ga/sub 0.7/P/sub 0.01/As/sub 0.99/ cladding layers. The Al/sub 0.3/Ga/sub 0.7/P/sub 0.01/As/sub 0.99/ alloy was grown using an incident P/sub 2/ flux of roughly-equal1 x 10/sup 14//cm/sup 2/ indicating a sticking coefficient of 0.1 at a substrate temperature of 600 /sup 0/C. X-ray automatic Bragg angle control curvature measurements were used to monitor the residual heteroepitaxial stress. Broadened double crystal x-ray linewidths indicated the occurrence of alloy grading and broadened interfaces. The effects of P concentration and film thickness on stress and on the existence of a misfit dislocation grid are discussed.
1982-09-01
X-ray diffraction evaluation of the structural perfection of cadmium telluride single crystals
A high degree of structural perfection is an essential requirement for CdTe crystals used as substrates for the epitaxial growth of CdHgTe alloys. Here, a method for the evaluation of the structural perfection of CdTe crystals is proposed which is based on X-ray diffraction measurements using both two-crystal and three-crystal diffractometers (differential version). The method makes it possible to obtain more information on structural perfection both at the crystal surface and within the crystal body.
1988-08-01
Stability of coherently strained semiconductor superlattices
International Nuclear Information System (INIS)
The excess energy of several III-V and II-VI strained-layer semiconductor superlattices (AC)_p(BC)_p is studied as a function of the repeat period p and orientation G=[001], [110], [111], and [201], using first-principles calculations. We discover a number of universal features, including the predicted instability for nearly all p's and G's with respect to bulk disproportionation, the identification of chalcopyrite as a metastable ordered structure, and the stability of all thin epitaxial [110] and [201] and most common-anion [001] superlattices relative to coherent phase separation.
Polycrystalline MBE-grown GaAs for solar cells
Energy Technology Data Exchange (ETDEWEB)
This paper will discuss initial studies of thin-film GaAs grown by molecular-beam epitaxy for use in developing a thin-film GaAs solar cell. Photocurrent and photoluminescence intensity are related to the material morphology as a function of growth conditions. Growth temperature and V/III ratio have a dramatic effect on the photocurrent. However, it seems likely that even after optimizing such growth parameters, it will be necessary to provide substrates that can provide templates to enhance grain size from the start of thin-film growth. {copyright} {ital 1997 American Institute of Physics.}
1997-02-01
Point defect supersaturation and enhanced diffusion in SPE regrown silicon
Energy Technology Data Exchange (ETDEWEB)
Transient, greatly enhanced diffusion has been observed on annealing solid-phase-epitaxial (SPE) grown Si-Sb alloys. This is shown to be due to a high concentration of interstitials being trapped during SPE regrowth. The migration enthalpy, for diffusion of Sb by an interstitialcy mechanism was measured as 1.8 +/- 0.2 eV. The interstitials eventually condensed into loops, marking the end of the transient. In a SPE grown Si-Bi alloy a similar transient enhanced diffusion was observed, with an activation energy of 2.0 +/- 0.2 eV, but no loops formed. 8 figures, 7 references.
1984-01-01
Point defect supersaturation and enhanced diffusion in SPE regrown silicon
International Nuclear Information System (INIS)
Transient, greatly enhanced diffusion has been observed on annealing solid-phase-epitaxial (SPE) grown Si-Sb alloys. This is shown to be due to a high concentration of interstitials being trapped during SPE regrowth. The migration enthalpy, for diffusion of Sb by an interstitialcy mechanism was measured as 1.8 +/- 0.2 eV. The interstitials eventually condensed into loops, marking the end of the transient. In a SPE grown Si-Bi alloy a similar transient enhanced diffusion was observed, with an activation energy of 2.0 +/- 0.2 eV, but no loops formed. 8 figures, 7 references.
Nanostructure of Si-Ge near-surface layers produced by ion implantation and laser annealing
International Nuclear Information System (INIS)
An annealing with the nanosecond laser light pulse is applied for crystal lattice reconstruction of a disturbed near-surface layer, which was created in semiconductor material as a result of the implantation process. Radiation with energy density higher than the threshold value causes the melting of the surface layer and than the epitaxial recrystallization from the melt on a different substrate. Structural changes occurring in the Ge implanted Si crystals after annealing with different energy densities are investigated by means of the cross-section high-resolution transmission electron microscopy. (author)
2001-09-23
The authors suggest a method of calculation of the isotherms of the spinodal and the heterogeneous equilibria in four-component systems in the framework of a unified thermodynamic model of the solution. The results of their calculations predict the existence of extended regions of immiscibility in the solid phase in the interval of temperatures usually used to obtain epitaxial layers of InAs/sub x/P/sub y/Sb/sub 1-x-y/ and AlAs/sub x/P/sub y/Sb/sub 1-x-y/.
1987-01-01
Measurement of AlP/GaP (001) heterojunction band offsets by x-ray photoemission spectroscopy
Energy Technology Data Exchange (ETDEWEB)
X-ray photoemission spectroscopy has been used to measure the valence band offset {Delta}E{sub v} for the AlP/GaP (001) heterojunction interface. The heterojunction samples were prepared by molecular-beam epitaxy. A value of {triangle}E{sub v}=0.43 eV is obtained (staggered band alignment, with AlP valence band below that of GaP). 24 refs., 8 figs., 1 tab.
1993-07-01
Ion beam crystallography of metal-silicon interfaces: Pd-Si(111)
Energy Technology Data Exchange (ETDEWEB)
The application of medium energy ion scattering in combination with channelling and blocking to the study of the initial stages of palladium silicide formation is discussed. After a brief description of the experimental arrangement and method, the effects on the Rutherford backscattering spectra of depositing small quantities of palladium on clean Si(111) are reported. The uniformity and thermal stability of thin palladium silicide films grown at room temperature were measured. Finally, channelling and blocking results were used to carry out a structural analysis of thin epitaxial Pd/sub 2/Si layers.
1982-07-09
Ion beam crystallography of metal-silicon interfaces: Pd-Si(111)
International Nuclear Information System (INIS)
The application of medium energy ion scattering in combination with channelling and blocking to the study of the initial stages of palladium silicide formation is discussed. After a brief description of the experimental arrangement and method, the effects on the Rutherford backscattering spectra of depositing small quantities of palladium on clean Si(111) are reported. The uniformity and thermal stability of thin palladium silicide films grown at room temperature were measured. Finally, channelling and blocking results were used to carry out a structural analysis of thin epitaxial Pd_2Si layers. (Auth.).
In-situ TEM study of dislocation-twin boundaries interaction in nanotwinned Cu films
British Library Electronic Table of Contents (United Kingdom)
Epitaxial thin films of nanotwinned face-centered cubic metals such as Cu possess an unprecedented combination of high hardness and high electrical conductivity due to the unique structure of nanometer-spaced coherent twin boundaries. Recent studies of in-situ nanoindentation in a transmission electron microscope have provided new insights on the deformation behavior of nanotwins that are reviewed here. In particular, two unit processes are highlighted: first, stress-induced migration of ?3 {112} incoherent twin boundary that leads to de-twinning of nanotwins; second, twinning dislocation can be multiplied at ?3 {111} coherent twin boundary.
2011-01-01
We have investigated the stability and catalytic activity of epitaxial overlayers of rhodium on Au(111) and Pd(111). Both surfaces show a strong affinity for hydrogen. We have calculated the energy of adsorption both for a strongly and a more weakly adsorbed species; the latter is the intermediate in the hydrogen evolution reaction. Both the energy of activation for hydrogen adsorption (Volmer reaction) and hydrogen recombination (Tafel reaction) are very low, suggesting that these overlayers are excellent catalysts. PMID:21847482
2011-08-16
Energy Technology Data Exchange (ETDEWEB)
Focussed ion beam (FIB) technology has the advantage of being a maskless process compatible with UHV processing. This makes it attractive for use in in situ processing and has been applied to the fabrication of various mesoscopic structures. The present paper reviews these results whilst putting emphasis on in situ processing by a combined FIB and molecular beam epitaxy system. The typical performance of present FIB systems is also presented. In order to utilize the potential advantages of FIB processing, reduction of damage and improvement of throughput are important, and much effort has been devoted to developing processing techniques which require a reduced dose. The importance of low-energy FIB is discussed. (author).
1993-06-01
International Nuclear Information System (INIS)
Focussed ion beam (FIB) technology has the advantage of being a maskless process compatible with UHV processing. This makes it attractive for use in in situ processing and has been applied to the fabrication of various mesoscopic structures. The present paper reviews these results whilst putting emphasis on in situ processing by a combined FIB and molecular beam epitaxy system. The typical performance of present FIB systems is also presented. In order to utilize the potential advantages of FIB processing, reduction of damage and improvement of throughput are important, and much effort has been devoted to developing processing techniques which require a reduced dose. The importance of low-energy FIB is discussed. (author).
Continuous wave lasing operation with the shortest wavelength for semiconductor lasers was obtained from AlGaInP double heterostructure lasers at 77 K. The structure was grown by metalorganic vapor phase epitaxy. Lasing wavelength was 583.6 nm (yellow). Threshold current was 43 mA (1.9 kA/cm/sup 2/). Magnesium was adopted as a p-type dopant, and was proved to be preferable for a high aluminum composition AlGaInP cladding layer.
1986-03-03
International Nuclear Information System (INIS)
The (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P material system, lattice matched to GaAs substrates, is useful for visible laser diodes. Here, low pressure organometallic vapor phase epitaxial growth of Ga/sub 0.5/In/sub 0.5/P and (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P is examined. Epitaxial layers of bulk materials are characterized using photoluminescence, electroreflectance, Raman scattering spectroscopy, and surface morphology studies to determine lattice match and optimum growth conditions. Lattice matching at the growth temperature produces featureless growth surfaces, while lattice matching at room temperatures results in minimum photoluminescence linewidth but cracked surface due to tensile strain during growth. Raman scattering spectra of the quaternary reveal a three-mode structure, with spectral peaks due to GaP-like, in P-like, and AIP-like LO phonons. Additionally, (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P/Ga/sub 0.5/In/sub ...
The (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P material system, lattice matched to GaAs substrates, is useful for visible laser diodes. Here, low pressure organometallic vapor phase epitaxial growth of Ga/sub 0.5/In/sub 0.5/P and (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P is examined. Epitaxial layers of bulk materials are characterized using photoluminescence, electroreflectance, Raman scattering spectroscopy, and surface morphology studies to determine lattice match and optimum growth conditions. Lattice matching at the growth temperature produces featureless growth surfaces, while lattice matching at room temperatures results in minimum photoluminescence linewidth but cracked surface due to tensile strain during growth. Raman scattering spectra of the quaternary reveal a three-mode structure, with spectral peaks due to GaP-like, in P-like, and AIP-like LO phonons. Additionally, (Al/sub x/Ga/sub 1-x/)/sub 0.5/In/sub 0.5/P/Ga/sub 0.5/In/sub ...
1988-09-01
International Nuclear Information System (INIS)
We studied the epitaxial growth of iron silicide (#epsilon#-FeSi,#beta#-FeSi_2, and #alpha#-FeSi_2) nanodots on Si (111) substrates by Fe deposition on Si nanodots on Si (111) substrates with ultrathin Si oxide films using reflection high-energy electron diffraction, scanning tunneling microscopy, and transmission electron microscope (TEM). We formed almost single phase iron silicide nanodots by controlling the Fe deposition conditions; growth temperature, deposition rate, and amount. The #epsilon#-FeSi or #alpha#-FeSi_2 nanodots were epitaxially grown in a dome shape with an average size of #approx#5 nm and an ultrahigh density (>10"1"2 cm"-"2) on the surface. We formed #approx#2-nm high and #approx#8-nm wide #beta#-FeSi_2 nanodots in a dome shape with a density of #approx#5x10"1"1 cm"-"2 on the surface. Cross-sectional TEM images revealed that the #beta#-FeSi_2 growth continued beneath the Si surface. The part of the #beta#-FeSi_2 nanodot ...
2005-08-15
Energy Technology Data Exchange (ETDEWEB)
[sup 13]C epitaxial diamond films have been grown on [sup 12]C-type IIb diamond substrates doped with boron, using electron assisted chemical vapor deposition. The relation between etch pits to dislocations in [sup 13]C diamond film and the broadening of the first-order Raman peak was examined. The reactant gas was [sup 13]CH[sub 4] of > 99% purity. The substrate temperature was varied from 943 to 1300 C. The uneven surface morphology was confirmed by atomic force microscopy (AFM) and laser microscopy. From 943 to 1030 C, etch pit rows along left angle 100 right angle were observed. At 991 C, the etch pit density on a row was 3300 to 5000 pits/cm. The Ar[sup +] laser beam was focused on a transparent area near the row of etch pits, where the boron impurity of the substrate is less than several 10 ppm. The first-order Raman line of [sup 13]C epitaxial diamond film was broadened to 3.6-4.0 cm[sup -1]. The line broadening was 50-90% compared ...
1993-03-01
Energy Technology Data Exchange (ETDEWEB)
Main topic of the project was the manufacturing of highly efficient GaAs-solar cells and the fabrication of concentrator cells. During this process significant progress was made with the material preparation, the solar cell technology and the material and process characterisation. This succeeded in the following efficiencies: - GaAs solar cell made by MOVPE technology: 22.9% on 4 cm{sup 2} (AM1.5g) - GaAs solar cell made by LPE-ER process: 22.8% on 4 cm{sup 2} (AM1.5g) - GaAs concentrator solar cell made by LPE-ER process: 24.9% at C=100xAM1.5d - GaAs concentrator module with fresnel lenses: Module efficiency 20.1% (under irradiation of 793 W/m{sup 2}). Another main focus was the epitaxy of GaAs on Si substrate. Two different approaches were investigated. Together with the cooperation partner ASE, Heilbronn a selective growth technology was developed that led to a decreased crack formation. By a simultanous optimization of the other epitaxy and ...
1996-10-01
Radioactive targets for neutron-induced cross section measurements
Measurements using radioactive targets are important for the determination of key reaction path ways associated with the synthesis of the elements in nuclear astrophysics (sprocess), advanced fuel cycle initiative (transmutation of radioactive waste), and stockpile stewardship. High precision capture cross-section measurements are needed to interpret observations, predict elemental or isotopical ratios, and unobserved abundances. There are two new detector systems that are presently being commissioned at Los Alamos National Laboratory for very precise measurements of (n,{gamma}) and (n,f) cross-sections using small quantities of radioactive samples. DANCE (Detector for Advanced Neutron-Capture Experiments), a 4 {pi} gamma array made up of 160 BaF{sub 2} detectors, is designed to measure neutron capture cross-sections of unstable nuclei in the low-energy range (thermal to {approx}500 keV). The high granularity and high detection efficiency of DANCE, combined with the high TOF-neutron ...
2004-01-01
Tunneling magnetoresistance from a symmetry filtering effect
International Nuclear Information System (INIS)
This paper provides a brief overview of the young, but rapidly growing field of spintronics. Its primary objective is to explain how as electrons tunnel through simple insulators such as MgO, wavefunctions of certain symmetries are preferentially transmitted. This symmetry filtering property can be converted into a spin-filtering property if the insulator is joined epitaxially to a ferromagnetic electrode with the same two-dimensional symmetry parallel to the interface. A second requirement of the ferromagnetic electrodes is that a wavefunction with the preferred symmetry exists in one of the two spin channels but not in the other. These requirements are satisfied for electrons traveling perpendicular to the interface for Fe-MgO-Fe tunnel barriers. This leads to a large change in the resistance when the magnetic moment of one of the electrodes is rotated relative to those of the other electrode. This large tunneling magnetoresistance effect is being used as the ...
2008-04-01
Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.
1985-08-01
Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon
International Nuclear Information System (INIS)
A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
International Nuclear Information System (INIS)
We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As"+ implanted Si.
1984-11-26
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
Energy Technology Data Exchange (ETDEWEB)
The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As/sup +/ implanted Si. 12 references, 12 figures.
1986-01-01
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
Energy Technology Data Exchange (ETDEWEB)
We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As/sup +/ implanted Si.
1984-01-01
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
International Nuclear Information System (INIS)
The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As"+ implanted Si. 12 references, 12 figures.
Stability of coherently strained semiconductor superlattices
The excess energy of several III-V and II-VI strained-layer semiconductor superlattices ({ital AC}){sub {ital p}}(BC){sub p} is studied as a function of the repeat period {ital p} and orientation {bold G}=(001), (110), (111), and (201), using first-principles calculations. We discover a number of universal features, including the predicted instability for nearly all {ital p}'s and {bold G}'s with respect to {ital bulk} disproportionation, the identification of chalcopyrite as a metastable ordered structure, and the stability of all thin {ital epitaxial} (110) and (201) and most common-anion (001) superlattices relative to coherent phase separation.
1990-01-01
British Library Electronic Table of Contents (United Kingdom)
The light-emitting properties of cubic silicon carbide films grown by vacuum vapor phase epitaxy on Si(100) and Si(111) substrates under conditions of decreased growth temperatures (T gr ? 900?700?C) have been discussed. Structural investigations have revealed a nanocrystalline structure and, simultaneously, a homogeneity of the phase composition of the grown 3C-SiC films. Photoluminescence spectra of these structures under excitation of the electronic subsystem by a helium-cadmium laser (?excit = 325 nm) are characterized by a rather intense luminescence band with the maximum shifted toward the ultraviolet (?3 eV) region of the spectral range. It has been found that the integral curve of photoluminescence at low temperatures of measurements is split into a set of Lorentzian components. Th...
2011-01-01
Energy Technology Data Exchange (ETDEWEB)
The growth and properties of Si{sub 1{minus}y}C{sub y} and Si{sub 1{minus}x{minus}y}Ge{sub x}C{sub y} alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers with more than 1 at.% C can be fabricated. The relation between substitutional and interstitial carbon incorporation will be presented. Substitutionally incorporated C atoms allow strain manipulation, including the growth of strain-free or inversely strained Si{sub 1{minus}x{minus}y}Ge{sub x}C{sub y} layers. The mechanical properties, microscopic structure, thermal stability, as well as the influence of C atoms on band structure will be discussed.
1996-12-31
Recent advance of focused ion beam technology in maskless deposition and patterning
International Nuclear Information System (INIS)
The present article will review recent advances in focused ion beam (FIB) technology. With increasing demands for scale of integration, microfabrication technology is becoming more important and various new microfabrication tools and processing techniques are desired. FIB is one of the promising tools for future microfabrication technology. This provides maskless patterning capability, which is of importance for process simplification, nanofabrication and in the development of in situ vacuum processing. In situ vacuum processing systems are being developed by combining FIB and a molecular beam epitaxy system. Radiation damage may limit applications of FIB. However, it was demonstrated that low energy FIB (<1 keV) with very high brightness was reached and promising results for low damage processing have been obtained. (orig.).
Prediction of transient-enhanced diffusion during rapid thermal annealing of ion-implanted silicon
International Nuclear Information System (INIS)
There have been several reports of transient-enhanced diffusion during furnace or rapid thermal annealing of ion-implanted silicon and some reports of no enhancement. In this contribution, the authors show that many of the observed effects can be accounted for by an interstitial trapping mechanism, in which large numbers of Si atoms are trapped by group V dopant atoms in the amorphous material during implantation. These trapped atoms are retained during solid-phase-epitaxial (SPE) growth, but can be released later during thermal processing to give the transient-enhanced diffusion. The authors present a model which can predict the transient effects (or lack of them) for any concentration of Sb, Bi, or As dopants sufficient to amorphize the silicon and any thermal processing technology which relies on SPE growth (furnace, cw laser, or rapid thermal annealing).
1985-03-01
International Nuclear Information System (INIS)
Pre-amorphization of ultrashallow implanted boron in Silicon-on-insulator is optimized to produce an abrupt box-like doping profile with negligible electrical deactivation and significantly reduced transient enhanced diffusion. The effect is achieved by positioning the as-implanted amorphous/crystalline interface close to the buried oxide interface, to minimize interstitials whilst leaving a single-crystal seed to support solid-phase epitaxy. Based on a simple physical model of our results, we estimate that the interface between the Si overlayer and the buried oxide is an efficient interstitial sink with a recombination length of the order of 10nm or less under our experimental conditions. (author)
2008-12-01
International Nuclear Information System (INIS)
InP-quantum dots (QDs) are promising sources of single-photons and as active laser medium, emitting in the red part of the visible spectrum and thus in the range of the highest sensitivity of current silicon detectors. The self assembled QDs were grown by metal organic vapor phase epitaxy and are embedded in between distributed Bragg reflectors (DBRs), afterwards the sample was processed by a Focused Ion Beam to fabricate micro-pillars. The DBRs and the high refractive index step between pillar and air results in a three dimensional mode confinement and highly directed emission and thus higher intensity. We have investigated the mode spectra by micro-photoluminescence measurements for different pillar diameters and compared the spectra with a theoretical model showing up good consistency. Q-factors up to 3600 were achieved.
2009-03-22
Energy Technology Data Exchange (ETDEWEB)
This report describes progress during the first year of a three-year project. The objective of the research is to examine new design approaches for achieving very high conversion efficiencies. The program is divided into two areas. The first centers on exploring new thin-film approaches specifically designed for III-V semiconductors. The second area centers on exploring design approaches for achieving high conversion efficiencies without requiring extremely high quality material. Research activities consisted of an experimental study of minority carrier recombination in n-type, metal-organic chemical vapor deposition (MOCVD)-deposited GaAs, an assessment of the minority carrier lifetimes in n-GaAs grown by molecular beam epitaxy, and developing a high-efficiency cell fabrication process.
1993-01-01
New III-V cell design approaches for very high efficiency
Energy Technology Data Exchange (ETDEWEB)
This report describes progress during the first year of a three-year project. The objective of the research is to examine new design approaches for achieving very high conversion efficiencies. The program is divided into two areas. The first centers on exploring new thin-film approaches specifically designed for III-V semiconductors. The second area centers on exploring design approaches for achieving high conversion efficiencies without requiring extremely high quality material. Research activities consisted of an experimental study of minority carrier recombination in n-type, metal-organic chemical vapor deposition (MOCVD)-deposited GaAs, an assessment of the minority carrier lifetimes in n-GaAs grown by molecular beam epitaxy, and developing a high-efficiency cell fabrication process.
1993-01-01
Microstructural features in sintered Si_3N_4/SiC platelets systems
International Nuclear Information System (INIS)
Analytical TEM and high resolution TEM were used in the microstructural characterization of hot-press sintered Si_3N_4-SiC platelets composites. The quantity of sintering additives, Er_2O_3 and AlN, was varied to produce different matrices, e. g. Si_3N_4, #beta#'+#alpha#'-Sialon and #alpha#'-Sialon. Detailed analysis of platelet-sialon matrix interfaces revealed the presence of AlN polytypoids. The polytypoids nucleate preferentially onto the (0001) plane of SiC and growth epitaxially in several ten nanometer layers contributing in this way to crystallize, partially, the matrix intergranular glass pockets contacting the platelets. Possible applications of the phenomena to microstructural control, grain boundary phase control and enhanced creep resistance are discussed. (orig.).
1993-10-04
Materials aspects of multijunction solar cells
Energy Technology Data Exchange (ETDEWEB)
Atomic layer epitaxy (ALE) was used to grow several components of the cascade solar cell structure in the AlGaAs/GaAs system. An ALE reactor was constructed for multiwafer growth with a growth rate of 0.6 {mu}m h{sup -1}. Device quality GaAs and Al{sub x}Ga{sub 1-x}As films were grown with p-type background carbon doping in the ranges 10{sup 16}-10{sup 19} cm{sup -3} and 10{sup 16}-10{sup 20} cm{sup -3} respectively. N-type films were achieved by SiH{sub 4} doping, producing carrier concentrations in the range 10{sup 16}-10{sup 18} cm{sup -3}. In addition, the potential applications of the ALE technique in the photovoltaic field are discussed. (orig.).
1991-05-01
MOCVD growth of GaAs solar cells on silicon substrates
Energy Technology Data Exchange (ETDEWEB)
This paper reports advances in the development of solar cells made from GaAs-on-Si structures prepared by metalorganic chemical vapor deposition (MOCVD). The use of concentrator cells, operating at [similar to]200 suns, has led to the efficiency achievements of 21.3% (AM1.5D) for a GaAs-on-Si solar cell, and 27.6 (AM1.5D) for a homoepitaxial GaAs cell. The development of epitaxial multilayer dielectric mirrors (Bragg reflectors), as back-surface reflectors in thin-film GaAs cells, on both Si and GaAs substrates, is shown to lead to modest efficiency increases, over that of conventional designs.
1992-12-01
Low energy ion scattering study of palladium films on silicon(111)-7 x 7 surfaces
Energy Technology Data Exchange (ETDEWEB)
The initial growth process and surface structure of thin Pd(silicide) films on clean Si(111)-7x7 surfaces have been studied by low energy ion scattering (ISS) and LEED-Auger techniques. Considerable reaction between Pd and Si at room temperature is observed to extend up to 25 ML thickness of deposited Pd. Heat treatment of the room temperature film produced epitaxial silicide Pd/sub 2/Si(0001) films covered with the accumulated elementary Si layers of 1-2 ML thickness. Deposition of 1/3 ML Pd onto a heated substrate gives a Pd-embedded ordered surface of Si(111)-..sqrt..3x..sqrt..3R30/sup 0/, the feature being similar to the cases of Ag, Au/Si(111) systems.
1983-12-15
Low energy ion scattering study of palladium films on silicon(111)-7 x 7 surfaces
International Nuclear Information System (INIS)
The initial growth process and surface structure of thin Pd(silicide) films on clean Si(111)-7x7 surfaces have been studied by low energy ion scattering (ISS) and LEED-Auger techniques. Considerable reaction between Pd and Si at room temperature is observed to extend up to 25 ML thickness of deposited Pd. Heat treatment of the room temperature film produced epitaxial silicide Pd_2Si(0001) films covered with the accumulated elementary Si layers of 1-2 ML thickness. Deposition of 1/3 ML Pd onto a heated substrate gives a Pd-embedded ordered surface of Si(111)-#sq root#3x#sq root#3R30"0, the feature being similar to the cases of Ag, Au/Si(111) systems. (orig.).
Kramers-Kronig Analysis of Infrared Reflectance Spectra for Quaternary In_xAl_yGa_1_-_x_-_yN Alloy
International Nuclear Information System (INIS)
In this paper, a Kramers-Kronig (KK) analysis of infrared (IR) reflectance spectrum of quaternary In_0_._0_1Al_0_._0_6Ga_0_._9_3N film grown by molecular beam epitaxy (MBE) is reported. The infrared measurement is performed in the reflection mode at an incident angle of 15 degree sign by Fourier transform infrared (FTIR) spectroscopy at T = 300 K. The Kramers-Kronig analysis of the reflectivity data has been used to obtain the real and imaginary parts of the index of refraction (n and k), and the real and imaginary parts of the dielectric response function (#epsilon#' and #epsilon#') of the materials. Finally, the transverse optical and longitudinal optical phonons for quaternary In_xAl_yGa_1_-_x_-_yN were obtained.
2010-07-07
Formation of Cu2O Quantum Dots on SrTiO3 (100): Self-Assembly and Directed Self-Assembly
Energy Technology Data Exchange (ETDEWEB)
Nanoscale islands of Cu2O have been synthesized on single-crystal SrTiO3 (100) substrates using oxygen plasma-assisted molecular-beam epitaxy (OPA-MBE). Island growth location has been controlled by using an ex-situ Ga+ focused ion beam (FIB) to modify the growth surface in discrete locations prior to island synthesis. Analysis of Cu2O dot growth on unmodified substrate regions revealed an evolution of dot size and array density. Atomic force microscopy studies show that certain FIB substrate modification and MBE growth condition combinations lead to directed self-assembly of islands. Islands initially formed in the FIB-generated surface topography and filled those features before nucleating on neighboring unmodified surface regions.
2006-11-09
Focused-ion-beam directed self-assembly of Cu_2O islands on SrTiO_3(100)
International Nuclear Information System (INIS)
Nanoscale islands of Cu_2O have been synthesized on single-crystal SrTiO_3 (100) substrates using oxygen plasma-assisted molecular-beam epitaxy (MBE). Island growth location has been controlled by using an ex situ Ga"+ focused ion beam (FIB) to modify the growth surface in discrete locations prior to island synthesis. The FIB modifications have generated surface topography with lateral dimensions of 150-200 nm. Ex situ atomic force microscopy study after island growth reveals that certain FIB substrate modification and MBE growth condition combinations lead to directed self-assembly of metal oxide islands at the edges of the FIB modified zones.
2004-06-21
Focused-Ion-Beam Directed Self-Assembly of Cu?O Islands on SrTiO3(100)
Energy Technology Data Exchange (ETDEWEB)
Nanoscale islands of Cu?O have been synthesized on single crystal SrTiO? (100) substrates using oxygen plasma assisted molecular beam epitaxy (MBE). Island growth location has been controlled by using an ex-situ Ga? focused ion beam (FIB) to modify the growth surface in discrete locations prior to island sythesis. The FIB modifications have generated surface topography with lateral dimensions of 150-200 nm. Ex-situ AFM study after island growth reveals that certain FIB substrate modification and MBE growth condition combinations lead to directed self-assembly of metal oxide islands at the edges of the FIB modified zones.
2004-06-21
Focused ion beam preparation of inclined planes in semiconductor materials
International Nuclear Information System (INIS)
Focused ion beam (FIB) micromachining has been used to produce inclined planes on semiconductor surfaces. A 10 keV FIB system, utilising a Ga"+ liquid metal ion source (LMIS), was employed. The ramped surfaces were prepared by digitally deflecting the ion beam in a serpentine fashion over a rectangular area and incrementing the time the beam spends at a pixel, dwell time, line by line. For the conditions used, control in micromachining the inclination of the ramps to the starting horizontal surface is of the order of 1 arc s per scan of the FIB over the area of interest. The possibility of using such surfaces prepared by FIB, along with vacuum growth techniques such as molecular beam epitaxy (MBE), for application to strain relief structures and lateral device production is discussed. (author).
Focused ion beam implantation induced site-selective growth of InAs quantum dots
International Nuclear Information System (INIS)
The site-selective growth of InAs quantum dots (QDs) by a combined focused ion beam (FIB) and molecular beam epitaxy (MBE) process has been demonstrated. An array of FIB modified spots on MBE grown GaAs was fabricated. Thereafter, an in situ annealing step followed by InAs deposition was performed. The InAs QDs were preferentially formed in the holes generated by the FIB. The influences of ion dose, annealing parameters, and InAs amount were investigated. With optimized parameters, the authors observe more than 50% single dot occupancy per holes. Photoluminescence spectra confirm the good optical quality of the QDs.
2007-09-17
Enhanced diffusion from interstitial trapping during solid-phase-epitaxial growth of silicon alloys
Energy Technology Data Exchange (ETDEWEB)
During the recrystallization by solid-phase-expitaxial (SPE) growth of supersaturated silicon alloys, a high concentration of interstitials is trapped. These are released by subsequent heating causing a transient (greatly enhanced) diffusion of the substitutional dopant by an interstitialcy mechanism. The enhancement may be as much as five orders of magnitude over tracer values, and shows an activation energy of only 1.8 +/- 0.2 eV. Following the transient, the interstitials condense into loops, allowing an independent estimate to be made of their concentration. From these observations, it is proposed that during ion implantation, a fraction of the implanted dopants can acquire their natural valency, and retain it as the crystallization interface passes. For group V dopants this creates the trapped interstitials, giving transient enhanced diffusion when they are released by subsequent annealing. 12 references, 6 figures.
1984-01-01
Boron diffusion in amorphous silicon
Energy Technology Data Exchange (ETDEWEB)
We have investigated B diffusion in pre-amorphized silicon. In our experiments, the crystalline surface layer of silicon-on-insulator (SOI) substrates was completely amorphized by Ge ion implantation. Using SOI substrates in this fashion suppressed solid-phase-epitaxy regrowth, making it possible to investigate B diffusion in pre-amorphous silicon over a wider range of temperatures (500-650 deg. C) and times (5-1000 s) than has previously been reported. Diffusivities were determined with the aid of computational processes modeling. The results from this work demonstrate the B diffusion in a-Si is concentration dependent, exhibits a transient enhanced diffusion, and possesses an Arhennius behavior with activation energy of {approx}2.1 eV.
2005-12-05
Boron diffusion in amorphous silicon
International Nuclear Information System (INIS)
We have investigated B diffusion in pre-amorphized silicon. In our experiments, the crystalline surface layer of silicon-on-insulator (SOI) substrates was completely amorphized by Ge ion implantation. Using SOI substrates in this fashion suppressed solid-phase-epitaxy regrowth, making it possible to investigate B diffusion in pre-amorphous silicon over a wider range of temperatures (500-650 deg. C) and times (5-1000 s) than has previously been reported. Diffusivities were determined with the aid of computational processes modeling. The results from this work demonstrate the B diffusion in a-Si is concentration dependent, exhibits a transient enhanced diffusion, and possesses an Arhennius behavior with activation energy of #approx#2.1 eV.
2005-12-05
Auger electron spectroscopy studies of GaAs and Si metal-semiconductor structures
The use of Auger electron spectroscopy (AES) combined with in situ sputter etching for revealing the metallurgy of the metal-semiconductor interface is presented. The physical basis, measurement techniques, and data interpretation for Auger analysis of thin-film structures are briefly reviewed. Results of a detailed study of an alloyed multilayered contact (Ni/Au-Ge) on n-type epitaxial GaAs are summarized to illustrate how electrical and metallurgical contact properties can be correlated using AES. In addition, the results of a study of the growth kinetics and chemical phase identification of palladium silicide on single-crystal Si is given, as well as the initial results of a study of aluminum-palladium silicide interaction at elevated temperature. (auth)
1975-01-01
Auger electron spectroscopy studies of GaAs and Si metal-semiconductor structures
International Nuclear Information System (INIS)
The use of Auger electron spectroscopy (AES) combined with in situ sputter etching for revealing the metallurgy of the metal-semiconductor interface is presented. The physical basis, measurement techniques, and data interpretation for Auger analysis of thin-film structures are briefly reviewed. Results of a detailed study of an alloyed multilayered contact (Ni/Au-Ge) on n-type epitaxial GaAs are summarized to illustrate how electrical and metallurgical contact properties can be correlated using AES. In addition, the results of a study of the growth kinetics and chemical phase identification of palladium silicide on single-crystal Si is given, as well as the initial results of a study of aluminum-palladium silicide interaction at elevated temperature.
Antiferromagnetic ordering of defects in GaAs
Energy Technology Data Exchange (ETDEWEB)
The magnetic susceptibility of GaAs samples containing a large concentration of native defects was investigated by dc magnetization measurements. Thin GaAs films grown by molecular-beam epitaxy at very low temperatures and bulk GaAs:S samples irradiated with fast neutrons have been studied. For all samples, the susceptibility follows a Curie-Weiss law, indicating the presence of localized magnetic moments. These moments are attributed to unpaired spins located at the native defects. Negative Curie-Weiss temperatures found for both neutron-irradiated and low-temperature-grown GaAs is a clear manifestation of an antiferromagnetic interaction between the moments. The presence of a highly inhomogeneous distribution of native defects has to be assumed to account for the observed antiferromagnetic ordering.
1992-10-15
[Magnetic thin film research]: Progress report year 2
Energy Technology Data Exchange (ETDEWEB)
The work in the past year has primarily involved four areas of magnetic thin films: amorphous rare earth-transition metal alloys, epitaxial CoPt{sub 3} and Ni-Pt alloy thin films, amorphous rare earth doped Si (a new class of dilute magnetic semiconductor with large negative magnetoresistance which the authors have discovered), and exchange-coupled antiferromagnetic insulators. In the amorphous alloys, they made a systematic study of the effects of local anisotropy, macroscopic (perpendicular) anisotropy, and exchange constant on the fundamental (and practical) properties of these magnetic alloys, as originally described in the grant proposal. The work on the epitaxial Co-Pt (and more recently Ni-Pt) alloys was originally undertaken as a comparison study to the amorphous alloys. Crystalline Co-Pt alloys have many striking similarities to the amorphous rare earth-transition metal alloys: perpendicular magnetic anisotropy, magneto-optic activity, ...
1996-09-01
XPS and STM study of passive films formed on Fe-22Cr(110) single-crystal surfaces
Energy Technology Data Exchange (ETDEWEB)
X-ray photoelectron spectroscopy and ex situ scanning tunneling microscopy measurements have been combined to investigate the thickness, the chemical composition, and the structure of passive films formed in 0.5 M H{sub 2}SO{sub 4} on Fe-22Cr(110). Aging under polarization at +500 mV/SHE causes a dehydration (anodic) reaction of the outer chromium hydroxide layer of the passive film. This anodic reaction results in a thickening of the inner mixed Cr(III) and Fe(III) oxide layer enriched in Cr{sub 2}O{sub 3}. It also causes a coalescence of the oxide nuclei of the passive film and a crystallization of the inner Cr{sub 2}O{sub 3}. It also causes a coalescence of the oxide nuclei of the passive film and a crystallization of the inner Cr{sub 2}O{sub 3} oxide layer in epitaxy with the substrate. The epitaxial relationship is {alpha}-Cr{sub 2}O{sub 3}(0001) {parallel} Fe-22Cr(110) with three different azimuthal orientations. Aging under polarization ...
1996-04-01
The dependence of the photoluminescent properties of In{sub 0.48}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.52}P alloys (0{le}{ital y}{le}0.5) on growth temperature and substrate misorientation off GaAs(100) has been studied. Samples were grown using low-pressure metalorganic vapor phase epitaxy. By studying the dependence of ordering behavior in InGaP as a function of substrate misorientation and growth temperature simultaneously, a very large range in low-temperature photoluminescence emission energy---135 meV---has been obtained. The photoluminescence linewidth exhibits a strong, continuous dependence on the extent of atomic ordering (the emission energy) in the alloys. The results indicate that inhomogeneity in the microstructure of the material (i.e., between ordered'' domains and the disordered'' matrix) is the dominant photoluminescence broadening mechanism. This investigation has allowed a significant ...
1992-12-01
Energy Technology Data Exchange (ETDEWEB)
The dependence of the photoluminescent properties of In{sub 0.48}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.52}P alloys (0{le}{ital y}{le}0.5) on growth temperature and substrate misorientation off GaAs(100) has been studied. Samples were grown using low-pressure metalorganic vapor phase epitaxy. By studying the dependence of ordering behavior in InGaP as a function of substrate misorientation and growth temperature simultaneously, a very large range in low-temperature photoluminescence emission energy---135 meV---has been obtained. The photoluminescence linewidth exhibits a strong, continuous dependence on the extent of atomic ordering (the emission energy) in the alloys. The results indicate that inhomogeneity in the microstructure of the material (i.e., between ordered'' domains and the disordered'' matrix) is the dominant photoluminescence broadening mechanism. This investigation has allowed a significant optimization ...
1992-12-01
Normal-state conductance used to probe superconducting tunnel junctions for quantum computing
International Nuclear Information System (INIS)
Here we report normal-state conductance measurements of three different types of superconducting tunnel junctions that are being used or proposed for quantum computing applications: p-Al/a-AlO/p-Al, e-Re/e-AlO/p-Al, and e-V/e-MgO/p-V, where p stands for polycrystalline, e for epitaxial, and a for amorphous. All three junctions exhibited significant deviations from the parabolic behavior predicted by the WKB approximation models. In the p-Al/a-AlO/p-Al junction, we observed enhancement of tunneling conductances at voltages matching harmonics of Al-O stretching modes. On the other hand, such Al-O vibration modes were missing in the epitaxial e-Re/e-AlO/p-Al junction. This suggests that absence or existence of the Al-O stretching mode might be related to the crystallinity of the AlO tunnel barrier and the interface between the electrode and the barrier. In the e-V/e-MgO/p-V junction, which is one of the candidate systems for future superconducting ...
2010-04-01
Energy Technology Data Exchange (ETDEWEB)
In order to fabricate high temperature superconducting tapes for power applications, the authors have analyzed different buffer layer architectures grown on textured Ni substrates suitable for YBCO deposition. Due to its optimal lattice matching the studied structures present as top layer a CeO{sub 2} film. The deposition of CeO{sub 2} on Ni substrates was performed by pulsed laser ablation and by e-beam evaporation at different temperatures. The films obtained by the two deposition techniques have not optimal structural properties, having a polycrystalline component. The misorientation of CeO{sub 2} is probably due to the formation of NiO at the interface between the film and the substrate during the deposition process even if no oxygen is introduced. In order to prevent Ni oxidation an intermediate 2000 {angstrom} Pd thick film was deposited by e-beam. Furthermore, the lattice mismatch between Pd and CeO{sub 2} is smaller than that between Ni and CeO{sub 2}. The Pd layer inhibits ...
1999-04-20
Influence of phosphorus vapor ambient for InGaAsP growth on GaAs substrate
For visible-light-emitting laser diodes, InGaAsP double heterostructures have been grown on GaAs substrates using liquid-phase epitaxy. As the growth temperature is as high as about 780 /sup 0/C, a large amount of phosphorus evaporates from the solutions for the cladding layers during the growth process. The phosphorus vapor disturbs the solution composition for the active layer, so that very thin and uniform active layers cannot be obtained. By using In-P-Sn solution and supplying the phosphorus partial pressure around the graphite boat, the influence of phosphorus vapor ambient for InGaAsP (lambda/sub P//sub L/ = 805 nm) growth is confirmed. When the phosphorus partial pressure increases, the surface of epitaxial layer becomes rough and the substrate is partly etched back. From x-ray diffraction and photoluminescence spectral measurements, the composition of the grown layer is also found to be changed. As a result of increasing the flow rate ...
1986-12-01
Room-temperature continuous-wave (cw) operation is achieved in the MBE (molecular-beam epitaxy)-grown InGaP/InGaAlP double-heterostructure (DH) visible laser diodes with a threshold current of 110 mA. The lasing wavelength and threshold current density under pulsed operation are 666 nm and as low as 3.9 kA/cm/sup 2/, respectively. This result is achieved by the introduction of H/sub 2/ into the growth chamber during growth, the continuous growth from one layer to the next layer, and the introduction of a GaAs buffer layer. InGaP/InGaAlP quantum well structures are also grown. From photoluminescence measurements, the conduction-band discontinuity ..delta..E/sub c/ is estimated to be 0.43 of the band-gap difference ..delta..E/sub g/. Furthermore, the multiquantum-well (MQW) structure is found to be stable under thermal treatment at temperatures as high as 750 /sup 0/C. Room-temperature pulsed operation of InGaP/InGaAlP MQW laser diodes is achieved for the first time. ...
1987-03-01
AlGaInP double heterostructure laser diodes with a GaInP active layer constitute a basic laser structure for visible-light lasers using an AlGaInP alloy system. This paper gives a detailed description of (Al/sub x/Ga/sub 1 - x/)/sub 0.5/In/sub 0.5/P metalorganic vapor phase epitaxial growth, laser-fabrication processes, and basic device-characteristics for these lasers. The obtained pulsed-threshold-current was about 3.8 kA/cm/sup 2/(3.2 kA/cm/sup 2/ minimum) for laser diodes with an 8-10 /n//m wide and 150-300 ..mu..m long injection stripe. High characteristic-temperature T/sub o/ for the temperature dependence of pulsed threshold current was obtained and was found to be dependent on band-gap-energy differences between active layers and cladding layers. The maximum value for T/sub o/ was 222 K. The lasing wavelength of an AlGaInP double heterostructure laser diode with a GaInP active layer was found to depend on growth conditions and dopant behaviour during the ...
1987-06-01
International Nuclear Information System (INIS)
In various situations, measurements in prompt gamma neutron activation analysis (PGNAA) are performed to determine the amount of an elemental impurity relative to that of a major constituent of the matrix. An example of this is the measurement of hydrogen concentration in a metallic matrix. In all such cases, a major contributor to the uncertainty in the measurement is the uncertainty in the ratio of the high-purity germanium (HPGe) detector full-energy peak efficiency for the gamma-ray lines of interest (i.e., impurity and matrix gammas). Usually, the ratio is derived from the relative peak efficiency curve, which is determined using isotopic standards that emit multiple gamma ray lines (e.g., "1"5"2Eu) in the energy range <3000 keV, or using prompt gamma radionuclides (e.g., "1"4N, "3"5Cl) in the energy range >3000 keV. In either case, the uncertainty in the ratio of the peak efficiency values derived from such measurements will be on the order of a few ...
2001-06-17
Trimodal island distribution of Ge nanodots on (001)Si
International Nuclear Information System (INIS)
Molecular beam epitaxy (MBE) grown Ge nanodots are found to come in a clear trimodal island distribution of huts, pyramids, and domes when grown on (001)Si at 550 deg. C. The island types appear in this order as Ge coverage increases and for a certain coverage all three types are found to coexist at this growth temperature. Previously Ge nanodots have mostly been divided into huts and domes at growth temperatures below 600 deg. C, or pyramids and domes above 600 deg. C. The (105) faceted pyramidal and elongated huts and the multifaceted domes are well known, but a distinction has not previously been seen between huts and a separate size distribution of similarly (105)-faceted pyramidal nanodots twice the size of huts, at temperatures below 600 deg. C. The 20-25 nm wide huts also appear to be the smallest obtainable self-assembled Ge dots on (001)Si, in accordance with predictions based on Si_1_-_xGe_x nanodots on (001)Si. They are about a factor of two too large ...
2006-09-15
Transient enhanced diffusion of Sb and B due to MeV silicon implants
Energy Technology Data Exchange (ETDEWEB)
We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si{sup +} ion implants at very high doses ({approx}10{sup 16}cm{sup {minus}2}). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation ({approx}700 at 740{degree}C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of {l_brace}311{r_brace} defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV implant under similar annealing conditions, implying that an interstitial supersaturation is present at the same time. We ...
1997-06-01
Transient enhanced diffusion of Sb and B due to MeV silicon implants
International Nuclear Information System (INIS)
We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si"+ ion implants at very high doses (#approx#10"1"6cm"-"2). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation (#approx#700 at 740 degree C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of #left brace#311#right brace# defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV implant under similar annealing conditions, implying that an interstitial supersaturation is present at the same time. We discuss possible ...
Transient enhanced diffusion in ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
We discuss the transient-enhanced diffusion of Sb, As, P, In, Ga, and B in ion-implanted Si, where the near-surface region has been amorphized by the dopant or by a self-implantation process. With Sb, a large transient diffusion enhancement is observed proportional to dopant concentration. For Sb, As, P, and In, the enhancement follows the relative interstitialcy diffusion coefficient. We believe this behavior is caused by stable implantation-induced point defects present in the amorphous surface layer, which decay during thermal processing to release high concentrations of self-interstitials. This process occurs in competition with the solid phase epitaxial (SPE) growth process, and for high dopant concentrations can occur in the amorphous phase ahead of the crystallization front. We believe this may be the origin of the dopant redistribution which can occur during SPE growth, which sets the upper limit to the dopant concentration which can be incorporated in the ...
1987-03-01
The effect of boron implant energy on transient enhanced diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
Transient enhanced diffusion (TED) of boron in silica after low energy boron implantation and annealing was investigated using boron-doping superlattices (DSLs) grown by low temperature molecular beam epitaxy. Boron ions were implanted at 5, 10, 20, and 40 keV at a constant dose of 2{times}10{sup 14}/cm{sup 2}. Subsequent annealing was performed at 750{degree}C for times of 3 min, 15 min, and 2 h in a nitrogen ambient. The broadening of the boron spikes was measured by secondary ion mass spectroscopy and simulated. Boron diffusivity enhancement was quantified as a function of implant energy. Transmission electron microscopy results show that {l_angle}311{r_angle} defects are only seen for implant energies {ge}10 keV at this dose and that the density increases with energy. DSL studies indicate the point defect concentration in the background decays much slower when {l_angle}311{r_angle} defects are present. These results imply there are at least two sources of TED ...
1997-02-01
The Study of Phosphors Efficiency and Homogeneity using a Nuclear Microprobe
Energy Technology Data Exchange (ETDEWEB)
Ion Beam Induced Luminescence (IBIL) and Ion Beam Induced Charge Collection (IBICC) have been applied in the study of the luminescence emission efficiency and investigation of the homogeneity of the luminescence emission in phosphors. The IBIL imaging was performed by using sharply focused ion beams or broad/partially-focused ion beams. The luminescence emission homogeneity in samples was examined to reveal possible distributed crystal-defects that may lead to the inhomogeneity of the luminescence emission in samples.The purpose of the study is to search for suitable luminescent thin films that have high homogeneity of luminescence emission, large IBIL efficiency under heavy ion excitation, and can be placed as a thin layer on the top of microelectronic devices to be analyzed with Ion Photon Emission Microscopy (IPEM). The emission yield was found to be low for organic materials, due to saturation of the light output dependence on the energy deposition of heavy ions. The emission yield ...
2000-12-08
The Reduction of TED in Ion Implanted Silicon
International Nuclear Information System (INIS)
The leading challenge in the continued scaling of junctions made by ion implantation and annealing is the control of the undesired transient enhanced diffusion (TED) effect. Spike annealing has been used as a means to reduce this effect and has proven successful in previous nodes. The peak temperature in this process is typically 1050 deg. C and the time spent within 50 deg. C of the peak is of the order of 1.5 seconds. As technology advances along the future scaling roadmap, further reduction or elimination of the enhanced diffusion effect is necessary. We have shown that raising the peak temperature to 1175 deg. C or more and reduction of the anneal time at peak temperature to less than a millisecond is effective in eliminating enhanced diffusion. We show that it is possible to employ a sequence of millisecond anneal followed by spike anneal to obtain profiles that do not exhibit gradient degradation at the junction and have junction depth and sheet resistance appropriate to the ...
2008-11-03
Surface oxidation processes in compound semiconductors studied by profile imaging
International Nuclear Information System (INIS)
The profile imaging technique is used to study the oxidation of ZnTe and InP surfaces induced by in situ reaction due to the electron beam of the microscope and by ex situ heating in air. For both materials, in situ reaction with the electron beam resulted in desorption of the anion species and the formation of the metal oxide. The observation of In metal particles, and the fact that the rate of formation of In_2O_3 was substantially reduced by an improvement of the vacuum near the specimen region, suggested that the presence of oxygen is not involved in the desorption process. The ex situ heating of ZnTe up to 260 degrees C in air resulted in crystals of ZnO and Te metal, generally in a layered surface region with the sequence of ZnTe/Te/ZnO. The large Te crystals usually had an epitaxial relationship with the bulk ZnTe but the small ZnO crystals had random orientations. The ex situ heating of InP to 380 degrees C in air only gave rise to small crystals of In_2O_3 ...
Positioning of self-assembled InAs quantum dots by focused ion beam implantation
International Nuclear Information System (INIS)
Self-assembled quantum dots (QDs) are envisioned as building blocks for realization of novel nanoelectronic devices, for which the site-selective growth is highly desirable. This thesis presents a successful route toward selective positioning of self-assembled InAs QDs on patterned GaAs surface by combination of in situ focused ion beam (FIB) implantation and molecular beam epitaxy (MBE) technology. First, a buffer layer of GaAs was grown by MBE before a square array of holes with a pitch of 1-2 #mu#m was fabricated by FIB implantation of Ga and In, ions respectively. Later, an in-situ annealing step followed by InAs deposition was performed. The InAs QDs were preferentially formed in the holes generated by FIB. The influence of ion dose, annealing parameters and InAs amount was investigated in this work. With optimized parameters, more than 50 % single dot occupancy per hole is achieved. Furthermore, the photoluminescence spectra from positioned QDs confirm their ...
2006-07-01
Point defect engineering in preamorphized silicon enriched with fluorine
International Nuclear Information System (INIS)
Fluorine is known to have a beneficial role for the B diffusion reduction in preamorphized Si, and is promising for the realization of ultra-shallow junctions. Thus, we studied the F incorporation in Si during the solid phase epitaxy (SPE) process, pointing out the effects of the implanted F energy and fluence and the role played by the possible presence of dopants. The incorporation of fluorine proceeds by F segregation at the amorphous-crystalline interface, with a kinetics driven by the SPE rate. In fact, the quicker the SPE rate, the higher is the F fluence retained. Moreover, we demonstrated that F incorporated in Si layers does not appreciably affect the Is emission from spatially separated end-of-range (EOR) defects. The modification, induced by the presence of F, of the point defect density (Is and Vs) was also studied by means of B and Sb spike layers, used as local markers for Is and Vs, respectively. We showed that F is not only able to completely ...
2006-12-01
Energy Technology Data Exchange (ETDEWEB)
Room temperature continuous wave operation of red ([lambda][sub 0] [approximately] 660 nm) vertical cavity surface emitting laser arrays is reported. The 1 [times] 64 arrays have a pitch of 100 [mu]m with device diameters of 15 [mu]m with device diameters of 15 [mu]m. Grown by metalorganic vapor phase epitaxy, the devices consist of an AlGaInP strained quantum well optical cavity active region surrounded by AlGaAs distributed Bragg reflectors (DBR's). The top coupling DBR includes a partial dielectric stack, deposited after implanted device fabrication. All 64 devices operation simultaneously with peak output powers >0.45 mW, threshold current <1.5 mA, and threshold voltages [<=] 2.7 V. The differential quantum efficiencies exceed 10%.
1994-12-01
Novel InN growth method under In-rich condition on GaN/Al2O3(0001) templates
International Nuclear Information System (INIS)
A novel technique is proposed for the growth of an InN film on a GaN/Al2O3(0001) template by radio-frequency plasma-excited molecular beam epitaxy (RF-MBE). The method involves 1) InN growth under an In-rich condition and 2) additional nitrogen radical irradiation after the InN growth under an In-rich condition. Excess In that appeared on the InN surface in the InN growth under an In-rich condition is transformed to InN by the additional nitrogen radical irradiation. The effective V/III ratio is easily controlled by monitoring the intensity in a reflection high-energy electron diffraction (RHEED) pattern. The growth of the InN film by repeating the InN growth under an In-rich condition and the additional nitrogen radical irradiation is also demonstrated. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)
2009-06-01
Energy Technology Data Exchange (ETDEWEB)
The diffusion of ion beam injected self-interstitials (I) and their interaction with impurities in crystalline Si has been investigated and modeled. In particular, the I-substitutional carbon (C) interactions have been studied, using a molecular-beam-epitaxy grown Si{sub 1-y}C{sub y} layer interposed between the shallow I-source and a deeper B-spike (marker for I-concentration). Substitutional C atoms are shown to trap I's, to be removed from their substitutional sites, and to form stable precipitates into the C-rich region. The I-trapping mechanism was quantitatively studied by a simulation code. The reactions causing trapping and deactivation are described. In addition, the boron markers approach was extended to the two dimensional (2D) diffusion. High resolution scanning capacitance microscopy was used for quantitative measurements of the 2D boron transient enhanced diffusion induced on a boron delta array by the I's ion beam injected through a ...
2003-05-01
International Nuclear Information System (INIS)
The diffusion of ion beam injected self-interstitials (I) and their interaction with impurities in crystalline Si has been investigated and modeled. In particular, the I-substitutional carbon (C) interactions have been studied, using a molecular-beam-epitaxy grown Si_1_-_yC_y layer interposed between the shallow I-source and a deeper B-spike (marker for I-concentration). Substitutional C atoms are shown to trap I's, to be removed from their substitutional sites, and to form stable precipitates into the C-rich region. The I-trapping mechanism was quantitatively studied by a simulation code. The reactions causing trapping and deactivation are described. In addition, the boron markers approach was extended to the two dimensional (2D) diffusion. High resolution scanning capacitance microscopy was used for quantitative measurements of the 2D boron transient enhanced diffusion induced on a boron delta array by the I's ion beam injected through a sub-micron dimension ...
2003-05-01
Modeling of the relaxation kinetics of metastable tensile strained Si:C alloys
Energy Technology Data Exchange (ETDEWEB)
In order to enhance the performance of CMOS transistors, embedded epitaxial layers of Si:C can be used. In the present work, Si:C layers with Carbon contents up to 1.9 at-% and in-situ Phosphorus doping up to 4 x 10{sup 20}At/cm{sup 3} have been investigated. Due to the low solubility of Carbon in Silicon (0.0004 at.-% at the melting point), all layers considered in this work are metastable and tend to relax. Since it is crucial to the application to retain the strain of those layers, the responsible mechanisms must be understood. The relaxation during thermal treatment was studied by high resolution X-ray diffraction and was found to behave differently, depending on Carbon content and Phosphorus doping concentration. In this work, we propose a relaxation mechanism based on a kick-out reaction of substitutional Carbon which is accelerated by Phosphorus content through transient enhanced diffusion. We simulate the time evolution of layer relaxation as a function of ...
2010-07-01
Microstructural observation of focused ion beam modification of Ni silicides/Si thin films
International Nuclear Information System (INIS)
Focused ion beam (FIB) irradiation of a thin Ni_2Si layer deposited on a Si substrate was carried out and studied using an in-situ transmission electron microscope (in-situ TEM). Square areas on sides of 4 by 4 and 9 by 9 microm were patterned at room temperature with a 25 keV Ga"+-FIB attached to the TEM. The structural changes of the films indicate a uniform milling, sputtering of the Ni_2Si layer and the damage introducing to the Si substrate. Annealing at 673 K results in the change of the Ni_2Si layer into an epitaxial NiSi_2 layer outside the FIB irradiated area, but several precipitates appear around the treated area. Precipitates was analyzed by energy dispersive X-ray spectroscopy (EDS). Larger amount of Ni than the surrounding matrix was found in precipitates. Selected area diffraction (SAD) patterns of the precipitates and the corresponding dark field images imply the formation of a Ni rich silicide. The relation between the FIB tail and the ...
1996-12-02
Microstructural characterization of dissimilar welds between alloy 800 and HP heat-resistant steel
International Nuclear Information System (INIS)
In this study, dissimilar welds between HP heat-resistant steel and Incoloy 800 were made with four different filler materials including: 309 stainless steel and nickel-based Inconel 82, 182 and 617. The microstructure of the base metals, weld metals and their interfaces were characterized by utilizing optical and scanning electron microscopy. Grain boundaries migration in the weld metals was studied. It was found that the migration of grain boundaries in the Inconel 82 weld metal was very extensive. Precipitates of TiC and M_2_3C_6 (M = Cr and Mo) in the Inconel 617 weld metal are identified. The necessary conditions for the formation of cracks close to the fusion line of the 309-HP joints are described. Furthermore unmixed zone near the fusion line between HP steel base metal and Inconel 82 weld metal is discussed. An epitaxial growth is characterized at the fusion line of the 309-Alloy 800 and Inconel 617-Alloy 800 joints.
2008-10-01
Microfabrication processes for high-T_c superconducting films
International Nuclear Information System (INIS)
Microfabrication processes for Y-Ba-Cu-O films have been investigated, using ion-beam techniques. High-T_c superconducting lines as narrow as 0.8 #mu#m have been fabricated from epitaxial YBa_2Cu_3O_7 _- _y films by Ar ion-beam etching (IBE), combined with focused ion-beam (FIB) lithography. The resulting lines, 1.3 #mu#m wide and 2 mm long, showed a zero resistance temperature of 81 K and a critical current density of 1.9 x 10"4 A/cm"2 at 77.3 K. Maskless etching was carried out using 130-keV au"+ focused ion-beam (FIB) with a 0.1-#mu#m-diameter beam. A 50-nm-thick film was patterned into 0.3-#mu#m-wide lines at a dose of 5 x "1"6 ions/cm"2. In comparison with Ar IBE, Cl_2 reactive ion-beam etching (RIBE) exhibited an enhancement effect in sputtering yield. Ion implantation with 300-keV Si"+ "+ FIB also indicated the possibility to produce submicrometer patterns by selectively modifying film properties from superconductive to normal or insulting.
Mechanism for transient-enhanced diffusion in ion-implanted silicon
International Nuclear Information System (INIS)
High-dose ion implantation followed by solid-phase-epitaxial (SPE) growth is now a well-established technique for the production of supersaturated silicon alloys. However, these alloys also contain a high supersaturation of silicon interstitials, which give rise to transient, greatly enhanced dopant diffusion with subsequent heating. In this contribution, the authors present a study of a series of Si-Sb alloys of various concentrations which were made by Sb implantation under various conditions to deduce the origin of the observed transient diffusion. A multiple implant scheme was employed to produce samples with an approximately uniform dopant concentration from 40 to 150 nm in depth, but with the amorphous layer extending to a depth of 380 nm. By scaling the implant doses, alloys with different concentrations in the uniform region were produced, allowing an accurate measure of diffusion coefficients as a function of concentration. Diffusion coefficients during ...
1985-03-01
Magnetic microstructure of candidates for epitaxial dual Heusler magnetic tunnel junctions
Energy Technology Data Exchange (ETDEWEB)
Heusler alloys are considered as interesting ferromagnetic electrode materials for magnetic tunnel junctions, because of their high spin polarization. We, therefore, investigated the micromagnetic properties in a prototypical thin film system comprising two different Heusler phases Co{sub 2}MnSi (CMS) and Co{sub 2}FeSi (CFS) separated by a MgO barrier. The magnetic microstructure was investigated by X-ray photoemission electron microscopy (XPEEM). We find a strong influence of the Heusler phase formation process on the magnetic domain patterns. SiO{sub 2}/V/CMS/MgO/CFS and SiO{sub 2}/V/CFS/MgO/CMS trilayer structures exhibit a strikingly different magnetic behavior, which is due to pinhole coupling through the MgO barrier and a strong thickness dependence of the magnetic ordering in Co{sub 2}MnSi.
2009-05-15
Energy Technology Data Exchange (ETDEWEB)
Undoped Al /SUB 0.5/ In /SUB 0.5/ P-Ga /SUB 0.5/ In /SUB 0.5/ P double heterostructure was grown on (100) GaAs by metalorganic chemical-vapor deposition for the first time. A mirror-like grown surface was obtained. Over ten-times stronger photoluminescence-intensity was gained from the sandwiched Ga /SUB 0.5/ In /SUB 0.5/ P-layer, than that from a single epitaxially-grown Ga /SUB 0.5/ In /SUB 0.5/ P-layer on (100) GaAs, indicating that high-quality Al /SUB 0.5/ In /SUB 0.5/ P-Ga /SUB 0.5/ In /SUB 0.5/ P heterointerfaces are formed in the double heterostructure. A lasing action by optical pumping with an argon ion laser was observed in the double heterostructure at 90 K. The observed stimulated emission wavelength was 6470 A.
1982-12-01
Linear augmented-plane-wave calculation of the structural properties of bulk Cr, Mo, and W
International Nuclear Information System (INIS)
A scalar-relativistic procedure for calculating the valence-electron contribution to the total energy of bulk and thin-film solids has been developed and applied to the fcc and bcc phases of the group-VIB transition elements Cr, Mo, and W. This approach, which is based on the linear augmented-plane-wave method and local-density-functional theory, contains no shape approximations for either the charge density or potential. The formulation adopts a rigid-core approximation and incorporates an exact treatment of the core-charge tails that extend beyond the muffin-tin spheres. The application of this procedure to bcc Cr, Mo, and W yields calculated lattice parameters and bulk moduli that are in good (Cr) to excellent (Mo and W) agreement with experiment. The present calculated properties also agree quite well with the results of previous calculations involving a variety of band-structure methods. The calculated fcc-bcc energy difference for Cr, Mo, and W increases in a nearly linear manner ...
Energy Technology Data Exchange (ETDEWEB)
In this paper, we propose to characterize boron transient enhanced diffusion (TED) for processes currently used for P{sup +}/N ultra-shallow junctions (USJ) fabrication. Indeed, the fundamental understanding of boron diffusion for low energy boron implantation is mandatory to evaluate the scalability of such processes for the coming complementary metal-oxide-semiconductor (CMOS) transistor generations. In these experiments, we characterize the boron anomalous diffusion, thanks to boron buried marker-layers obtained by epitaxial growth. B{sup +} and BF{sub 2}{sup +} ultra-low energy (ULE) implantations and plasma doping (PLAD) using BF{sub 3} as precursor gas are carried out to compare the two techniques used for advanced USJ fabrication. Boron diffusion behaviors are analyzed via secondary ion mass spectrometry for annealing at 700 deg. C for 5 min and 15 min. Finally this paper brings some physical insights explaining the technological benefit coming from PLAD ...
2005-08-01
International Nuclear Information System (INIS)
In this paper, we propose to characterize boron transient enhanced diffusion (TED) for processes currently used for P"+/N ultra-shallow junctions (USJ) fabrication. Indeed, the fundamental understanding of boron diffusion for low energy boron implantation is mandatory to evaluate the scalability of such processes for the coming complementary metal-oxide-semiconductor (CMOS) transistor generations. In these experiments, we characterize the boron anomalous diffusion, thanks to boron buried marker-layers obtained by epitaxial growth. B"+ and BF_2"+ ultra-low energy (ULE) implantations and plasma doping (PLAD) using BF_3 as precursor gas are carried out to compare the two techniques used for advanced USJ fabrication. Boron diffusion behaviors are analyzed via secondary ion mass spectrometry for annealing at 700 deg. C for 5 min and 15 min. Finally this paper brings some physical insights explaining the technological benefit coming from PLAD technique over standard ion ...
2005-08-01
Indentation modulus and hardness in heteroepitaxial Al{sub x}Ga{sub 1{minus}x}P films
Energy Technology Data Exchange (ETDEWEB)
Al{sub x}Ga{sub 1{minus}x}P layers (0 {le} x {le} 0.7), with thicknesses of {ge}1 {micro}m were grown on Si (100) wafers by metal-organic molecular beam epitaxy (MOMBE) at 450 C. Transmission electron micrographs of the single crystal films revealed that the microstructure contains stacking faults and microtwins especially near the interface as well as both threading and misfit dislocations. Hardness and elastic modulus were measured using a Nanotest 500 indenter, which can probe the film properties without influence from the substrate. The hardness H varies linearly according to (11.8 {minus} 2.3x) GPa. The absence of alloy hardening is due to the fact that there is no difference in atomic size of Al and Ga. The indentation modulus E/(1{minus}v{sup 2}) decreases monotonically from 136 GPa for GaP to 129 GPa for Al{sub 0.7}Ga{sub 0.3}P and bows only slightly (about 2%) below the straight line of linear interpolation.
1997-05-01
InAIP/InAlGaP distributed Bragg reflectors for visible vertical cavity surface-emitting lasers
International Nuclear Information System (INIS)
Distributed Bragg reflectors (DBRs) composed of In_0_._5Al_0_._5P/In_0_._5(Al_yGa_1_-_y)_0_._5P quarter-wave layers have been prepared using metalorganic vapor phase epitaxy. The structures were grown over a wide range of high-index layer composition (0#<=#y#<=#0.6) and peak reflectivity wavelength (720 nm#<=##lambda##<=#565 nm, covering the spectrum from deep red to green). In all cases observed and calculated reflectance spectra were in excellent agreement. Using these DBRs, an undoped all-phosphide visible vertical cavity surface-emitting laser structure was grown. Under pulsed optical excitation at room temperature, lasing was obtained at a wavelength of #lambda##approx#670 nm, with a threshold power density comparable to that observed from similar structures prepared using AlAs/AlGaAs DBRs.
How epitaxial are Pd/sub 2/Si-Si interfaces
Energy Technology Data Exchange (ETDEWEB)
Pd/sub 2/Si layers produced by evaporation or sputtering onto silicon substrates were examined by high resolution electron microscopy, microdiffraction, X-ray, energy loss and Auger spectroscopy. The Si-Pd/sub 2/Si interfaces produced by evaporation were in all cases rougher and more polycrystalline than those produced by sputtering. X-ray microanalysis showed the predictable variation in palladium distribution across the interface but quantification did not produce the expected palladium-to-silicon ratios, primarily because of probe broadening and X-ray-induced fluorescence. Energy loss spectra showed plasmon energy shifts and changes in Si L edge shape due to bond formation with palladium. Auger data provided evidence for a small amount of oxygen at the Si-Pd/sub 2/Si interface. Electrical measurements of the ideality factor for Schottky barriers made from the materials produced higher values for the rougher evaporation-formed interfaces consistent with interface-roughness-induced ...
1983-06-17
High-efficiency GaAs solar cells on mm and sub-mm grain-size polycrystalline Ge substrates
Energy Technology Data Exchange (ETDEWEB)
GaAs material and device structure optimization studies on optical-grade, millimeter-and-less grain-size polycrystalline Ge substrates are presented. We discuss the growth of high-quality epitaxial layers across various crystalline orientations of a polycrystalline substrate; this is important for obtaining high-performance solar cells. The GaAs solar cell on n-type poly-Ge substrate is a p-on-n type, with an undoped spacer between the p-emitter and the n-base. An experimental study of dark currents in these junctions, with and without the spacer, as a function of temperature (77K to 288K) is presented; this study suggests that the spacer reduces the tunneling contribution to dark current. In addition, we describe device-structure optimization studies that have led us to achieve an open-circuit voltage (V{sub oc}) exceeding 1 Volt and an AM1.5 efficiency of {approximately}19{percent} for a 4-cm{sup 2}-area GaAs cell on sub-mm grain-size poly-Ge. We have also ...
1997-02-01
Growth of single-crystal metastable semiconducting (GaSb)_1/sub -//sub x/Ge/sub x/ films
International Nuclear Information System (INIS)
Epitaxial metastable (GaSb)/sub 1-x/Ge/sub x/ alloys with compostions across the pseudobinary phase diagram have been grown on (100) GaAs substrates by multitarget rf sputtering. An essential feature allowing the growth of these metastable materials was low-energy ion bombardment of the growing film during deposition to enhance surface diffusion, promote mixing, and preferentially sputter incipient second-phase precipitates. Annealing experiments indicated that the metastable films exhibit good high-temperature stability and that they transform through a continuous series of GaSb-rich and Ge-rich phases in which the solute concentrations decrease until the equilibrium two-phase alloy is obtained. While the calculated free-energy difference between the single-phase metastable and equilibrium states is approx.18 meV, the measured activation barrier for the transformation is approx.3 eV. All films were p-type with room-temperature hole concentrations varying from ...
6180-01-01
Energy Technology Data Exchange (ETDEWEB)
Useful bipolar transistor action over the full temperature range from 78 to 823K has been demonstrated for mesa-isolated, liquid-phase epitaxial n/sup +/npn, GaP/Al/sub 0/ /sub 35/Ga/sub 0/ /sub 65/P/GaP/GaP structures. This represents both the highest temperature and the widest temperature range (745K) over which useful solid-state transistor action has ever been demonstrated in any III-V compound semiconductor system. These results imply that the GaP/Al/sub x/Ga/sub 1-x/P chemical system is an excellent materials candidate in which to base a technology for high-temperature electronics and the results also imply the very real possibility of functional solid-state devices and circuits at temperatures in excess of 500/sup 0/C.
1982-01-01
Formation of stable dopant interstitials during ion implantation of silicon
Energy Technology Data Exchange (ETDEWEB)
High concentrations of self-interstitials are trapped by dopant atoms during ion implantation into Si. For group V dopants, these complexes are sufficiently stable to survive solid-phase-epitaxial (SPE) growth but break up on subsequent thermal processing and cause a transient-enhanced diffusion. Dopant diffusion coefficients are enhanced by up to five orders of magnitude over tracer values and are characterized by an activation energy of approximately one half of the tracer values. In the case of group III dopants, any complexes formed during implantation do not survive SPE growth but a second source of self-interstitials becomes significant and leads to similar transient effects. This is the damaged layer underlying the original amorphous/crystalline interface. These observations provide direct evidence for long-range self-interstitial migration in Si, and we believe these are the first observations of the interstitialcy diffusion mechanism with no vacancy ...
1986-05-01
Formation of stable dopant interstitials during ion implantation of silicon
International Nuclear Information System (INIS)
High concentrations of self-interstitials are trapped by dopant atoms during ion implantation into Si. For group V dopants, these complexes are sufficiently stable to survive solid-phase-epitaxial (SPE) growth but break up on subsequent thermal processing and cause a transient-enhanced diffusion. Dopant diffusion coefficients are enhanced by up to five orders of magnitude over tracer values and are characterized by an activation energy of approximately one half of the tracer values. In the case of group III dopants, any complexes formed during implantation do not survive SPE growth but a second source of self-interstitials becomes significant and leads to similar transient effects. This is the damaged layer underlying the original amorphous/crystalline interface. These observations provide direct evidence for long-range self-interstitial migration in Si, and we believe these are the first observations of the interstitialcy diffusion mechanism with no vacancy ...
Exploring the 2D to 3D dimensionality crossover in thin iron films
Energy Technology Data Exchange (ETDEWEB)
The temperature dependence of the spontaneous magnetization of epitaxial iron films with a thickness ranging from d=20 to 200nm has been measured. The films are grown on GaAs (100) substrates which are covered by a 150nm thick silver (100) buffer layer. For three-dimensional BCC iron it was observed already in 1929 that saturation of the spontaneous magnetization for T->0 is perfectly described by a T{sup 2} power law. On the other hand, for thin two-dimensional (2D) iron films a T{sup 3/2} law has been established in many recent experimental investigations. In our iron films grown on diamagnetic silver, this dimensionality change occurs at a thickness between d=100 and 200nm. Comparison of the here-observed T{sup 3/2} coefficients with those on iron films grown on paramagnetic tungsten (110) shows that the 2D interactions are {approx}20 times larger in the films on tungsten. Recent results on Fe films which are grown directly on GaAs (100) confirm that the ...
2006-05-15
Excitonic transitions in InGaP/InAlGaP strained quantum wells
International Nuclear Information System (INIS)
Excitonic transitions in metalorganic vapor phase epitaxially grown In_xGa_1_-_xP/In_0_._4_8(Al_0_._7Ga_0_._3)_0_._5_2P strained single quantum-well structures are characterized using low-temperature photoluminescence and photoluminescence excitation (PLE) spectroscopies. The structures consist of several uncoupled quantum wells with thicknesses between 1.2 and 11.3 nm, and compositions x of 0.48 (nominally lattice matched) and 0.56 (#approx#0.6% biaxial compressive strain). The photoluminescence spectra exhibit intense peaks over the wavelength range 550--650 nm, with linewidths between 7 and 23 meV depending on the well thickness. The PLE spectra reveal strong heavy-hole and light-hole transitions, as well as higher-order (n=2) transitions in the thicker wells. The heavy-hole/light-hole splitting shows little dependence on well thickness in the strained structures, indicating a relatively large conduction band offset of #DELTA#E_C#approx#0.75#DELTA#E_G.
Electrical and structural properties of ion-implanted and post-annealed silicide films
Energy Technology Data Exchange (ETDEWEB)
The changes in the electrical and structural properties of metal-silicide films caused by ion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800/sup 0/C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10/sup 16/ Ar-ions/cm/sup 2/, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd/sub 2/Si to PdSi was also observed in the high-temperature annealing of the ...
1982-05-01
Electrical and structural properties of ion-implanted and post-annealed silicide films
International Nuclear Information System (INIS)
The changes in the electrical and structural properties of metal-silicide films caused byion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi"2, NiSi"2 and Pd"2Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800_0C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi"2, NiSi"2 and Pd"2Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10_1_6 Ar-ions/cm_2, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd"2Si to PdSi was also observed in the high-temperature annealing of the implanted Pd"2Si films. (author).
Direct evidence of the recombination of silicon interstitial atoms at the silicon surface
Energy Technology Data Exchange (ETDEWEB)
In this experiment, a Si wafer containing four lightly doped B marker layers epitaxially grown by CVD has been implanted with 100 keV Si{sup +} ions to a dose of 2 x 10{sup 14} ions/cm{sup 2} and annealed at 850 deg. C for several times in an RTA system in flowing N{sub 2}. TEM and SIMS analysis, in conjunction with a transient enhanced diffusion (TED) evaluation method based on the kick-out diffusion mechanism, have allowed us to accurately study the boron TED evolution in presence of extended defects. We show that the silicon surface plays a key role in the recombination of Si interstitial atoms by providing the first experimental evidence of the resulting Si{sub int}s supersaturation gradient between the defect region and the surface. Our results indicate an upper limit of about 200 nm for the surface recombination length of Si interstitials at 850 deg. C in a N{sub 2} ambient.
2004-02-01
Direct evidence of the recombination of silicon interstitial atoms at the silicon surface
International Nuclear Information System (INIS)
In this experiment, a Si wafer containing four lightly doped B marker layers epitaxially grown by CVD has been implanted with 100 keV Si"+ ions to a dose of 2 x 10"1"4 ions/cm"2 and annealed at 850 deg. C for several times in an RTA system in flowing N_2. TEM and SIMS analysis, in conjunction with a transient enhanced diffusion (TED) evaluation method based on the kick-out diffusion mechanism, have allowed us to accurately study the boron TED evolution in presence of extended defects. We show that the silicon surface plays a key role in the recombination of Si interstitial atoms by providing the first experimental evidence of the resulting Si_i_n_ts supersaturation gradient between the defect region and the surface. Our results indicate an upper limit of about 200 nm for the surface recombination length of Si interstitials at 850 deg. C in a N_2 ambient.
2004-02-01
Design of a GaAs X-ray imaging sensor with integrated HEMT readout circuitry
A new monolithic semi-insulating (SI) GaAs sensor design for X-ray imaging applications between 10-100keV has been proposed. Monolithic pixel detectors offer a number of advantages over hybrid bump-bonded detectors, such as high device yield, low costs and are easier to produce large scale arrays. In this thesis, an investigation is made of the use of a SI GaAs wafer as both a detector element and substrate for the epitaxially grown High Electron Mobility Transistors (HEMTs). The design of the HEMT transistors, optimised for this application, were produced with the aid of the Silvaco 'Virtual Wafer Fab' simulation package. It was determined that the device characteristics would consist of a small positive threshold voltage, a low off-state drain current and high transconductance. The final HEMT transistor design, that would be integrated to a pixel detector, had a threshold voltage of 0.17V, an off-state leakage current of approx 1nA and a transconductance of ...
2002-01-01
Al[sub 0. 3]Ga[sub 0. 7]As/GaAs heterojunction tunnel diode for tandem solar cell applications
Energy Technology Data Exchange (ETDEWEB)
A p[sup +]-Al[sub 0.3]Ga[sub 0.7]As/n[sup +]-GaAs heterojunction tunnel diode was fabricated using Atomic Layer Epitaxy (ALE) growth technique. Background carbon doping of [similar to]10[sup 20] cm[sup [minus]3] was achieved in the p-side of the diode by optimizing growth conditions such as V/III ratio, exposure times to reactant gases, and growth temperature. In the n-side of the diode GaAs was doped with silane and doping concentrations as high as 7[times]10[sup 18] cm[sup [minus]3] were also achieved. The dopants are chosen to satisfy the high levels and low diffusion requirements. The diode can be used to interconnect the high and low band-gap cells in the AlGaAs/GaAs cascade solar cell structure. The reactor used in this investigation is a commercial MOCVD system which has been specially modified for dual operation of ALE and MOCVD growth modes.
1994-06-30
AlGaInP single quantum well laser diodes
Energy Technology Data Exchange (ETDEWEB)
The properties and low pressure organometallic vapor phase epitaxy of Ga{sub x}In{sub 1{minus}x}P/(AlGa){sub 0.5}In{sub 0.5}P quantum well (QW) laser diode heterostructures with Al{sub 0.5}In{sub 0.5}P cladding layers, and having wavelength 614 < {lambda} < 690 nm, are described. At longer wavelengths ({lambda} > 660 nm), threshold current densities under 200 A/cm{sup 2} and efficiencies greater than 75% result from a biaxially-compressed GaInP QW active region. Although short wavelength laser performance is diminished by the poor electron confinement afforded by AlGaInP heterostructures, good 630 nm band performance, and extension into the 610 nm band, is achieved with strained, single QW active regions.
1994-12-31
Energy Technology Data Exchange (ETDEWEB)
Modelization of crack propagation and theoretical prediction of rupture are the two main objectives of researchers in stress corrosion cracking. Nevertheless, to reach this aim, the behavior of the passive film which appears spontaneously on the substrate in contact with an environment has to be known. This structural and mechanical characterization is all the more difficult because the number of parameters is important: crystallinity rate, defects concentration, thickness (about a few nanometers), electric field, chemical composition (a lot of oxides are present), peeling layers (atomic structure for example) and some hypothesis can be made about their multi-layer structure, their chemical composition or their epitaxial character... Passive films formed on 316L or 304L stainless steels in different aqueous solutions (in ambient air, in MgCl{sub 2} at 117 deg. C...) have been studied and some important remarks about their mechanical properties are made (brittle ...
1995-12-01
International Nuclear Information System (INIS)
Modelization of crack propagation and theoretical prediction of rupture are the two main objectives of researchers in stress corrosion cracking. Nevertheless, to reach this aim, the behavior of the passive film which appears spontaneously on the substrate in contact with an environment has to be known. This structural and mechanical characterization is all the more difficult because the number of parameters is important: crystallinity rate, defects concentration, thickness (about a few nanometers), electric field, chemical composition (a lot of oxides are present), peeling layers (atomic structure for example) and some hypothesis can be made about their multi-layer structure, their chemical composition or their epitaxial character... Passive films formed on 316L or 304L stainless steels in different aqueous solutions (in ambient air, in MgCl_2 at 117 deg. C...) have been studied and some important remarks about their mechanical properties are made (brittle ...
1995-06-01
The study of the intrinsic behavior of high transition temperature copper-oxide superconductors (HTSC) has proven to be challenging because of the extreme sensitivity of their transport properties on material quality. These compounds are characterized by a high degree of structural and electrical anisotropy, and a very short superconductive coherence length of the same order as the size of the crystalline unit cell (~5-30 A). As a result, microscopic defects such as oxygen vacancies, cationic disorder, and the presence of minute impurities have a significant effect on electrical transport in these materials. Therefore, much effort has been expended in synthesizing sizable samples that are homogeneous, well characterized, and emenable to the study of the anisotropic properties of the HTSC. We have demonstrated that thin films of HTSC compounds such as rm YBa_2Cu_3O_{7 -delta}, which is a 92 K superconductor, can be synthesized easily by a technique known as pulsed laser deposition, and ...
1992-01-01
International Nuclear Information System (INIS)
Analysis of steady-state and transient photoconductivity measurements at room temperature performed on c-axis oriented GaN nanowires yielded estimates of free carrier concentration, drift mobility, surface band bending, and surface capture coefficient for electrons. Samples grown (unintentionally n-type) by nitrogen-plasma-assisted molecular beam epitaxy primarily from two separate growth runs were examined. The results revealed carrier concentration in the range of (3-6)x10"1"6 cm"-"3 for one growth run, roughly 5x10"1"4-1x10"1"5 cm"-"3 for the second, and drift mobility in the range of 500-700 cm"2/(V s) for both. Nanowires were dispersed onto insulating substrates and contacted forming single-wire, two-terminal structures with typical electrode gaps of #approx =#3-5 #mu#m. When biased at 1 V bias and illuminated at 360 nm (3.6 mW/cm"2) the thinner (#approx =#100 nm diameter) nanowires with the higher background doping showed an abrupt increase in photocurrent ...
2010-02-01
International Nuclear Information System (INIS)
Interest to thin film of metals' silicides first of all is conditioned intrinsic al them unique physical properties. On their basis of it is possible to produce extremely sophisticated devices of solid-state electronics, production which needs the controlled change of physics, chemical and electrical properties with high-level of accuracy. On the present time most are in detail investigated composition, structure and properties of three-dimensional samples of metals' silicides. In the last years the intensive are led to researches in the direction of creation and study of physical-chemical properties thin (500-1000 Angstroms) and ultrafine (100-120 Angstroms) films silicides. It has information about composition, morphology of surface and emission of properties of thin film of silicides of barium, of cobalt and of palladium, was obtained in conditions of ultra-high vacuum. Low energy ion implantation and further annealing on composition, electronic and crystalline structure of Si ...
Interaction of antimicrobial peptides with lipid membranes
International Nuclear Information System (INIS)
This study aims to investigate the difference in the interaction of antimicrobial peptides with two classes of zwitterionic peptides, phosphatidylethanolamines (PE) and phosphatidylcholines (PC). Further experiments were performed on model membranes prepared from specific bacterial lipids, lipopolysaccharides (LPS) isolated from Salmonella minnesota. The structure of the lipid-peptide aqueous dispersions was studied by small-and wide-angle X-ray diffraction during heating and cooling from 5 to 85 C. The lipids and peptides were mixed at lipid-to-peptide ratios 10-10000 (POPE and POPC) or 2-50 (LPS). All experiments were performed at synchrotron soft condensed matter beamline A2 in Hasylab at Desy in Hamburg, Germany. The phases were identified and the lattice parameters were calculated. Alamethicin and melittin interact in similar ways with the lipids. Pure POPC forms only lamellar phases. POPE forms lamellar phases at low temperatures that upon heating transform into a highly curved ...
Heteroepitaxial growth of In-face InN on GaN (0001) by plasma-assisted molecular-beam epitaxy
International Nuclear Information System (INIS)
The thermodynamic aspects of indium-face InN growth by radio frequency plasma-assisted molecular-beam epitaxy (rf-MBE) and the nucleation of InN on gallium-face GaN (0001) surface were investigated. The rates of InN decomposition and indium desorption from the surface were measured in situ using reflected high-energy electron diffraction and the rf-MBE 'growth window' of In-face InN (0001) was identified. It is shown that sustainable growth can be achieved only when the arrival rate of active nitrogen species on the surface is higher than the arrival rate of indium atoms. The maximum substrate temperature permitting InN growth as a function of the active nitrogen flux was determined. The growth mode of InN on Ga-face GaN (0001) surface was investigated by reflected high-energy electron diffraction and atomic force microscopy. It was found to be of the Volmer-Weber-type for substrate temperatures less than 350 deg. C and of the Stranski-Krastanov for substrate ...
2005-06-01
Visible (657 nm) InGaP/InAlGaP strained quantum well vertical-cavity surface-emitting laser
We report the first visible (657 nm) vertical-cavity surface-emitting laser. The photopumped undoped structure was grown using low-pressure metalorganic vapor-phase epitaxy in a single-growth sequence on misoriented GaAs substrates. The optical cavity consists of an In{sub 0.54}Ga{sub 0.46}P/In{sub 0.48}(Al{sub 0.7}Ga{sub 0.3}){sub 0.52} P strained quantum-well active region and a lattice-matched In{sub 0.48}(Al{sub {ital y}}Ga{sub 1{minus}{ital y}}){sub 0.52} P (0.7{le}{ital y}{le}1.0) graded spacer region, while the distributed Bragg reflectors are composed of Al{sub 0.5}Ga{sub 0.5}As/AlAs quarter-wave stacks. Room-temperature optically pumped lasing was achieved with a very low-threshold power, clearly demonstrating the viability of this new technology. These results provide the foundation for visible semiconductor laser-diode arrays for a number of applications including laser projection displays, holographic memories, and plastic fiber communication.
1992-04-13
Energy Technology Data Exchange (ETDEWEB)
We have investigated the generation and propagation of misfit dislocations in strained In/sub y/Ga/sub 1-//sub y/As/GaAs multiquantum wells grown by molecular-beam epitaxy, with cross-sectional transmission electron microscopy. The samples are of excellent optical quality, with multiquantum wells having well widths of 100 A, being characterized by excitonic linewidths and Stokes shifts of 1.5--2.5 and 1--2 meV, respectively. We have examined the growth of 2-..mu..m-thick multiquantum-well samples grown either directly on GaAs, or with an intermediate composition buffer layer, and for the cases of small (y = 0.07) and large (y = 0.16) misfits. It is seen that for the case of quantum wells with small misfit, grown directly on GaAs, metastable growth can be achieved. This is confirmed by low-temperature absorption measurements and from transmission electron microscopy experiments performed both before and after post-growth thermal annealing. In the case of quantum ...
1989-05-01
Shallow Si/Pd-based ohmic contacts to n type Al{sub 0.5}In{sub 0.5}P and Ga{sub 0.5}In{sub 0.5}P
Energy Technology Data Exchange (ETDEWEB)
Si/Pd-based contact schemes based on the solid phase regrowth (SPR) principle have been developed to form low resistance ohmic contacts to n type Al{sub 0.5}In{sub 0.5}P and Ga{sub 0.5}In{sub 0.5}P lattice matched to GaAs grown by gas source molecular beam epitaxy (GSMBE). Lowest contact resistivities of {approximately} 6 {times} 10{sup {minus}6} {Omega}-cm{sup 2} and {approximately} 1 {times} 10{sup {minus}5} {Omega}-cm{sup 2} have been obtained on Al{sub 0.5}In{sub 0.5}P and Ga{sub 0.5}In{sub 0.5}P respectively (both doped to {approximately} 2 {times} 10{sup 18} cm{sup {minus}3}). In this article, the electrical properties and the ohmic contact formation model of the Si/Pd-based contacts to n-Al{sub 0.5}In{sub 0.5}P and n-Ga{sub 0.5}In{sub 0.5}P are presented.
1996-12-31
Self-interstitial diffusion and clustering with impurities in crystalline silicon
International Nuclear Information System (INIS)
In this work the diffusion of ion-beam-injected self-interstitials (Is) and their interaction with impurities in crystalline Si are presented. In particular, the I penetration into a molecular beam epitaxy grown Si structure was studied by means of diffusion effects induced on B spikes, analyzed by a developed simulation code. Trapping effects at sample-surface and bulk are evidenced and modeled. The B marker approach was extended to the two-dimensional (2D) I-diffusion occurring as a consequence of ion implantation through a sub-micron dimension patterned oxide mask. I-source size effects on the I penetration have been found and modeled, quantitatively describing the 2D I-diffusion. The I-substitutional carbon interactions have been also studied, showing the C ability to effectively retain Is. The I-trapping mechanism was quantitatively studied by the simulation code, showing that one I is able to deactivate about two C traps by means of I-trapping and ...
2004-02-01
International Nuclear Information System (INIS)
Buffer layers with 100% lattice match with YBa2Cu3O7 - ? (YBCO) were prepared from mixed rare-earth-oxides applying a simple sol-gel process and dip-coating method. Structural analysis of the sol-gel derived powder by X-ray diffraction revealed that the mixing parameter, which eliminates the lattice mismatch with YBCO, is x = 0.2382, 0.1852, 0.1252, 0.0906, 0.0793 and 0.0395 in (Eu1 - xHox)2O3, (Eu1 - xErx)2O3, (Eu1 - xYbx)2O3, (Gd1 - xHox)2O3, (Gd1 - xYx)2O3 and (Gd1 - xYbx)2O3, respectively. Microstructural investigations were carried out for Gd1.819Ho0.181O3 films epitaxially grown on cube-textured Ni (100) substrates by sol-gel dip-coating process. X-ray diffraction of the buffer showed strong out-of-plane orientation on Ni tape. The (Gd1 - xHox)2O3 (222) pole figure indicated a single cube-on-cube textured structure. The omega and phi scans revealed good out-of-plane and in-plane alne alignments. The full-width at half-maximum values of omega and phi scan of ...
2010-04-02
International Nuclear Information System (INIS)
This topical review provides an overview of quantum dot micropillars and their application in cavity quantum electrodynamics (cQED) experiments. The development of quantum dot micropillars is motivated by the study of fundamental cQED effects in solid state and their exploitation in novel light sources. In general, light-matter interaction occurs when the dipole of an emitter couples to the ambient light field. The corresponding coupling strength is strongly enhanced in the framework of cQED when the emitter is located inside a low mode volume microcavity providing three-dimensional photon confinement on a length scale of the photon wavelength. In addition, coherent coupling between light and matter, which is essential for applications in quantum information processing, can be achieved when dissipative losses, predominantly due to photon leakage out of the cavity, are strongly reduced. In this paper, we will demonstrate that high-quality, low mode volume quantum dot micropillars ...
2010-01-27
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5{times}10{sup 12} to 1{times}10{sup 14}/cm{sup 2} evolves into a distribution of {l_brace}311{r_brace} interstitial agglomerates during the initial annealing stages at 670{endash}815{degree}C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of interstitials from the damage region involves the dissolution of {l_brace}311{r_brace} defects during ...
1997-05-01
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
International Nuclear Information System (INIS)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5x10"1"2 to 1x10"1"4/cm"2 evolves into a distribution of #left brace#311#right brace# interstitial agglomerates during the initial annealing stages at 670 endash 815 degree C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of interstitials from the damage region involves the dissolution of #left brace#311#right brace# defects during Ostwald ...
Nuclear radiation detectors on II-VI compounds
International Nuclear Information System (INIS)
Nuclear radiation detectors in integral execution were produced by successive epitaxial growth from vapor phase of Zn Te and Cd Se thin layers onto scintillating Zn Se (Te) crystals. The irradiation of combined Zn Se (Te) - Zn Te - Cd Se detectors by Cu_K_a X-rays leads to the appearance of photoreceiver e.m.f., which tends to saturation with the increase of X-ray radiation dose reaching the value of 0.34-0.40 V at 200 R/min. The short circuit current dependence of irradiation dose power is linear. The matching factor for detectors with Zn Te-Cd Se photoreceivers with different doping levels is 0.68-0.92. The absolute monochromatic sensitivity is 0.32-0.35 m A/m W at a quantum efficiency 0.58-0.61 and a time constant 2 x 10"-"4 s. The calculated dose sensitivity for Zn Se(Te)-Zn Te-Cd Se combined detectors at the irradiation with X-rays having effective energy 8.86 keV gives the value 3.9 x 10"-"7 A/cm"2 (R/min); the experimental value of dose sensitivity reaches ...
1993-10-13
Microfabrication processes for high-T sub c superconducting films
Energy Technology Data Exchange (ETDEWEB)
Microfabrication processes for Y-Ba-Cu-O films have been investigated, using ion-beam techniques. High-{Tc} superconducting lines as narrow as 0.8 {mu}m have been fabricated from epitaxial YBa{sub 2}Cu{sub 3}O{sub 7 {minus} {ital y}} films by Ar ion-beam etching (IBE), combined with focused ion-beam (FIB) lithography. The resulting lines, 1.3 {mu}m wide and 2 mm long, showed a zero resistance temperature of 81 K and a critical current density of 1.9 {times} 10{sup 4} A/cm{sup 2} at 77.3 K. Maskless etching was carried out using 130-keV au{sup +} focused ion-beam (FIB) with a 0.1-{mu}m-diameter beam. A 50-nm-thick film was patterned into 0.3-{mu}m-wide lines at a dose of 5 {times} {sup 16} ions/cm{sup 2}. In comparison with Ar IBE, Cl{sub 2} reactive ion-beam etching (RIBE) exhibited an enhancement effect in sputtering yield. Ion implantation with 300-keV Si{sup + +} FIB also indicated the possibility to produce submicrometer patterns by selectively modifying film ...
1989-12-01
Local Structures and Interface Morphology of InGaAsN Thin Films Grown on GaAs
Energy Technology Data Exchange (ETDEWEB)
The compound semiconductor system InGaAsN exhibits many intriguing properties which are particularly useful for the development of innovative high efficiency thin film solar cells and long wavelength lasers. The bandgap in these semiconductors can be varied by controlling the content of N and In and the thin films can yet be lattice-matched to GaAs. In the present work, x-ray absorption fine structure (XAFS) and grazing incidence x-ray scattering (GIXS) techniques have been employed to probe the local environment surrounding both N and In atoms as well as the interface morphology of InGaAsN thin films epitaxially grown on GaAs. The soft x-ray XAFS results around nitrogen K-edge reveal that N is in the sp{sup 3} hybridized bonding configuration in InGaAsN and GaAsN, suggesting that N impurities most likely substitute for As sites in these two compounds. The results of In K-edge XAFS suggest a possible trend of a slightly larger coordination number of As nearest ...
1999-02-23
Kinetics of Pd/sub 2/Si layer growth measured by an x-ray diffraction technique
An x-ray diffraction approach has been developed for determination of the kinetics of growth of Pd/sub 2/Si layers. Epitaxial Pd/sub 2/Si films were grown on Si(111) substrates over a temperature range of 160-222/sup 0/C by a solid-state reaction between the substrates and the Pd overlayers. The parabolic rate equation was verified and rate constants showed Arrhenius behavior with an activation energy E/sub a/ = 1.06 eV and prefactor k/sub 0/ = 7 x 10/sup -4/ cm/sup 2//s. The low value of E/sub a/ suggests a short-circuit diffusion mechanism. It is reasonable to expect that impurities and microstructure may play important roles in the growth process. Impurity levels in the specimens were evaluated by analytic techniques suited to thin-film study: Rutherford backscattering spectrometry, secondary ion mass spectrometry, and Auger electron spectrometry. No impurities were present at concentrations approaching 1 at. %. Some O, C, and F were detected at the Pd/sub ...
1986-05-15
The x-ray diffraction technique described previously for measurement of growth kinetics of Pd/sub 2/Si layers from their solid state reaction couples has been extended by the use of a one-dimensional position-sensitive detector (PSD). Additionally, the method has been extended to include measurement of the Pd layer. A detailed description of the experimental arrangement and analytical procedures is presented. The kinetics of epitaxial Pd/sub 2/Si film growth were measured in situ over a range of 170--230 /sup 0/C. The PSD results, using data obtained from both the Pd/sub 2/Si and Pd layers, were able to confirm parabolic growth behavior for the Pd/sub 2/Si film. The rate constants followed Arrhenius behavior and yielded an activation energy of E = 1.32 +- 0.07 eV with a prefactor k/sub 0/ = 0.49 cm/sup 2//s for the Pd/sub 2/Si layer analysis and E = 1.34 +- 0.17 eV with a prefactor of 0.72 cm/sup 2//s for the Pd layer analysis. The PSD technique significantly ...
1988-02-15
Energy Technology Data Exchange (ETDEWEB)
The structure of hydroxylated oxide films (passive films) formed on Cr(110) in 0.5 M H{sub 2}SO{sub 4} at +0.35, +0.55, and +0.75 V/SHE has been investigated by in situ scanning tunneling microscopy (STM). Cathodic reduction pretreatments at {minus}0.54, {minus}0.64, and {minus}0.74 V/SHE destroy the well-defined topography of the single-crystal electrode and they have been excluded from the passivation procedure. Two different passive film structures have been observed, depending on the potential and time of passivation. At low potential (+0.35 V/SHE), the passive film, consisting mostly of chromium hydroxide, has a noncrystalline and granular structure whose roughness suggests local variations of thickness of ca. {+-} 0.5 nm. A similar structure is observed at higher potential (+0.55 V/SHE), but only for a short polarization time. For longer polarization at 0.55 V/SHE, and at higher potentials (+0.75 V/SHE), a crystalline structure is formed; the higher the potential, the faster the ...
1999-09-16
Pulsed operation of an AlGaInP graded-index separate confinement heterostructure laser grown by organometallic vapor phase epitaxy is reported. The laser active region consists of a single 100 A Ga/sub 0.5/In/sub 0.5/P quantum well and 1600 A graded index regions on both sides of the well. The graded index regions were produced by lattice-matched graded composition (Al/sub y/Ga/sub 1-//sub y/)/sub 0.5/In/sub 0.5/P quaternary alloys. This structure reduces the broad-area threshold current compared to a double heterostructure laser, with pulsed thresholds as low as 1050 A/cm/sup 2/. Total pulsed power of 1.4 W at 658 nm is available from an 80 ..mu..m x 300 ..mu..m mesa-stripe laser. A differential quantum efficiency of approx.56% is measured. By examining the cavity length dependence of the threshold current density and quantum efficiency, it is apparent that the quantum well gain has not saturated in these structures. This suggests that devices containing a thinner ...
1987-11-23
International Nuclear Information System (INIS)
We report on the transport properties of a high mobility two-dimensional hole system (2DHS) confined in GaAs/AlGaAs quantum wells grown by molecular-beam epitaxy on the (100) surface of GaAs. The quantum wells are modulation doped with carbon utilizing a resistive filament source. At T=0.3 K and carrier density p=1x10"1"1 cm"-"2, a mobility of 10"6 cm"2/Vs is achieved. At fixed carrier density p=10"1"1 cm"-"2, the mobility is found to be a nonmonotonic function of the quantum well width. The mobility peaks at 10"6 cm"2/Vs for a 15-nm well and is reduced for both smaller and larger well widths for these (100) samples. The mobility anisotropy is found to be small. Mobility along [011] is approximately 20% higher than along the [011] direction. In addition, the low-temperature carrier density is found to have low sensitivity to light. The hole density increases by only #approx#10% after exposure to red light at T=4.2 K. In structures designed for a lower carrier ...
2005-04-18
International Nuclear Information System (INIS)
Epitaxial CeO_2 buffer layers were fabricated by pulsed laser deposition (PLD) on r-cut sapphire substrates. An atomically flat CeO_2 surface with a high density of nanodots was formed by a self-assembly process. Scanning transmission electron microscopy and energy-dispersive X-ray spectroscopy investigation showed that the nanodots were CeO_2 other than impurities. YBa_2Cu_3O_7_-_#delta# (YBCO) thin films were then grown on the annealed and the as-grown CeO_2-buffered sapphires by PLD. The transport measurement results showed that the nanodots enhanced the effective pinning potential and significantly increased critical current density (J _c). Especially, YBCO films with an annealed CeO_2 buffer layer showed a high J _c peak when the applied field was directed along the c-axis of YBCO. Cross-section transmission electron microscopy investigation revealed that the J _c peaks in YBCO with annealed CeO_2 buffer layer is caused by c-axis correlated pinning sites, such ...
2006-12-05
We present results from the first studies of electric-field effects on optical transitions in visible-band-gap InGaP/InAlGaP multiple-quantum-well (MQW) structures. These structures, grown at 775 [degree]C by metalorganic vapor phase epitaxy on (100) GaAs substrates misoriented 6[degree] towards P(111)[r angle][l angle]111[r angle]A, consist of nominally undoped MQWs surrounded by doped In[sub 0.49]Al[sub 0.51]P cladding layers to form [ital p]-[ital i]-[ital n] diodes. The Stark shifts of various allowed and forbidden quantum-well transitions were observed in bias-dependent electroreflectance spectra of In[sub 0.49]Ga[sub 0.51]P/In[sub 0.49](Al[sub 0.5]Ga[sub 0.5])[sub 0.51]P MQW samples with 10-nm-thick layers. We find the magnitude of these shifts to depend on the details of the Mg doping profile, confirming the importance of Mg diffusion and unintentional background doping in these materials. Our results show that (InAlGa)P materials are promising for ...
1994-04-04
International Nuclear Information System (INIS)
We present results from the first studies of electric-field effects on optical transitions in visible-band-gap InGaP/InAlGaP multiple-quantum-well (MQW) structures. These structures, grown at 775 degree C by metalorganic vapor phase epitaxy on (100) GaAs substrates misoriented 6 degree towards P(111)right-angle left-angle 111 right-angle A, consist of nominally undoped MQWs surrounded by doped In_0_._4_9Al_0_._5_1P cladding layers to form p-i-n diodes. The Stark shifts of various allowed and forbidden quantum-well transitions were observed in bias-dependent electroreflectance spectra of In_0_._4_9Ga_0_._5_1P/In_0_._4_9(Al_0_._5Ga_0_._5)_0_._5_1P MQW samples with 10-nm-thick layers. We find the magnitude of these shifts to depend on the details of the Mg doping profile, confirming the importance of Mg diffusion and unintentional background doping in these materials. Our results show that (InAlGa)P materials are promising for visible-wavelength electro-optic ...
The authors present electric-field dependent electroreflectance and photocurrent spectra of visible-bandgap In{sub x}(Al{sub y}Ga{sub 1{minus}y}){sub 1{minus}x}P/In{sub x{prime}}(Al{sub y{prime}}Ga{sub 1{minus}y{prime}}){sub 1{minus}x{prime}}P multiple-quantum-well (MQW) structures. These structures, grown by metal-organic vapor phase epitaxy on 6{degrees}-misoriented (100) GaAs substrates, have undoped MQWs sandwiched between doped In{sub 0.5}Al{sub 0.5}P layers, forming p-i-n diodes. Quantum-well compositions in the range 0.46{le}x{le}0.52 and 0{le}y{le}0.4, corresponding to bandgaps in the red to yellow-green range, were used. The Stark shifts in these various samples were measured and found to depend on the details of the Mg p-type doping profile, confirming important diffusion effects, in agreement with secondary ion mass spectrometry and capacitance-voltage data. The results show that these new materials are promising for visible-wavelength optical modulator ...
1993-12-31
Effective thickness of CeO{sub 2} buffer layer for YBCO coated conductor by advanced TFA-MOD process
Energy Technology Data Exchange (ETDEWEB)
YBCO films were fabricated on PLD-CeO{sub 2}/IBAD-Gd{sub 2}Zr{sub 2}O{sub 7}/Hastelloy substrates using the advanced TFA-MOD process. The effective thickness of the CeO{sub 2} buffer layer for obtaining high I{sub c} was investigated in short samples of YBCO films. The CeO{sub 2} buffer layer was epitaxially grown on an IBAD-Gd{sub 2}Zr{sub 2}O{sub 7} template tape with 18 deg. of {delta}{phi} by a reel-to-reel PLD system. The in-plane grain alignment of PLD-CeO{sub 2} buffer layers rapidly improved with the thickness and saturated at a critical thickness of 0.8 {mu}m. The size of CeO{sub 2} grains was about 1 {mu}m at the saturated thickness of {delta}{phi}. YBCO films with the thickness of 1 {mu}m were deposited by the TFA-MOD on the CeO{sub 2} buffer layer with different thickness films. Improvement of the CeO{sub 2} in-plane grain alignment resulted in increase of I{sub c}. The I{sub c} values of 250-290 A were obtained with the CeO{sub 2} layer thicker than ...
2007-10-01
Diffusion in silicon isotope heterostructures
The simultaneous diffusion of Si and the dopants B, P, and As has been studied by the use of a multilayer structure of isotopically enriched Si. This structure, consisting of 5 pairs of 120 nm thick natural Si and {sup 28}Si enriched layers, enables the observation of {sup 30}Si self-diffusion from the natural layers into the {sup 28}Si enriched layers, as well as dopant diffusion from an implanted source in an amorphous Si cap layer, via Secondary Ion Mass Spectrometry (SIMS). The dopant diffusion created regions of the multilayer structure that were extrinsic at the diffusion temperatures. In these regions, the Fermi level shift due to the extrinsic condition altered the concentration and charge state of the native defects involved in the diffusion process, which affected the dopant and self-diffusion. The simultaneously recorded diffusion profiles enabled the modeling of the coupled dopant and self-diffusion. From the modeling of the simultaneous diffusion, the dopant diffusion ...
2004-05-14
Relations between structural and superconducting properties of bulk and thin film high-T_c materials
International Nuclear Information System (INIS)
The structural ordering of oxygen deficient and Co-doped YBCO (YBa_2Cu_3_-_yCo_yO_6_+_x) have been studied experimentally, and by computer simulations of the oxygen ordering in the basal plane of the structure. The calculations are based on the two-dimensional ASYNNNI model and its modifications. Good agreement is established between the ASYNNNI calculations and the experimentally observed structural properties of the double cell ortho-II structure and the oxygen disordering process from Co-doping into the basal plane. A model that relates the superconducting transition temperature T_c(x) of undoped YBCO and T_c(y) of Co-doped YBCO to the formation of specific domains of the two orthorhombic ordered oxygen phases, ortho-I and ortho-II, shows a close agreement with experimental T_c(x) and T_c(y) data of samples prepared under equilibrium conditions. The structural changes as a result of metal ion substitutions and oxidation/reduction processes have been studied by neutron powder ...
1984-02-13
Energy Technology Data Exchange (ETDEWEB)
1. In order to carry out isothermic crystal growth experiments of YBCO the 123 primary crystallization field was determined by means of phase diagram investigations and crystal growth experiments at different oxygen partial pressure. 2. YBCO single crystals of high crystallographic perfection were grown and conclusions on the flux pinning mechanism were drawn. 3. By means of Liquid Phase Epitaxy (LPE) single crystalline (Tc{approx}90 K; {Delta}T{<=}0.5 K) c- and a,b- YBCO fils have been prepared on NdGaO{sub 3} and LaGaO{sub 3} substrates. The films were characterized structurally and magnetically. 4. Our fist melt textured YBCO ``single crystals`` possess intracrystalline critical current densities >10{sup 4} A/cm{sup 2} at B{<=}2T. The irreversibility inductions are {<=}6 T at 77 K. A simple demonstrator was constructed together with the IFW Dresden and a growth model was developed. 5. Using above all torque magnetometer measurements we separated ...
1993-06-01
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